Especially adapted for treating semiconductor wafers

Industry

CPC
F27B17/0025

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Parent Industries

FMECHANICAL ENGINEERING LIGHTING HEATING WEAPONS BLASTING ENGINES OR PUMPS F27Furnaces F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL OPEN SINTERING OR LIKE APPARATUS F27B17/00Furnaces of a kind not covered by any preceding group

Current Industry

F27B17/0025Especially adapted for treating semiconductor wafers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lamp filament having a pitch gradient and method of making
- Patent number 12,198,922
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Vilen K. Nestorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adaptive baking method
- Patent number 12,196,491
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzung-Chen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and device for temperature control
- Patent number 12,176,226
- Issue date Dec 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Guoqing Zhang
- G05 - CONTROLLING REGULATING
Information Patent Grant
RTP substrate temperature one for all control algorithm
- Patent number 12,169,098
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating system comprisi...
- Patent number 12,146,710
- Issue date Nov 19, 2024
- Semes Co., Ltd.
- Young Je Um
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment method and heat treatment apparatus
- Patent number 12,125,723
- Issue date Oct 22, 2024
- SCREEN Holdings Co., Ltd.
- Oma Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, methods, and apparatus for correcting thermal processing o...
- Patent number 12,085,965
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Heater, temperature control system, and processing apparatus
- Patent number 12,085,338
- Issue date Sep 10, 2024
- Kokusai Electric Corporation
- Tetsuya Kosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus, display method, method of manufacturing semic...
- Patent number 12,080,149
- Issue date Sep 3, 2024
- Kokusai Electric Corporation
- Masanori Okuno
- G08 - SIGNALLING
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,046,489
- Issue date Jul 23, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Rolf Bremensdorfer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater lift assembly spring damper
- Patent number 12,009,232
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kai-Wen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer boat handling device, vertical batch furnace and method
- Patent number 11,996,309
- Issue date May 28, 2024
- ASM IP Holding B.V.
- Christianus G. M. de Ridder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,967,513
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate manufacturing device applicable to large-di...
- Patent number 11,955,354
- Issue date Apr 9, 2024
- Kwansei Gakuin Educational Foundation
- Tadaaki Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus and heat treatment method
- Patent number 11,927,394
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Tatsuya Yamaguchi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate processing apparatus, substrate support, and method of ma...
- Patent number 11,929,272
- Issue date Mar 12, 2024
- Kokusai Electric Corporation
- Kenichi Suzaki
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,923,212
- Issue date Mar 5, 2024
- Semes Co., Ltd.
- Kyungsik Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical batch furnace assembly
- Patent number 11,915,960
- Issue date Feb 27, 2024
- ASM IP Holding B.V.
- Jeroen Fluit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffusion furnace
- Patent number 11,862,490
- Issue date Jan 2, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Pengfei Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate heat treatment apparatus
- Patent number 11,854,842
- Issue date Dec 26, 2023
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Displacement control device for seismic events
- Patent number 11,852,291
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chuan-Chieh Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spot heating by moving a beam with horizontal rotary motion
- Patent number 11,842,907
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- Shu-Kwan Danny Lau
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing chamber with filament lamps having nonunif...
- Patent number 11,842,908
- Issue date Dec 12, 2023
- ASM IP Holding B.V.
- Shiva K. T. Rajavelu Muralidhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid thermal processing method and rapid thermal processing device
- Patent number 11,815,312
- Issue date Nov 14, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Wei Li
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate processing apparatus and method
- Patent number 11,804,388
- Issue date Oct 31, 2023
- ASM IP Holding B.V.
- Theodorus Oosterlaken
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 11,798,821
- Issue date Oct 24, 2023
- Tokyo Electron Limited
- Yukinobu Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing a workpiece using a multi-cycle thermal treat...
- Patent number 11,764,072
- Issue date Sep 19, 2023
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch processing oven and operating methods
- Patent number 11,688,621
- Issue date Jun 27, 2023
- YIELD ENGINEERING SYSTEMS, INC.
- Mark William Curry
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Semiconductor burn-in oven chamber sealing
- Patent number 11,680,980
- Issue date Jun 20, 2023
- Micro Control Company
- Tom Alan Tremmel
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for doping semiconductor materials
- Patent number 11,621,168
- Issue date Apr 4, 2023
- Gyrotron Technology, Inc.
- Vladislav Sklyarevich
