Direction of beam or parts thereof in view of the optical axis

Industry

CPC
H01J2237/24528

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24528Direction of beam or parts thereof in view of the optical axis

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of determining the beam convergence of a focused charged par...
- Patent number 11,791,128
- Issue date Oct 17, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dominik Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection of buried features by backscattered particles
- Patent number 11,443,915
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Joe Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ angle measurement using channeling
- Patent number 11,387,073
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of angled gratings
- Patent number 11,380,578
- Issue date Jul 5, 2022
- Applied Materials, Inc.
- Rutger Meyer Timmerman Thijssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and beam profiler
- Patent number 11,205,560
- Issue date Dec 21, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration measurement method and electron microscope
- Patent number 10,840,058
- Issue date Nov 17, 2020
- Jeol Ltd.
- Yuji Kohno
- G01 - MEASURING TESTING
Information Patent Grant
Ion implantation apparatus and measurement device
- Patent number 10,790,117
- Issue date Sep 29, 2020
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoshiaki Inda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam apparatus
- Patent number 10,790,112
- Issue date Sep 29, 2020
- Hitachi High-Tech Science Corporation
- Yoshimi Kawanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 10,755,893
- Issue date Aug 25, 2020
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,586,681
- Issue date Mar 10, 2020
- ASML Netherlands B.V.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam profiling speed enhancement for scanned beam implanters
- Patent number 10,483,086
- Issue date Nov 19, 2019
- Axcelis Technologies, Inc.
- Andy M. Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and measurement device
- Patent number 10,403,472
- Issue date Sep 3, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Kazuhisa Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,020,164
- Issue date Jul 10, 2018
- Hermes Microvision Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation apparatus and semiconductor manufacturing method
- Patent number 9,773,712
- Issue date Sep 26, 2017
- TOSHIBA MEMORY CORPORATION
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tube-detector alignment using light projections
- Patent number 9,737,280
- Issue date Aug 22, 2017
- Koninklijke Philips N.V.
- Dirk Manke
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
System and method to improve productivity of hybrid scan ion beam i...
- Patent number 9,711,329
- Issue date Jul 18, 2017
- Axelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam measuring device and method of measuring ion beam
- Patent number 9,564,292
- Issue date Feb 7, 2017
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Noriyasu Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control for optically aligning an X-ray tube and X-ray detector
- Patent number 9,474,502
- Issue date Oct 25, 2016
- Koninklijke Philips N.V.
- Christoph Kurze
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,362,087
- Issue date Jun 7, 2016
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter, beam energy measuring device, and method of measurin...
- Patent number 9,343,263
- Issue date May 17, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Haruka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam monitoring device, method, and system
- Patent number 9,218,938
- Issue date Dec 22, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Nai-Han Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device, and image analysis device
- Patent number 9,129,353
- Issue date Sep 8, 2015
- Hitachi High-Technologies Corporation
- Masumi Shirai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,889,503
- Issue date Nov 18, 2014
- Panasonic Corporation
- Kenji Yoneda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of adjusting the same
- Patent number 8,859,964
- Issue date Oct 14, 2014
- Jeol Ltd.
- Yuji Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time monitoring ion beam
- Patent number 8,835,882
- Issue date Sep 16, 2014
- Advanced Ion Beam Technology, Inc.
- Wei-Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam monitoring device, method, and system
- Patent number 8,766,207
- Issue date Jul 1, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting system
- Patent number 8,698,110
- Issue date Apr 15, 2014
- Advanced Ion Beam Technology, Inc.
- Heng-Gung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique and apparatus for monitoring ion mass, energy, and angle...
- Patent number 8,698,107
- Issue date Apr 15, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster ion beam etch profile control using beam divergence
- Patent number 8,691,700
- Issue date Apr 8, 2014
- TEL Epion Inc.
- John J. Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for electron beam detection
- Patent number 8,692,204
- Issue date Apr 8, 2014
- KLA-Tencor Corporation
- Shinichi Kojima
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM
- Publication number 20240194444
- Publication date Jun 13, 2024
- INFINEON TECHNOLOGIES AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...
- Publication number 20240087838
- Publication date Mar 14, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...
- Publication number 20230402253
- Publication date Dec 14, 2023
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20230317399
- Publication date Oct 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshimasa KAMEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING THE BEAM CONVERGENCE OF A FOCUSED CHARGED PAR...
- Publication number 20230116466
- Publication date Apr 13, 2023
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dominik Ehberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF ANGLED GRATINGS
- Publication number 20220301926
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Rutger MEYER TIMMERMAN THIJSSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND BEAM PROFILER
- Publication number 20210134559
- Publication date May 6, 2021
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- David Edward Potkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20200251305
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Zhongwei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETECTION OF BURIED FEATURES BY BACKSCATTERED PARTICLES
- Publication number 20200243299
- Publication date Jul 30, 2020
- ASML NETHERLANDS B.V.
- Joe WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF ANGLED GRATINGS
- Publication number 20200144109
- Publication date May 7, 2020
- Applied Materials, Inc.
- Rutger MEYER TIMMERMAN THIJSSEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE
- Publication number 20190295818
- Publication date Sep 26, 2019
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoshiaki Inda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20190237297
- Publication date Aug 1, 2019
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS
- Publication number 20160042915
- Publication date Feb 11, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEDICAL IMAGING SYSTEM AND METHOD FOR PROVIDING AN X-RAY IMAGE
- Publication number 20140341356
- Publication date Nov 20, 2014
- Christoph Kurze
- G02 - OPTICS
Information Patent Application
Beam Monitoring Device, Method, and System
- Publication number 20140306119
- Publication date Oct 16, 2014
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20140291510
- Publication date Oct 2, 2014
- Hermes-Microvision, Inc.
- Zhongwei Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20140158903
- Publication date Jun 12, 2014
- Canon Kabushiki Kaisha
- Kentaro Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20140106521
- Publication date Apr 17, 2014
- PANASONIC CORPORATION
- Kenji YONEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope and Method of Adjusting the Same
- Publication number 20130327938
- Publication date Dec 12, 2013
- Yuji Kohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS
- Publication number 20130320209
- Publication date Dec 5, 2013
- Hitachi High-Technologies Corporation
- Hiroyasu Shichi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, AND IMAGE ANALYSIS DEVICE
- Publication number 20130301954
- Publication date Nov 14, 2013
- Hitachi High-Technologies Corporation
- Masumi Shirai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SAMPLE ANALYZING APPARATUS AND SAMPLE ANALYZING METHOD
- Publication number 20130248706
- Publication date Sep 26, 2013
- Haruko AKUTSU
- G01 - MEASURING TESTING
Information Patent Application
Beam Monitoring Device, Method, And System
- Publication number 20130075624
- Publication date Mar 28, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hong Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ION BEAM ETCH PROFILE CONTROL USING BEAM DIVERGENCE
- Publication number 20130059449
- Publication date Mar 7, 2013
- TEL Epion Inc.
- John J. HAUTALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM INCIDENT ANGLE DETECTION ASSEMBLY AND METHOD
- Publication number 20130035897
- Publication date Feb 7, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Thomas A. Pandolfi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Real Time Monitoring Ion Beam
- Publication number 20130001433
- Publication date Jan 3, 2013
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Wei-Cheng LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTING SYSTEM
- Publication number 20120280137
- Publication date Nov 8, 2012
- Heng-Gung CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ELECTRON BEAM DETECTION
- Publication number 20120273686
- Publication date Nov 1, 2012
- Shinichi KOJIMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK HEALTH MONITOR USING A FARADAY PROBE
- Publication number 20120181443
- Publication date Jul 19, 2012
- VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.,
- Benjamin B. RIORDON
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
TECHNIQUE AND APPARATUS FOR MONITORING ION MASS, ENERGY, AND ANGLE...
- Publication number 20120175518
- Publication date Jul 12, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS

