Doping

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CPC
Y10S438/914

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YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10USPC classification Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS Y10S438/00Semiconductor device manufacturing: process

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Y10S438/914Doping

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Patents Grantslast 30 patents

Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 10,332,748
- Issue date Jun 25, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Etch rate modulation through ion implantation
- Patent number 9,934,982
- Issue date Apr 3, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including a resistor and method for the format...
- Patent number 9,478,671
- Issue date Oct 25, 2016
- GLOBALFOUNDRIES Inc.
- Alexandru Romanescu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including a resistor and method for the format...
- Patent number 9,012,313
- Issue date Apr 21, 2015
- GLOBALFOUNDRIES Inc.
- Alexandru Romanescu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Systems and methods for plasma doping microfeature workpieces
- Patent number 8,975,603
- Issue date Mar 10, 2015
- Micron Technology, Inc.
- Shu Qin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor surface modification
- Patent number 8,802,549
- Issue date Aug 12, 2014
- SiOnyx, Inc.
- Jason Sickler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Systems and methods for plasma doping microfeature workpieces
- Patent number 8,642,135
- Issue date Feb 4, 2014
- Micron Technology, Inc.
- Shu Qin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,497,208
- Issue date Jul 30, 2013
- Fujitsu Semiconductor Limited
- Michie Sunayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing apparatus and manufacturing method of semicond...
- Patent number 8,367,530
- Issue date Feb 5, 2013
- Hitachi Kokusai Electric Inc.
- Kiyohiko Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor surface modification
- Patent number 8,207,051
- Issue date Jun 26, 2012
- SiOnyx, Inc.
- Jason Sickler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Doping apparatus, doping method, and method for fabricating thin fi...
- Patent number 7,980,198
- Issue date Jul 19, 2011
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,816,279
- Issue date Oct 19, 2010
- Fujitsu Semiconductor Limited
- Michie Sunayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing apparatus and manufacturing method of semicond...
- Patent number 7,795,143
- Issue date Sep 14, 2010
- Hitachi Kokusai Electric Inc.
- Kiyohiko Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-cost high-performance planar back-gate CMOS
- Patent number 7,750,405
- Issue date Jul 6, 2010
- International Business Machines Corporation
- Edward J. Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ZnO layer and semiconductor light emitting device
- Patent number 7,728,347
- Issue date Jun 1, 2010
- Stanley Electric Co., Ltd.
- Akio Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping apparatus, doping method, and method for fabricating thin fi...
- Patent number 7,713,761
- Issue date May 11, 2010
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing an N-type diamond with high electrical conducti...
- Patent number 7,368,317
- Issue date May 6, 2008
- Centre National de la Recherche Scientifique CNRS
- Jacques Paul Marie Chevallier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing highly doped semiconductor wafers, and disloc...
- Patent number 7,341,787
- Issue date Mar 11, 2008
- Siltronic AG
- Rupert Krautbauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-cost high-performance planar back-gate CMOS
- Patent number 7,314,794
- Issue date Jan 1, 2008
- International Business Machines Corporation
- Edward J. Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping method and method for fabricating thin film transistor
- Patent number 7,250,312
- Issue date Jul 31, 2007
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for implanting dopants within a substrate by tilting the sub...
- Patent number 7,232,744
- Issue date Jun 19, 2007
- Texas Instruments Incorporated
- Said Ghneim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of an energy source to convert precursors into patterned semico...
- Patent number 7,176,484
- Issue date Feb 13, 2007
- International Business Machines Corporation
- Ali Afzali-Ardakani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for implanting ions in a semiconductor
- Patent number 7,148,131
- Issue date Dec 12, 2006
- LSI Logic Corporation
- Agajan Suvkhanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming contact plug having double doping distribution i...
- Patent number 6,977,204
- Issue date Dec 20, 2005
- Hynix Semiconductor Inc.
- Sung-Jae Joo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,872,628
- Issue date Mar 29, 2005
- Renesas Technology Corp.
- Masayoshi Shirahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Implant damage removal by laser thermal annealing
- Patent number 6,872,643
- Issue date Mar 29, 2005
- Advanced Micro Devices, Inc.
- Arvind Halliyal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 6,815,318
- Issue date Nov 9, 2004
- Renesas Technology Corp.
- Eiji Hasunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for a junction field effect transistor with reduced gate cap...
- Patent number 6,812,079
- Issue date Nov 2, 2004
- Lovoltech, Inc.
- Pete L. Pegler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial deposition layer as screening material for implants int...
- Patent number 6,797,596
- Issue date Sep 28, 2004
- Micron Technology, Inc.
- Fawad Ahmed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of doping semiconductor layer, method of manufacturing thin...
