for centering, aligning or positioning of ray or beam

Industry

CPC
H01J37/1471

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/1471for centering, aligning or positioning of ray or beam

Industries

Patents Grantslast 30 patents

Information Patent Grant
Automated ion-beam alignment for dual-beam instrument
- Patent number 12,154,757
- Issue date Nov 26, 2024
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for generating particle wave carrying electric...
- Patent number 12,125,666
- Issue date Oct 22, 2024
- Yanbing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-die metrology methods and systems for process control
- Patent number 12,040,187
- Issue date Jul 16, 2024
- ASML Netherlands B.V.
- Lingling Pu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron optical module for providing an off-axial electron beam wi...
- Patent number 11,804,357
- Issue date Oct 31, 2023
- FEI Company
- Ali Mohammadi-Gheidari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for bare wafer inspection
- Patent number 11,791,127
- Issue date Oct 17, 2023
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bandpass charged particle energy filtering detector for charged par...
- Patent number 11,749,495
- Issue date Sep 5, 2023
- KLA Corp.
- Youfei Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle source
- Patent number 11,735,391
- Issue date Aug 22, 2023
- IMS Nanofabrication GmbH
- Stefan Gerhold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam inspection apparatus with improved detection performance...
- Patent number 11,721,521
- Issue date Aug 8, 2023
- ASML Netherlands B.V.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam manipulation device and method for manipulati...
- Patent number 11,705,301
- Issue date Jul 18, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam adjustment method, charged particle beam draw...
- Patent number 11,658,002
- Issue date May 23, 2023
- NuFlare Technology, Inc.
- Ryoichi Kakehi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning transmission electron microscope and adjustment method of...
- Patent number 11,545,337
- Issue date Jan 3, 2023
- Jeol Ltd.
- Ryusuke Sagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-die metrology methods and systems for process control
- Patent number 11,527,405
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Lingling Pu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam irradiation apparatus and electron beam alignment method
- Patent number 11,515,118
- Issue date Nov 29, 2022
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Incident axis alignment method for electron gun equipped with photo...
- Patent number 11,417,494
- Issue date Aug 16, 2022
- Photo electron Soul Inc.
- Reiki Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microscopy
- Patent number 11,404,243
- Issue date Aug 2, 2022
- Mochii, Inc.
- Christopher Su-Yan Own
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-beam inspection apparatus with improved detection performance...
- Patent number 11,282,675
- Issue date Mar 22, 2022
- ASML Netherlands B.V.
- Weiming Ren
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle optical apparatus for through-the-lens detection o...
- Patent number 11,276,547
- Issue date Mar 15, 2022
- Carl Zeiss Microscopy GmbH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system and method
- Patent number 11,239,053
- Issue date Feb 1, 2022
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustment method and electron beam device
- Patent number 11,217,421
- Issue date Jan 4, 2022
- Ebara Corporation
- Takehide Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,189,457
- Issue date Nov 30, 2021
- HITACHI HIGH-TECH CORPORATION
- Hideo Morishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam writing method and multi-beam writing apparatus
- Patent number 11,183,366
- Issue date Nov 23, 2021
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,164,716
- Issue date Nov 2, 2021
- HITACHI HIGH-TECH CORPORATION
- Shunichi Motomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 11,127,566
- Issue date Sep 21, 2021
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for bare wafer inspection
- Patent number 11,087,954
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Wei Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged particle beam writing method and apparatus using b...
- Patent number 10,978,273
- Issue date Apr 13, 2021
- NuFlare Technology, Inc.
- Hideo Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,971,332
- Issue date Apr 6, 2021
- Canon Anelva Corporation
- Hiroshi Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam apparatus including slit structure for extracting ion beam
- Patent number 10,916,403
- Issue date Feb 9, 2021
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and optical-axis adjusting method thereof
- Patent number 10,910,194
- Issue date Feb 2, 2021
- HITACHI HIGH-TECH CORPORATION
- Shuhei Yabu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple electron beam image acquisition apparatus, and alignment m...
- Patent number 10,896,801
- Issue date Jan 19, 2021
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...
- Publication number 20240371600
- Publication date Nov 7, 2024
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIZATION DEVICE FOR AN ELECTRON MICROSCOPE AND METHOD
