Electron or ion optical systems

Industry

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H01J2237/303

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/303Electron or ion optical systems

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ion beam source for optical device fabrication using a segmented io...
- Patent number 11,810,755
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of optical device fabrication using an ion beam source
- Patent number 11,640,898
- Issue date May 2, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam apparatus for optical device fabrication
- Patent number 11,462,386
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Kartik Ramaswamy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of optical device fabrication using an electron beam apparatus
- Patent number 11,430,634
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ion milling device, ion source, and ion milling method
- Patent number 11,158,481
- Issue date Oct 26, 2021
- HITACHI HIGH-TECH CORPORATION
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of optical device fabrication using an electron beam apparatus
- Patent number 10,818,472
- Issue date Oct 27, 2020
- Applied Materials, Inc.
- Ludovic Godet
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-charged-particle beam writing apparatus
- Patent number 10,811,224
- Issue date Oct 20, 2020
- NuFlare Technology, Inc.
- Hirofumi Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Textiles and methods and systems for producing textiles
- Patent number 10,697,111
- Issue date Jun 30, 2020
- Xyleco, Inc.
- Marhsall Medoff
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method and apparatus for an imaging system
- Patent number 10,614,993
- Issue date Apr 7, 2020
- Frederick A. Flitsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ebeam universal cutter
- Patent number 10,578,970
- Issue date Mar 3, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic field fluctuation for beam smoothing
- Patent number 10,361,059
- Issue date Jul 23, 2019
- Advanced Ion Beam Technology, Inc.
- Xiao Bai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion milling device, ion source and ion milling method
- Patent number 10,304,653
- Issue date May 28, 2019
- Hitachi High-Technologies Corporation
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,191,376
- Issue date Jan 29, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ebeam three beam aperture array
- Patent number 10,067,416
- Issue date Sep 4, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Unidirectional metal on layer with ebeam
- Patent number 10,014,256
- Issue date Jul 3, 2018
- Intel Corporation
- Donald W. Nelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electrode electron optics
- Patent number 9,905,322
- Issue date Feb 27, 2018
- Mapper Lithography IP B.V.
- Marco Jan-Jaco Wieland
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ebeam three beam aperture array
- Patent number 9,897,908
- Issue date Feb 20, 2018
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques for processing a substrate
- Patent number 9,863,032
- Issue date Jan 9, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Kevin M. Daniels
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Annular cooling fluid passage for magnets
- Patent number 9,852,882
- Issue date Dec 26, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Scott Barraclough
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deceleration apparatus for ribbon and spot beams
- Patent number 9,824,850
- Issue date Nov 21, 2017
- Advanced Ion Beam Technology, Inc.
- Nicholas White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus and method of manufacturin...
- Patent number 9,824,860
- Issue date Nov 21, 2017
- Advantest Corp.
- Akio Yamada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lower dose rate ion implantation using a wider ion beam
- Patent number 9,748,072
- Issue date Aug 29, 2017
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid, method of manufacturing the same, and ion beam processing app...
- Patent number 9,721,747
- Issue date Aug 1, 2017
- Canon Anelva Corporation
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion source for use with a focused ion beam column with selec...
- Patent number 9,627,169
- Issue date Apr 18, 2017
- FEI Company
- Anthony Graupera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arc chamber with multiple cathodes for an ion source
- Patent number 9,620,326
- Issue date Apr 11, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chin-Tsung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for aberration correction in electron beam ba...
- Patent number 9,607,802
- Issue date Mar 28, 2017
- KLA-Tencor Corporation
- Christopher F. Bevis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Textiles and methods and systems for producing textiles
- Patent number 9,587,349
- Issue date Mar 7, 2017
- Xyleco, Inc.
- Marshall Medoff
- D10 - INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEX...
Information Patent Grant
Method and apparatus for a high resolution imaging system
- Patent number 9,558,915
- Issue date Jan 31, 2017
- Frederick A. Flitsch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Blanking aperture array device for multi-beams, and fabrication met...
- Patent number 9,530,610
- Issue date Dec 27, 2016
- NuFlare Technology, Inc.
- Kazuhiro Chiba
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION BEAM SOURCE FOR OPTICAL DEVICE FABRICATION
