Especially adapted for treating semiconductor wafers

Industry

CPC
F27B17/0025

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Parent Industries

FMECHANICAL ENGINEERING LIGHTING HEATING WEAPONS BLASTING ENGINES OR PUMPS F27Furnaces F27BFURNACES, KILNS, OVENS, OR RETORTS IN GENERAL OPEN SINTERING OR LIKE APPARATUS F27B17/00Furnaces of a kind not covered by any preceding group

Current Industry

F27B17/0025Especially adapted for treating semiconductor wafers

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for purge clean of low pressure furnace
- Patent number 12,305,276
- Issue date May 20, 2025
- Shanghai Huali Microelectronics Corporation
- Yuhong Lang
- B08 - CLEANING
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,300,515
- Issue date May 13, 2025
- Semes Co., Ltd.
- Miso Park
- B08 - CLEANING
Information Patent Grant
Matching process controllers for improved matching of process
- Patent number 12,265,380
- Issue date Apr 1, 2025
- Applied Materials, Inc.
- James Robert Moyne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spot heating by moving a beam with horizontal rotary motion
- Patent number 12,261,062
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Shu-Kwan Danny Lau
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Flange and apparatus for processing substrates
- Patent number 12,243,757
- Issue date Mar 4, 2025
- ASM IP Holding B.V.
- Jeroen de Jonge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic annealing equipment and method
- Patent number 12,235,045
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Ian Colgan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,230,516
- Issue date Feb 18, 2025
- Semes Co., Ltd.
- Jae Oh Bang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light-irradiation heat treatment apparatus
- Patent number 12,219,670
- Issue date Feb 4, 2025
- SCREEN Holdings Co., Ltd.
- Makoto Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lamp filament having a pitch gradient and method of making
- Patent number 12,198,922
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Vilen K. Nestorov
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adaptive baking method
- Patent number 12,196,491
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzung-Chen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and device for temperature control
- Patent number 12,176,226
- Issue date Dec 24, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Guoqing Zhang
- G05 - CONTROLLING REGULATING
Information Patent Grant
RTP substrate temperature one for all control algorithm
- Patent number 12,169,098
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating system comprisi...
- Patent number 12,146,710
- Issue date Nov 19, 2024
- Semes Co., Ltd.
- Young Je Um
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment method and heat treatment apparatus
- Patent number 12,125,723
- Issue date Oct 22, 2024
- SCREEN Holdings Co., Ltd.
- Oma Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater, temperature control system, and processing apparatus
- Patent number 12,085,338
- Issue date Sep 10, 2024
- Kokusai Electric Corporation
- Tetsuya Kosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems, methods, and apparatus for correcting thermal processing o...
- Patent number 12,085,965
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Wolfgang R. Aderhold
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Processing apparatus, display method, method of manufacturing semic...
- Patent number 12,080,149
- Issue date Sep 3, 2024
- Kokusai Electric Corporation
- Masanori Okuno
- G08 - SIGNALLING
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,046,489
- Issue date Jul 23, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Rolf Bremensdorfer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater lift assembly spring damper
- Patent number 12,009,232
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kai-Wen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer boat handling device, vertical batch furnace and method
- Patent number 11,996,309
- Issue date May 28, 2024
- ASM IP Holding B.V.
- Christianus G. M. de Ridder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,967,513
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate manufacturing device applicable to large-di...
- Patent number 11,955,354
- Issue date Apr 9, 2024
- Kwansei Gakuin Educational Foundation
- Tadaaki Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus and heat treatment method
- Patent number 11,927,394
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Tatsuya Yamaguchi
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate processing apparatus, substrate support, and method of ma...
- Patent number 11,929,272
- Issue date Mar 12, 2024
- Kokusai Electric Corporation
- Kenichi Suzaki
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 11,923,212
- Issue date Mar 5, 2024
- Semes Co., Ltd.
- Kyungsik Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical batch furnace assembly
- Patent number 11,915,960
- Issue date Feb 27, 2024
- ASM IP Holding B.V.
- Jeroen Fluit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffusion furnace
- Patent number 11,862,490
- Issue date Jan 2, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Pengfei Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate heat treatment apparatus
- Patent number 11,854,842
- Issue date Dec 26, 2023
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Displacement control device for seismic events
- Patent number 11,852,291
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chuan-Chieh Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spot heating by moving a beam with horizontal rotary motion
- Patent number 11,842,907
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- Shu-Kwan Danny Lau
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
