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Plasma processing apparatus
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Patent number 11,978,612
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Issue date May 7, 2024
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HITACHI HIGH-TECH CORPORATION
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Isao Mori
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma reactors
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Patent number 11,961,717
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Issue date Apr 16, 2024
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OZONE 1 PTY LTD
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John Lionel Brauer
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 11,908,664
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Issue date Feb 20, 2024
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Tokyo Electron Limited
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Naohiko Okunishi
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Systems for reverse pulsing
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Patent number 11,798,785
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Issue date Oct 24, 2023
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Lam Research Corporation
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Maolin Long
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H01 - BASIC ELECTRIC ELEMENTS
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Wafer support
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Patent number 11,764,039
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Issue date Sep 19, 2023
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NGK Insulators, Ltd.
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Tomohiro Takahashi
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 11,735,392
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Issue date Aug 22, 2023
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Tokyo Electron Limited
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Daisuke Hayashi
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 11,676,799
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Issue date Jun 13, 2023
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Tokyo Electron Limited
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Koji Yamagishi
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H01 - BASIC ELECTRIC ELEMENTS
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