- Patent number 6,794,277
- Issue date Sep 21, 2004
- Sony Corporation
- Akio Machida
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Etch Rate Modulation Through Ion Implantation
- Publication number 20180182636
- Publication date Jun 28, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Rajesh Prasad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING A RESISTOR AND METHOD FOR THE FORMAT...
- Publication number 20140264342
- Publication date Sep 18, 2014
- GLOBALFOUNDRIES INC.
- Alexandru Romanescu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR PLASMA DOPING MICROFEATURE WORKPIECES
- Publication number 20140144379
- Publication date May 29, 2014
- Micron Technology, Inc.
- Shu Qin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Surface Modification
- Publication number 20120214260
- Publication date Aug 23, 2012
- SiOnyx, Inc.
- Jason Sickler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20110003475
- Publication date Jan 6, 2011
- FUJITSU SEMICONDUCTOR LIMITED
- Michie Sunayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Surface Modification
- Publication number 20100270635
- Publication date Oct 28, 2010
- Jason Sickler
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
DOPING APPARATUS, DOPING METHOD, AND METHOD FOR FABRICATING THIN FI...
- Publication number 20100197049
- Publication date Aug 5, 2010
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and manufacturing method of semicond...
- Publication number 20100190355
- Publication date Jul 29, 2010
- Hitachi Kokusai Electric Inc.
- Kiyohiko Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ZnO LAYER AND SEMICONDUCTOR LIGHT EMITTING DEVICE
- Publication number 20090236598
- Publication date Sep 24, 2009
- Stanley Electric Co., Ltd
- Akio OGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20090200670
- Publication date Aug 13, 2009
- Fujitsu Microelectronics Limited
- Michie SUNAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus and Manufacturing Method of Semicond...
- Publication number 20090163040
- Publication date Jun 25, 2009
- Hitachi Kokusai Electric Inc.
- Kiyohiko Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-COST HIGH-PERFORMANCE PLANAR BACK-GATE CMOS
- Publication number 20080042205
- Publication date Feb 21, 2008
- International Business Machines Corporation
- Edward J. Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Doping apparatus, doping method, and method for fabricating thin fi...
- Publication number 20070224711
- Publication date Sep 27, 2007
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and methods for plasma doping microfeature workpieces
- Publication number 20070048453
- Publication date Mar 1, 2007
- Micron Technology, Inc.
- Shu Qin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW-COST HIGH-PERFORMANCE PLANAR BACK-GATE CMOS
- Publication number 20070029620
- Publication date Feb 8, 2007
- International Business Machines Corporation
- Edward J. Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for implanting dopants within a substrate by tilting the sub...
- Publication number 20060073685
- Publication date Apr 6, 2006
- TEXAS INSTRUMENTS INCORPORATED
- Said Ghneim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of producing an n-type diamond with high electrical conducti...
- Publication number 20050266606
- Publication date Dec 1, 2005
- CENTRE NATIONAL DE LA RECHERCHE SCIENTIFQUE-CNRS
- Jacques Paul Marie Chevallier
- C30 - CRYSTAL GROWTH
Information Patent Application
Process for producing highly doped semiconductor wafers, and disloc...
- Publication number 20050167001
- Publication date Aug 4, 2005
- Siltronic AG
- Rupert Krautbauer
- C30 - CRYSTAL GROWTH
Information Patent Application
Doping apparatus, doping method, and method for fabricating thin fi...
- Publication number 20050032341
- Publication date Feb 10, 2005
- Semiconductor Energy Laboratory Co., Ltd.
- Junichi Koezuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of an energy source to convert precursors into patterned semico...
- Publication number 20040110093
- Publication date Jun 10, 2004
- International Business Machines Corporation
- Ali Afzali-Ardakani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20040053482
- Publication date Mar 18, 2004
- Mitsubishi Denki Kabushiki Kaisha
- Eiji Hasunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sacrificial deposition layer as screening material for implants int...
- Publication number 20040043586
- Publication date Mar 4, 2004
- Fawad Ahmed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing semiconductor device
- Publication number 20030100173
- Publication date May 29, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Masayoshi Shirahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor layer doping method, thin-film semiconductor device m...
- Publication number 20030077886
- Publication date Apr 24, 2003
- Akio Machida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Barrier and seed layer system
- Publication number 20030064593
- Publication date Apr 3, 2003
- LSI Logic Corporation
- Kiran Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for improving a doping profile for gas phase doping
- Publication number 20030013283
- Publication date Jan 16, 2003
- Moritz Haupt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOS-gated power device with doped polysilicon body and process for...
- Publication number 20020175383
- Publication date Nov 28, 2002
- Fairchild Semiconductor Corporation
- Christopher B. Kocon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Labelled, returnable plastic crate
- Publication number 20020088536
- Publication date Jul 11, 2002
- Patrick Johannes Blom
- B08 - CLEANING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Etch rate modulation through ion implantation

