Electrostatic discharge [ESD] related features

Industry

CPC
G03F1/40

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/40Electrostatic discharge [ESD] related features

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of lithography process and transferring a reticle
- Patent number 11,982,944
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Lun Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective type blankmask and photomask for EUV
- Patent number 11,815,801
- Issue date Nov 14, 2023
- S&S TECH Co., Ltd.
- Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of lithography process using reticle container with discharg...
- Patent number 11,703,763
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Lun Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 11,630,386
- Issue date Apr 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask with electrostatic discharge protection
- Patent number 11,493,842
- Issue date Nov 8, 2022
- Yangtze Memory Technologies Co., Ltd.
- Peng Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle with conductive material structure
- Patent number 11,320,733
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsiao-Lun Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark, substrate and manufacturing method therefor, and ex...
- Patent number 11,315,882
- Issue date Apr 26, 2022
- ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- Qinglin Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 11,243,461
- Issue date Feb 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Induced stress for EUV pellicle tensioning
- Patent number 11,163,229
- Issue date Nov 2, 2021
- Imec VZW
- Marina Mariano Juste
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,036,127
- Issue date Jun 15, 2021
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with an electrically conductive film, substrate with a mu...
- Patent number 10,996,554
- Issue date May 4, 2021
- Hoya Corporation
- Takumi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask and method
- Patent number 10,859,902
- Issue date Dec 8, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for discharging static charges on reticle
- Patent number 10,802,394
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Lun Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask and method of manufacturing semiconductor element using...
- Patent number 10,719,009
- Issue date Jul 21, 2020
- Samsung Display Co., Ltd.
- Jun Chun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank having a resist layer, method for manufacturing mask bla...
- Patent number 10,712,652
- Issue date Jul 14, 2020
- Hoya Corporation
- Takahiro Hiromatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with electrically conductive film, substrate with multila...
- Patent number 10,606,166
- Issue date Mar 31, 2020
- Hoya Corporation
- Takumi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive composition, antistatic film, laminate and production th...
- Patent number 10,488,757
- Issue date Nov 26, 2019
- Mitsubishi Chemical Corporation
- Akira Yamazaki
- B32 - LAYERED PRODUCTS
Information Patent Grant
Lithography mask and method
- Patent number 10,481,483
- Issue date Nov 19, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoetching mask plate, manufacture method thereof, and photoetchi...
- Patent number 10,466,584
- Issue date Nov 5, 2019
- BOE Technology Group Co., Ltd.
- Zhenhua Lv
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-ESD photomask and method of forming the same
- Patent number 10,126,643
- Issue date Nov 13, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Hung Kung
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pattern trimming compositions and methods
- Patent number 9,760,011
- Issue date Sep 12, 2017
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank for reflection-type exposure, and mask for reflection-ty...
- Patent number 9,442,364
- Issue date Sep 13, 2016
- Toppan Printing Co., Ltd.
- Yutaka Kodera
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for performing pattern exposure using reflected light
- Patent number 9,298,080
- Issue date Mar 29, 2016
- Renesas Electronics Corporation
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank and photomask
- Patent number 9,280,045
- Issue date Mar 8, 2016
- CLEAN SURFACE TECHNOLOGY CO.
- Isao Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device, and mask
- Patent number 9,069,254
- Issue date Jun 30, 2015
- Renesas Electronics Corporation
- Toshihiko Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticles with subdivided blocking regions
- Patent number 8,822,108
- Issue date Sep 2, 2014
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method for manufacturing same and method for manu...
- Patent number 8,771,905
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Conductive element for electrically coupling an EUVL mask to a supp...
- Patent number 8,772,737
- Issue date Jul 8, 2014
- Applied Materials Israel, Ltd.
- Igor Krivts (Krayvitz)
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus of mask drawing using a grounding body at lowe...
- Patent number 8,742,376
- Issue date Jun 3, 2014
- Nuflare Technology, Inc.
- Takayuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of fabricating reticles with subdivided blocking regions
- Patent number 8,383,301
- Issue date Feb 26, 2013
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF LITHOGRAPHY PROCESS AND TRANSFERRING A RETICLE
- Publication number 20230305404
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Lun CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM
- Publication number 20230138079
- Publication date May 4, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC
- MEI-LI WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20230104571
- Publication date Apr 6, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK, METHOD OF MANUFACTURING ARRAY SUBSTRATE, AND DISPLAY PANEL
- Publication number 20220397820
- Publication date Dec 15, 2022
- TCL China Star Optoelectronics Technology Co., Ltd.
- Xiaofang TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF LITHOGRAPHY PROCESS USING RETICLE CONTAINER WITH DISCHARG...
- Publication number 20220260901
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Lun CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK AND FABRICATING METHOD THEREOF
- Publication number 20220146924
- Publication date May 12, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsiao-Chen WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSPORT COMPLEX AND TRANSPORT MODULE INCLUDING THE SAME
- Publication number 20210373434
- Publication date Dec 2, 2021
- SAMSUNG DISPLAY CO., LTD.
- SUKBIN JUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE WITH CONDUCTIVE MATERIAL STRUCTURE
- Publication number 20210026236
- Publication date Jan 28, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Lun CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-STATIC PHOTOMASK
- Publication number 20200371426
- Publication date Nov 26, 2020
- WINBOND ELECTRONICS CORP.
- Tsung-Wei LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK WITH ELECTROSTATIC DISCHARGE PROTECTION
- Publication number 20200233298
- Publication date Jul 23, 2020
- Yangtze Memory Technologies Co., Ltd.
- Peng Jiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK, SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND EX...
- Publication number 20200201168
- Publication date Jun 25, 2020
- Ordos Yuansheng Optoelectronics Co., Ltd.
- Qinglin MA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH AN ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH A MU...
- Publication number 20200192213
- Publication date Jun 18, 2020
- HOYA CORPORATION
- Takumi KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask With Backside Coating
- Publication number 20200133114
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOETCHING MASK PLATE, MANUFACTURE METHOD THEREOF, AND PHOTOETCHI...
- Publication number 20190094681
- Publication date Mar 28, 2019
- BOE TECHNOLOGY GROUP CO., LTD.
- Zhenhua LV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20190056653
- Publication date Feb 21, 2019
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK HAVING RESIST LAYER, METHOD FOR MANUFACTURING MASK BLANK...
- Publication number 20180335693
- Publication date Nov 22, 2018
- HOYA CORPORATION
- Takahiro HIROMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-ESD PHOTOMASK AND METHOD OF FORMING THE SAME
- Publication number 20180164676
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hung Kung
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE WITH ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH MULTILA...
- Publication number 20180149962
- Publication date May 31, 2018
- HOYA CORPORATION
- Takumi KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION TH...
- Publication number 20170261854
- Publication date Sep 14, 2017
- MITSUBISHI CHEMICAL CORPORATION
- Akira YAMAZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MASK BLANK FOR REFLECTION-TYPE EXPOSURE, AND MASK FOR REFLECTION-TY...
- Publication number 20140205936
- Publication date Jul 24, 2014
- Toppan Printing Co., Ltd.
- Yutaka KODERA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND PHOTOMASK
- Publication number 20140106266
- Publication date Apr 17, 2014
- CLEAN SURFACE TECHNOLOGY CO.
- Isao Hattori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DRAWING METHOD, MASK DRAWING APPARATUS
- Publication number 20140001380
- Publication date Jan 2, 2014
- NuFlare Technology, Inc.
- Takayuki OHNISHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND MASK
- Publication number 20130323928
- Publication date Dec 5, 2013
- RENESAS ELECTRONICS CORPORATION
- Toshihiko TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLES WITH SUBDIVIDED BLOCKING REGIONS
- Publication number 20130157179
- Publication date Jun 20, 2013
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONDUCTIVE ELEMENT FOR ELECTRICALLY COUPLING AN EUVL MASK TO A SUPP...
- Publication number 20130075605
- Publication date Mar 28, 2013
- APPLIED MATERIALS ISRAEL, LTD.
- Igor Krivts (Krayvitz)
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...
- Publication number 20120244714
- Publication date Sep 27, 2012
- Kabushiki Kaisha Toshiba
- Masamitsu Itoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
RETICLES WITH SUBDIVIDED BLOCKING REGIONS AND METHODS OF FABRICATION
- Publication number 20120070768
- Publication date Mar 22, 2012
- Micron Technology, Inc.
- J. Brett Rolfson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONITORING MODULE INCLUDING E-FIELD-INDUCED ESD-SENSITIVE PATTERN A...
- Publication number 20110169495
- Publication date Jul 14, 2011
- Su-Young Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Mask and Method of Forming a Lithographic Mask
- Publication number 20100266939
- Publication date Oct 21, 2010
- Haiko Rolff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...
- Publication number 20100203432
- Publication date Aug 12, 2010
- Masamitsu ITOH
- B82 - NANO-TECHNOLOGY