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH-TEMPERATURE TUBE FURNACE
- Publication number 20250029848
- Publication date Jan 23, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED REFLECTOR FOR PROCESS CHAMBER
- Publication number 20250027716
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Raja Murali DHAMODHARAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS AND TEMPERATURE REGULATING METHOD FOR SEMI...
- Publication number 20240430986
- Publication date Dec 26, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Wenyan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER, TEMPERATURE CONTROL SYSTEM, AND PROCESSING APPARATUS
- Publication number 20240393050
- Publication date Nov 28, 2024
- Kokusai Electric Corporation
- Tetsuya KOSUGI
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
ADAPTIVE BAKING METHOD
- Publication number 20240393051
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzung-Chen WU
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
PROCESSING APPARATUS, DISPLAY METHOD, METHOD OF MANUFACTURING SEMIC...
- Publication number 20240378989
- Publication date Nov 14, 2024
- Kokusai Electric Corporation
- Masanori OKUNO
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
EPI THERMAL PROFILE TUNING WITH LAMP RADIATION SHIELDS
- Publication number 20240363327
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Zhepeng CONG
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
FURNACE AND SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20240344769
- Publication date Oct 17, 2024
- LAPLACE RENEWABLE ENERGY TECHNOLOGY CO., LTD.
- Qinghua Chang
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
Workpiece Processing Apparatus with Thermal Processing Systems
- Publication number 20240347356
- Publication date Oct 17, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Rolf Bremensdorfer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER LIFT ASSEMBLY SPRING DAMPER
- Publication number 20240304471
- Publication date Sep 12, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Kai-Wen WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR HIGH PRESSURE ANNEALING DEVICE
- Publication number 20240242982
- Publication date Jul 18, 2024
- Naidun-tech Co., Ltd.
- Cheng-Hsiung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240234183
- Publication date Jul 11, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
SUBSTRATE SUPPORTS AND TRANSFER APPARATUS FOR SUBSTRATE DEFORMATION
- Publication number 20240213078
- Publication date Jun 27, 2024
- Applied Materials, Inc.
- Zhepeng CONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT IRRADIATION TYPE HEAT TREATMENT APPARATUS
- Publication number 20240105474
- Publication date Mar 28, 2024
- SCREEN Holdings Co., Ltd.
- Takahiro KITAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLACEMENT CONTROL DEVICE FOR SEISMIC EVENTS
- Publication number 20240084954
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chuan-Chieh Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER HEATING APPARATUS
- Publication number 20240068748
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- Joohee KIM
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
SUBSTRATE HEAT-TREATING APPARATUS USING LASER LIGHT-EMITTING DEVICE
- Publication number 20240071787
- Publication date Feb 29, 2024
- Viatron Co., Ltd.
- Hyoung June Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIF...
- Publication number 20240055279
- Publication date Feb 15, 2024
- ASM IP HOLDING B.V.
- Shiva K.T. Rajavelu Muralidhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR LAMP HOUSING CRACK DETECTION
- Publication number 20240027295
- Publication date Jan 25, 2024
- Philip MATHEW
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20240030049
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Yukinobu OTSUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPOT HEATING BY MOVING A BEAM WITH HORIZONTAL ROTARY MOTION
- Publication number 20230369077
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Shu-Kwan Danny LAU
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
LOAD LOCK FAST PUMP VENT
- Publication number 20230335414
- Publication date Oct 19, 2023
- BROOKS AUTOMATION US, LLC
- Christopher HOFMEISTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetic Annealing Equipment and Method
- Publication number 20230304741
- Publication date Sep 28, 2023
- TOKYO ELECTRON LIMITED
- Ian Colgan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT-EMISSION HEAT TREATMENT APPARATUS
- Publication number 20230290654
- Publication date Sep 14, 2023
- SCREEN Holdings Co., Ltd.
- Ryuta TOBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230282505
- Publication date Sep 7, 2023
- Kokusai Electric Corporation
- Atsushi MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLACEMENT CONTROL DEVICE FOR SEISMIC EVENTS
- Publication number 20230265961
- Publication date Aug 24, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
- Chuan-Chieh Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20230268203
- Publication date Aug 24, 2023
- SEMES CO., LTD.
- Jin Taek Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PURGE CLEAN OF LOW PRESSURE FURNACE
- Publication number 20230265557
- Publication date Aug 24, 2023
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Yuhong LANG
- B08 - CLEANING
Information Patent Application
CONTINUOUS PRODUCTION OF NANOFORESTS
- Publication number 20230264960
- Publication date Aug 24, 2023
- University of Hawai'i
- Mohammad Naghi Ghasemi-Nejhad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAPID THERMAL PROCESSING METHOD AND RAPID THERMAL PROCESSING DEVICE
- Publication number 20230235960
- Publication date Jul 27, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Wei LI
- F27 - FURNACES KILNS OVENS RETORTS

