during, before or after processing of conductive layers

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H01L21/02068

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02068during, before or after processing of conductive layers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor structure cutting process and structures formed thereby
- Patent number 12,218,130
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning chamber for metal oxide removal
- Patent number 12,211,737
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low resistivity tungsten film and method of manufacture
- Patent number 12,191,198
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Feihu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for cleaning high aspect ratio structures
- Patent number 12,170,196
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Schubert S. Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor structure and semiconductor...
- Patent number 12,165,879
- Issue date Dec 10, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xinman Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of selective deposition
- Patent number 12,157,943
- Issue date Dec 3, 2024
- Applied Materials, Inc.
- Wenjing Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling chemical concentration in electrolyte
- Patent number 12,157,952
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Chang Huang
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for forming source/drain contacts
- Patent number 12,142,663
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching compositions
- Patent number 12,104,108
- Issue date Oct 1, 2024
- Fujifilm Electronic Materials U.S.A., Inc.
- Tomonori Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods related to wire bond cleaning and wire bonding...
- Patent number 12,087,728
- Issue date Sep 10, 2024
- Skyworks Solutions, Inc.
- Aldrin Quinones Garing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-free tungsten ALD for dielectric selectivity improvement
- Patent number 12,062,545
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Ilanit Fisher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,062,580
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for manufacturing metal gate structures
- Patent number 12,054,823
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 12,046,465
- Issue date Jul 23, 2024
- SCREEN Holdings Co., Ltd.
- Manabu Okutani
- B08 - CLEANING
Information Patent Grant
Redistribution layer metallic structure and method
- Patent number 12,040,293
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih Wei Bih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and fabrication method thereof, and periphe...
- Patent number 12,027,595
- Issue date Jul 2, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jie Bai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate using monolayers
- Patent number 12,015,077
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ju-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for metal gate surface clean
- Patent number 11,996,283
- Issue date May 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shich-Chang Suen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aqueous and semi-aqueous cleaners for the removal of post-etch resi...
- Patent number 11,978,622
- Issue date May 7, 2024
- Entegris, Inc.
- Lingyan Song
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Self-aligned barrier for metal vias
- Patent number 11,972,974
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Li Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective cobalt deposition on copper surfaces
- Patent number 11,959,167
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Sang-Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming conductive feature including cleaning step
- Patent number 11,955,329
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hafnium oxide corrosion inhibitor
- Patent number 11,946,148
- Issue date Apr 2, 2024
- VERSUM MATERIALS US, LLC
- Wen Dar Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-region diffusion barrier containing titanium, silicon and nit...
- Patent number 11,942,365
- Issue date Mar 26, 2024
- Eugenus, Inc.
- Vinayak Veer Vats
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning machine and cleaning method
- Patent number 11,935,737
- Issue date Mar 19, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Ning Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a wafer
- Patent number 11,935,738
- Issue date Mar 19, 2024
- Disco Corporation
- Takashi Okamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and a s...
- Patent number 11,929,250
- Issue date Mar 12, 2024
- Kioxia Corporation
- Katsuhiro Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching platinum-containing thin film using protective cap layer
- Patent number 11,929,423
- Issue date Mar 12, 2024
- Texas Instruments Incorporated
- Sebastian Meier
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Semiconductor device pre-cleaning
- Patent number 11,915,976
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Wei Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,908,680
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Akira Fujita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
- Publication number 20250054767
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Qihao ZHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURI...
- Publication number 20250043216
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Masafumi YAGYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A MOLYBDENUM SILICIDE LAYER ON A SURFACE OF A SU...
- Publication number 20250038006
- Publication date Jan 30, 2025
- Didem Ernur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...
- Publication number 20250034427
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Shun KUBODERA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT
- Publication number 20250006519
- Publication date Jan 2, 2025
- Applied Materials, Inc.
- Kyle M. Hanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WET CLEANING METHOD
- Publication number 20240404844
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu Tung Yen
- B08 - CLEANING
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...
- Publication number 20240393693
- Publication date Nov 28, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR FORMING SOURCE/DRAIN CONTACTS
- Publication number 20240379814
- Publication date Nov 14, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING CHAMBER FOR METAL OXIDE REMOVAL
- Publication number 20240371685
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE DAMAGE-FREE DRY ETCH METHOD FOR TUNGSTEN REMOVAL IN...
- Publication number 20240371654
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Qihao ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20240363330
- Publication date Oct 31, 2024
- NANYA TECHNOLOGY CORPORATION
- Szu Yu HOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20240355681
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shahaji B. MORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20240355615
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
- Publication number 20240337012
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Yu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE INTERCONNECT COEFFICIENT OF THERMAL EXPANSION
- Publication number 20240321636
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Tyler Sherwood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240290609
- Publication date Aug 29, 2024
- Tokyo Electron Limited
- Tadahiro ISHIZAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Methods of Forming the Same
- Publication number 20240282569
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Chen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATION SOLUTION FOR NAND DEEP CONTACT GAP FILL
- Publication number 20240282631
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Xi CEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED BARRIER FOR METAL VIAS
- Publication number 20240243009
- Publication date Jul 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sung-Li WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...
- Publication number 20240231237
- Publication date Jul 11, 2024
- FUJIFILM CORPORATION
- Tomonori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PLATINUM-CONTAINING THIN FILM USING PROTECTIVE CAP LAYER
- Publication number 20240222470
- Publication date Jul 4, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Sebastian Meier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SELECTIVELY FORMING A PASSIVATION LAYER ON A DIELECTRIC...
- Publication number 20240222135
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Daniele Chiappe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
- Publication number 20240218503
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Sang-Ho YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED ATMOSPHERIC PLASMA TREATMENT STATION IN PROCESSING TOOL
- Publication number 20240213089
- Publication date Jun 27, 2024
- LAM RESEARCH CORPORATION
- Navaneetha Krishnan SUBBAIYAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming Conductive Feature Including Cleaning Step
- Publication number 20240213016
- Publication date Jun 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES
- Publication number 20240203742
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAVITY SHAPING AND SELECTIVE METAL SILICIDE FORMATION FOR CMOS DEVICES
- Publication number 20240203741
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Nicolas Louis BREIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT FOR REMOVING RESIDUES FROM DIELECTRIC SURFACE
- Publication number 20240194605
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Mohammad Mahdi TAVAKOLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Operating a PVD Apparatus
- Publication number 20240177997
- Publication date May 30, 2024
- SPTS TECHNOLOGIES LIMITED
- Scott Haymore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FABRICATING A CAPACITOR
- Publication number 20240162279
- Publication date May 16, 2024
- STMicroelectronics International N.V.
- Vincent CARO
- H01 - BASIC ELECTRIC ELEMENTS

