Diffractive optical elements

Industry

CPC
G03F7/70158

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70158Diffractive optical elements

Industries

Patents Grantslast 30 patents

Information Patent Grant
Dual diffraction order spin-on-glass phase-grating beam-splitter ba...
- Patent number 12,204,249
- Issue date Jan 21, 2025
- Steven R. J. Brueck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 12,007,700
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Optical diffraction component
- Patent number 11,947,265
- Issue date Apr 2, 2024
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,940,737
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High uniformity telecentric illuminator
- Patent number 11,868,049
- Issue date Jan 9, 2024
- Innovations In Optics, Inc.
- Thomas J. Brukilacchio
- G02 - OPTICS
Information Patent Grant
EUV lithography system with diffraction optics
- Patent number 11,520,235
- Issue date Dec 6, 2022
- Kenneth Carlisle Johnson
- G02 - OPTICS
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 11,415,900
- Issue date Aug 16, 2022
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 11,385,552
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining a radiation beam intensity pro...
- Patent number 11,353,796
- Issue date Jun 7, 2022
- ASML Netherlands B.V.
- Teis Johan Coenen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination source for an inspection apparatus, inspection apparat...
- Patent number 11,347,155
- Issue date May 31, 2022
- ASML Netherlands B.V.
- David O Dwyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydroxide-catalysis bonding of optical components used in DUV optic...
- Patent number 11,340,383
- Issue date May 24, 2022
- Corning Incorporated
- Michael Morgan Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle and method of detecting intactness of reticle stage using t...
- Patent number 11,221,562
- Issue date Jan 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Yu Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for monitoring reflectivity of the collector f...
- Patent number 11,204,556
- Issue date Dec 21, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chih Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 11,194,256
- Issue date Dec 7, 2021
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Projection system and mirror and radiation source for a lithographi...
- Patent number 11,150,560
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Marcus Adrianus Van De Kerkhof
- G02 - OPTICS
Information Patent Grant
Beam splitting apparatus
- Patent number 11,112,618
- Issue date Sep 7, 2021
- ASML Netherlands B.V.
- Gosse Charles De Vries
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to mitigate defect printability for ID pattern
- Patent number 11,086,227
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Grant
Device for determining the exposure energy during the exposure of a...
- Patent number 11,079,604
- Issue date Aug 3, 2021
- Carl Zeiss SMT GmbH
- Thomas Frank
- G02 - OPTICS
Information Patent Grant
Optical module with an anticollision device for module components
- Patent number 11,054,755
- Issue date Jul 6, 2021
- Carl Zeiss SMT GmbH
- Joachim Hartjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an illumination system for an EUV projection e...
- Patent number 11,048,172
- Issue date Jun 29, 2021
- Carl Zeiss SMT GmbH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reticle
- Patent number 11,003,091
- Issue date May 11, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsueh-Yi Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of aligning a diffractive optical system and diffracting be...
- Patent number 10,983,361
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Sander Bas Roobol
- G02 - OPTICS
Information Patent Grant
Producing light-exposed structures on a workpiece
- Patent number 10,969,693
- Issue date Apr 6, 2021
- Temicon GmbH
- Oliver Humbach
- G02 - OPTICS
Information Patent Grant
Optical diffraction component for suppressing at least one target w...
- Patent number 10,852,640
- Issue date Dec 1, 2020
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Grant
Method of measuring a structure, inspection apparatus, lithographic...
- Patent number 10,831,109
- Issue date Nov 10, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for determining a characteristic of one...
- Patent number 10,816,909
- Issue date Oct 27, 2020
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus having non-linear optics
- Patent number 10,809,193
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Marinus Johannes Maria Van Dam
- G01 - MEASURING TESTING
Information Patent Grant
Method of designing metrology targets, substrates having metrology...
- Patent number 10,809,628
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of measuring a parameter of interest, device manufacturing m...
- Patent number 10,788,758
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Jin Lian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for monitoring reflectivity of the collector f...
- Patent number 10,747,119
- Issue date Aug 18, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chih Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
IMAGING OPTICAL UNIT
- Publication number 20240103382
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Hans-Jürgen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, IN PARTICULAR FOR REFLECTING EUV RADIATION, OPTICA...
- Publication number 20230266673
- Publication date Aug 24, 2023
- Carl Zeiss SMT GMBH
- Vitaliy SHKLOVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSMISSIVE DIFFRACTION GRATING
- Publication number 20230251407
- Publication date Aug 10, 2023
- ASML NETHERLANDS B.V.
- Derick Yun Chek Chong
- G02 - OPTICS
Information Patent Application
OPTICAL COMPONENT
- Publication number 20230221648
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20230213866
- Publication date Jul 6, 2023
- SEMES CO.,LTD
- Hyun YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICES AND METHODS FOR MANUFACTURING THE OPTICAL DEVICES
- Publication number 20230152708
- Publication date May 18, 2023
- II-VI Delaware, Inc.
- Christoph M. GREINER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology System and Method for Determining a Characteristic of One...
- Publication number 20230062585
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
HIGH UNIFORMITY TELECENTRIC ILLUMINATOR
- Publication number 20220334498
- Publication date Oct 20, 2022
- INNOVATIONS IN OPTICS, INC.
- Thomas J. Brukilacchio
- G02 - OPTICS
Information Patent Application
DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURI...
- Publication number 20220236650
- Publication date Jul 28, 2022
- Canon Kabushiki Kaisha
- Ryo Nakayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR FABRICATING MICROSTRUCTURES
- Publication number 20220221732
- Publication date Jul 14, 2022
- MICROTAU IP PTY LTD
- Henry Claudius BILINSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DIFFRACTION COMPONENT
- Publication number 20220171292
- Publication date Jun 2, 2022
- Carl Zeiss SMT GmbH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
OPTICAL ILLUMINATION SYSTEM FOR GUIDING EUV RADIATION
- Publication number 20220163897
- Publication date May 26, 2022
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20220158401
- Publication date May 19, 2022
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography System with Diffraction Optics
- Publication number 20220107568
- Publication date Apr 7, 2022
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20210397099
- Publication date Dec 23, 2021
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...
- Publication number 20210318622
- Publication date Oct 14, 2021
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING RETICLE
- Publication number 20210263425
- Publication date Aug 26, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Yi CHUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Illumination Source for an Inspection Apparatus, Inspection Apparat...
- Publication number 20210191274
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- David O DWYER
- G02 - OPTICS
Information Patent Application
Method of Measuring a Structure, Inspection Apparatus, Lithographic...
- Publication number 20210026256
- Publication date Jan 28, 2021
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology System and Method For Determining a Characteristic of one...
- Publication number 20210003924
- Publication date Jan 7, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR MONITORING REFLECTIVITY OF THE COLLECTOR F...
- Publication number 20200379357
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Chih HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method to Mitigate Defect Printability for ID Pattern
- Publication number 20200310250
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Cheng Lu
- G02 - OPTICS
Information Patent Application
RETICLE AND METHOD OF DETECTING INTACTNESS OF RETICLE STAGE USING T...
- Publication number 20200292932
- Publication date Sep 17, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Yu LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Projection System and Mirror and Radiation Source for a Lithographi...
- Publication number 20200285155
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Marcus Adrianus VAN DE KERKHOF
- G02 - OPTICS
Information Patent Application
PRODUCING LIGHT-EXPOSED STRUCTURES ON A WORKPIECE
- Publication number 20200233313
- Publication date Jul 23, 2020
- temicon GmbH
- Oliver Humbach
- G02 - OPTICS
Information Patent Application
OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...
- Publication number 20200225586
- Publication date Jul 16, 2020
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING RETICLE
- Publication number 20200150546
- Publication date May 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Yi CHUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...
- Publication number 20200110340
- Publication date Apr 9, 2020
- Carl Zeiss SMT GMBH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE FOR DETERMINING THE EXPOSURE ENERGY DURING THE EXPOSURE OF A...
- Publication number 20200103668
- Publication date Apr 2, 2020
- Carl Zeiss SMT GMBH
- Thomas Frank
- G02 - OPTICS