- Publication number 20240258064
- Publication date Aug 1, 2024
- FORSCHUNGSZENTRUM JULICH GmbH
- Amir Hossein TAVABI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Gun, Electron Beam Applying Device, and Irradiation Positi...
- Publication number 20240222062
- Publication date Jul 4, 2024
- Photo electron Soul, Inc.
- Tomohiro NISHITANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPLICATION DEVICE
- Publication number 20240161997
- Publication date May 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Takashi OHSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...
- Publication number 20240087844
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Albertus Victor Gerardus MANGNUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Simple Spherical Aberration Corrector for SEM
- Publication number 20240047170
- Publication date Feb 8, 2024
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BE...
- Publication number 20240038481
- Publication date Feb 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR AND ELECTRON MICROSCOPE
- Publication number 20240006148
- Publication date Jan 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Hirokazu TAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTOMATED ION-BEAM ALIGNMENT FOR DUAL-BEAM INSTRUMENT
- Publication number 20230377830
- Publication date Nov 23, 2023
- FEI Company
- Jeremy Graham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND METHOD OF MANUFACTURE
- Publication number 20230326705
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INSPECTION APPARATUS AND SEMICONDUCTOR INSPECTION MET...
- Publication number 20230197402
- Publication date Jun 22, 2023
- Samsung Electronics Co., Ltd.
- YUJIN CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Processing of Microscopy Images
- Publication number 20230179885
- Publication date Jun 8, 2023
- FEI Company
- Jeroen KEIZER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Imaging And Milling A Sample
- Publication number 20230162945
- Publication date May 25, 2023
- FEI Company
- Jaroslav Velcovský
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK
- Publication number 20230113702
- Publication date Apr 13, 2023
- Carl Zeiss SMT GMBH
- Daniel Rhinow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BANDPASS CHARGED PARTICLE ENERGY FILTERING DETECTOR FOR CHARGED PAR...
- Publication number 20230104558
- Publication date Apr 6, 2023
- KLA Corporation
- Youfei Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON OPTICAL MODULE FOR PROVIDING AN OFF-AXIAL ELECTRON BEAM WI...
- Publication number 20230101108
- Publication date Mar 30, 2023
- FEI Company
- Ali MOHAMMADI-GHEIDARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...
- Publication number 20230081844
- Publication date Mar 16, 2023
- Carl Zeiss SMT GMBH
- Thorsten Hofmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...
- Publication number 20230081240
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Ryosuke UEBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-DIE METROLOGY METHODS AND SYSTEMS FOR PROCESS CONTROL
- Publication number 20230076943
- Publication date Mar 9, 2023
- ASML NETHERLANDS B.V.
- Lingling PU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PARTICLE BEAM COLUMN
- Publication number 20230065039
- Publication date Mar 2, 2023
- CARL ZEISS MICROSCOPY GMBH
- Erik Essers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GUN AND METHODS FOR SURFACE TREATMENT
- Publication number 20230054638
- Publication date Feb 23, 2023
- The Regents of the University of California
- Hartmut G. HAEFFNER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR GENERATING PARTICLE WAVE CARRYING ELECTRIC...
- Publication number 20220392733
- Publication date Dec 8, 2022
- Yanbing LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220359150
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE ELECTRON BEAM IMAGE ACQUISITION METHOD, MULTIPLE ELECTRON...
- Publication number 20220336183
- Publication date Oct 20, 2022
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM INSPECTION APPARATUS WITH IMPROVED DETECTION PERFORMANCE...
- Publication number 20220319808
- Publication date Oct 6, 2022
- ASML NETHERLANDS B.V.
- Weiming REN
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM MANIPULATION DEVICE AND METHOD FOR MANIPULATI...
- Publication number 20220230836
- Publication date Jul 21, 2022
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Benjamin John Cook
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM ADJUSTMENT METHOD, CHARGED PARTICLE BEAM DRAW...
- Publication number 20220068591
- Publication date Mar 3, 2022
- NuFlare Technology, Inc.
- Ryoichi KAKEHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR BARE WAFER INSPECTION
- Publication number 20220068592
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Wei FANG
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS
- Publication number 20220068590
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Ying LUO
- H01 - BASIC ELECTRIC ELEMENTS

for centering, aligning or positioning of ray or beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Automated ion-beam alignment for dual-beam instrument

Apparatus and method for generating particle wave carrying electric...

