Etching

Industry

CPC
G03F1/80

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/80Etching

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a template
- Patent number 12,130,549
- Issue date Oct 29, 2024
- Canon Kabushiki Kaisha
- Amir Tavakkoli Kermani Ghariehali
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 12,085,843
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device
- Patent number 12,087,579
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chung-Yang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and method of forming the same
- Patent number 12,066,757
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 12,038,684
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,134
- Issue date Jun 4, 2024
- AGC Inc.
- Yuya Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,133
- Issue date Jun 4, 2024
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for producing photomask, and photomask
- Patent number 11,971,653
- Issue date Apr 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining an effect of one or more pixel...
- Patent number 11,914,289
- Issue date Feb 27, 2024
- Carl Zeiss SMS Ltd.
- Joachim Welte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,914,284
- Issue date Feb 27, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing phase shift photo masks
- Patent number 11,906,898
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for performing spin dry etching
- Patent number 11,854,861
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photomask
- Patent number 11,846,881
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Huang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,829,065
- Issue date Nov 28, 2023
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for processing workpiece
- Patent number 11,823,903
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV lithography mask with a porous reflective multilayer structure
- Patent number 11,809,075
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for solvent recycling
- Patent number 11,798,800
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 11,789,356
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 11,782,339
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming organic film, patterning process, and polymer
- Patent number 11,782,347
- Issue date Oct 10, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fabrication of diffraction gratings
- Patent number 11,733,533
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of etch model calibration using optical scatterometry
- Patent number 11,704,463
- Issue date Jul 18, 2023
- Lam Research Corporation
- Ye Feng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for modifying the wettability and/or other biocompatibility...
- Patent number 11,698,582
- Issue date Jul 11, 2023
- Exogenesis Corporation
- Joseph B. Khoury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and method for forming the same
- Patent number 11,681,215
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsuan-Wen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch bias characterization and method of using the same
- Patent number 11,675,274
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Yongfa Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and method of forming the same
- Patent number 11,662,656
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing phase shift mask, and method f...
- Patent number 11,630,388
- Issue date Apr 18, 2023
- Hoya Corporation
- Osamu Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 11,630,386
- Issue date Apr 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS
- Publication number 20240411223
- Publication date Dec 12, 2024
- Carl Zeiss SMT GMBH
- Jens Oster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
- Publication number 20240377720
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20240377722
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING EUV PHOTO MASKS
- Publication number 20240369918
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...
- Publication number 20240361686
- Publication date Oct 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OPTICAL ELEMENTS PATTERNING
- Publication number 20240353751
- Publication date Oct 24, 2024
- TEL Manufacturing and Engineering of America, Inc.
- Angelique Raley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...
- Publication number 20240353747
- Publication date Oct 24, 2024
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEED
- Publication number 20240357791
- Publication date Oct 24, 2024
- Shanghai Huali Integrated Circuit Corporation
- Yuan Yuan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND MANUFACTURING METHOD THEREOF
- Publication number 20240342749
- Publication date Oct 17, 2024
- Darwin Precisions Corporation
- Ming-Hung Tsai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK
- Publication number 20240310721
- Publication date Sep 19, 2024
- Cart Zeiss SMT GmbH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240295807
- Publication date Sep 5, 2024
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
- Publication number 20240288763
- Publication date Aug 29, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Daisuke Miyawaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240280890
- Publication date Aug 22, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD
- Publication number 20240264523
- Publication date Aug 8, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...
- Publication number 20240248387
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Min WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND M...
- Publication number 20240201600
- Publication date Jun 20, 2024
- KIOXIA Corporation
- Kasumi OKABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF
- Publication number 20240192600
- Publication date Jun 13, 2024
- Darwin Precisions Corporation
- Cheng-Wei Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240192584
- Publication date Jun 13, 2024
- SK enpulse Co., Ltd.
- Hyung-joo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS
- Publication number 20240184195
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh TIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY PATTERNING METHOD
- Publication number 20240176245
- Publication date May 30, 2024
- Korea Advanced Institute of Science and Technology
- Jungchul SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240176224
- Publication date May 30, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240168370
- Publication date May 23, 2024
- AGC Inc.
- Shunya TAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...
- Publication number 20240152043
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Minseung SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
- Publication number 20240142869
- Publication date May 2, 2024
- Applied Materials, Inc.
- Yung-chen LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
- Publication number 20240142870
- Publication date May 2, 2024
- Applied Materials, Inc.
- Yung-chen LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20240118607
- Publication date Apr 11, 2024
- SEMES CO.,LTD
- Hyun YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND REFLECTIVE MASK
- Publication number 20240094621
- Publication date Mar 21, 2024
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240094622
- Publication date Mar 21, 2024
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing a template

Method of manufacturing EUV photo masks

Method for forming semiconductor device

Mask and method of forming the same

Reflective mask and fabricating method thereof

Etch processing system having reflective endpoint detection

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask, method of manufacturing ref...

Photomask blank, method for producing photomask, and photomask

Method and apparatus for determining an effect of one or more pixel...

Reflective mask blank, reflective mask, method of manufacturing ref...

Method for extreme ultraviolet lithography mask treatment

Method of manufacturing phase shift photo masks

System and method for performing spin dry etching

EUV photomask

Reflective mask blank, reflective mask, method of manufacturing ref...

Method for processing workpiece

EUV lithography mask with a porous reflective multilayer structure

Method and apparatus for solvent recycling

Method of manufacturing EUV photo masks

Pellicle for an EUV lithography mask and a method of manufacturing...

Composition for forming organic film, patterning process, and polymer

Fabrication of diffraction gratings

Method of etch model calibration using optical scatterometry

Method for modifying the wettability and/or other biocompatibility...

Photomask and method for forming the same

Etch bias characterization and method of using the same

Mask and method of forming the same

Mask blank, method for manufacturing phase shift mask, and method f...

Reflective mask and fabricating method thereof

Patents Applicationslast 30 patents

METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

EUV Lithography Mask With A Porous Reflective Multilayer Structure

MASK AND METHOD OF FORMING THE SAME

METHOD OF MANUFACTURING EUV PHOTO MASKS

METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...

OPTICAL ELEMENTS PATTERNING

DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...

PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEED

MASK AND MANUFACTURING METHOD THEREOF

METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

PHOTOLITHOGRAPHY METHOD

METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...

IMPRINT METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND M...

MANUFACTURING METHOD OF METAL MASK AND METAL MASK THEREOF

BLANK MASK AND PHOTOMASK USING THE SAME

METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS

PHOTOLITHOGRAPHY PATTERNING METHOD

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

METHOD OF MANUFACTURING EXTREME ULTRAVIOLET (EUV) MASK FOR FORMING...

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD