Differential etching apparatus including particular materials of construction

Industry

CPC
Y10S156/914

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Parent Industries

YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S156/00Adhesive bonding and miscellaneous chemical manufacture

Current Industry

Y10S156/914Differential etching apparatus including particular materials of construction

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for fabricating chamber parts
- Patent number 11,591,689
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Mats Larsson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for backside polymer reduction in dry-etch process
- Patent number 8,529,783
- Issue date Sep 10, 2013
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Huang-Ming Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma confinement rings having reduced polymer deposition characte...
- Patent number 8,500,952
- Issue date Aug 6, 2013
- Lam Research Corporation
- Rajinder Dhindsa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma confinement rings having reduced polymer deposition characte...
- Patent number 8,262,922
- Issue date Sep 11, 2012
- Lam Research Corporation
- Rajinder Dhindsa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and apparatus for backside polymer reduction in dry-etch pro...
- Patent number 7,713,380
- Issue date May 11, 2010
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Huang-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement ring assemblies having reduced polymer depositio...
- Patent number 7,430,986
- Issue date Oct 7, 2008
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Island projection-modified part, method for producing the same, and...
- Patent number 7,338,699
- Issue date Mar 4, 2008
- Tosoh Corporation
- Koyata Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric-coated electrode, plasma discharge treatment apparatus a...
- Patent number 7,281,491
- Issue date Oct 16, 2007
- Konica Corporation
- Shunichi Iwamaru
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition apparatus
- Patent number 7,270,715
- Issue date Sep 18, 2007
- Micron Technology, Inc.
- Ross S. Dando
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,229,522
- Issue date Jun 12, 2007
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber having components with textured surfaces and method of manu...
- Patent number 6,933,025
- Issue date Aug 23, 2005
- Applied Materials, Inc.
- Shyh-Nung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition apparatus
- Patent number 6,814,813
- Issue date Nov 9, 2004
- Micron Technology, Inc.
- Ross S. Dando
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating boron carbide on aluminum
- Patent number 6,808,747
- Issue date Oct 26, 2004
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber components having textured surfaces and method of manufacture
- Patent number 6,777,045
- Issue date Aug 17, 2004
- Applied Materials Inc.
- Shyh-Nung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus of carbon thin film
- Patent number 6,743,729
- Issue date Jun 1, 2004
- Osaka Prefecture
- Katsutoshi Izumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Container for treating with corrosive-gas and plasma and method for...
- Patent number 6,645,585
- Issue date Nov 11, 2003
- Kyocera Corporation
- Shunichi Ozono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing using a member comprising an oxide of a group...
- Patent number 6,641,697
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination high density plasma etch chambers and methods for...
- Patent number 6,583,064
- Issue date Jun 24, 2003
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination high density plasma etch chambers and methods for...
- Patent number 6,394,026
- Issue date May 28, 2002
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film formed by inductively coupled plasma
- Patent number 6,380,612
- Issue date Apr 30, 2002
- Hyundai Display Technology, Inc.
- Jin Jang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic composition for an apparatus and method for processing a su...
- Patent number 6,352,611
- Issue date Mar 5, 2002
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum treatment system and its stage
- Patent number 6,235,146
- Issue date May 22, 2001
- Hitachi, Ltd.
- Masanori Kadotani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating for parts used in semiconductor processing chambers
- Patent number 6,235,120
- Issue date May 22, 2001
- Applied Materials, Inc.
- Won Bang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Instrument for production of semiconductor device and process for p...
- Patent number 6,221,200
- Issue date Apr 24, 2001
- Nisshinbo Industries Inc.
- Kazuo Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support for a thermal processing chamber
- Patent number 6,200,388
- Issue date Mar 13, 2001
- Applied Materials, Inc.
- Dean C. Jennings
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Center gas feed apparatus for a high density plasma reactor
- Patent number 6,193,836
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Jon Mohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination high density plasma etch chambers and methods for...
- Patent number 6,129,808
- Issue date Oct 10, 2000
- Lam Research Corporation
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic composition for an apparatus and method for processing a su...
- Patent number 6,123,791
- Issue date Sep 26, 2000
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing glass substrate
- Patent number 6,120,661
- Issue date Sep 19, 2000
- Sony Corporation
- Shinsuke Hirano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron carbide parts and coatings in a plasma reactor
- Patent number 6,120,640
- Issue date Sep 19, 2000
- Applied Materials, Inc.
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FABRICATING CHAMBER PARTS
- Publication number 20230167543
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Mats LARSSON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CONFINEMENT RINGS HAVING REDUCED POLYMER DEPOSITION CHARACTE...
- Publication number 20120325407
- Publication date Dec 27, 2012
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for backside polymer reduction in dry-etch process
- Publication number 20100190349
- Publication date Jul 29, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Huang-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma confinement rings assemblies having reduced polymer depositi...
- Publication number 20080318433
- Publication date Dec 25, 2008
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma confinement ring assemblies having reduced polymer depositio...
- Publication number 20060207502
- Publication date Sep 21, 2006
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for backside polymer reduction in dry-etch pro...
- Publication number 20050164506
- Publication date Jul 28, 2005
- Huang-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber having components with textured surfaces and method of manu...
- Publication number 20040180158
- Publication date Sep 16, 2004
- APPLIED MATERIALS, INC.
- Shyh-Nung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chemical vapor deposition apparatus
- Publication number 20040089240
- Publication date May 13, 2004
- Ross S. Dando
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Island projection-modified part, method for producing the same, and...
- Publication number 20040086689
- Publication date May 6, 2004
- TOSOH CORPORATION
- Koyata Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20040063319
- Publication date Apr 1, 2004
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dielectric-coated electrode, plasma discharge treatment apparatus a...
- Publication number 20030228416
- Publication date Dec 11, 2003
- Shunichi Iwamaru
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Chemical vapor deposition apparatus
- Publication number 20030200926
- Publication date Oct 30, 2003
- Ross S. Dando
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process chamber components having textured internal surfaces and me...
- Publication number 20030026917
- Publication date Feb 6, 2003
- Shyh-Nung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and etching apparatus of carbon thin film
- Publication number 20020130107
- Publication date Sep 19, 2002
- OSAKA PREFECTURE
- Katsutoshi Izumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low contamination high density plasma etch chambers and methods for...
- Publication number 20020102858
- Publication date Aug 1, 2002
- Thomas E. Wicker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing using a member comprising an oxide of a group...
- Publication number 20020100554
- Publication date Aug 1, 2002
- APPLIED MATERIALS, INC.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Container for treating with corrosive-gas and plasma and method for...
- Publication number 20020009560
- Publication date Jan 24, 2002
- KYOCERA CORPORATION
- Shunichi Ozono
- B32 - LAYERED PRODUCTS

