during, before or after processing of conductive layers

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H01L21/02068

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02068during, before or after processing of conductive layers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Selective passivation and selective deposition
- Patent number 12,322,593
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Jan Willem Hub Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device pre-cleaning
- Patent number 12,300,542
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Wei Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain contact formation methods and devices
- Patent number 12,300,539
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method of forming the same
- Patent number 12,278,146
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,276,027
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Katsuhiro Morikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective internal gate structure for ferroelectric semiconductor d...
- Patent number 12,278,287
- Issue date Apr 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Ming Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistors with recessed silicon cap and method forming same
- Patent number 12,266,655
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrate rinse module in hybrid bonding platform
- Patent number 12,255,062
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Xin-Hua Huang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 12,230,509
- Issue date Feb 18, 2025
- United Microelectronics Corp.
- Ming Thai Chai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure cutting process and structures formed thereby
- Patent number 12,218,130
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning chamber for metal oxide removal
- Patent number 12,211,737
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistivity tungsten film and method of manufacture
- Patent number 12,191,198
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Feihu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for cleaning high aspect ratio structures
- Patent number 12,170,196
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Schubert S. Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure and semiconductor...
- Patent number 12,165,879
- Issue date Dec 10, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xinman Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of selective deposition
- Patent number 12,157,943
- Issue date Dec 3, 2024
- Applied Materials, Inc.
- Wenjing Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling chemical concentration in electrolyte
- Patent number 12,157,952
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Chang Huang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for forming source/drain contacts
- Patent number 12,142,663
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching compositions
- Patent number 12,104,108
- Issue date Oct 1, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods related to wire bond cleaning and wire bonding...
- Patent number 12,087,728
- Issue date Sep 10, 2024
- Skyworks Solutions, Inc.
- Aldrin Quinones Garing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-free tungsten ALD for dielectric selectivity improvement
- Patent number 12,062,545
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Ilanit Fisher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,062,580
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for manufacturing metal gate structures
- Patent number 12,054,823
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 12,046,465
- Issue date Jul 23, 2024
- SCREEN Holdings Co., Ltd.
- Manabu Okutani
- B08 - CLEANING
Information Patent Grant
Redistribution layer metallic structure and method
- Patent number 12,040,293
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih Wei Bih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and fabrication method thereof, and periphe...
- Patent number 12,027,595
- Issue date Jul 2, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jie Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate using monolayers
- Patent number 12,015,077
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ju-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for metal gate surface clean
- Patent number 11,996,283
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous and semi-aqueous cleaners for the removal of post-etch resi...
- Patent number 11,978,622
- Issue date May 7, 2024
- Entegris, Inc.
- Lingyan Song
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Self-aligned barrier for metal vias
- Patent number 11,972,974
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Li Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective cobalt deposition on copper surfaces
- Patent number 11,959,167
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Sang-Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
COPPER SURFACE PASSIVATION COMPOSITION, USE THEREOF, AND PHOTORESIS...
- Publication number 20250180997
- Publication date Jun 5, 2025
- Zhejiang Aufirst Material Technology Co., Ltd.
- Jun HOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE BOTTOM-UP FILL
- Publication number 20250183054
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Guannan Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...
- Publication number 20250174468
- Publication date May 29, 2025
- SEMES CO., LTD.
- Yong Hoon HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Transistors with Recessed Silicon Cap and Method Forming Same
- Publication number 20250169170
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE BLOCKING OF METAL SURFACES USING N-HETEROCYCLIC CARBENES...
- Publication number 20250157855
- Publication date May 15, 2025
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective metal Capping with Metal Halide enhancement
- Publication number 20250157824
- Publication date May 15, 2025
- Applied Materials, Inc.
- Shumao ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20250149344
- Publication date May 8, 2025
- UNITED MICROELECTRONICS CORP.
- MING THAI CHAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FO...
- Publication number 20250140548
- Publication date May 1, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Jun IIOKA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FO...
- Publication number 20250140549
- Publication date May 1, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Jun IIOKA
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METAL OXIDE CONVERSION FOR MEOL AND BEOL APPLICATIONS
- Publication number 20250132146
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Mohammad Mahdi TAVAKOLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MINIATURIZED IMPLANTABLE MEDICAL DEVICES AND ASSOCIATED FABRICATION...
- Publication number 20250133814
- Publication date Apr 24, 2025
- University of Florida Research Foundation, Incoprated
- Adam Khalifa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Structure Cutting Process and Structures Formed Thereby
- Publication number 20250126883
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING COMPOSITIONS
- Publication number 20250101303
- Publication date Mar 27, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Jieying Jiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FO...
- Publication number 20250084351
- Publication date Mar 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Jun IIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20250089325
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yao-Wen Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS RELATED TO WIRE BOND CLEANING AND WIRE BONDING...
- Publication number 20250087631
- Publication date Mar 13, 2025
- Skyworks Solutions, Inc.
- Aldrin Quinones GARING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-REGION DIFFUSION BARRIER CONTAINING TITANIUM, SILICON AND NIT...
- Publication number 20250087534
- Publication date Mar 13, 2025
- EUGENUS, INC.
- Vinayak Veer Vats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20250079238
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Uihyoung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLATING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20250075363
- Publication date Mar 6, 2025
- EBARA CORPORATION
- Kazuhito TSUJI
- B08 - CLEANING
Information Patent Application
METHODS FOR WET ATOMIC LAYER ETCHING OF MOLYBDENUM
- Publication number 20250079180
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Tulashi Dahal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL IMPLANTATION TO BARRIER OR LINER FOR INTERCONNECT
- Publication number 20250062160
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Ge QU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
- Publication number 20250054767
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Qihao ZHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURI...
- Publication number 20250043216
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Masafumi YAGYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A MOLYBDENUM SILICIDE LAYER ON A SURFACE OF A SU...
- Publication number 20250038006
- Publication date Jan 30, 2025
- Didem Ernur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT
- Publication number 20250006519
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kyle M. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET CLEANING METHOD
- Publication number 20240404844
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu Tung Yen
- B08 - CLEANING
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...
- Publication number 20240393693
- Publication date Nov 28, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR FORMING SOURCE/DRAIN CONTACTS
- Publication number 20240379814
- Publication date Nov 14, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING CHAMBER FOR METAL OXIDE REMOVAL
- Publication number 20240371685
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS

