Dividing into sub-patterns

Industry

CPC
H01J2237/31764

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31764Dividing into sub-patterns

Industries

Patents Grantslast 30 patents

Information Patent Grant
Massive overlay metrology sampling with multiple measurement columns
- Patent number 11,899,375
- Issue date Feb 13, 2024
- KLA Corporation
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,869,746
- Issue date Jan 9, 2024
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 11,270,865
- Issue date Mar 8, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam evaluation method and multi charged par...
- Patent number 11,211,227
- Issue date Dec 28, 2021
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for fabricating unique chips using a charged part...
- Patent number 11,137,689
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus Van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,937,629
- Issue date Mar 2, 2021
- NuFlare Technology, Inc.
- Hironori Teguri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ebeam universal cutter
- Patent number 10,578,970
- Issue date Mar 3, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for scanning an object with an electron beam usin...
- Patent number 10,541,104
- Issue date Jan 21, 2020
- Applied Materials Israel Ltd.
- Uri Lev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose-related feature reshaping in an exposure pattern to be exposed...
- Patent number 10,522,329
- Issue date Dec 31, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of creating writing data
- Patent number 10,503,860
- Issue date Dec 10, 2019
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generating method of drawing data and charged particle beam drawing...
- Patent number 10,445,450
- Issue date Oct 15, 2019
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 10,431,422
- Issue date Oct 1, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus, and method of manufacturing article by controlli...
- Patent number 10,361,067
- Issue date Jul 23, 2019
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle lithography system
- Patent number 10,297,420
- Issue date May 21, 2019
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drawing data creation method and charged particle beam drawing appa...
- Patent number 10,199,199
- Issue date Feb 5, 2019
- NuFlare Technology, Inc.
- Shigehiro Hara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,191,376
- Issue date Jan 29, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography method with combined optimization of the radiated energ...
- Patent number 10,157,728
- Issue date Dec 18, 2018
- Aselta Nanographics
- Charles Tiphine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming a pattern on a reticle using charged...
- Patent number 10,101,648
- Issue date Oct 16, 2018
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam lithography method and charged particle beam...
- Patent number 10,074,515
- Issue date Sep 11, 2018
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,074,516
- Issue date Sep 11, 2018
- NuFlare Technology, Inc.
- Hironobu Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam three beam aperture array
- Patent number 10,067,416
- Issue date Sep 4, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 10,032,603
- Issue date Jul 24, 2018
- NuFlare Technology, Inc.
- Noriaki Nakayamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment and registration targets for charged particle beam substr...
- Patent number 10,026,589
- Issue date Jul 17, 2018
- Kevin M. Monahan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment and registration targets for charged particle beam substr...
- Patent number 10,020,166
- Issue date Jul 10, 2018
- Kevin M. Monahan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Unidirectional metal on layer with ebeam
- Patent number 10,014,256
- Issue date Jul 3, 2018
- Intel Corporation
- Donald W. Nelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system and method for operating a particle optical unit
- Patent number 9,991,089
- Issue date Jun 5, 2018
- Carl Zeiss Microscopy GmbH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for generating writing data
- Patent number 9,984,853
- Issue date May 29, 2018
- NuFlare Technology, Inc.
- Shigehiro Hara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for exposing a wafer
- Patent number 9,978,562
- Issue date May 22, 2018
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
- Publication number 20230359129
- Publication date Nov 9, 2023
- Jonathan Madsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITI...
- Publication number 20230260748
- Publication date Aug 17, 2023
- NuFlare Technology, Inc.
- Kota IWASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD AND MULTI CHARGED PAR...
- Publication number 20210074510
- Publication date Mar 11, 2021
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS
- Publication number 20210027987
- Publication date Jan 28, 2021
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20200118791
- Publication date Apr 16, 2020
- NuFlare Technology, Inc.
- Hironori TEGURI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20190121236
- Publication date Apr 25, 2019
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20180374675
- Publication date Dec 27, 2018
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
EBEAM THREE BEAM APERTURE ARRAY
- Publication number 20180143526
- Publication date May 24, 2018
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20180108513
- Publication date Apr 19, 2018
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING A PARTICLE OPTICAL UNIT
- Publication number 20180040454
- Publication date Feb 8, 2018
- CARL ZEISS MICROSCOPY GMBH
- Ingo Mueller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming a Pattern on a Reticle Using Charged...
- Publication number 20170322485
- Publication date Nov 9, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20170309450
- Publication date Oct 26, 2017
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming Patterns Using Charged Particle Beam...
- Publication number 20170213698
- Publication date Jul 27, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DRAWING DATA CREATION METHOD AND CHARGED PARTICLE BEAM DRAWING APPA...
- Publication number 20170018404
- Publication date Jan 19, 2017
- NuFlare Technology, Inc.
- Shigehiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20160005569
- Publication date Jan 7, 2016
- NuFlare Technology, Inc.
- Hironobu MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CHARGED-PARTICLE MULTI-BEAM EXPOSURE
- Publication number 20150028230
- Publication date Jan 29, 2015
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam Data Storage System and Method for High Volume Manufa...
- Publication number 20150008343
- Publication date Jan 8, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- HUNG-CHUN WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20140367584
- Publication date Dec 18, 2014
- NuFlare Technology, Inc.
- Hiroshi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR ACQUIRING DO...
- Publication number 20140291553
- Publication date Oct 2, 2014
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM
- Publication number 20140264086
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A DIAGONAL PATTERN USING CHARGED PART...
- Publication number 20140282304
- Publication date Sep 18, 2014
- D2S, INC.
- Etienne Jacques
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR EXPOSING A WAFER
- Publication number 20140264085
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE
- Publication number 20140264066
- Publication date Sep 18, 2014
- Teunis VAN DE PEUT
- B82 - NANO-TECHNOLOGY
Information Patent Application
Free Form Fracturing Method for Electronic or Optical Lithography
- Publication number 20140245240
- Publication date Aug 28, 2014
- ASELTA NANOGRAPHICS
- Charles TIPHINE
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY DEVICE AND LITHOGRAPHIC METHOD
- Publication number 20140231668
- Publication date Aug 21, 2014
- PARAM CORPORATION
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...
- Publication number 20140229904
- Publication date Aug 14, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS FOR FORMING A RETICLE
- Publication number 20140218710
- Publication date Aug 7, 2014
- Samsung Electronics Co., Ltd.
- Jin CHOI
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20140187056
- Publication date Jul 3, 2014
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN ON A RETICLE USING CHARGED...
- Publication number 20140158916
- Publication date Jun 12, 2014
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN ON A RETICLE USING CHARGED...
- Publication number 20140162466
- Publication date Jun 12, 2014
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING

