for casting, melting, evaporating or etching

Industry

CPC
H01J37/305

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/305for casting, melting, evaporating or etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for depositing hard carbon layers
- Patent number 12,362,141
- Issue date Jul 15, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Bert Scheffel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor analysis system
- Patent number 12,347,707
- Issue date Jul 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Yudai Kubo
- G05 - CONTROLLING REGULATING
Information Patent Grant
Focused ion beam system and method of correcting deviation of field...
- Patent number 12,334,300
- Issue date Jun 17, 2025
- Jeol Ltd.
- Yuichiro Ohori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,278,131
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Naoki Sugawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for performing sample lift-out for highly react...
- Patent number 12,278,087
- Issue date Apr 15, 2025
- FEI Company
- Christopher Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for forming a three-dimensional article
- Patent number 12,269,092
- Issue date Apr 8, 2025
- Arcam AB
- Safdar Ali
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
3D metrology from 3D datacube created from stack of registered imag...
- Patent number 12,272,518
- Issue date Apr 8, 2025
- Applied Materials Israel Ltd.
- Ilya Blayvas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fiducial guided cross-sectioning and lamella preparation with tomog...
- Patent number 12,255,044
- Issue date Mar 18, 2025
- FIBICS INCORPORATED
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Microscopy feedback for improved milling accuracy
- Patent number 12,249,482
- Issue date Mar 11, 2025
- FEI Company
- Thomas Gary Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-breakdown ion source discharge apparatus
- Patent number 12,243,713
- Issue date Mar 4, 2025
- JIANGSU LEUVEN INSTRUMENTS CO. LTD
- Yaoyao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,230,471
- Issue date Feb 18, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Broad ion beam (BIB) systems for more efficient processing of multi...
- Patent number 12,228,484
- Issue date Feb 18, 2025
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 12,224,155
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota Aida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge carrier generation source
- Patent number 12,211,663
- Issue date Jan 28, 2025
- SCIA SYSTEMS GMBH
- Enrico Loos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced spatial/temporal overlaps to increase temporal overlaps to...
- Patent number 12,191,110
- Issue date Jan 7, 2025
- The University of Liverpool
- Nigel D Browning
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam plasma enhanced chemical vapor deposition system for an...
- Patent number 12,191,156
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- John Hautala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Beam bending snout for mobile electron accelerators
- Patent number 12,172,367
- Issue date Dec 24, 2024
- Fermi Research Alliance, LLC
- Aaron Sauers
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method for producing lamella, analysis system and method for analyz...
- Patent number 12,176,180
- Issue date Dec 24, 2024
- HITACHI HIGH-TECH CORPORATION
- Atsushi Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for automated processing of multiple samples in...
- Patent number 12,165,833
- Issue date Dec 10, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for electron beam focusing in electron beam add...
- Patent number 12,148,592
- Issue date Nov 19, 2024
- General Electric Company
- John Scott Price
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching isolation features and dense features within a substrate
- Patent number 12,119,232
- Issue date Oct 15, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Systems and methods for pre-aligning samples for more efficient pro...
- Patent number 12,106,931
- Issue date Oct 1, 2024
- FEI Company
- Michal Hrouzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modulation of rolling k vectors of angled gratings
- Patent number 12,106,935
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanned angled etching apparatus and techniques providing separate...
- Patent number 12,106,936
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner, reaction chamber and semiconductor processing equipment
- Patent number 12,106,934
- Issue date Oct 1, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jinrong Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Focused Ion Beam System
- Publication number 20250239433
- Publication date Jul 24, 2025
- JEOL Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING SYSTEM
- Publication number 20250239432
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SA...
- Publication number 20250232948
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Hoonseop KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASS FLOW CONTROLLER, FLOW CONTROL METHOD USING THE SAME, AND SUBST...
- Publication number 20250216872
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Seunghun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING
- Publication number 20250218788
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Morgan EVANS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D METROLOGY FROM 3D DATACUBE CREATED FROM STACK OF REGISTERED IMAG...
- Publication number 20250210301
- Publication date Jun 26, 2025
- APPLIED MATERIALS ISRAEL LTD.
- Ilya Blayvas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING PARTICLES OF ION BEAM ETCHING SYSTEM, AND ION B...
- Publication number 20250183017
- Publication date Jun 5, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Xiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROSCOPY IMAGING METHOD AND SYSTEM
- Publication number 20250166961
- Publication date May 22, 2025
- Fibics Incorporated
- Michael William Phaneuf
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Ion Milling Device, and Inspection System
- Publication number 20250149288
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Naohiro FUJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING DEVICE
- Publication number 20250149289
- Publication date May 8, 2025
- HITACHI HIGH-TECH CORPORATION
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF
- Publication number 20250140512
- Publication date May 1, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Huaidong ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION NEUTRALIZATION MODULE
- Publication number 20250140509
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Dongwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20250140518
- Publication date May 1, 2025
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Toshiyuki NAGAMINE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Focused Ion Beam System
- Publication number 20250109481
- Publication date Apr 3, 2025
- JEOL Ltd.
- Noriaki Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BEAM ANGLE ROTATION AND SAMPLE ROTATION
- Publication number 20250104963
- Publication date Mar 27, 2025
- Carl Zeiss SMT GMBH
- Thomas Korb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DELAYERING APPARATUS AND METHODS
- Publication number 20250095959
- Publication date Mar 20, 2025
- FEI Company
- Chad Rue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250096006
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Rin SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087454
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSCALE FAILURE ANALYSIS METHOD
- Publication number 20250087453
- Publication date Mar 13, 2025
- Shanghai Huali Microeloctronics Corporation
- Yunong Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250087455
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOBILE ACCELERATOR-BASED VOLUMETRIC FABRICATION METHOD FOR IN-SITU...
- Publication number 20250083381
- Publication date Mar 13, 2025
- FERMI RESEARCH ALLIANCE, LLC
- Aaron Sauers
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...
- Publication number 20250069958
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Alex Buxbaum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20250046567
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Shota AIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...
- Publication number 20250040442
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...
- Publication number 20250022680
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Dmitry Klochkov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20250014861
- Publication date Jan 9, 2025
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION
- Publication number 20250005714
- Publication date Jan 2, 2025
- FEI Company
- Matej Dolník
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Sample Milling System and Apparatus and Method for Image Generation
- Publication number 20250006458
- Publication date Jan 2, 2025
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...
- Publication number 20240404786
- Publication date Dec 5, 2024
- Carl Zeiss SMT GMBH
- Ivo IHRKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Reducing Line-End Space in Integrated Circuit Patterning
- Publication number 20240385526
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS

for casting, melting, evaporating or etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for depositing hard carbon layers

Semiconductor analysis system

Focused ion beam system and method of correcting deviation of field...

Stage and plasma processing apparatus

Systems and methods for performing sample lift-out for highly react...

Apparatus and method for forming a three-dimensional article

3D metrology from 3D datacube created from stack of registered imag...

Plasma treatment apparatus, lower electrode assembly and forming me...

Fiducial guided cross-sectioning and lamella preparation with tomog...

Microscopy feedback for improved milling accuracy

Anti-breakdown ion source discharge apparatus

Ion milling device

Broad ion beam (BIB) systems for more efficient processing of multi...

Ion milling device

Ion beam source, substrate process apparatus including the same, an...

Charge carrier generation source

Method and apparatus for anisotropic pattern etching and treatment

Method for reducing line-end space in integrated circuit patterning

Reduced spatial/temporal overlaps to increase temporal overlaps to...

Ribbon beam plasma enhanced chemical vapor deposition system for an...

Beam bending snout for mobile electron accelerators

Method for producing lamella, analysis system and method for analyz...

System and methods for automated processing of multiple samples in...

Systems and methods for electron beam focusing in electron beam add...

Etching isolation features and dense features within a substrate

Ion beam processing apparatus, electrode assembly, and method of cl...

Systems and methods for pre-aligning samples for more efficient pro...

Modulation of rolling k vectors of angled gratings

Scanned angled etching apparatus and techniques providing separate...

Liner, reaction chamber and semiconductor processing equipment

Patents Applicationslast 30 patents

Focused Ion Beam System

ION BEAM PROCESSING SYSTEM

ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SA...

MASS FLOW CONTROLLER, FLOW CONTROL METHOD USING THE SAME, AND SUBST...

SUBSTRATE STRESS MANAGEMENT USING DIRECT SELECTIVE AREA PROCESSING

3D METROLOGY FROM 3D DATACUBE CREATED FROM STACK OF REGISTERED IMAG...

METHOD FOR REMOVING PARTICLES OF ION BEAM ETCHING SYSTEM, AND ION B...

MICROSCOPY IMAGING METHOD AND SYSTEM

Ion Milling Device, and Inspection System

ION MILLING DEVICE

ION BEAM ETCHING MACHINE AND LOWER ELECTRODE STRUCTURE THEREOF

ION NEUTRALIZATION MODULE

MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE

Focused Ion Beam System

BEAM ANGLE ROTATION AND SAMPLE ROTATION

DELAYERING APPARATUS AND METHODS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

NANOSCALE FAILURE ANALYSIS METHOD

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

MOBILE ACCELERATOR-BASED VOLUMETRIC FABRICATION METHOD FOR IN-SITU...

DUAL BEAM SYSTEMS AND METHODS FOR DECOUPLING THE WORKING DISTANCE O...

Ion Milling Device

POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...

3D VOLUME INSPECTION OF SEMICONDUCTOR WAFERS WITH INCREASED THROUGH...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

FOCUS STACKING APPLICATIONS FOR SAMPLE PREPARATION

Sample Milling System and Apparatus and Method for Image Generation

METHOD TO INVESTIGATE A SEMICONDUCTOR SAMPLE LAYER BY LAYER AND INV...

Method for Reducing Line-End Space in Integrated Circuit Patterning