Differential etching apparatus including particular materials of construction

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for fabricating chamber parts

Method for backside polymer reduction in dry-etch process

Plasma confinement rings having reduced polymer deposition characte...

Plasma confinement rings having reduced polymer deposition characte...

Method and apparatus for backside polymer reduction in dry-etch pro...

Plasma confinement ring assemblies having reduced polymer depositio...

Island projection-modified part, method for producing the same, and...

Dielectric-coated electrode, plasma discharge treatment apparatus a...

Chemical vapor deposition apparatus

Substrate processing apparatus and substrate processing method

Chamber having components with textured surfaces and method of manu...

Chemical vapor deposition apparatus

Coating boron carbide on aluminum

Chamber components having textured surfaces and method of manufacture

Etching method and etching apparatus of carbon thin film

Container for treating with corrosive-gas and plasma and method for...

Substrate processing using a member comprising an oxide of a group...

Low contamination high density plasma etch chambers and methods for...

Low contamination high density plasma etch chambers and methods for...

Thin film formed by inductively coupled plasma

Ceramic composition for an apparatus and method for processing a su...

Vacuum treatment system and its stage

Coating for parts used in semiconductor processing chambers

Instrument for production of semiconductor device and process for p...

Substrate support for a thermal processing chamber

Center gas feed apparatus for a high density plasma reactor

Low contamination high density plasma etch chambers and methods for...

Ceramic composition for an apparatus and method for processing a su...

Apparatus for processing glass substrate

Boron carbide parts and coatings in a plasma reactor

Patents Applicationslast 30 patents

METHOD FOR FABRICATING CHAMBER PARTS

PLASMA CONFINEMENT RINGS HAVING REDUCED POLYMER DEPOSITION CHARACTE...

Method for backside polymer reduction in dry-etch process

Plasma confinement rings assemblies having reduced polymer depositi...

Plasma confinement ring assemblies having reduced polymer depositio...

Method and apparatus for backside polymer reduction in dry-etch pro...

Chamber having components with textured surfaces and method of manu...

Chemical vapor deposition apparatus

Island projection-modified part, method for producing the same, and...

Substrate processing apparatus and substrate processing method

Dielectric-coated electrode, plasma discharge treatment apparatus a...

Chemical vapor deposition apparatus

Process chamber components having textured internal surfaces and me...

Etching method and etching apparatus of carbon thin film

Low contamination high density plasma etch chambers and methods for...

Substrate processing using a member comprising an oxide of a group...

Container for treating with corrosive-gas and plasma and method for...