Field-emitting cathode

Industry

CPC
H01J2237/31786

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31786Field-emitting cathode

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Patents Grantslast 30 patents

Information Patent Grant
Integrated circuits having interconnects and heat dissipators based...
- Patent number 8,415,787
- Issue date Apr 9, 2013
- Smoltek AB
- Mohammad Shafiqul Kabir
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Integrated circuits having interconnects and heat dissipators based...
- Patent number 8,183,659
- Issue date May 22, 2012
- Smoltek AB
- Mohammad Shafiqul Kabir
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Controlled growth of a nanostructure on a substrate, and electron e...
- Patent number 7,977,761
- Issue date Jul 12, 2011
- Smoltek AB
- Mohammad Shafiqul Kabir
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Integrated circuits having interconnects and heat dissipators based...
- Patent number 7,777,291
- Issue date Aug 17, 2010
- Smoltek AB
- Mohammad Shafiqul Kabir
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlled growth of a nanostructure on a substrate
- Patent number 7,687,876
- Issue date Mar 30, 2010
- Smoltek AB
- Mohammad Shafiqul Kabir
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Digital parallel electron beam lithography stamp
- Patent number 7,425,715
- Issue date Sep 16, 2008
- Blaise Laurent Mouttet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam duplication lithography method
- Patent number 7,306,896
- Issue date Dec 11, 2007
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam duplication lithography method and apparatus
- Patent number 7,011,927
- Issue date Mar 14, 2006
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Individually addressable cathodes with integrated focusing stack or...
- Patent number 6,917,043
- Issue date Jul 12, 2005
- U.T. Battelle LLC
- Clarence E. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam duplication lithography method and apparatus
- Patent number 6,849,856
- Issue date Feb 1, 2005
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatically focused addressable field emission array chips (A...
- Patent number 6,498,349
- Issue date Dec 24, 2002
- UT-Battelle
- Clarence E. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital electron lithography with field emission array (FEA)
- Patent number 6,014,203
- Issue date Jan 11, 2000
- Toyo Technologies, Inc.
- Tihiro Ohkawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Virtual mask digital electron beam lithography
- Patent number 5,892,231
- Issue date Apr 6, 1999
- Lockheed Martin Energy Research Corporation
- Larry R. Baylor
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing an electron beam emission aperture
- Patent number 4,331,505
- Issue date May 25, 1982
- Man Maschinenfabrik Augsburg-Nurnburg A.G.
- Alfred Hirt
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Integrated Circuits Having Interconnects and Heat Dissipators Based...
- Publication number 20120224327
- Publication date Sep 6, 2012
- SMOLTEK AB
- Mohammad Shafiqul Kabir
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
Integrated Circuits Having Interconnects and Heat Dissipators Based...
- Publication number 20100328898
- Publication date Dec 30, 2010
- SMOLTEK AB
- Mohammad Shafiqul Kabir
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
Controlled Growth of a Nanostructure on a Substrate, and Electron E...
- Publication number 20100171093
- Publication date Jul 8, 2010
- SMOLTEK AB
- Mohammad Shafiqul Kabir
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
CONTROLLED GROWTH OF A NANOSTRUCTURE ON A SUBSTRATE
- Publication number 20090108251
- Publication date Apr 30, 2009
- Mohammad Shafiqul Kabir
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
Digital parallel electron beam lithography stamp
- Publication number 20070257212
- Publication date Nov 8, 2007
- Blaise Laurent Mouttet
- B82 - NANO-TECHNOLOGY
Information Patent Application
Interconnects and heat dissipators based on nanostructures
- Publication number 20070096304
- Publication date May 3, 2007
- Mohammad Shafiqul Kabir
- D01 - NATURAL OR ARTIFICIAL THREADS OR FIBRES SPINNING
Information Patent Application
Electron beam duplication lithography method
- Publication number 20060151719
- Publication date Jul 13, 2006
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam duplication lithography method and apparatus
- Publication number 20050121623
- Publication date Jun 9, 2005
- SI Diamond Technology, Inc.
- Seiichi Iwamatsu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrostatically focused addressable field emission array chips (A...
- Publication number 20030038244
- Publication date Feb 27, 2003
- Clarence E. Thomas
- B82 - NANO-TECHNOLOGY

Field-emitting cathode

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Integrated circuits having interconnects and heat dissipators based...

Integrated circuits having interconnects and heat dissipators based...

Controlled growth of a nanostructure on a substrate, and electron e...

Integrated circuits having interconnects and heat dissipators based...

Controlled growth of a nanostructure on a substrate

Digital parallel electron beam lithography stamp

Electron beam duplication lithography method

Electron beam duplication lithography method and apparatus

Individually addressable cathodes with integrated focusing stack or...

Electron beam duplication lithography method and apparatus

Electrostatically focused addressable field emission array chips (A...

Digital electron lithography with field emission array (FEA)

Virtual mask digital electron beam lithography

Method for manufacturing an electron beam emission aperture

Patents Applicationslast 30 patents

Integrated Circuits Having Interconnects and Heat Dissipators Based...

Integrated Circuits Having Interconnects and Heat Dissipators Based...

Controlled Growth of a Nanostructure on a Substrate, and Electron E...

CONTROLLED GROWTH OF A NANOSTRUCTURE ON A SUBSTRATE

Digital parallel electron beam lithography stamp

Interconnects and heat dissipators based on nanostructures

Electron beam duplication lithography method

Electron beam duplication lithography method and apparatus

Electrostatically focused addressable field emission array chips (A...