Dividing into sub-patterns

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Massive overlay metrology sampling with multiple measurement columns

Multi-beam writing method and multi-beam writing apparatus

Multi-charged particle beam writing apparatus and multi-charged par...

Multi charged particle beam evaluation method and multi charged par...

Method and system for fabricating unique chips using a charged part...

Multi charged particle beam writing apparatus and multi charged par...

Cross scan proximity correction with ebeam universal cutter

Deflection scan speed adjustment during charged particle exposure

Ebeam universal cutter

System and method for scanning an object with an electron beam usin...

Dose-related feature reshaping in an exposure pattern to be exposed...

Method of creating writing data

Generating method of drawing data and charged particle beam drawing...

Method and system for dimensional uniformity using charged particle...

Drawing apparatus, and method of manufacturing article by controlli...

Charged particle lithography system

Drawing data creation method and charged particle beam drawing appa...

Cross scan proximity correction with ebeam universal cutter

Lithography method with combined optimization of the radiated energ...

Method and system for forming a pattern on a reticle using charged...

Charged particle beam lithography method and charged particle beam...

Charged particle beam writing apparatus and charged particle beam w...

Ebeam three beam aperture array

Charged particle beam lithography apparatus and charged particle be...

Alignment and registration targets for charged particle beam substr...

Alignment and registration targets for charged particle beam substr...

Unidirectional metal on layer with ebeam

Particle beam system and method for operating a particle optical unit

Method for generating writing data

Method for exposing a wafer

Patents Applicationslast 30 patents

MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS

MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITI...

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD AND MULTI CHARGED PAR...

MULTI-BEAM WRITING METHOD AND MULTI-BEAM WRITING APPARATUS

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

EBEAM THREE BEAM APERTURE ARRAY

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING A PARTICLE OPTICAL UNIT

Method and System for Forming a Pattern on a Reticle Using Charged...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

Method and System for Forming Patterns Using Charged Particle Beam...

DRAWING DATA CREATION METHOD AND CHARGED PARTICLE BEAM DRAWING APPA...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

METHOD FOR CHARGED-PARTICLE MULTI-BEAM EXPOSURE

Electron Beam Data Storage System and Method for High Volume Manufa...

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR ACQUIRING DO...

CHARGED PARTICLE LITHOGRAPHY SYSTEM

METHOD AND SYSTEM FOR FORMING A DIAGONAL PATTERN USING CHARGED PART...

METHOD FOR EXPOSING A WAFER

DEFLECTION SCAN SPEED ADJUSTMENT DURING CHARGED PARTICLE EXPOSURE

Free Form Fracturing Method for Electronic or Optical Lithography

ELECTRON BEAM LITHOGRAPHY DEVICE AND LITHOGRAPHIC METHOD

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...

EXPOSURE APPARATUS FOR FORMING A RETICLE

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

METHOD AND SYSTEM FOR FORMING A PATTERN ON A RETICLE USING CHARGED...

METHOD AND SYSTEM FOR FORMING A PATTERN ON A RETICLE USING CHARGED...