electrostatic

Industry

CPC
H01J2237/04924

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/04924electrostatic

Industries

Patents Grantslast 30 patents

Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 12,087,541
- Issue date Sep 10, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,705,304
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam system for adjusting the current of individual partic...
- Patent number 11,562,880
- Issue date Jan 24, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Circuits for edge ring control in shaped DC pulsed plasma process d...
- Patent number 11,289,310
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, composite charged particle beam ap...
- Patent number 11,276,555
- Issue date Mar 15, 2022
- Hitachi High-Tech Science Corporation
- Yasuhiko Sugiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and method
- Patent number 11,239,053
- Issue date Feb 1, 2022
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode arrangement, contact assembly for an electrode arrangemen...
- Patent number 11,177,114
- Issue date Nov 16, 2021
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Matthias Firnkes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,107,657
- Issue date Aug 31, 2021
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 11,062,877
- Issue date Jul 13, 2021
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conductive beam optic containing internal heating element
- Patent number 10,879,038
- Issue date Dec 29, 2020
- Applied Materials, Inc.
- Scott E. Peitzsch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,643,820
- Issue date May 5, 2020
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,541,110
- Issue date Jan 21, 2020
- ASML Netherlands B.V.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 10,504,686
- Issue date Dec 10, 2019
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam combiner
- Patent number 10,361,064
- Issue date Jul 23, 2019
- National Electrostatics Corp.
- Mark L. Sundquist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle inspection method and charged particle system
- Patent number 10,354,831
- Issue date Jul 16, 2019
- Carl Zeiss Microscopy GmbH
- Thomas Kemen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,276,347
- Issue date Apr 30, 2019
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 10,109,456
- Issue date Oct 23, 2018
- Hermes Microvision Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 9,922,799
- Issue date Mar 20, 2018
- Hermes-Microvision, Inc.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number 9,691,588
- Issue date Jun 27, 2017
- Hermes-Microvision, Inc.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic lens structure
- Patent number RE46452
- Issue date Jun 27, 2017
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
Information Patent Grant
Micro-electron column having an electron emitter improving the dens...
- Patent number 9,673,016
- Issue date Jun 6, 2017
- Industry-University Cooperation Foundation Sunmoon University
- Ho Seob Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic quadrupole deflector for microcolumn
- Patent number 9,666,407
- Issue date May 30, 2017
- Industry-University Cooperation Foundation Sunmoon University
- Tae Sik Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle multi-beam apparatus including a manipulator devic...
- Patent number 9,607,806
- Issue date Mar 28, 2017
- Mapper Lithography IP B.V.
- Aernout Christiaan Zonnevylle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam apparatus
- Patent number 9,111,717
- Issue date Aug 18, 2015
- Hitachi High-Tech Science Corporation
- Tatsuya Asahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lens and exposure apparatus using the same
- Patent number 8,901,511
- Issue date Dec 2, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drawing apparatus and method of manufacturing article
- Patent number 8,748,841
- Issue date Jun 10, 2014
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Drawing apparatus and method of manufacturing article
- Patent number 8,704,192
- Issue date Apr 22, 2014
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam drawing apparatus and article manufacturing m...
- Patent number 8,698,095
- Issue date Apr 15, 2014
- Canon Kabushiki Kaisha
- Ichiro Tanaka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple beam charged particle optical system
- Patent number 8,648,318
- Issue date Feb 11, 2014
- Mapper Lithography IP B.V.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple beam charged particle optical system
- Patent number 8,598,545
- Issue date Dec 3, 2013
- Mapper Lithography IP B.V.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Energy Filter, and Energy Analyzer and Charged Particle Beam Device...
- Publication number 20230298845
- Publication date Sep 21, 2023
- Hitachi High-Tech Corporation
- Kazuhiro HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...
- Publication number 20230245849
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...
- Publication number 20230037583
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...
- Publication number 20220223386
- Publication date Jul 14, 2022
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20220148851
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTIC...
- Publication number 20210210303
- Publication date Jul 8, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS, COMPOSITE CHARGED PARTICLE BEAM AP...
- Publication number 20210118645
- Publication date Apr 22, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Yasuhiko SUGIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM AND METHOD
- Publication number 20210005423
- Publication date Jan 7, 2021
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20200388464
- Publication date Dec 10, 2020
- ASML Netherlands B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...
- Publication number 20200161098
- Publication date May 21, 2020
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190259573
- Publication date Aug 22, 2019
- ASML NETHERLANDS B.V.
- Weiming REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20190057837
- Publication date Feb 21, 2019
- HERMES MICROVISION, INC.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
- Publication number 20180350555
- Publication date Dec 6, 2018
- HERMES MICROVISION, INC.
- Shuai Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Quadrupole Deflector for Microcolumn
- Publication number 20160247659
- Publication date Aug 25, 2016
- Tae Sik OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS
- Publication number 20160042915
- Publication date Feb 11, 2016
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Makoto Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRAWING DATA GENERATING METHOD, PROCESSING APPARATUS, STORAGE MEDIU...
- Publication number 20150044615
- Publication date Feb 12, 2015
- Canon Kabushiki Kaisha
- Kimitaka OZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140197325
- Publication date Jul 17, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR MANUFACTURING CHARGED PARTICLE BEAM LENS
- Publication number 20140190006
- Publication date Jul 10, 2014
- Canon Kabushiki Kaisha
- Yutaka Setomoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140166894
- Publication date Jun 19, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140151570
- Publication date Jun 5, 2014
- Canon Kabushiki Kaisha
- Takahisa Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME
- Publication number 20140151571
- Publication date Jun 5, 2014
- Takahisa Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY
- Publication number 20130256554
- Publication date Oct 3, 2013
- Johan Joost Koning
- B82 - NANO-TECHNOLOGY
Information Patent Application
ION BEAM APPARATUS
- Publication number 20130248732
- Publication date Sep 26, 2013
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tatsuya ASAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE MULTI-BEAMLET APPARATUS
- Publication number 20120305798
- Publication date Dec 6, 2012
- Aernout Christiaan Zonnevylle
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20120295202
- Publication date Nov 22, 2012
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Application
DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20120295203
- Publication date Nov 22, 2012
- Canon Kabushiki Kaisha
- Kentaro Sano
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
- Publication number 20120211677
- Publication date Aug 23, 2012
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING M...
- Publication number 20120178025
- Publication date Jul 12, 2012
- Canon Kabushiki Kaisha
- Ichiro TANAKA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam apparatus and sample processing method
- Publication number 20120001086
- Publication date Jan 5, 2012
- Takashi Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Generalized Focusing And Deflection Utilizing Deformed Conducting E...
- Publication number 20110297841
- Publication date Dec 8, 2011
- Lawrence Livermore National Security, LLC.
- George J. Caporaso
- H01 - BASIC ELECTRIC ELEMENTS

