Feedback systems

Industry

CPC
H01J37/3299

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3299Feedback systems

Industries

Patents Grantslast 30 patents

Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etch feedback for control of upstream process
- Patent number 12,237,158
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, and substrate treatme...
- Patent number 12,217,946
- Issue date Feb 4, 2025
- ASM IP Holding B.V.
- Taku Omori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Recipe updating method
- Patent number 12,211,678
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency generator
- Patent number 12,206,372
- Issue date Jan 21, 2025
- Comet AG
- Daniel Gruner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature estimation apparatus, plasma processing system, tempera...
- Patent number 12,170,193
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Yuki Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for releasing sample
- Patent number 12,148,633
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration jig and calibration method
- Patent number 12,148,645
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for monitoring faults, anomalies, and other cha...
- Patent number 12,142,452
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement system to measure a thickness of an adjustable edge rin...
- Patent number 12,123,709
- Issue date Oct 22, 2024
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,112,925
- Issue date Oct 8, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Distortion current mitigation in a radio frequency plasma processin...
- Patent number 12,106,938
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for stabilizing reaction chamber pressure
- Patent number 12,098,460
- Issue date Sep 24, 2024
- ASM IP Holding B.V.
- Eiichiro Shiba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generator, plasma treatment device, and method for providing...
- Patent number 12,087,544
- Issue date Sep 10, 2024
- CENTROTHERM INTERNATIONAL AG
- Sebastian Hubertus Schulz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 12,068,208
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF power compensation to reduce deposition or etch rate changes in...
- Patent number 12,057,295
- Issue date Aug 6, 2024
- Lam Research Corporation
- Wei Yi Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Feedback loop for controlling a pulsed voltage waveform
- Patent number 12,057,292
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF current measurement in semiconductor processing tool
- Patent number 12,051,630
- Issue date Jul 30, 2024
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma non-uniformity detection
- Patent number 12,027,351
- Issue date Jul 2, 2024
- COMET Technologies USA, Inc.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing with broadband RF waveforms
- Patent number 12,020,902
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch processing system having reflective endpoint detection
- Patent number 12,007,686
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Michael N. Grimbergen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real-time, non-invasive IEDF plasma sensor
- Patent number 11,996,274
- Issue date May 28, 2024
- MKS Instruments, Inc.
- Linnell Martinez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with switches to produce a waveform
- Patent number 11,978,611
- Issue date May 7, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glow plasma gas measurement signal processing
- Patent number 11,948,774
- Issue date Apr 2, 2024
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA IGNITION DETECTION DEVICE FOR CONNECTION TO AN IMPEDANCE MAT...
- Publication number 20250104973
- Publication date Mar 27, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
- Publication number 20250087462
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING OR DEPOSITING A THIN FILM
- Publication number 20250079141
- Publication date Mar 6, 2025
- Oxford Instruments Nanotechnology Tools Limited
- Andrew Newton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE
- Publication number 20250079121
- Publication date Mar 6, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...
- Publication number 20250054729
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Shen PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY
- Publication number 20250022697
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Costel BILOIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA BEHAVIORS PREDICTED BY CURRENT MEASUREMENTS DURING ASYMMETRI...
- Publication number 20250022698
- Publication date Jan 16, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014877
- Publication date Jan 9, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Hisao NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulse-Shaping Using A Sub-Region Tuning Apparatus And Method
- Publication number 20250006478
- Publication date Jan 2, 2025
- MKS Instruments, Inc.
- Aaron BURRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...
- Publication number 20250006477
- Publication date Jan 2, 2025
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...
- Publication number 20240429026
- Publication date Dec 26, 2024
- CENTROTHERM INTERNATIONAL AG
- Sebastian Hubertus Schulz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240412960
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jawon KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
- Publication number 20240404804
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM
- Publication number 20240404805
- Publication date Dec 5, 2024
- Tokyo Electron Limited
- Mikio SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION QUALITY MONITORING USING MULTI-CHANNEL SENSOR DATA
- Publication number 20240371617
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Jeremy Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...
- Publication number 20240363311
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Weiyi LUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL
- Publication number 20240347400
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Sunil Kapoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MINI SPECTROMETER SENSOR FOR IN-LINE, ON-TOOL, DISTRIBUTED DEPOSITI...
- Publication number 20240331989
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Chuang-Chia Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240312765
- Publication date Sep 19, 2024
- Samsung Electronics Co., Ltd.
- Kyung Min LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
- Publication number 20240312766
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240282555
- Publication date Aug 22, 2024
- Hitachi High-Tech Corporation
- Kyohei HORIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND...
- Publication number 20240266156
- Publication date Aug 8, 2024
- KOREA INSTITUTE OF FUSION ENERGY
- Jongsik KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240266201
- Publication date Aug 8, 2024
- Panasonic Intellectual Property Management Co., Ltd.
- Toshiyuki TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258129
- Publication date Aug 1, 2024
- Lam Reseach Corporation
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258130
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...
- Publication number 20240258131
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Dengliang YANG
- B08 - CLEANING
Information Patent Application
SUBSTRATE SUPPORT WITH REAL TIME FORCE AND FILM STRESS CONTROL
- Publication number 20240258075
- Publication date Aug 1, 2024
- Applied Materials, Inc.
- Wendell Glenn BOYD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW POWER PLASMA SYSTEM MONITOR METHOD
- Publication number 20240242946
- Publication date Jul 18, 2024
- SKY TECH INC.
- JING-CHENG LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240243019
- Publication date Jul 18, 2024
- Kokusai Electric Corporation
- Yuichiro TAKESHIMA
- H01 - BASIC ELECTRIC ELEMENTS

