Exposing with the same light pattern different positions of the same surface at the same time

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/213Exposing with the same light pattern different positions of the same surface at the same time

Industries

Patents Grantslast 30 patents

Information Patent Grant
Optical patterning systems and methods
- Patent number 11,448,965
- Issue date Sep 20, 2022
- Board of Regents, The University of Texas System
- Yuebing Zheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Large area high resolution feature reduction lithography technique
- Patent number 11,042,098
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Arvinder Chadha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and methods, substrates having metrology targe...
- Patent number 11,022,900
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for exposure of photosensitive layer
- Patent number 10,852,528
- Issue date Dec 1, 2020
- EV Group E. Thallner GmbH
- Bernhard Thallner
- G02 - OPTICS
Information Patent Grant
Inspection apparatus and methods, substrates having metrology targe...
- Patent number 10,761,432
- Issue date Sep 1, 2020
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for deposition and method of manufacturing the same
- Patent number 10,665,785
- Issue date May 26, 2020
- Samsung Display Co., Ltd.
- Youngdae Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inspection apparatus and methods, substrates having metrology targe...
- Patent number 9,958,791
- Issue date May 1, 2018
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus for processing a flexographic plate, a method...
- Patent number 9,463,595
- Issue date Oct 11, 2016
- XEIKON PREPRESS N.V.
- Dirk de Rauw
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Lithography method and apparatus
- Patent number 9,400,432
- Issue date Jul 26, 2016
- National University of Singapore
- Sascha Pierre Heussler
- G02 - OPTICS
Information Patent Grant
Light processing apparatus
- Patent number 8,513,631
- Issue date Aug 20, 2013
- Ushio Denki Kabushiki Kaisha
- Masatoshi Shimonaka
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure method and method for manufacturing semiconductor device
- Patent number 7,517,621
- Issue date Apr 14, 2009
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ADJUSTING LOCAL THICKNESS OF PHOTORESIST
- Publication number 20240019783
- Publication date Jan 18, 2024
- Shanghai Huali Integrated Circuit Corporation
- Dongyu Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20230120789
- Publication date Apr 20, 2023
- PlayNitride Display Co., Ltd.
- Po-Wei Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE CAMERA APPARATUS FOR PHOTOLITHOGRAPHIC PROCESSING
- Publication number 20230043353
- Publication date Feb 9, 2023
- Onto Innovation, Inc.
- Elvino DaSilveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DUAL DEVELOPING METHOD FOR DEFINING DIFFERENT RESIST PATTERNS
- Publication number 20220260916
- Publication date Aug 18, 2022
- NANYA TECHNOLOGY CORPORATION
- Yung-Chuan YEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL PATTERNING SYSTEMS AND METHODS
- Publication number 20210311397
- Publication date Oct 7, 2021
- Board of Regents, The University of Texas System
- Yuebing ZHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adapting the Duration of Exposure Slots in Multi-Beam Writers
- Publication number 20200348597
- Publication date Nov 5, 2020
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus and Methods, Substrates Having Metrology Targe...
- Publication number 20200348605
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LARGE AREA HIGH RESOLUTION FEATURE REDUCTION LITHOGRAPHY TECHNIQUE
- Publication number 20200264518
- Publication date Aug 20, 2020
- Applied Materials, Inc.
- Arvinder CHADHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR EXPOSURE OF PHOTOSENSITIVE LAYER
- Publication number 20190293924
- Publication date Sep 26, 2019
- EV GROUP E. THALLNER GMBH
- Bernhard Thallner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FOR DEPOSITION AND METHOD OF MANUFACTURING THE SAME
- Publication number 20190027686
- Publication date Jan 24, 2019
- SAMSUNG DISPLAY CO., LTD.
- Youngdae KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection Apparatus and Methods, Substrates Having Metrology Targe...
- Publication number 20180239263
- Publication date Aug 23, 2018
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD, SUBSTRATE AND EXPOSURE APPARATUS
- Publication number 20180052395
- Publication date Feb 22, 2018
- BOE TECHNOLOGY GROUP CO., LTD.
- Xiao Guang Li
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE
- Publication number 20170212423
- Publication date Jul 27, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Jun-Yih Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus and Methods, Substrates Having Metrology Targe...
- Publication number 20160274472
- Publication date Sep 22, 2016
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel Dual-Tone Resist Formulations And Methods
- Publication number 20140342291
- Publication date Nov 20, 2014
- Board of Regents, The University of Texas System
- C. Grant Willson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS FOR PROCESSING A FLEXOGRAPHIC PLATE, A METHOD...
- Publication number 20140147791
- Publication date May 29, 2014
- XEIKON I.P. B.V.
- Dirk de Rauw
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHASE DIFFERENCE LAYER LAMINATED BODY FOR THREE DIMENSIONAL LIQUID...
- Publication number 20140034209
- Publication date Feb 6, 2014
- DAI NIPPON PRINTING CO., LTD.
- Keiji KASHIMA
- B32 - LAYERED PRODUCTS
Information Patent Application
LITHOGRAPHY METHOD AND APPARATUS
- Publication number 20130215406
- Publication date Aug 22, 2013
- National University of Singapore
- Sascha Pierre Heussler
- G02 - OPTICS
Information Patent Application
LIGHT PROCESSING APPARATUS
- Publication number 20120248339
- Publication date Oct 4, 2012
- Ushio Denki Kabushiki Kaisha
- Masatoshi Shimonaka
- B08 - CLEANING
Information Patent Application
NOVEL DUAL-TONE RESIST FORMULATIONS AND METHODS
- Publication number 20110262860
- Publication date Oct 27, 2011
- Board of Regents, The University of Texas
- C. Grant Willson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method and method for manufacturing semiconductor device
- Publication number 20080063988
- Publication date Mar 13, 2008
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLATE-MAKING METHOD OF LITHOGRAPHIC PRINTING PLATE PRECURSOR
- Publication number 20060216646
- Publication date Sep 28, 2006
- FUJI PHOTO FILM CO., LTD.
- Takahiro Goto
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Exposing with the same light pattern different positions of the same surface at the same time