electrostatic

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Particle beam system for adjusting the current of individual partic...

Circuits for edge ring control in shaped DC pulsed plasma process d...

Charged particle beam apparatus, composite charged particle beam ap...

Charged particle beam system and method

Electrode arrangement, contact assembly for an electrode arrangemen...

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Conductive beam optic containing internal heating element

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Charged particle beam writing method and charged particle beam writ...

Beam combiner

Charged particle inspection method and charged particle system

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Apparatus of plural charged-particle beams

Electrostatic lens structure

Micro-electron column having an electron emitter improving the dens...

Electrostatic quadrupole deflector for microcolumn

Charged particle multi-beam apparatus including a manipulator devic...

Ion beam apparatus

Charged particle beam lens and exposure apparatus using the same

Drawing apparatus and method of manufacturing article

Drawing apparatus and method of manufacturing article

Charged particle beam drawing apparatus and article manufacturing m...

Multiple beam charged particle optical system

Multiple beam charged particle optical system

Patents Applicationslast 30 patents

Energy Filter, and Energy Analyzer and Charged Particle Beam Device...

OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OP...

APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CH...

CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTIC...

CHARGED PARTICLE BEAM APPARATUS, COMPOSITE CHARGED PARTICLE BEAM AP...

CHARGED PARTICLE BEAM SYSTEM AND METHOD

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

CIRCUITS FOR EDGE RING CONTROL IN SHAPED DC PULSED PLASMA PROCESS D...

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

Electrostatic Quadrupole Deflector for Microcolumn

ION IMPLANTER, ION IMPLANTATION METHOD, AND BEAM MEASUREMENT APPARATUS

DRAWING DATA GENERATING METHOD, PROCESSING APPARATUS, STORAGE MEDIU...

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

METHOD FOR MANUFACTURING CHARGED PARTICLE BEAM LENS

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME

ENHANCED INTEGRITY PROJECTION LENS ASSEMBLY

ION BEAM APPARATUS

CHARGED PARTICLE MULTI-BEAMLET APPARATUS

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING M...

Charged particle beam apparatus and sample processing method

Generalized Focusing And Deflection Utilizing Deformed Conducting E...