Feedback systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus to control ion energy

Etch feedback for control of upstream process

Method of manufacturing semiconductor device, and substrate treatme...

Systems and methods for metastable activated radical selective stri...

Recipe updating method

Radio frequency generator

Cover with a sensor system for a configurable measuring system for...

Temperature estimation apparatus, plasma processing system, tempera...

Dual-frequency, direct-drive inductively coupled plasma source

Apparatus to control a waveform

Plasma processing apparatus and method for releasing sample

Calibration jig and calibration method

Systems and methods for monitoring faults, anomalies, and other cha...

Plasma processing chambers configured for tunable substrate and edg...

Measurement system to measure a thickness of an adjustable edge rin...

Plasma processing apparatus

Distortion current mitigation in a radio frequency plasma processin...

Systems and methods for stabilizing reaction chamber pressure

Plasma generator, plasma treatment device, and method for providing...

Plasma processing apparatus and prediction method of the condition...

Plasma processing apparatus and control method

RF power compensation to reduce deposition or etch rate changes in...

Feedback loop for controlling a pulsed voltage waveform

RF current measurement in semiconductor processing tool

Plasma non-uniformity detection

Plasma processing with broadband RF waveforms

Etch processing system having reflective endpoint detection

Real-time, non-invasive IEDF plasma sensor

Apparatus with switches to produce a waveform

Glow plasma gas measurement signal processing

Patents Applicationslast 30 patents

PLASMA IGNITION DETECTION DEVICE FOR CONNECTION TO AN IMPEDANCE MAT...

RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE

METHOD OF ETCHING OR DEPOSITING A THIN FILM

DUAL-FREQUENCY, DIRECT-DRIVE INDUCTIVELY COUPLED PLASMA SOURCE

SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...

PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY

PLASMA BEHAVIORS PREDICTED BY CURRENT MEASUREMENTS DURING ASYMMETRI...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Pulse-Shaping Using A Sub-Region Tuning Apparatus And Method

PLASMA DIAGNOSTIC APPARATUS, AND APPARATUS FOR FABRICATING SEMICOND...

PLASMA GENERATOR, PLASMA TREATMENT DEVICE, AND METHOD FOR PROVIDING...

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

Reference Box for Direct-Drive Radiofrequency Power Supply

PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

PLASMA GENERATION QUALITY MONITORING USING MULTI-CHANNEL SENSOR DATA

RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN...

RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL

MINI SPECTROMETER SENSOR FOR IN-LINE, ON-TOOL, DISTRIBUTED DEPOSITI...

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS

PLASMA PROCESSING APPARATUS

MODULE FOR MEASURING CURRENT/VOLTAGE/POWER OF PLASMA APPARATUS AND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SYSTEMS AND METHODS FOR METASTABLE ACTIVATED RADICAL SELECTIVE STRI...

SUBSTRATE SUPPORT WITH REAL TIME FORCE AND FILM STRESS CONTROL

LOW POWER PLASMA SYSTEM MONITOR METHOD

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...