- Publication number 20200194217
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING DEVICE, lON SOURCE, AND ION MILLING METHOD
- Publication number 20190237291
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Kengo ASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20190121236
- Publication date Apr 25, 2019
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM THREE BEAM APERTURE ARRAY
- Publication number 20180143526
- Publication date May 24, 2018
- Intel Corporation
- Yan A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING DEVICE, ION SOURCE AND ION MILLING METHOD
- Publication number 20170221671
- Publication date Aug 3, 2017
- Hitachi High-Technologies Corporation
- Kengo ASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...
- Publication number 20170092473
- Publication date Mar 30, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRID, METHOD OF MANUFACTURING THE SAME, AND ION BEAM PROCESSING APP...
- Publication number 20170084419
- Publication date Mar 23, 2017
- Canon ANELVA Corporation
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FIELD FLUCTUATION FOR BEAM SMOOTHING
- Publication number 20160225577
- Publication date Aug 4, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Xiao BAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ABERRATION CORRECTION IN ELECTRON BEAM BA...
- Publication number 20160172151
- Publication date Jun 16, 2016
- KLA-Tencor Corporation
- Christopher F. BEVIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANKING APERTURE ARRAY DEVICE FOR MULTI-BEAMS, AND FABRICATION MET...
- Publication number 20160155600
- Publication date Jun 2, 2016
- NuFlare Technology, Inc.
- Kazuhiro CHIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BE...
- Publication number 20160027607
- Publication date Jan 28, 2016
- FEI Company
- Anthony Graupera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNULAR COOLING FLUID PASSAGE FOR MAGNETS
- Publication number 20160027610
- Publication date Jan 28, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Scott Barraclough
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20150380213
- Publication date Dec 31, 2015
- NuFlare Technology, Inc.
- Hideyuki TSURUMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20150348740
- Publication date Dec 3, 2015
- Kabushiki Kaisha Toshiba
- Shinichi FURUKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGET DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20150318139
- Publication date Nov 5, 2015
- Canon Kabushiki Kaisha
- Mitsuaki Amemiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CORRECTING DRIFT OF CHARGED PARTICLE BEAM, AND CHARGED P...
- Publication number 20150270101
- Publication date Sep 24, 2015
- NuFlare Technology, Inc.
- Osamu IIZUKA
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ION BEAM UNIFORMITY CONTROL USING ION BEAM BLOCKERS
- Publication number 20150270099
- Publication date Sep 24, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...
- Publication number 20150243480
- Publication date Aug 27, 2015
- Advantest Corporation
- Akio Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRODE ELECTRON OPTICS
- Publication number 20150136995
- Publication date May 21, 2015
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco WIELAND
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS
- Publication number 20150136967
- Publication date May 21, 2015
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Nicholas White
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPECIMEN PREPARATION METHOD
- Publication number 20150137003
- Publication date May 21, 2015
- United Microelectronics Corp.
- Kaeng-Nan Liew
- G01 - MEASURING TESTING
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20150129779
- Publication date May 14, 2015
- Canon Kabushiki Kaisha
- Tomoyuki Morita
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BE...
- Publication number 20150129759
- Publication date May 14, 2015
- FEI Company
- Anthony Graupera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE
- Publication number 20150130353
- Publication date May 14, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Chin-Tsung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing System
- Publication number 20150114294
- Publication date Apr 30, 2015
- CARL ZEISS MICROSCOPY GMBH
- Emmerich Bertagnolli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Techniques For Processing A Substrate
- Publication number 20150102237
- Publication date Apr 16, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Kevin M. Daniels
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DETERMINING BEAM PARAMETERS OF A CHARGE CARRIER BEAM, ME...
- Publication number 20150083928
- Publication date Mar 26, 2015
- RWTH Aachen Koerperschaft des oeffentlichen Rechts
- Uwe Reisgen
- G01 - MEASURING TESTING
Information Patent Application
TEXTILES AND METHODS AND SYSTEMS FOR PRODUCING TEXTILES
- Publication number 20150082556
- Publication date Mar 26, 2015
- XYLECO, INC.
- Marshall Medoff
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ANNULAR COOLING FLUID PASSAGE FOR MAGNETS
- Publication number 20140367583
- Publication date Dec 18, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Scott Barraclough
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUS FOR HIGH RATE HYDROGEN IMPLANTATION AND CO...
- Publication number 20140256121
- Publication date Sep 11, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Svetlana B. Radovanov
- H01 - BASIC ELECTRIC ELEMENTS

Electron or ion optical systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ion beam source for optical device fabrication using a segmented io...

Methods of optical device fabrication using an ion beam source

Electron beam apparatus for optical device fabrication

Methods of optical device fabrication using an electron beam apparatus

Ion milling device, ion source, and ion milling method

Methods of optical device fabrication using an electron beam apparatus

Multi-charged-particle beam writing apparatus

Cross scan proximity correction with ebeam universal cutter

Textiles and methods and systems for producing textiles

Method and apparatus for an imaging system

Ebeam universal cutter

Magnetic field fluctuation for beam smoothing

Ion milling device, ion source and ion milling method

Cross scan proximity correction with ebeam universal cutter

Ebeam three beam aperture array

Unidirectional metal on layer with ebeam

Multi-electrode electron optics

Ebeam three beam aperture array

Techniques for processing a substrate

Annular cooling fluid passage for magnets

Deceleration apparatus for ribbon and spot beams

Charged particle beam exposure apparatus and method of manufacturin...

Lower dose rate ion implantation using a wider ion beam

Grid, method of manufacturing the same, and ion beam processing app...

Plasma ion source for use with a focused ion beam column with selec...

Arc chamber with multiple cathodes for an ion source

Apparatus and methods for aberration correction in electron beam ba...

Textiles and methods and systems for producing textiles

Method and apparatus for a high resolution imaging system

Blanking aperture array device for multi-beams, and fabrication met...

Patents Applicationslast 30 patents

ION BEAM SOURCE FOR OPTICAL DEVICE FABRICATION

ION MILLING DEVICE, lON SOURCE, AND ION MILLING METHOD

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

EBEAM THREE BEAM APERTURE ARRAY

ION MILLING DEVICE, ION SOURCE AND ION MILLING METHOD

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...

GRID, METHOD OF MANUFACTURING THE SAME, AND ION BEAM PROCESSING APP...

MAGNETIC FIELD FLUCTUATION FOR BEAM SMOOTHING

APPARATUS AND METHODS FOR ABERRATION CORRECTION IN ELECTRON BEAM BA...

BLANKING APERTURE ARRAY DEVICE FOR MULTI-BEAMS, AND FABRICATION MET...

INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BE...

ANNULAR COOLING FLUID PASSAGE FOR MAGNETS

CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM D...

PROCESSING APPARATUS AND PROCESSING METHOD

TARGET DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

METHOD FOR CORRECTING DRIFT OF CHARGED PARTICLE BEAM, AND CHARGED P...

ION BEAM UNIFORMITY CONTROL USING ION BEAM BLOCKERS

CHARGED PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURIN...

MULTI-ELECTRODE ELECTRON OPTICS

DECELERATION APPARATUS FOR RIBBON AND SPOT BEAMS

SPECIMEN PREPARATION METHOD

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BE...

ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE

Processing System

Techniques For Processing A Substrate

METHOD FOR DETERMINING BEAM PARAMETERS OF A CHARGE CARRIER BEAM, ME...

TEXTILES AND METHODS AND SYSTEMS FOR PRODUCING TEXTILES

ANNULAR COOLING FLUID PASSAGE FOR MAGNETS

TECHNIQUES AND APPARATUS FOR HIGH RATE HYDROGEN IMPLANTATION AND CO...