electrostatic

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CPC
H01J2237/12

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/12electrostatic

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Circuits for edge ring control in shaped dc pulsed plasma process d...
- Patent number 12,334,311
- Issue date Jun 17, 2025
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lens designs
- Patent number 12,243,714
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Laura Del Tin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,237,143
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,961,697
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,887,807
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for multiple charged-particle beams
- Patent number 11,804,355
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Yan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Axially progressive lens for transporting charged particles
- Patent number 11,791,149
- Issue date Oct 17, 2023
- Agilent Technologies, Inc.
- Tong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic devices to influence beams of charged particles
- Patent number 11,699,566
- Issue date Jul 11, 2023
- ViaMEMS Technologies, Inc.
- David Xuan-Qi Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Apparatus using charged particle beams
- Patent number 11,670,477
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,587,758
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for adjusting the current of individual partic...
- Patent number 11,562,880
- Issue date Jan 24, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens arrangement usable in particle-optical systems
- Patent number 11,527,379
- Issue date Dec 13, 2022
- Carl Zeiss Microscopy GmbH
- Rainer Knippelmeyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection methods and systems
- Patent number 11,462,380
- Issue date Oct 4, 2022
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam electron characterization tool with telecentric illumina...
- Patent number 11,373,838
- Issue date Jun 28, 2022
- KLA Corporation
- Alan D. Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction in charged particle system
- Patent number 11,348,756
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field curvature correction for multi-beam inspection systems
- Patent number 11,302,511
- Issue date Apr 12, 2022
- KLA Corporation
- Alan Brodie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuits for edge ring control in shaped DC pulsed plasma process d...
- Patent number 11,289,310
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,217,423
- Issue date Jan 4, 2022
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano vacuum tube
- Patent number 11,152,188
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsien-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,107,657
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,094,426
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-beam charged particle system
- Patent number 11,087,948
- Issue date Aug 10, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,062,877
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro stigmator array for multi electron beam system
- Patent number 11,056,312
- Issue date Jul 6, 2021
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,024,481
- Issue date Jun 1, 2021
- FEI Company
- Karel Diederick Van Der Mast
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-current ion implanter and method for controlling ion beam usin...
- Patent number 11,011,343
- Issue date May 18, 2021
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250232945
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPOLE LENS AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20250232944
- Publication date Jul 17, 2025
- HITACHI HIGH-TECH CORPORATION
- Shun KIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LENS DESIGNS
- Publication number 20250125120
- Publication date Apr 17, 2025
- ASML NETHERLANDS B.V.
- Laura DEL TIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION
- Publication number 20250112017
- Publication date Apr 3, 2025
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20250112023
- Publication date Apr 3, 2025
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD F...
- Publication number 20250079111
- Publication date Mar 6, 2025
- Carl Zeiss MultiSEM GmbH
- Joerg Jacobi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20250014855
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...
- Publication number 20240379322
- Publication date Nov 14, 2024
- Carl Zeiss MultiSEM GmbH
- Alexander Wertz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339287
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
- Publication number 20240170252
- Publication date May 23, 2024
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20240128044
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSESSMENT SYSTEM, METHOD OF ASSESSING
- Publication number 20240079205
- Publication date Mar 7, 2024
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES
- Publication number 20240038521
- Publication date Feb 1, 2024
- Agilent Technologies, Inc.
- Tong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MICROSCOPE
- Publication number 20240006146
- Publication date Jan 4, 2024
- National University of Singapore
- Jeroen Anton VAN KAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING CHARGED PARTICLE BEAMS
- Publication number 20230411110
- Publication date Dec 21, 2023
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386801
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Tsuyoshi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD AND IMAGE
- Publication number 20230304949
- Publication date Sep 28, 2023
- ASML NETHERLANDS B.V.
- Roy Ramon VEENSTRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20230282441
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230245849
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM
- Publication number 20230086984
- Publication date Mar 23, 2023
- ASML NETHERLANDS B.V.
- Te-Yu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC DEVICES TO INFLUENCE BEAMS OF CHARGED PARTICLES
- Publication number 20230071331
- Publication date Mar 9, 2023
- ViaMEMS Technologies, Inc.
- David Xuan-Qi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LENS DESIGNS
- Publication number 20220406563
- Publication date Dec 22, 2022
- ASML NETHERLANDS B.V.
- Laura DEL TIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES
- Publication number 20220336199
- Publication date Oct 20, 2022
- Agilent Technologies, Inc.
- Tong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...
- Publication number 20220223386
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20220148851
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS
- Publication number 20220068587
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20210383941
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MULTI-BEAM INSPECTION METHODS AND SYSTEMS
- Publication number 20210343497
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- H01 - BASIC ELECTRIC ELEMENTS

electrostatic

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Circuits for edge ring control in shaped dc pulsed plasma process d...

Lens designs

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Vacuum chamber arrangement for charged particle beam generator

Apparatus using charged particle beams

Apparatus of plural charged-particle beams

Apparatus for multiple charged-particle beams

Axially progressive lens for transporting charged particles

Vacuum chamber arrangement for charged particle beam generator

Apparatus of plural charged-particle beams

Electrostatic devices to influence beams of charged particles

Apparatus using charged particle beams

Apparatus of plural charged-particle beams

Particle beam system for adjusting the current of individual partic...

Objective lens arrangement usable in particle-optical systems

Multi-beam inspection methods and systems

Multi-beam electron characterization tool with telecentric illumina...

Aberration correction in charged particle system

Field curvature correction for multi-beam inspection systems

Circuits for edge ring control in shaped DC pulsed plasma process d...

Apparatus of plural charged-particle beams

Nano vacuum tube

Apparatus of plural charged-particle beams

Vacuum chamber arrangement for charged particle beam generator

Multi-beam charged particle system

Apparatus of plural charged-particle beams

Micro stigmator array for multi electron beam system

Scanning electron microscope

High-current ion implanter and method for controlling ion beam usin...

Patents Applicationslast 30 patents

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTIPOLE LENS AND CHARGED PARTICLE BEAM DEVICE

LENS DESIGNS

IMAGING THOUSANDS OF ELECTRON BEAMS DURING WORKPIECE INSPECTION

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD F...

CHARGED PARTICLE APPARATUS AND METHOD

MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSI...

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

ASSESSMENT SYSTEM, METHOD OF ASSESSING

AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES

ION MICROSCOPE

APPARATUS USING CHARGED PARTICLE BEAMS

PLASMA PROCESSING APPARATUS

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD AND IMAGE

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM

ELECTROSTATIC DEVICES TO INFLUENCE BEAMS OF CHARGED PARTICLES

LENS DESIGNS

AXIALLY PROGRESSIVE LENS FOR TRANSPORTING CHARGED PARTICLES

CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS FOR MULTIPLE CHARGED-PARTICLE BEAMS

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR

MULTI-BEAM INSPECTION METHODS AND SYSTEMS