Electron beam cleaning

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CPC
H01L2224/85017

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00

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H01L2224/85017Electron beam cleaning

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Patents Grantslast 30 patents

Information Patent Grant
Ion-ion plasma atomic layer etch process
- Patent number 11,101,113
- Issue date Aug 24, 2021
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents