Electron scattering (proximity) correction or prevention methods

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G03F7/2061

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2061Electron scattering (proximity) correction or prevention methods

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Electron beam lithography with dynamic fin overlay correction
- Patent number 12,099,304
- Issue date Sep 24, 2024
- International Business Machines Corporation
- Simon Dawes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of mask data synthesis and mask making
- Patent number 11,947,254
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsu-Ting Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dummy insertion for improving throughput of electron beam lithography
- Patent number 11,899,367
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography with dynamic fin overlay correction
- Patent number 11,852,975
- Issue date Dec 26, 2023
- International Business Machines Corporation
- Simon Dawes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,756,765
- Issue date Sep 12, 2023
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dummy insertion for improving throughput of electron beam lithography
- Patent number 11,526,081
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of mask data synthesis and mask making
- Patent number 11,415,890
- Issue date Aug 16, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsu-Ting Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 11,152,302
- Issue date Oct 19, 2021
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Resist composition
- Patent number 11,143,961
- Issue date Oct 12, 2021
- The University of Manchester
- Scott Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 11,062,878
- Issue date Jul 13, 2021
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dummy insertion for improving throughput of electron beam lithography
- Patent number 11,054,748
- Issue date Jul 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for projecting a beam of particles onto a substrate with cor...
- Patent number 10,923,319
- Issue date Feb 16, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Christophe Constancias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and system for determining a charged particle beam exposure...
- Patent number 10,748,744
- Issue date Aug 18, 2020
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a grating
- Patent number 10,705,427
- Issue date Jul 7, 2020
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 10,600,733
- Issue date Mar 24, 2020
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for acquiring parameter for dose correction of charged parti...
- Patent number 10,488,760
- Issue date Nov 26, 2019
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating unique chips using a charged particle multi-beamlet lit...
- Patent number 10,418,324
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for acquiring parameter for dose correction of charged parti...
- Patent number 10,114,290
- Issue date Oct 30, 2018
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for design of enhanced edge slope patterns for ch...
- Patent number 9,612,530
- Issue date Apr 4, 2017
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of electron-beam lithography with correction of corner round...
- Patent number 9,607,808
- Issue date Mar 28, 2017
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Serdar Manakli
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Conductive polymer composition, coated article having antistatic fi...
- Patent number 9,558,862
- Issue date Jan 31, 2017
- Shin-Etsu Polymer Co., Ltd.
- Toshiya Sawai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fracturing and forming a pattern using shaped beam charg...
- Patent number 9,448,473
- Issue date Sep 20, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for estimating patterns to be printed on a plate or mask by...
- Patent number 9,430,597
- Issue date Aug 30, 2016
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Jerome Belledent
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterning method using electron beam and exposure system configure...
- Patent number 9,411,236
- Issue date Aug 9, 2016
- Samsung Electronics Co., Ltd.
- Yongseok Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam lithography apparatus and charged particle be...
- Patent number 9,268,234
- Issue date Feb 23, 2016
- Nuflare Technology, Inc.
- Noriaki Nakayamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for correcting electronic proximity effects using off-center...
- Patent number 9,224,577
- Issue date Dec 29, 2015
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Patrick Schiavone
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing apparatus and method for acquiring do...
- Patent number 9,224,578
- Issue date Dec 29, 2015
- NuFlare Technology, Inc.
- Noriaki Nakayamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning method using electron beam and exposure system configure...
- Patent number 9,164,389
- Issue date Oct 20, 2015
- Samsung Electronics Co., Ltd.
- Yongseok Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for design of enhanced edge slope patterns for ch...
- Patent number 9,057,956
- Issue date Jun 16, 2015
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fracturing and forming a pattern using shaped beam charg...
- Patent number 8,916,315
- Issue date Dec 23, 2014
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING INTEGRATED CIRCUIT
- Publication number 20240201579
- Publication date Jun 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...
- Publication number 20240145212
- Publication date May 2, 2024
- NIPPON CONTROL SYSTEM CORPORATION
- Masakazu HAMAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD
- Publication number 20240087845
- Publication date Mar 14, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY WITH DYNAMIC FIN OVERLAY CORRECTION
- Publication number 20240061342
- Publication date Feb 22, 2024
- International Business Machines Corporation
- Simon DAWES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230386784
- Publication date Nov 30, 2023
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dummy Insertion for Improving Throughput of Electron Beam Lithography
- Publication number 20230273524
- Publication date Aug 31, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20230124768
- Publication date Apr 20, 2023
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PAR...
- Publication number 20230095091
- Publication date Mar 30, 2023
- NuFlare Technology, Inc.
- Yasuo KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MASK DATA SYNTHESIS AND MASK MAKING
- Publication number 20220373878
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsu-Ting HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Composition
- Publication number 20220179319
- Publication date Jun 9, 2022
- The University of Manchester
- Scott Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dummy Insertion for Improving Throughput of Electron Beam Lithography
- Publication number 20210405534
- Publication date Dec 30, 2021
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20210313143
- Publication date Oct 7, 2021
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...
- Publication number 20200373122
- Publication date Nov 26, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATING UNIQUE CHIPS USING A CHARGED PARTICLE MULTI-BEAMLET LIT...
- Publication number 20200219806
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dummy Insertion for Improving Throughput of Electron Beam Lithography
- Publication number 20200098545
- Publication date Mar 26, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FABRICATING UNIQUE CHIPS USING A CHARGED PARTICLE MULTI-BEAMLET LIT...
- Publication number 20200013712
- Publication date Jan 9, 2020
- ASML NETHERLANDS B.V.
- Marcel Nicolaas Jacobus van Kervinck
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR ACQUIRING PARAMETER FOR DOSE CORRECTION OF CHARGED PARTI...
- Publication number 20190004429
- Publication date Jan 3, 2019
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MAKING A GRATING
- Publication number 20180373153
- Publication date Dec 27, 2018
- TSINGHUA UNIVERSITY
- MO CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ACQUIRING PARAMETER FOR DOSE CORRECTION OF CHARGED PARTI...
- Publication number 20170139327
- Publication date May 18, 2017
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING METHOD USING ELECTRON BEAM AND EXPOSURE SYSTEM CONFIGURE...
- Publication number 20160004161
- Publication date Jan 7, 2016
- Yongseok Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Design of Enhanced Edge Slope Patterns for Ch...
- Publication number 20150338737
- Publication date Nov 26, 2015
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR ACQUIRING DO...
- Publication number 20140291553
- Publication date Oct 2, 2014
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...
- Publication number 20140180462
- Publication date Jun 26, 2014
- ASELTA NANOGRAPHICS
- Jerome BELLEDENT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHO...
- Publication number 20140146298
- Publication date May 29, 2014
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...
- Publication number 20130316288
- Publication date Nov 28, 2013
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method For Fracturing And Forming A Pattern Using Shaped Beam Charg...
- Publication number 20130316273
- Publication date Nov 28, 2013
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309608
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309610
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...
- Publication number 20130309609
- Publication date Nov 21, 2013
- D2S, INC.
- Harold Robert Zable
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR OPTICAL PROXIMITY CORRECTION OF A RETICLE TO BE MANUFACT...
- Publication number 20130290913
- Publication date Oct 31, 2013
- Akira Fujimura
- B82 - NANO-TECHNOLOGY

Electron scattering (proximity) correction or prevention methods

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electron beam lithography with dynamic fin overlay correction

Method of mask data synthesis and mask making

Dummy insertion for improving throughput of electron beam lithography

Electron beam lithography with dynamic fin overlay correction

Method and system for determining a charged particle beam exposure...

Dummy insertion for improving throughput of electron beam lithography

Method of mask data synthesis and mask making

Fabricating unique chips using a charged particle multi-beamlet lit...

Resist composition

Method and system for determining a charged particle beam exposure...

Dummy insertion for improving throughput of electron beam lithography

Method for projecting a beam of particles onto a substrate with cor...

Method and system for determining a charged particle beam exposure...

Method for making a grating

Fabricating unique chips using a charged particle multi-beamlet lit...

Method for acquiring parameter for dose correction of charged parti...

Fabricating unique chips using a charged particle multi-beamlet lit...

Method for acquiring parameter for dose correction of charged parti...

Method and system for design of enhanced edge slope patterns for ch...

Method of electron-beam lithography with correction of corner round...

Conductive polymer composition, coated article having antistatic fi...

Method for fracturing and forming a pattern using shaped beam charg...

Method for estimating patterns to be printed on a plate or mask by...

Patterning method using electron beam and exposure system configure...

Charged particle beam lithography apparatus and charged particle be...

Method for correcting electronic proximity effects using off-center...

Charged particle beam writing apparatus and method for acquiring do...

Patterning method using electron beam and exposure system configure...

Method and system for design of enhanced edge slope patterns for ch...

Method for fracturing and forming a pattern using shaped beam charg...

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING INTEGRATED CIRCUIT

ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METH...

ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD

ELECTRON BEAM LITHOGRAPHY WITH DYNAMIC FIN OVERLAY CORRECTION

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

Dummy Insertion for Improving Throughput of Electron Beam Lithography

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PAR...

METHOD OF MASK DATA SYNTHESIS AND MASK MAKING

Resist Composition

Dummy Insertion for Improving Throughput of Electron Beam Lithography

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE...

FABRICATING UNIQUE CHIPS USING A CHARGED PARTICLE MULTI-BEAMLET LIT...

Dummy Insertion for Improving Throughput of Electron Beam Lithography

FABRICATING UNIQUE CHIPS USING A CHARGED PARTICLE MULTI-BEAMLET LIT...

METHOD FOR ACQUIRING PARAMETER FOR DOSE CORRECTION OF CHARGED PARTI...

METHOD FOR MAKING A GRATING

METHOD FOR ACQUIRING PARAMETER FOR DOSE CORRECTION OF CHARGED PARTI...

PATTERNING METHOD USING ELECTRON BEAM AND EXPOSURE SYSTEM CONFIGURE...

Method and System for Design of Enhanced Edge Slope Patterns for Ch...

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR ACQUIRING DO...

METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...

DEVICE FOR MANUFACTURING A SURFACE USING CHARACTER PROJECTION LITHO...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BE...

Method For Fracturing And Forming A Pattern Using Shaped Beam Charg...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...

METHOD AND SYSTEM FOR FORMING A PATTERN USING CHARGED PARTICLE BEAM...

METHOD FOR OPTICAL PROXIMITY CORRECTION OF A RETICLE TO BE MANUFACT...