Direction of beam or parts thereof in view of the optical axis

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of determining the beam convergence of a focused charged par...

Detection of buried features by backscattered particles

In situ angle measurement using channeling

Formation of angled gratings

Ion implanter and beam profiler

Aberration measurement method and electron microscope

Ion implantation apparatus and measurement device

Focused ion beam apparatus

Charged particle beam writing method and charged particle beam writ...

Charged particle beam apparatus

Beam profiling speed enhancement for scanned beam implanters

Ion implantation apparatus and measurement device

Charged particle beam apparatus

Ion implantation apparatus and semiconductor manufacturing method

Tube-detector alignment using light projections

System and method to improve productivity of hybrid scan ion beam i...

Ion beam measuring device and method of measuring ion beam

Control for optically aligning an X-ray tube and X-ray detector

Charged particle beam apparatus

Ion implanter, beam energy measuring device, and method of measurin...

Beam monitoring device, method, and system

Charged particle beam device, and image analysis device

Method for manufacturing semiconductor device

Electron microscope and method of adjusting the same

Real time monitoring ion beam

Beam monitoring device, method, and system

Ion implanting system

Technique and apparatus for monitoring ion mass, energy, and angle...

Gas cluster ion beam etch profile control using beam divergence

Apparatus and methods for electron beam detection

Patents Applicationslast 30 patents

ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM

MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTIC...

Charged Particle Beam Device

METHOD OF DETERMINING THE BEAM CONVERGENCE OF A FOCUSED CHARGED PAR...

FORMATION OF ANGLED GRATINGS

ION IMPLANTER AND BEAM PROFILER

CHARGED PARTICLE BEAM APPARATUS

DETECTION OF BURIED FEATURES BY BACKSCATTERED PARTICLES

FORMATION OF ANGLED GRATINGS

ION IMPLANTATION APPARATUS AND MEASUREMENT DEVICE

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS

MEDICAL IMAGING SYSTEM AND METHOD FOR PROVIDING AN X-RAY IMAGE

Beam Monitoring Device, Method, and System

Charged Particle Beam Apparatus

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Electron Microscope and Method of Adjusting the Same

ION BEAM PROCESSING APPARATUS

CHARGED PARTICLE BEAM DEVICE, AND IMAGE ANALYSIS DEVICE

SAMPLE ANALYZING APPARATUS AND SAMPLE ANALYZING METHOD

Beam Monitoring Device, Method, And System

GAS CLUSTER ION BEAM ETCH PROFILE CONTROL USING BEAM DIVERGENCE

ION BEAM INCIDENT ANGLE DETECTION ASSEMBLY AND METHOD

Real Time Monitoring Ion Beam

ION IMPLANTING SYSTEM

APPARATUS AND METHODS FOR ELECTRON BEAM DETECTION

MASK HEALTH MONITOR USING A FARADAY PROBE

TECHNIQUE AND APPARATUS FOR MONITORING ION MASS, ENERGY, AND ANGLE...