Diffractive optical elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Dual diffraction order spin-on-glass phase-grating beam-splitter ba...

Metrology system and method for determining a characteristic of one...

Optical diffraction component

Method of fabricating reticle

High uniformity telecentric illuminator

EUV lithography system with diffraction optics

Metrology system and method for determining a characteristic of one...

Method of measuring a structure, inspection apparatus, lithographic...

Method and apparatus for determining a radiation beam intensity pro...

Illumination source for an inspection apparatus, inspection apparat...

Hydroxide-catalysis bonding of optical components used in DUV optic...

Reticle and method of detecting intactness of reticle stage using t...

Apparatus and method for monitoring reflectivity of the collector f...

Optical diffraction component for suppressing at least one target w...

Projection system and mirror and radiation source for a lithographi...

Beam splitting apparatus

Method to mitigate defect printability for ID pattern

Device for determining the exposure energy during the exposure of a...

Optical module with an anticollision device for module components

Method for producing an illumination system for an EUV projection e...

Method of fabricating reticle

Methods of aligning a diffractive optical system and diffracting be...

Producing light-exposed structures on a workpiece

Optical diffraction component for suppressing at least one target w...

Method of measuring a structure, inspection apparatus, lithographic...

Metrology system and method for determining a characteristic of one...

Inspection apparatus having non-linear optics

Method of designing metrology targets, substrates having metrology...

Method of measuring a parameter of interest, device manufacturing m...

Apparatus and method for monitoring reflectivity of the collector f...

Patents Applicationslast 30 patents

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

IMAGING OPTICAL UNIT

OPTICAL ELEMENT, IN PARTICULAR FOR REFLECTING EUV RADIATION, OPTICA...

TRANSMISSIVE DIFFRACTION GRATING

OPTICAL COMPONENT

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

OPTICAL DEVICES AND METHODS FOR MANUFACTURING THE OPTICAL DEVICES

Metrology System and Method for Determining a Characteristic of One...

HIGH UNIFORMITY TELECENTRIC ILLUMINATOR

DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURI...

SYSTEMS AND METHODS FOR FABRICATING MICROSTRUCTURES

OPTICAL DIFFRACTION COMPONENT

OPTICAL ILLUMINATION SYSTEM FOR GUIDING EUV RADIATION

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

EUV Lithography System with Diffraction Optics

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...

METHOD OF FABRICATING RETICLE

Illumination Source for an Inspection Apparatus, Inspection Apparat...

Method of Measuring a Structure, Inspection Apparatus, Lithographic...

Metrology System and Method For Determining a Characteristic of one...

APPARATUS AND METHOD FOR MONITORING REFLECTIVITY OF THE COLLECTOR F...

Method to Mitigate Defect Printability for ID Pattern

RETICLE AND METHOD OF DETECTING INTACTNESS OF RETICLE STAGE USING T...

Projection System and Mirror and Radiation Source for a Lithographi...

PRODUCING LIGHT-EXPOSED STRUCTURES ON A WORKPIECE

OPTICAL DIFFRACTION COMPONENT FOR SUPPRESSING AT LEAST ONE TARGET W...

METHOD OF FABRICATING RETICLE

METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...

DEVICE FOR DETERMINING THE EXPOSURE ENERGY DURING THE EXPOSURE OF A...