FLANGE AND APPARATUS FOR PROCESSING SUBSTRATES
- Publication number 20250183065
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Jeroen de Jonge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER BODIES HAVING MACHINED WALLS, CHAMBER ARRANGEMENTS AND SEMI...
- Publication number 20250137723
- Publication date May 1, 2025
- ASM IP Holding B.V.
- Felix Rabinovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
CHAMBER BODIES HAVING MACHINED LOWER WALLS, CHAMBER ARRANGEMENTS AN...
- Publication number 20250137722
- Publication date May 1, 2025
- ASM IP HOLDING B.V.
- Felix Rabinovich
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Application
PRE-HEAT RINGS, HEATING SYSTEMS, AND PROCESSING CHAMBERS INCLUDING...
- Publication number 20250132174
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Haifeng ZHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250102918
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Koji Ushimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, METHODS, AND APPARATUS FOR CORRECTING THERMAL PROCESSING O...
- Publication number 20250068195
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Wolfgang R. ADERHOLD
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM
- Publication number 20250067511
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Wolfgang Aderhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FURNACE INNER TUBE FOR PROCESS UNIFORMITY
- Publication number 20250062139
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- De-Wei YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HEAT TREATMENT APPARATUS COTROLLING INDIVIDUALLY THE OUTP...
- Publication number 20250062142
- Publication date Feb 20, 2025
- Viatron Co., Ltd.
- Hyoung June Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-TEMPERATURE TUBE FURNACE
- Publication number 20250029848
- Publication date Jan 23, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED REFLECTOR FOR PROCESS CHAMBER
- Publication number 20250027716
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Raja Murali DHAMODHARAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS AND TEMPERATURE REGULATING METHOD FOR SEMI...
- Publication number 20240430986
- Publication date Dec 26, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Wenyan WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER, TEMPERATURE CONTROL SYSTEM, AND PROCESSING APPARATUS
- Publication number 20240393050
- Publication date Nov 28, 2024
- Kokusai Electric Corporation
- Tetsuya KOSUGI
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
ADAPTIVE BAKING METHOD
- Publication number 20240393051
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzung-Chen WU
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
PROCESSING APPARATUS, DISPLAY METHOD, METHOD OF MANUFACTURING SEMIC...
- Publication number 20240378989
- Publication date Nov 14, 2024
- Kokusai Electric Corporation
- Masanori OKUNO
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
EPI THERMAL PROFILE TUNING WITH LAMP RADIATION SHIELDS
- Publication number 20240363327
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Zhepeng CONG
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
FURNACE AND SEMICONDUCTOR PROCESSING EQUIPMENT
- Publication number 20240344769
- Publication date Oct 17, 2024
- LAPLACE RENEWABLE ENERGY TECHNOLOGY CO., LTD.
- Qinghua Chang
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
Workpiece Processing Apparatus with Thermal Processing Systems
- Publication number 20240347356
- Publication date Oct 17, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Rolf Bremensdorfer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER LIFT ASSEMBLY SPRING DAMPER
- Publication number 20240304471
- Publication date Sep 12, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Kai-Wen WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR HIGH PRESSURE ANNEALING DEVICE
- Publication number 20240242982
- Publication date Jul 18, 2024
- Naidun-tech Co., Ltd.
- Cheng-Hsiung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240234183
- Publication date Jul 11, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
SUBSTRATE SUPPORTS AND TRANSFER APPARATUS FOR SUBSTRATE DEFORMATION
- Publication number 20240213078
- Publication date Jun 27, 2024
- Applied Materials, Inc.
- Zhepeng CONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT IRRADIATION TYPE HEAT TREATMENT APPARATUS
- Publication number 20240105474
- Publication date Mar 28, 2024
- SCREEN Holdings Co., Ltd.
- Takahiro KITAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLACEMENT CONTROL DEVICE FOR SEISMIC EVENTS
- Publication number 20240084954
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chuan-Chieh Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER HEATING APPARATUS
- Publication number 20240068748
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- Joohee KIM
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
SUBSTRATE HEAT-TREATING APPARATUS USING LASER LIGHT-EMITTING DEVICE
- Publication number 20240071787
- Publication date Feb 29, 2024
- Viatron Co., Ltd.
- Hyoung June Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIF...
- Publication number 20240055279
- Publication date Feb 15, 2024
- ASM IP HOLDING B.V.
- Shiva K.T. Rajavelu Muralidhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR LAMP HOUSING CRACK DETECTION
- Publication number 20240027295
- Publication date Jan 25, 2024
- Philip MATHEW
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20240030049
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Yukinobu OTSUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPOT HEATING BY MOVING A BEAM WITH HORIZONTAL ROTARY MOTION
- Publication number 20230369077
- Publication date Nov 16, 2023
- Applied Materials, Inc.
- Shu-Kwan Danny LAU
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR

Especially adapted for treating semiconductor wafers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for purge clean of low pressure furnace

Substrate treating apparatus and substrate treating method

Matching process controllers for improved matching of process

Spot heating by moving a beam with horizontal rotary motion

Flange and apparatus for processing substrates

Magnetic annealing equipment and method

Substrate treating apparatus and substrate treating method

Light-irradiation heat treatment apparatus

Lamp filament having a pitch gradient and method of making

Adaptive baking method

System, method and device for temperature control

RTP substrate temperature one for all control algorithm

Substrate treating apparatus and substrate treating system comprisi...

Heat treatment method and heat treatment apparatus

Heater, temperature control system, and processing apparatus

Systems, methods, and apparatus for correcting thermal processing o...

Processing apparatus, display method, method of manufacturing semic...

Workpiece processing apparatus with thermal processing systems

Heater lift assembly spring damper

Wafer boat handling device, vertical batch furnace and method

Substrate processing apparatus

Semiconductor substrate manufacturing device applicable to large-di...

Heat treatment apparatus and heat treatment method

Substrate processing apparatus, substrate support, and method of ma...

Apparatus and method for treating substrate

Vertical batch furnace assembly

Diffusion furnace

Substrate heat treatment apparatus

Displacement control device for seismic events

Spot heating by moving a beam with horizontal rotary motion

Patents Applicationslast 30 patents

FLANGE AND APPARATUS FOR PROCESSING SUBSTRATES

CHAMBER BODIES HAVING MACHINED WALLS, CHAMBER ARRANGEMENTS AND SEMI...

CHAMBER BODIES HAVING MACHINED LOWER WALLS, CHAMBER ARRANGEMENTS AN...

PRE-HEAT RINGS, HEATING SYSTEMS, AND PROCESSING CHAMBERS INCLUDING...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SYSTEMS, METHODS, AND APPARATUS FOR CORRECTING THERMAL PROCESSING O...

RTP SUBSTRATE TEMPERATURE ONE FOR ALL CONTROL ALGORITHM

FURNACE INNER TUBE FOR PROCESS UNIFORMITY

SUBSTRATE HEAT TREATMENT APPARATUS COTROLLING INDIVIDUALLY THE OUTP...

HIGH-TEMPERATURE TUBE FURNACE

IMPROVED REFLECTOR FOR PROCESS CHAMBER

HEAT TREATMENT APPARATUS AND TEMPERATURE REGULATING METHOD FOR SEMI...

HEATER, TEMPERATURE CONTROL SYSTEM, AND PROCESSING APPARATUS

ADAPTIVE BAKING METHOD

PROCESSING APPARATUS, DISPLAY METHOD, METHOD OF MANUFACTURING SEMIC...

EPI THERMAL PROFILE TUNING WITH LAMP RADIATION SHIELDS

FURNACE AND SEMICONDUCTOR PROCESSING EQUIPMENT

Workpiece Processing Apparatus with Thermal Processing Systems

HEATER LIFT ASSEMBLY SPRING DAMPER

SEMICONDUCTOR HIGH PRESSURE ANNEALING DEVICE

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE SUPPORTS AND TRANSFER APPARATUS FOR SUBSTRATE DEFORMATION

LIGHT IRRADIATION TYPE HEAT TREATMENT APPARATUS

DISPLACEMENT CONTROL DEVICE FOR SEISMIC EVENTS

WAFER HEATING APPARATUS

SUBSTRATE HEAT-TREATING APPARATUS USING LASER LIGHT-EMITTING DEVICE

SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIF...

METHOD AND APPARATUS FOR LAMP HOUSING CRACK DETECTION

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SPOT HEATING BY MOVING A BEAM WITH HORIZONTAL ROTARY MOTION