Etch rate modulation through ion implantation

Semiconductor device including a resistor and method for the format...

Semiconductor device including a resistor and method for the format...

Systems and methods for plasma doping microfeature workpieces

Semiconductor surface modification

Systems and methods for plasma doping microfeature workpieces

Semiconductor device and method for manufacturing the same

Substrate processing apparatus and manufacturing method of semicond...

Semiconductor surface modification

Doping apparatus, doping method, and method for fabricating thin fi...

Semiconductor device and method for manufacturing the same

Substrate processing apparatus and manufacturing method of semicond...

Low-cost high-performance planar back-gate CMOS

ZnO layer and semiconductor light emitting device

Doping apparatus, doping method, and method for fabricating thin fi...

Method of producing an N-type diamond with high electrical conducti...

Process for producing highly doped semiconductor wafers, and disloc...

Low-cost high-performance planar back-gate CMOS

Doping method and method for fabricating thin film transistor

Method for implanting dopants within a substrate by tilting the sub...

Use of an energy source to convert precursors into patterned semico...

Method for implanting ions in a semiconductor

Method for forming contact plug having double doping distribution i...

Method of manufacturing semiconductor device

Implant damage removal by laser thermal annealing

Manufacturing method of semiconductor device

Method for a junction field effect transistor with reduced gate cap...

Sacrificial deposition layer as screening material for implants int...

Method of doping semiconductor layer, method of manufacturing thin...

Patents Applicationslast 30 patents

Etch Rate Modulation Through Ion Implantation

SEMICONDUCTOR DEVICE INCLUDING A RESISTOR AND METHOD FOR THE FORMAT...

SYSTEMS AND METHODS FOR PLASMA DOPING MICROFEATURE WORKPIECES

Semiconductor Surface Modification

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Semiconductor Surface Modification

DOPING APPARATUS, DOPING METHOD, AND METHOD FOR FABRICATING THIN FI...

Substrate processing apparatus and manufacturing method of semicond...

ZnO LAYER AND SEMICONDUCTOR LIGHT EMITTING DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Substrate Processing Apparatus and Manufacturing Method of Semicond...

LOW-COST HIGH-PERFORMANCE PLANAR BACK-GATE CMOS

Doping apparatus, doping method, and method for fabricating thin fi...

Systems and methods for plasma doping microfeature workpieces

LOW-COST HIGH-PERFORMANCE PLANAR BACK-GATE CMOS

Method for implanting dopants within a substrate by tilting the sub...

Method of producing an n-type diamond with high electrical conducti...

Process for producing highly doped semiconductor wafers, and disloc...

Doping apparatus, doping method, and method for fabricating thin fi...

Use of an energy source to convert precursors into patterned semico...

Manufacturing method of semiconductor device

Sacrificial deposition layer as screening material for implants int...

Method of manufacturing semiconductor device

Semiconductor layer doping method, thin-film semiconductor device m...

Barrier and seed layer system

Method for improving a doping profile for gas phase doping

MOS-gated power device with doped polysilicon body and process for...

Labelled, returnable plastic crate