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H01J37/3299
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H
ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/00
Discharge tubes with provision for introducing objects or material to be exposed to the discharge
Current Industry
H01J37/3299
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Patents Grants
last 30 patents
Information
Patent Grant
Systems and methods for delay and amplitude correction
Patent number
12,272,536
Issue date
Apr 8, 2025
Advanced Energy Industries, Inc.
Chad S. Samuels
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for metastable activated radical selective stri...
Patent number
12,272,570
Issue date
Apr 8, 2025
Lam Research Corporation
Dengliang Yang
B08 - CLEANING
Information
Patent Grant
Systems and methods for metastable activated radical selective stri...
Patent number
12,272,571
Issue date
Apr 8, 2025
Lam Research Corporation
Dengliang Yang
B08 - CLEANING
Information
Patent Grant
Advanced temperature control for wafer carrier in plasma processing...
Patent number
12,272,575
Issue date
Apr 8, 2025
Applied Materials, Inc.
Fernando M. Silveira
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Apparatus to control ion energy
Patent number
12,255,048
Issue date
Mar 18, 2025
Advanced Energy Industries, Inc.
Victor Brouk
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Etch feedback for control of upstream process
Patent number
12,237,158
Issue date
Feb 25, 2025
Applied Materials, Inc.
Priyadarshi Panda
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of manufacturing semiconductor device, and substrate treatme...
Patent number
12,217,946
Issue date
Feb 4, 2025
ASM IP Holding B.V.
Taku Omori
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for metastable activated radical selective stri...
Patent number
12,211,709
Issue date
Jan 28, 2025
Lam Research Corporation
Dengliang Yang
B08 - CLEANING
Information
Patent Grant
Recipe updating method
Patent number
12,211,678
Issue date
Jan 28, 2025
Tokyo Electron Limited
Masafumi Urakawa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Radio frequency generator
Patent number
12,206,372
Issue date
Jan 21, 2025
Comet AG
Daniel Gruner
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cover with a sensor system for a configurable measuring system for...
Patent number
12,183,561
Issue date
Dec 31, 2024
SOLERAS ADVANCED COATINGS BV
Ivan Van De Putte
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Temperature estimation apparatus, plasma processing system, tempera...
Patent number
12,170,193
Issue date
Dec 17, 2024
Tokyo Electron Limited
Yuki Kataoka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
Patent number
12,165,841
Issue date
Dec 10, 2024
Lam Research Corporation
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Apparatus to control a waveform
Patent number
12,154,759
Issue date
Nov 26, 2024
Advanced Energy Industries, Inc.
Daniel Carter
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and method for releasing sample
Patent number
12,148,633
Issue date
Nov 19, 2024
HITACHI HIGH-TECH CORPORATION
Masaki Ishiguro
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Calibration jig and calibration method
Patent number
12,148,645
Issue date
Nov 19, 2024
Applied Materials, Inc.
Andrew Myles
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for monitoring faults, anomalies, and other cha...
Patent number
12,142,452
Issue date
Nov 12, 2024
Advanced Energy Industries, Inc.
Daniel Carter
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
Patent number
12,142,469
Issue date
Nov 12, 2024
Applied Materials, Inc.
Rajinder Dhindsa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Measurement system to measure a thickness of an adjustable edge rin...
Patent number
12,123,709
Issue date
Oct 22, 2024
Lam Research Corporation
Hossein Sadeghi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus
Patent number
12,112,925
Issue date
Oct 8, 2024
HITACHI HIGH-TECH CORPORATION
Masaki Ishiguro
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Distortion current mitigation in a radio frequency plasma processin...
Patent number
12,106,938
Issue date
Oct 1, 2024
Applied Materials, Inc.
Yue Guo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for stabilizing reaction chamber pressure
Patent number
12,098,460
Issue date
Sep 24, 2024
ASM IP Holding B.V.
Eiichiro Shiba
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma generator, plasma treatment device, and method for providing...
Patent number
12,087,544
Issue date
Sep 10, 2024
CENTROTHERM INTERNATIONAL AG
Sebastian Hubertus Schulz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and prediction method of the condition...
Patent number
12,080,529
Issue date
Sep 3, 2024
HITACHI HIGH-TECH CORPORATION
Yoshito Kamaji
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Plasma processing apparatus and control method
Patent number
12,068,208
Issue date
Aug 20, 2024
Tokyo Electron Limited
Taro Ikeda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
RF power compensation to reduce deposition or etch rate changes in...
Patent number
12,057,295
Issue date
Aug 6, 2024
Lam Research Corporation
Wei Yi Luo
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Feedback loop for controlling a pulsed voltage waveform
Patent number
12,057,292
Issue date
Aug 6, 2024
Applied Materials, Inc.
Leonid Dorf
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
RF current measurement in semiconductor processing tool
Patent number
12,051,630
Issue date
Jul 30, 2024
Lam Research Corporation
Sunil Kapoor
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma non-uniformity detection
Patent number
12,027,351
Issue date
Jul 2, 2024
COMET Technologies USA, Inc.
