Exposure light control, in all parts of the microlithographic apparatus

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G03F7/7055

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/7055Exposure light control, in all parts of the microlithographic apparatus

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Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining best focus and best dose in exposure process
- Patent number 12,135,504
- Issue date Nov 5, 2024
- Samsung Electronics Co., Ltd.
- Kihyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for exposure of relief precursors
- Patent number 12,124,171
- Issue date Oct 22, 2024
- XSYS PREPRESS N.V.
- Pieter Lenssens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and ultraviolet radiation control system
- Patent number 12,124,172
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Alexander Kremer
- G01 - MEASURING TESTING
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for controlling a lithographic system
- Patent number 12,099,306
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric lithography grating-mask-based wafer-scale large-ar...
- Patent number 12,092,959
- Issue date Sep 17, 2024
- UNM Rainforest Innovations
- Steven R. J. Brueck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using radiation source apparatus
- Patent number 12,096,543
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chiao-Hua Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithography thermal control
- Patent number 12,096,544
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for monitoring and controlling extreme ultraviole...
- Patent number 12,085,860
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Laser system for target metrology and alteration in an EUV light so...
- Patent number 12,078,934
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-charged-particle-beam writing method, multi-charged-particle-...
- Patent number 12,046,447
- Issue date Jul 23, 2024
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detection using semiconductor detector
- Patent number 12,009,177
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ya-Chin King
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improving critical dimension variation
- Patent number 11,988,972
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hsun Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,977,334
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determination method, determination device, exposure device, and pr...
- Patent number 11,972,325
- Issue date Apr 30, 2024
- Nikon Corporation
- Yosuke Okudaira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for maskless lithography
- Patent number 11,953,835
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Erwin John Van Zwet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy correction module for an optical source apparatus
- Patent number 11,947,268
- Issue date Apr 2, 2024
- Cymer, LLC
- Yingbo Zhao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Maskless based lithography methods
- Patent number 11,934,107
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Shih-Hsien Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for controlling droplet in extreme ultraviolet...
- Patent number 11,914,302
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time registration in lithography system
- Patent number 11,906,903
- Issue date Feb 20, 2024
- Visitech AS
- Øyvind Tafjord
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target control in extreme ultraviolet lithography systems using abe...
- Patent number 11,860,544
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ya Cheng
- G02 - OPTICS
Information Patent Grant
Method of assembling a facet mirror of an optical system
- Patent number 11,841,620
- Issue date Dec 12, 2023
- Carl Zeiss SMT GmbH
- Andreas Königer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Decreasing distortion by modifying pixel spacing
- Patent number 11,822,253
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Joseph Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process window based on defect probability
- Patent number 11,822,255
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Abraham Slachter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi charged particle beam adjustment method, multi charged partic...
- Patent number 11,804,360
- Issue date Oct 31, 2023
- NuFlare Technology, Inc.
- Tsubasa Nanao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 11,796,922
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and lithograph apparatus for measuring a radiation beam
- Patent number 11,796,921
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Arend Johannes Donkerbroek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of optical component alignment
- Patent number 11,799,261
- Issue date Oct 24, 2023
- Cymer, LLC
- Hong Ye
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...
- Publication number 20240411232
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Jingshi LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY THERMAL CONTROL
- Publication number 20240389215
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...
- Publication number 20240377752
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EMBEDDING REDISTRIBUTION LAYER METAL TRACES IN A POLYMERIC DIELECTRIC
- Publication number 20240379411
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Peng SOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV LITHOGRAPHY APPARATUS
- Publication number 20240379259
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...
- Publication number 20240369944
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Chrysostomos BATISTAKIS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...
- Publication number 20240345488
- Publication date Oct 17, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Dandan Han
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...
- Publication number 20240329541
- Publication date Oct 3, 2024
- National Cheng Kung University
- YUNG-CHUN LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE
- Publication number 20240302750
- Publication date Sep 12, 2024
- SAMSUNG DISPLAY CO., LTD.
- CHOULWON MIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION
- Publication number 20240295831
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hsun LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION USING SEMICONDUCTOR DETECTOR
- Publication number 20240290575
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING
- Publication number 20240280911
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- CHI-MING TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...
- Publication number 20240280913
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Chi-Ming TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL BEAM SENSOR WITH CENTER TRANSMISSIVE CUT-OUT
- Publication number 20240271996
- Publication date Aug 15, 2024
- KLA Corporation
- Matthew Hoffman
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240264541
- Publication date Aug 8, 2024
- CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Xiaosong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTO...
- Publication number 20240241446
- Publication date Jul 18, 2024
- Intel Corporation
- Marvin Paik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE
- Publication number 20240219848
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC MODULE FOR A MAGNETIC SWITCHING NETWORK TO PRODUCE A PUL...
- Publication number 20240222927
- Publication date Jul 4, 2024
- CYMER, LLC
- Paul Christopher Melcher
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...
- Publication number 20240210839
- Publication date Jun 27, 2024
- KIOXIA Corporation
- Yoshio MIZUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS
- Publication number 20240210336
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Marie-Claire VAN LARE
- G01 - MEASURING TESTING
Information Patent Application
MONITORING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME
- Publication number 20240184216
- Publication date Jun 6, 2024
- Samsung Electronics Co., Ltd.
- Yoon Sang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM
- Publication number 20240184217
- Publication date Jun 6, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTI...
- Publication number 20240176250
- Publication date May 30, 2024
- Canon Kabushiki Kaisha
- ATSUSHI TAKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR DISTRIBUTING LIGHT DELIVERY
- Publication number 20240160110
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET...
- Publication number 20240160106
- Publication date May 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCE...
- Publication number 20240152046
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Jeongjin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20240126181
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Exposure light control, in all parts of the microlithographic apparatus