during, before or after processing of conductive layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Selective passivation and selective deposition

Semiconductor device pre-cleaning

Source/drain contact formation methods and devices

Fin field-effect transistor device and method of forming the same

Substrate processing apparatus and substrate processing method

Selective internal gate structure for ferroelectric semiconductor d...

Transistors with recessed silicon cap and method forming same

Integrate rinse module in hybrid bonding platform

Method for fabricating semiconductor device

Semiconductor structure cutting process and structures formed thereby

Cleaning chamber for metal oxide removal

Low resistivity tungsten film and method of manufacture

Methods and systems for cleaning high aspect ratio structures

Method for manufacturing semiconductor structure and semiconductor...

Methods of selective deposition

Method of controlling chemical concentration in electrolyte

Method for forming source/drain contacts

Etching compositions

Systems and methods related to wire bond cleaning and wire bonding...

Fluorine-free tungsten ALD for dielectric selectivity improvement

Method of manufacturing a semiconductor device and a semiconductor...

Apparatus and method for manufacturing metal gate structures

Substrate treatment method and substrate treatment apparatus

Redistribution layer metallic structure and method

Semiconductor structure and fabrication method thereof, and periphe...

Metal gate using monolayers

Method for metal gate surface clean

Aqueous and semi-aqueous cleaners for the removal of post-etch resi...

Self-aligned barrier for metal vias

Selective cobalt deposition on copper surfaces

Patents Applicationslast 30 patents

COPPER SURFACE PASSIVATION COMPOSITION, USE THEREOF, AND PHOTORESIS...

SELECTIVE BOTTOM-UP FILL

SUBSTRATE PROCESSING METHOD, MANUFACTURING METHOD, AND SUBSTRATE PR...

Transistors with Recessed Silicon Cap and Method Forming Same

SELECTIVE BLOCKING OF METAL SURFACES USING N-HETEROCYCLIC CARBENES...

Selective metal Capping with Metal Halide enhancement

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FO...

PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FO...

METAL OXIDE CONVERSION FOR MEOL AND BEOL APPLICATIONS

MINIATURIZED IMPLANTABLE MEDICAL DEVICES AND ASSOCIATED FABRICATION...

Semiconductor Structure Cutting Process and Structures Formed Thereby

ETCHING COMPOSITIONS

PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FO...

SEMICONDUCTOR DEVICE AND METHOD

SYSTEMS AND METHODS RELATED TO WIRE BOND CLEANING AND WIRE BONDING...

MULTI-REGION DIFFUSION BARRIER CONTAINING TITANIUM, SILICON AND NIT...

METHOD OF FABRICATING A SEMICONDUCTOR DEVICE

PLATING APPARATUS AND SUBSTRATE CLEANING METHOD

METHODS FOR WET ATOMIC LAYER ETCHING OF MOLYBDENUM

METAL IMPLANTATION TO BARRIER OR LINER FOR INTERCONNECT

SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURI...

METHOD FOR FORMING A MOLYBDENUM SILICIDE LAYER ON A SURFACE OF A SU...

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

WET CLEANING METHOD

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...

METHOD FOR FORMING SOURCE/DRAIN CONTACTS

CLEANING CHAMBER FOR METAL OXIDE REMOVAL