during, before or after processing of conductive layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor structure cutting process and structures formed thereby

Cleaning chamber for metal oxide removal

Low resistivity tungsten film and method of manufacture

Methods and systems for cleaning high aspect ratio structures

Method for manufacturing semiconductor structure and semiconductor...

Methods of selective deposition

Method of controlling chemical concentration in electrolyte

Method for forming source/drain contacts

Etching compositions

Systems and methods related to wire bond cleaning and wire bonding...

Fluorine-free tungsten ALD for dielectric selectivity improvement

Method of manufacturing a semiconductor device and a semiconductor...

Apparatus and method for manufacturing metal gate structures

Substrate treatment method and substrate treatment apparatus

Redistribution layer metallic structure and method

Semiconductor structure and fabrication method thereof, and periphe...

Metal gate using monolayers

Method for metal gate surface clean

Aqueous and semi-aqueous cleaners for the removal of post-etch resi...

Self-aligned barrier for metal vias

Selective cobalt deposition on copper surfaces

Method of forming conductive feature including cleaning step

Hafnium oxide corrosion inhibitor

Multi-region diffusion barrier containing titanium, silicon and nit...

Cleaning machine and cleaning method

Method of processing a wafer

Substrate processing apparatus, substrate processing method and a s...

Etching platinum-containing thin film using protective cap layer

Semiconductor device pre-cleaning

Substrate processing method and substrate processing apparatus

Patents Applicationslast 30 patents

SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURI...

METHOD FOR FORMING A MOLYBDENUM SILICIDE LAYER ON A SURFACE OF A SU...

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATEC...

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

WET CLEANING METHOD

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMI...

METHOD FOR FORMING SOURCE/DRAIN CONTACTS

CLEANING CHAMBER FOR METAL OXIDE REMOVAL

SILICON NITRIDE DAMAGE-FREE DRY ETCH METHOD FOR TUNGSTEN REMOVAL IN...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

METHOD AND APPARATUS FOR PROCESSING SUBSTRATE

APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES

METHOD TO IMPROVE INTERCONNECT COEFFICIENT OF THERMAL EXPANSION

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Semiconductor Device and Methods of Forming the Same

INTEGRATION SOLUTION FOR NAND DEEP CONTACT GAP FILL

SELF-ALIGNED BARRIER FOR METAL VIAS

TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMO...

ETCHING PLATINUM-CONTAINING THIN FILM USING PROTECTIVE CAP LAYER

METHODS FOR SELECTIVELY FORMING A PASSIVATION LAYER ON A DIELECTRIC...

SELECTIVE COBALT DEPOSITION ON COPPER SURFACES

INTEGRATED ATMOSPHERIC PLASMA TREATMENT STATION IN PROCESSING TOOL

Method of Forming Conductive Feature Including Cleaning Step

CONTACT LAYER FORMATION WITH MICROWAVE ANNEALING FOR NMOS DEVICES

CAVITY SHAPING AND SELECTIVE METAL SILICIDE FORMATION FOR CMOS DEVICES

POST-TREATMENT FOR REMOVING RESIDUES FROM DIELECTRIC SURFACE

Method of Operating a PVD Apparatus

METHOD OF FABRICATING A CAPACITOR