In-die metrology methods and systems for process control

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Electron optical module for providing an off-axial electron beam wi...

System and method for bare wafer inspection

Bandpass charged particle energy filtering detector for charged par...

Charged-particle source

Multi-beam inspection apparatus with improved detection performance...

Charged particle beam manipulation device and method for manipulati...

Charged particle beam adjustment method, charged particle beam draw...

Scanning transmission electron microscope and adjustment method of...

In-die metrology methods and systems for process control

Electron beam irradiation apparatus and electron beam alignment method

Incident axis alignment method for electron gun equipped with photo...

Microscopy

Multi-beam inspection apparatus with improved detection performance...

Charged particle optical apparatus for through-the-lens detection o...

Charged particle beam system and method

Adjustment method and electron beam device

Scanning electron microscope

Multi-beam writing method and multi-beam writing apparatus

Charged particle beam device

Multi charged particle beam writing apparatus and multi charged par...

System and method for bare wafer inspection

Multiple charged particle beam writing method and apparatus using b...

Plasma processing apparatus and plasma processing method

Ion beam apparatus including slit structure for extracting ion beam

Charged particle beam device and optical-axis adjusting method thereof

Multiple electron beam image acquisition apparatus, and alignment m...

Patents Applicationslast 30 patents

METHOD OF DETERMINING AN ENERGY SPECTRUM OR ENERGY WIDTH OF A CHARG...

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

MAGNETIZATION DEVICE FOR AN ELECTRON MICROSCOPE AND METHOD

Electron Gun, Electron Beam Applying Device, and Irradiation Positi...

ELECTRON BEAM APPLICATION DEVICE

CHARGED PARTICLE OPTICAL DEVICE, OBJECTIVE LENS ASSEMBLY, DETECTOR,...

Simple Spherical Aberration Corrector for SEM

IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BE...

ABERRATION CORRECTOR AND ELECTRON MICROSCOPE

AUTOMATED ION-BEAM ALIGNMENT FOR DUAL-BEAM INSTRUMENT

PROCESSING APPARATUS AND METHOD OF MANUFACTURE

SEMICONDUCTOR INSPECTION APPARATUS AND SEMICONDUCTOR INSPECTION MET...

Methods and Systems for Processing of Microscopy Images

Method Of Imaging And Milling A Sample

METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK

BANDPASS CHARGED PARTICLE ENERGY FILTERING DETECTOR FOR CHARGED PAR...

ELECTRON OPTICAL MODULE FOR PROVIDING AN OFF-AXIAL ELECTRON BEAM WI...

METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROL...

MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...

IN-DIE METROLOGY METHODS AND SYSTEMS FOR PROCESS CONTROL

PARTICLE BEAM COLUMN

ION GUN AND METHODS FOR SURFACE TREATMENT

APPARATUS AND METHOD FOR GENERATING PARTICLE WAVE CARRYING ELECTRIC...

CHARGED PARTICLE BEAM DEVICE

MULTIPLE ELECTRON BEAM IMAGE ACQUISITION METHOD, MULTIPLE ELECTRON...

MULTI-BEAM INSPECTION APPARATUS WITH IMPROVED DETECTION PERFORMANCE...

CHARGED PARTICLE BEAM MANIPULATION DEVICE AND METHOD FOR MANIPULATI...

CHARGED PARTICLE BEAM ADJUSTMENT METHOD, CHARGED PARTICLE BEAM DRAW...

SYSTEM AND METHOD FOR BARE WAFER INSPECTION

SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS