Etching

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CPC
H01J2237/334

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/334Etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Polycrystalline SiC compact and method for manufacturing the same
- Patent number 12,368,026
- Issue date Jul 22, 2025
- Tokai Carbon Co., Ltd.
- Yohei Harada
- B24 - GRINDING POLISHING
Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,368,027
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Takatoshi Orui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ closed-loop management of radio frequency power generator
- Patent number 12,368,023
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei Ting Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas analyzer apparatus
- Patent number 12,368,032
- Issue date Jul 22, 2025
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method
- Patent number 12,362,152
- Issue date Jul 15, 2025
- SPTS Technologies Limited
- Maxime Varvara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for controlling a plasma sheath characteristic
- Patent number 12,362,159
- Issue date Jul 15, 2025
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glow plasma stabilization
- Patent number 12,362,140
- Issue date Jul 15, 2025
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for measuring pedestal voltage uniformity in p...
- Patent number 12,362,136
- Issue date Jul 15, 2025
- Stephen Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ focus ring coating
- Patent number 12,354,842
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for heating the top lid of a process chamber
- Patent number 12,354,844
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Shiou Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck, substrate processing apparatus, and substrate...
- Patent number 12,354,852
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Hyun Tak Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,354,837
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Takahiro Yonezawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma etching apparatus
- Patent number 12,354,853
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Koki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,347,694
- Issue date Jul 1, 2025
- Semes Co., Ltd.
- Dong-Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,656
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yasushi Sonoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and manufacturing method of semiconductor...
- Patent number 12,347,693
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yu Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional selective deposition
- Patent number 12,347,674
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Bhargav S. Citla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor assembly for plasma apparatus
- Patent number 12,347,644
- Issue date Jul 1, 2025
- ASM IP Holding B.V.
- Sam Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,654
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,347,645
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method using the same, and...
- Patent number 12,347,657
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,646
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Bongseong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for cryogenic applications
- Patent number 12,347,659
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
End point detection method and apparatus for anisotropic etching us...
- Patent number 12,347,663
- Issue date Jul 1, 2025
- SanDisk Technologies, Inc.
- Shoichi Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with outer gas channel insert
- Patent number 12,340,981
- Issue date Jun 24, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ring carrier and substrate treating system
- Patent number 12,340,988
- Issue date Jun 24, 2025
- Semes Co., Ltd.
- Mun Gi Jung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA SYSTEMS AND METHODS FOR USING SQUARE-SHAPED PULSE SIGNALS
- Publication number 20250239434
- Publication date Jul 24, 2025
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS
- Publication number 20250239476
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER PROCESSING APPARATUS
- Publication number 20250239436
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Seongha JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20250239439
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Jaebin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250239437
- Publication date Jul 24, 2025
- Hitachi High-Tech Corporation
- Makoto SATAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SWITCHING CIRCUIT FOR MULTILEVEL PLASMA IMPEDANCE MATCHING
- Publication number 20250239435
- Publication date Jul 24, 2025
- Applied Materials, Inc.
- Anm Wasekul AZAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MULTI-WAFER ASHING SYSTEM
- Publication number 20250237959
- Publication date Jul 24, 2025
- Rockwell Collins, Inc.
- Mark J. Reimer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER PROCESSING APPARATUS
- Publication number 20250232966
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Yutaka KADOMOTO
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Resonant Frequency Shift as Etch Stop of Gate Oxide of MOSFET Trans...
- Publication number 20250232968
- Publication date Jul 17, 2025
- King Faisal University
- HESHAM MOHAMMED ENSHASY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF
- Publication number 20250233008
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Yohei UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF)...
- Publication number 20250230541
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Rui Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...
- Publication number 20250232960
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND WAFER PR...
- Publication number 20250233023
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Jewon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250232954
- Publication date Jul 17, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250232961
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Kazuya TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20250226178
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT DEVICE AND ETCHING METHOD
- Publication number 20250226183
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226185
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...
- Publication number 20250226188
- Publication date Jul 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Jung Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA
- Publication number 20250226187
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Heewon MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20250226189
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250226181
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro IWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR MODULATING IONS AND RADICAL SPECIES IN PLA...
- Publication number 20250226184
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- THAI CHENG CHUA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD ASSEMBLY AND SUBSTRATE TREATING APPARATUS INCLUDING THE...
- Publication number 20250218728
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Tae Guen PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218729
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jae Hwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND METHOD
- Publication number 20250218732
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Seong Gil LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218743
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- In Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING
- Publication number 20250218748
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASS FLOW CONTROLLER, FLOW CONTROL METHOD USING THE SAME, AND SUBST...
- Publication number 20250216872
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Seunghun Kim
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Polycrystalline SiC compact and method for manufacturing the same

Plasma processing method

Substrate processing method and substrate processing apparatus

Plasma processing method and plasma processing apparatus

In-situ closed-loop management of radio frequency power generator

Gas analyzer apparatus

Plasma etching apparatus and method

Ion beam etching chamber with etching by-product redistributor

Systems and methods for controlling a plasma sheath characteristic

Glow plasma stabilization

Apparatus and method for measuring pedestal voltage uniformity in p...

In-situ focus ring coating

High aspect ratio etch with infinite selectivity

System and method for heating the top lid of a process chamber

Electrostatic chuck, substrate processing apparatus, and substrate...

Plasma processing method and plasma processing apparatus

Etching method and plasma etching apparatus

Method and apparatus for treating substrate

Plasma processing apparatus

Plasma processing method and manufacturing method of semiconductor...

Directional selective deposition

Susceptor assembly for plasma apparatus

Plasma processing apparatus

Substrate processing method and substrate processing apparatus

Plasma etching apparatus, plasma etching method using the same, and...

Plasma processing apparatus

Electrostatic chuck assembly for cryogenic applications

End point detection method and apparatus for anisotropic etching us...

Workpiece processing apparatus with outer gas channel insert

Ring carrier and substrate treating system

Patents Applicationslast 30 patents

PLASMA SYSTEMS AND METHODS FOR USING SQUARE-SHAPED PULSE SIGNALS

ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS

SEMICONDUCTOR WAFER PROCESSING APPARATUS

EDGE RING AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

PLASMA PROCESSING METHOD

SWITCHING CIRCUIT FOR MULTILEVEL PLASMA IMPEDANCE MATCHING

PLASMA MULTI-WAFER ASHING SYSTEM

WAFER PROCESSING APPARATUS

Resonant Frequency Shift as Etch Stop of Gate Oxide of MOSFET Trans...

PLASMA PROCESSING APPARATUS AND MOUNTING TABLE THEREOF

Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF)...

FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND WAFER PR...

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

PLASMA PROCESSING APPARATUS

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

PLASMA TREATMENT DEVICE AND ETCHING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA ETCHER WITH EDGE RING AND METHOD OF PROCESSING SEMICONDUCTOR...

SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA

SUBSTRATE TREATMENT SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

APPARATUS AND METHOD FOR MODULATING IONS AND RADICAL SPECIES IN PLA...

SHOWER HEAD ASSEMBLY AND SUBSTRATE TREATING APPARATUS INCLUDING THE...

SHOWER HEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND METHOD

SUBSTRATE PROCESSING APPARATUS

AIR-CORE COIL IN ANALOG CIRCUIT FILTERS FOR PLASMA PROCESSING

MASS FLOW CONTROLLER, FLOW CONTROL METHOD USING THE SAME, AND SUBST...