Etching

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G03F1/80

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/80Etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, and reflective mask
- Patent number 12,353,121
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga Ogose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,346,018
- Issue date Jul 1, 2025
- AGC Inc.
- Yuya Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank and method of manufacturing photomask
- Patent number 12,326,656
- Issue date Jun 10, 2025
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...
- Patent number 12,313,979
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Sanguk Park
- G02 - OPTICS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,306,530
- Issue date May 20, 2025
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,222,640
- Issue date Feb 11, 2025
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,204,240
- Issue date Jan 21, 2025
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography method
- Patent number 12,181,794
- Issue date Dec 31, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,174,527
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a template
- Patent number 12,130,549
- Issue date Oct 29, 2024
- Canon Kabushiki Kaisha
- Amir Tavakkoli Kermani Ghariehali
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for forming semiconductor device
- Patent number 12,087,579
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chung-Yang Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 12,085,843
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and method of forming the same
- Patent number 12,066,757
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 12,038,684
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,134
- Issue date Jun 4, 2024
- AGC Inc.
- Yuya Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,133
- Issue date Jun 4, 2024
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for producing photomask, and photomask
- Patent number 11,971,653
- Issue date Apr 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for determining an effect of one or more pixel...
- Patent number 11,914,289
- Issue date Feb 27, 2024
- Carl Zeiss SMS Ltd.
- Joachim Welte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,914,284
- Issue date Feb 27, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing phase shift photo masks
- Patent number 11,906,898
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for performing spin dry etching
- Patent number 11,854,861
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photomask
- Patent number 11,846,881
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Huang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 11,829,065
- Issue date Nov 28, 2023
- AGC Inc.
- Shunya Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for processing workpiece
- Patent number 11,823,903
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV lithography mask with a porous reflective multilayer structure
- Patent number 11,809,075
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for solvent recycling
- Patent number 11,798,800
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Wei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing EUV photo masks
- Patent number 11,789,356
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 11,782,339
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, AND METHOD FOR MA...
- Publication number 20250224663
- Publication date Jul 10, 2025
- AGC Inc.
- Masayoshi MIZOGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216779
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Sanghee JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216778
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Sumin JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF MANUFACUTING THE SAME
- Publication number 20250180981
- Publication date Jun 5, 2025
- SAMSUNG DISPLAY CO., LTD.
- JINWOO LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20250164891
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Soo Doo Chae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK
- Publication number 20250147408
- Publication date May 8, 2025
- TEKSCEND PHOTOMASK CORP.
- Naoto YONEMARU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK
- Publication number 20250130488
- Publication date Apr 24, 2025
- TOPPAN PHOTOMASK CO., LTD.
- Kazuaki MATSUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RE...
- Publication number 20250123552
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250102904
- Publication date Mar 27, 2025
- SAMSUNG DISPLAY CO., LTD.
- JINWOO LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250102898
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASK
- Publication number 20250076752
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...
- Publication number 20250060672
- Publication date Feb 20, 2025
- WESTERN DIGITAL TECHNOLOGIES, INC.,
- Shinichi HISADOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250044685
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Changsoo WOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBON-BASED THIN FILM SHADOW MASK AND MANUFACTURING METHOD THEREFOR
- Publication number 20250013144
- Publication date Jan 9, 2025
- GrapheneLab.Co.,Ltd.
- Seung Il MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK
- Publication number 20240427228
- Publication date Dec 26, 2024
- KIOXIA Corporation
- Kosuke TAKAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...
- Publication number 20240427226
- Publication date Dec 26, 2024
- AGC Inc.
- Takeshi Okato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS
- Publication number 20240411223
- Publication date Dec 12, 2024
- Carl Zeiss SMT GMBH
- Jens Oster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
- Publication number 20240377720
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20240377722
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING EUV PHOTO MASKS
- Publication number 20240369918
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...
- Publication number 20240361686
- Publication date Oct 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OPTICAL ELEMENTS PATTERNING
- Publication number 20240353751
- Publication date Oct 24, 2024
- TEL Manufacturing and Engineering of America, Inc.
- Angelique Raley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEED
- Publication number 20240357791
- Publication date Oct 24, 2024
- Shanghai Huali Integrated Circuit Corporation
- Yuan Yuan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...
- Publication number 20240353747
- Publication date Oct 24, 2024
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND MANUFACTURING METHOD THEREOF
- Publication number 20240342749
- Publication date Oct 17, 2024
- Darwin Precisions Corporation
- Ming-Hung Tsai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK
- Publication number 20240310721
- Publication date Sep 19, 2024
- Cart Zeiss SMT GmbH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240295807
- Publication date Sep 5, 2024
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
- Publication number 20240288763
- Publication date Aug 29, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Daisuke Miyawaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240280890
- Publication date Aug 22, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reflective mask blank, and reflective mask

Reflective mask blank, reflective mask, method of manufacturing ref...

Mask blank and method of manufacturing photomask

Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask, method of manufacturing ref...

Photolithography method

Pellicle for an EUV lithography mask and a method of manufacturing...

Method of manufacturing a template

Method for forming semiconductor device

Method of manufacturing EUV photo masks

Mask and method of forming the same

Reflective mask and fabricating method thereof

Etch processing system having reflective endpoint detection

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank, reflective mask, method of manufacturing ref...

Photomask blank, method for producing photomask, and photomask

Method and apparatus for determining an effect of one or more pixel...

Reflective mask blank, reflective mask, method of manufacturing ref...

Method for extreme ultraviolet lithography mask treatment

Method of manufacturing phase shift photo masks

System and method for performing spin dry etching

EUV photomask

Reflective mask blank, reflective mask, method of manufacturing ref...

Method for processing workpiece

EUV lithography mask with a porous reflective multilayer structure

Method and apparatus for solvent recycling

Method of manufacturing EUV photo masks

Pellicle for an EUV lithography mask and a method of manufacturing...

Patents Applicationslast 30 patents

REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, AND METHOD FOR MA...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

MASK AND METHOD OF MANUFACUTING THE SAME

LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK

PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK

LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RE...

MASK AND METHOD OF MANUFACTURING THE SAME

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

PELLICLE FOR EUV LITHOGRAPHY MASK

PHOTOLITHOGRAPHY METHOD USING CASTELLATION SHAPED ASSIST FEATURES T...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

CARBON-BASED THIN FILM SHADOW MASK AND MANUFACTURING METHOD THEREFOR

PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...

METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

EUV Lithography Mask With A Porous Reflective Multilayer Structure

MASK AND METHOD OF FORMING THE SAME

METHOD OF MANUFACTURING EUV PHOTO MASKS

METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...

OPTICAL ELEMENTS PATTERNING

PROCESS METHOD FOR IMPROVING SRAM OPERATING SPEED

DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...

MASK AND MANUFACTURING METHOD THEREOF

METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...