Especially adapted for treating semiconductor wafers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lamp filament having a pitch gradient and method of making

Adaptive baking method

System, method and device for temperature control

RTP substrate temperature one for all control algorithm

Substrate treating apparatus and substrate treating system comprisi...

Heat treatment method and heat treatment apparatus

Systems, methods, and apparatus for correcting thermal processing o...

Heater, temperature control system, and processing apparatus

Processing apparatus, display method, method of manufacturing semic...

Workpiece processing apparatus with thermal processing systems

Heater lift assembly spring damper

Wafer boat handling device, vertical batch furnace and method

Substrate processing apparatus

Semiconductor substrate manufacturing device applicable to large-di...

Heat treatment apparatus and heat treatment method

Substrate processing apparatus, substrate support, and method of ma...

Apparatus and method for treating substrate

Vertical batch furnace assembly

Diffusion furnace

Substrate heat treatment apparatus

Displacement control device for seismic events

Spot heating by moving a beam with horizontal rotary motion

Semiconductor processing chamber with filament lamps having nonunif...

Rapid thermal processing method and rapid thermal processing device

Substrate processing apparatus and method

Substrate processing apparatus, substrate processing method, and st...

Method for processing a workpiece using a multi-cycle thermal treat...

Batch processing oven and operating methods

Semiconductor burn-in oven chamber sealing

Method and system for doping semiconductor materials

Patents Applicationslast 30 patents

HIGH-TEMPERATURE TUBE FURNACE

IMPROVED REFLECTOR FOR PROCESS CHAMBER

HEAT TREATMENT APPARATUS AND TEMPERATURE REGULATING METHOD FOR SEMI...

HEATER, TEMPERATURE CONTROL SYSTEM, AND PROCESSING APPARATUS

ADAPTIVE BAKING METHOD

PROCESSING APPARATUS, DISPLAY METHOD, METHOD OF MANUFACTURING SEMIC...

EPI THERMAL PROFILE TUNING WITH LAMP RADIATION SHIELDS

FURNACE AND SEMICONDUCTOR PROCESSING EQUIPMENT

Workpiece Processing Apparatus with Thermal Processing Systems

HEATER LIFT ASSEMBLY SPRING DAMPER

SEMICONDUCTOR HIGH PRESSURE ANNEALING DEVICE

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE SUPPORTS AND TRANSFER APPARATUS FOR SUBSTRATE DEFORMATION

LIGHT IRRADIATION TYPE HEAT TREATMENT APPARATUS

DISPLACEMENT CONTROL DEVICE FOR SEISMIC EVENTS

WAFER HEATING APPARATUS

SUBSTRATE HEAT-TREATING APPARATUS USING LASER LIGHT-EMITTING DEVICE

SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIF...

METHOD AND APPARATUS FOR LAMP HOUSING CRACK DETECTION

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SPOT HEATING BY MOVING A BEAM WITH HORIZONTAL ROTARY MOTION

LOAD LOCK FAST PUMP VENT

Magnetic Annealing Equipment and Method

LIGHT-EMISSION HEAT TREATMENT APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

DISPLACEMENT CONTROL DEVICE FOR SEISMIC EVENTS

HEATING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

METHOD FOR PURGE CLEAN OF LOW PRESSURE FURNACE

CONTINUOUS PRODUCTION OF NANOFORESTS

RAPID THERMAL PROCESSING METHOD AND RAPID THERMAL PROCESSING DEVICE