Stephen E. Savas
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing with broadband RF waveforms
Patent number
12,020,902
Issue date
Jun 25, 2024
Tokyo Electron Limited
Jianping Zhao
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM
Publication number
20250118578
Publication date
Apr 10, 2025
Applied Materials, Inc.
Ajith Karonnan Ramapurath
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING
Publication number
20250118534
Publication date
Apr 10, 2025
LAM RESEARCH CORPORATION
Ranadeep Bhowmick
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA IGNITION DETECTION DEVICE FOR CONNECTION TO AN IMPEDANCE MAT...
Publication number
20250104973
Publication date
Mar 27, 2025
TRUMPF Hüttinger GmbH + Co. KG
Florian Maier
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
Publication number
20250087462
Publication date
Mar 13, 2025
Applied Materials, Inc.
Yue GUO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF ETCHING OR DEPOSITING A THIN FILM
Publication number
20250079141
Publication date
Mar 6, 2025
Oxford Instruments Nanotechnology Tools Limited
Andrew Newton
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
Publication number
20250079121
Publication date
Mar 6, 2025
LAM RESEARCH CORPORATION
Maolin Long
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...
Publication number
20250054729
Publication date
Feb 13, 2025
LAM RESEARCH CORPORATION
Shen PENG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY
Publication number
20250022697
Publication date
Jan 16, 2025
Applied Materials, Inc.
Costel BILOIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA BEHAVIORS PREDICTED BY CURRENT MEASUREMENTS DURING ASYMMETRI...
Publication number
20250022698
Publication date
Jan 16, 2025
Advanced Energy Industries, Inc.
Daniel Carter
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20250014877
Publication date
Jan 9, 2025
Panasonic Intellectual Property Management Co., Ltd.
Hisao NAGAI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Pulse-Shaping Using A Sub-Region Tuning Apparatus And Method
Publication number
20250006478
Publication date
Jan 2, 2025
MKS Instruments, Inc.
Aaron BURRY
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...
Publication number
20250006477
Publication date
Jan 2, 2025
Samsung Electronics Co., Ltd.
Haewook PARK
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...
Publication number
20240429026
Publication date
Dec 26, 2024
CENTROTHERM INTERNATIONAL AG
Sebastian Hubertus Schulz
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
Publication number
20240412960
Publication date
Dec 12, 2024
Samsung Electronics Co., Ltd.
Jawon KO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
Publication number
20240404804
Publication date
Dec 5, 2024
LAM RESEARCH CORPORATION
Alexander Miller Paterson
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM
Publication number
20240404805
Publication date
Dec 5, 2024
Tokyo Electron Limited
Mikio SATO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
Publication number
20240395502
Publication date
Nov 28, 2024
Applied Materials, Inc.
Leonid DORF
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA GENERATION QUALITY MONITORING USING MULTI-CHANNEL SENSOR DATA
Publication number
20240371617
Publication date
Nov 7, 2024
Applied Materials, Inc.
Jeremy Smith
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...
Publication number
20240363311
Publication date
Oct 31, 2024
LAM RESEARCH CORPORATION
Weiyi LUO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL
Publication number
20240347400
Publication date
Oct 17, 2024
LAM RESEARCH CORPORATION
Sunil Kapoor
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
MINI SPECTROMETER SENSOR FOR IN-LINE, ON-TOOL, DISTRIBUTED DEPOSITI...
Publication number
20240331989
Publication date
Oct 3, 2024
Applied Materials, Inc.
Chuang-Chia Lin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING APPARATUS
Publication number
20240312765
Publication date
Sep 19, 2024
Samsung Electronics Co., Ltd.
Kyung Min LEE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
Publication number
20240312766
Publication date
Sep 19, 2024
TOKYO ELECTRON LIMITED
Jianping Zhao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20240282555
Publication date
Aug 22, 2024
Hitachi High-Tech Corporation
Kyohei HORIKAWA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND...
Publication number
20240266156
Publication date
Aug 8, 2024
KOREA INSTITUTE OF FUSION ENERGY
Jongsik KIM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20240266201
Publication date
Aug 8, 2024
Panasonic Intellectual Property Management Co., Ltd.
Toshiyuki TAKASAKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
Publication number
20240258129
Publication date
Aug 1, 2024
Lam Reseach Corporation
Dengliang YANG
B08 - CLEANING
Information
Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
Publication number
20240258130
Publication date
Aug 1, 2024
LAM RESEARCH CORPORATION
Dengliang YANG
B08 - CLEANING
Information
Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
Publication number
20240258131
Publication date
Aug 1, 2024
LAM RESEARCH CORPORATION
Dengliang YANG
B08 - CLEANING
Information
Patent Application
SUBSTRATE SUPPORT WITH REAL TIME FORCE AND FILM STRESS CONTROL
Publication number
20240258075
Publication date
Aug 1, 2024
Applied Materials, Inc.
Wendell Glenn BOYD
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...