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of manufacturing semiconductor devices

Method for determining best focus and best dose in exposure process

Apparatus and method for exposure of relief precursors

Lithographic apparatus and ultraviolet radiation control system

EUV lithography apparatus

Method for controlling a lithographic system

Interferometric lithography grating-mask-based wafer-scale large-ar...

Method for using radiation source apparatus

Lithography thermal control

System and method for monitoring and controlling extreme ultraviole...

Laser system for target metrology and alteration in an EUV light so...

Multi-charged-particle-beam writing method, multi-charged-particle-...

Detection using semiconductor detector

Method and apparatus for improving critical dimension variation

Wavefront optimization for tuning scanner based on performance matc...

Determination method, determination device, exposure device, and pr...

Charged particle beam writing apparatus, charged particle beam writ...

Methods and systems for maskless lithography

Energy correction module for an optical source apparatus

Maskless based lithography methods

Method and apparatus for controlling droplet in extreme ultraviolet...

Real time registration in lithography system

Target control in extreme ultraviolet lithography systems using abe...

Method of assembling a facet mirror of an optical system

Decreasing distortion by modifying pixel spacing

Process window based on defect probability

Multi charged particle beam adjustment method, multi charged partic...

Method of manufacturing semiconductor devices

Method and lithograph apparatus for measuring a radiation beam

Apparatus for and method of optical component alignment

Patents Applicationslast 30 patents

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

LITHOGRAPHY THERMAL CONTROL

SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...

EMBEDDING REDISTRIBUTION LAYER METAL TRACES IN A POLYMERIC DIELECTRIC

EUV LITHOGRAPHY APPARATUS

METHOD FOR DETERMINING A STOCHASTIC METRIC RELATING TO A LITHOGRAPH...

OPTICAL METHOD AND APPARATUS FOR QUICKLY REALIZING PRECISE CALIBRAT...

CYCLIC EXPOSURE SCANNING SYSTEM HAVING DISTRIBUTED MULTI-LENS AND M...

CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE

METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION

DETECTION USING SEMICONDUCTOR DETECTOR

DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING

SYSTEM, SOFTWARE APPLICATION, AND METHOD FOR DOSE UNIFORMITY IMPROV...

OPTICAL BEAM SENSOR WITH CENTER TRANSMISSIVE CUT-OUT

EXPOSURE APPARATUS

Lithographic Method for Imprinting Three-Dimensional Microstructure...

METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTO...

EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE

ELECTRONIC MODULE FOR A MAGNETIC SWITCHING NETWORK TO PRODUCE A PUL...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING S...

PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS

MONITORING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

METHOD AND APPARATUS FOR CORRECTING PROXIMITY EFFECT OF ELECTRON BEAM

DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTI...

SYSTEMS AND METHODS FOR DISTRIBUTING LIGHT DELIVERY

METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET...

METHOD OF CONTROLLING SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCE...

PROCESS WINDOW BASED ON DEFECT PROBABILITY