Dry cleaning only

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CPC
H01L21/02046

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02046Dry cleaning only

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Gallium arsenide substrate comprising a surface oxide layer with im...
- Patent number 12,205,815
- Issue date Jan 21, 2025
- Freiberger Compound Materials GmbH
- Wolfram Fliegel
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Substrate cleaning apparatus and substrate cleaning method
- Patent number 12,131,919
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Tsunenaga Nakashima
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Semiconductor processing preclean methods and apparatus
- Patent number 12,112,938
- Issue date Oct 8, 2024
- ASM IP Holding B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Grant
Gas purge device and gas purging method
- Patent number 12,100,605
- Issue date Sep 24, 2024
- NANYA TECHNOLOGY CORPORATION
- Meng-Liang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for conditioning a plasma processing chamber
- Patent number 12,060,636
- Issue date Aug 13, 2024
- Lam Research Corporation
- Chiara Helena Catherina Giammanco MacPherson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing substrate with patterned film
- Patent number 12,038,691
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing substrate with patterned film and fluorine-con...
- Patent number 12,038,692
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas purge device and gas purging method
- Patent number 12,027,399
- Issue date Jul 2, 2024
- NANYA TECHNOLOGY CORPORATION
- Meng-Liang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic substrate cleaning system and method
- Patent number 12,009,227
- Issue date Jun 11, 2024
- KLA Corporation
- Shai Mark
- B08 - CLEANING
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,990,321
- Issue date May 21, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Method and device for the surface treatment of substrates
- Patent number 11,901,172
- Issue date Feb 13, 2024
- EV Group E. Thallner GmbH
- Nasser Razek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning plasma processing apparatus and plasma processin...
- Patent number 11,887,824
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Yasutaka Hama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical image capturing system, image capturing device and electron...
- Patent number 11,815,667
- Issue date Nov 14, 2023
- LARGAN PRECISION CO., LTD
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method, and gas cluster generat...
- Patent number 11,772,138
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Plasma purge method
- Patent number 11,725,276
- Issue date Aug 15, 2023
- Tokyo Electron Limited
- Hideomi Hane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for dry etching compound materials
- Patent number 11,605,542
- Issue date Mar 14, 2023
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical image capturing system, image capturing device and electron...
- Patent number 11,555,987
- Issue date Jan 17, 2023
- LARGAN PRECISION CO., LTD
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus based on light irradiation and wafer clean...
- Patent number 11,527,399
- Issue date Dec 13, 2022
- Samsung Electronics Co., Ltd.
- Byungkwon Cho
- B08 - CLEANING
Information Patent Grant
Fast response pedestal assembly for selective preclean
- Patent number 11,515,130
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Method of cleaning substrate processing apparatus
- Patent number 11,488,819
- Issue date Nov 1, 2022
- ASM IP Holding B.V.
- HakJoo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing method, and gas cluster generat...
- Patent number 11,446,714
- Issue date Sep 20, 2022
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Combination vacuum and over-pressure process chamber and methods re...
- Patent number 11,367,640
- Issue date Jun 21, 2022
- Yield Engineering Systems, Inc.
- William Moffat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for wafer bonding
- Patent number 11,348,790
- Issue date May 31, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yeong-Jyh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing particles of substrate processing apparatus, and...
- Patent number 11,344,931
- Issue date May 31, 2022
- Tokyo Electron Limited
- Shogo Fukui
- B08 - CLEANING
Information Patent Grant
Apparatus and methods for selectively etching films
- Patent number 11,315,794
- Issue date Apr 26, 2022
- ASM IP Holding B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and substrate processing apparatus
- Patent number 11,251,034
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Hiroyuki Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ammonium fluoride pre-clean protection
- Patent number 11,232,947
- Issue date Jan 25, 2022
- Taiwan Semiconductor Manufacturing Company Limited
- Li-Wei Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gallium arsenide substrate comprising a surface oxide layer with im...
- Patent number 11,170,989
- Issue date Nov 9, 2021
- Freiberger Compound Materials GmbH
- Wolfram Fliegel
- G01 - MEASURING TESTING
Information Patent Grant
Integrated system for semiconductor process
- Patent number 11,164,767
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Xinyu Bao
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIDUE SCRAPER
- Publication number 20250010340
- Publication date Jan 9, 2025
- TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO., LTD.
- Yilin XU
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTRATE PRO...
- Publication number 20250006517
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Sang Min LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS
- Publication number 20240429038
- Publication date Dec 26, 2024
- ASM IP HOLDING B.V.
- Chuang Wei
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240429068
- Publication date Dec 26, 2024
- Tokyo Electron Limited
- Yosuke KAWABUCHI
- B08 - CLEANING
Information Patent Application
METAL OXIDE PRECLEAN FOR BOTTOM-UP GAPFILL IN MEOL AND BEOL
- Publication number 20240420947
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR PRODUCING AND PREPARING ELECTRONIC COMPONENTS
- Publication number 20240387270
- Publication date Nov 21, 2024
- EV GROUP E. THALLNER GMBH
- Jurgen Burggraf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DRY-CLEANING AlN HEATER FOR SEMICONDUCTOR...
- Publication number 20240363328
- Publication date Oct 31, 2024
- WONIK QNC Corporation
- Eun Young CHOI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
- Publication number 20240319606
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...
- Publication number 20240319607
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20240282556
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- B08 - CLEANING
Information Patent Application
INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...
- Publication number 20240249934
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Naomi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SELECTIVELY FORMING A DIELECTRIC LAYER ON A METALLIC SU...
- Publication number 20240222111
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING PLASMA PROCESSING APPARATUS AND PLASMA PROCESSIN...
- Publication number 20240063000
- Publication date Feb 22, 2024
- TOKYO ELECTRON LIMITED
- Yasutaka HAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PURGE DEVICE AND GAS PURGING METHOD
- Publication number 20240047251
- Publication date Feb 8, 2024
- NANYA TECHNOLOGY CORPORATION
- Meng-Liang WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...
- Publication number 20240027738
- Publication date Jan 25, 2024
- LARGAN PRECISION CO., LTD.
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITION OF MOLYBDENUM FOR SOURCE/DRAIN C...
- Publication number 20230298902
- Publication date Sep 21, 2023
- ASM IP HOLDING B.V.
- Jiyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR SEMICONDUCTOR SUBSTRATE PROCESSING
- Publication number 20230212740
- Publication date Jul 6, 2023
- ASM IP HOLDING, B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY-TYPE CLEANSING APPARATUS FOR WAFERS
- Publication number 20230207304
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- Kwang Ryul KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...
- Publication number 20230112466
- Publication date Apr 13, 2023
- LARGAN PRECISION CO., LTD.
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN
- Publication number 20230086640
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20220399210
- Publication date Dec 15, 2022
- TOKYO ELECTRON LIMITED
- Tsunenaga Nakashima
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDU...
- Publication number 20220367175
- Publication date Nov 17, 2022
- ASM IP HOLDING B.V.
- Xing Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC SUBSTRATE CLEANING SYSTEM AND METHOD
- Publication number 20220359234
- Publication date Nov 10, 2022
- KLA Corporation
- Shai Mark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS
- Publication number 20220301856
- Publication date Sep 22, 2022
- ASM IP HOLDING B.V.
- Chuang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR WAFER BONDING
- Publication number 20220285156
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- YEONG-JYH LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR SELECTIVELY ETCHING FILMS
- Publication number 20220246436
- Publication date Aug 4, 2022
- ASM IP HOLDING B.V.
- Fei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PURGE DEVICE AND GAS PURGING METHOD
- Publication number 20220130698
- Publication date Apr 28, 2022
- NANYA TECHNOLOGY CORPORATION
- Meng-Liang WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PURGE METHOD
- Publication number 20220081764
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Hideomi HANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20220059342
- Publication date Feb 24, 2022
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Dry cleaning only

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Gallium arsenide substrate comprising a surface oxide layer with im...

Substrate cleaning apparatus and substrate cleaning method

Integrated epitaxy and preclean system

Semiconductor processing preclean methods and apparatus

Gas purge device and gas purging method

Method for conditioning a plasma processing chamber

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Gas purge device and gas purging method

Electrostatic substrate cleaning system and method

Fast response pedestal assembly for selective preclean

Method and device for the surface treatment of substrates

Method of cleaning plasma processing apparatus and plasma processin...

Optical image capturing system, image capturing device and electron...

Processing apparatus and processing method, and gas cluster generat...

Plasma purge method

Method for dry etching compound materials

Optical image capturing system, image capturing device and electron...

Wafer cleaning apparatus based on light irradiation and wafer clean...

Fast response pedestal assembly for selective preclean

Method of cleaning substrate processing apparatus

Processing apparatus and processing method, and gas cluster generat...

Combination vacuum and over-pressure process chamber and methods re...

Apparatus and method for wafer bonding

Method of removing particles of substrate processing apparatus, and...

Apparatus and methods for selectively etching films

Film forming method and substrate processing apparatus

Ammonium fluoride pre-clean protection

Gallium arsenide substrate comprising a surface oxide layer with im...

Integrated system for semiconductor process

Patents Applicationslast 30 patents

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

RESIDUE SCRAPER

SUBSTRATE PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTRATE PRO...

SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METAL OXIDE PRECLEAN FOR BOTTOM-UP GAPFILL IN MEOL AND BEOL

METHOD AND DEVICE FOR PRODUCING AND PREPARING ELECTRONIC COMPONENTS

METHOD AND APPARATUS FOR DRY-CLEANING AlN HEATER FOR SEMICONDUCTOR...

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

INTEGRATED METHOD AND TOOL FOR HIGH QUALITY SELECTIVE SILICON NITRI...

METHODS FOR SELECTIVELY FORMING A DIELECTRIC LAYER ON A METALLIC SU...

METHOD OF CLEANING PLASMA PROCESSING APPARATUS AND PLASMA PROCESSIN...

GAS PURGE DEVICE AND GAS PURGING METHOD

OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...

SYSTEMS AND METHODS FOR DEPOSITION OF MOLYBDENUM FOR SOURCE/DRAIN C...

METHODS AND SYSTEMS FOR SEMICONDUCTOR SUBSTRATE PROCESSING

DRY-TYPE CLEANSING APPARATUS FOR WAFERS

OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...

FAST RESPONSE PEDESTAL ASSEMBLY FOR SELECTIVE PRECLEAN

SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD

APPARATUS AND METHOD FOR REMOVAL OF OXIDE AND CARBON FROM SEMICONDU...

ELECTROSTATIC SUBSTRATE CLEANING SYSTEM AND METHOD

SEMICONDUCTOR PROCESSING PRECLEAN METHODS AND APPARATUS

APPARATUS AND METHOD FOR WAFER BONDING

APPARATUS AND METHODS FOR SELECTIVELY ETCHING FILMS

GAS PURGE DEVICE AND GAS PURGING METHOD

PLASMA PURGE METHOD

INTEGRATED EPITAXY AND PRECLEAN SYSTEM