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optical patterning systems and methods

Adapting the duration of exposure slots in multi-beam writers

Large area high resolution feature reduction lithography technique

Inspection apparatus and methods, substrates having metrology targe...

Method and device for exposure of photosensitive layer

Inspection apparatus and methods, substrates having metrology targe...

Mask for deposition and method of manufacturing the same

Inspection apparatus and methods, substrates having metrology targe...

Processing apparatus for processing a flexographic plate, a method...

Lithography method and apparatus

Light processing apparatus

Exposure method and method for manufacturing semiconductor device

Patents Applicationslast 30 patents

METHOD FOR ADJUSTING LOCAL THICKNESS OF PHOTORESIST

EXPOSURE APPARATUS

MULTIPLE CAMERA APPARATUS FOR PHOTOLITHOGRAPHIC PROCESSING

DUAL DEVELOPING METHOD FOR DEFINING DIFFERENT RESIST PATTERNS

OPTICAL PATTERNING SYSTEMS AND METHODS

Adapting the Duration of Exposure Slots in Multi-Beam Writers

Inspection Apparatus and Methods, Substrates Having Metrology Targe...

LARGE AREA HIGH RESOLUTION FEATURE REDUCTION LITHOGRAPHY TECHNIQUE

METHOD AND DEVICE FOR EXPOSURE OF PHOTOSENSITIVE LAYER

MASK FOR DEPOSITION AND METHOD OF MANUFACTURING THE SAME

Inspection Apparatus and Methods, Substrates Having Metrology Targe...

EXPOSURE METHOD, SUBSTRATE AND EXPOSURE APPARATUS

METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE

Inspection Apparatus and Methods, Substrates Having Metrology Targe...

Novel Dual-Tone Resist Formulations And Methods

PROCESSING APPARATUS FOR PROCESSING A FLEXOGRAPHIC PLATE, A METHOD...

PHASE DIFFERENCE LAYER LAMINATED BODY FOR THREE DIMENSIONAL LIQUID...

LITHOGRAPHY METHOD AND APPARATUS

LIGHT PROCESSING APPARATUS

NOVEL DUAL-TONE RESIST FORMULATIONS AND METHODS

Exposure method and method for manufacturing semiconductor device

PLATE-MAKING METHOD OF LITHOGRAPHIC PRINTING PLATE PRECURSOR