Electrostatic discharge [ESD] related features

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of lithography process and transferring a reticle

Reflective type blankmask and photomask for EUV

Method of lithography process using reticle container with discharg...

Reflective mask and fabricating method thereof

Photomask with electrostatic discharge protection

Reticle with conductive material structure

Alignment mark, substrate and manufacturing method therefor, and ex...

Reflective mask and fabricating method thereof

Induced stress for EUV pellicle tensioning

Reflective mask blank and reflective mask

Substrate with an electrically conductive film, substrate with a mu...

Lithography mask and method

Method for discharging static charges on reticle

Photo mask and method of manufacturing semiconductor element using...

Mask blank having a resist layer, method for manufacturing mask bla...

Substrate with electrically conductive film, substrate with multila...

Conductive composition, antistatic film, laminate and production th...

Lithography mask and method

Photoetching mask plate, manufacture method thereof, and photoetchi...

Anti-ESD photomask and method of forming the same

Pattern trimming compositions and methods

Mask blank for reflection-type exposure, and mask for reflection-ty...

Mask for performing pattern exposure using reflected light

Mask blank and photomask

Method of manufacturing semiconductor device, and mask

Reticles with subdivided blocking regions

Exposure mask and method for manufacturing same and method for manu...

Conductive element for electrically coupling an EUVL mask to a supp...

Method and apparatus of mask drawing using a grounding body at lowe...

Methods of fabricating reticles with subdivided blocking regions

Patents Applicationslast 30 patents

METHOD OF LITHOGRAPHY PROCESS AND TRANSFERRING A RETICLE

LITHOGRAPHY SYSTEM

SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

PHOTOMASK, METHOD OF MANUFACTURING ARRAY SUBSTRATE, AND DISPLAY PANEL

METHOD OF LITHOGRAPHY PROCESS USING RETICLE CONTAINER WITH DISCHARG...

REFLECTIVE MASK AND FABRICATING METHOD THEREOF

TRANSPORT COMPLEX AND TRANSPORT MODULE INCLUDING THE SAME

RETICLE WITH CONDUCTIVE MATERIAL STRUCTURE

ANTI-STATIC PHOTOMASK

PHOTOMASK WITH ELECTROSTATIC DISCHARGE PROTECTION

ALIGNMENT MARK, SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND EX...

SUBSTRATE WITH AN ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH A MU...

Extreme Ultraviolet Mask With Backside Coating

PHOTOETCHING MASK PLATE, MANUFACTURE METHOD THEREOF, AND PHOTOETCHI...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

MASK BLANK HAVING RESIST LAYER, METHOD FOR MANUFACTURING MASK BLANK...

ANTI-ESD PHOTOMASK AND METHOD OF FORMING THE SAME

SUBSTRATE WITH ELECTRICALLY CONDUCTIVE FILM, SUBSTRATE WITH MULTILA...

CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION TH...

MASK BLANK FOR REFLECTION-TYPE EXPOSURE, AND MASK FOR REFLECTION-TY...

MASK BLANK AND PHOTOMASK

MASK DRAWING METHOD, MASK DRAWING APPARATUS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND MASK

RETICLES WITH SUBDIVIDED BLOCKING REGIONS

CONDUCTIVE ELEMENT FOR ELECTRICALLY COUPLING AN EUVL MASK TO A SUPP...

EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...

RETICLES WITH SUBDIVIDED BLOCKING REGIONS AND METHODS OF FABRICATION

MONITORING MODULE INCLUDING E-FIELD-INDUCED ESD-SENSITIVE PATTERN A...

Lithographic Mask and Method of Forming a Lithographic Mask

EXPOSURE MASK AND METHOD FOR MANUFACTURING SAME AND METHOD FOR MANU...