for drying etching

Industry

CPC
H01L21/67069

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/67069for drying etching

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High aspect ratio etch with infinite selectivity
- Patent number 12,354,880
- Issue date Jul 8, 2025
- Lam Research Corporation
- Leonid Belau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for conductance liners in semiconductor proce...
- Patent number 12,354,847
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Timothy Joseph Franklin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck, substrate processing apparatus, and substrate...
- Patent number 12,354,852
- Issue date Jul 8, 2025
- Semes Co., Ltd.
- Hyun Tak Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,347,654
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Hwajun Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for cryogenic applications
- Patent number 12,347,659
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for backside deposition of a substrate
- Patent number 12,341,053
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Ronald Nasman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Batch-type apparatus for atomic layer etching (ALE), and ALE method...
- Patent number 12,334,308
- Issue date Jun 17, 2025
- Samsung Electronics Co., Ltd.
- Hanjin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter device and plasma processing apparatus
- Patent number 12,334,309
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Naohiko Okunishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated showerhead with thermal control for delivering radical a...
- Patent number 12,331,402
- Issue date Jun 17, 2025
- Lam Research Corporation
- Rachel E. Batzer
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for producing a waveform
- Patent number 12,334,303
- Issue date Jun 17, 2025
- Advanced Energy Industries, Inc.
- Hien Minh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power control for rf impedance matching network
- Patent number 12,334,307
- Issue date Jun 17, 2025
- ASM IP Holding B.V.
- Ronald Anthony Decker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antennas, circuits for generating plasma, plasma processing apparat...
- Patent number 12,327,709
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Dong-Hyub Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,327,735
- Issue date Jun 10, 2025
- Semes Co., Ltd.
- Seong Gil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 12,322,579
- Issue date Jun 3, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and method and program for controlling...
- Patent number 12,315,704
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yusuke Saitoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method, method for producing semiconductor device, and...
- Patent number 12,308,244
- Issue date May 20, 2025
- Central Glass Company, Limited
- Kunihiro Yamauchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck for high bias radio frequency (RF) power applic...
- Patent number 12,300,473
- Issue date May 13, 2025
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating etch and passivation process
- Patent number 12,293,919
- Issue date May 6, 2025
- Lam Research Corporation
- Seongjun Heo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 12,288,713
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 12,283,461
- Issue date Apr 22, 2025
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater and stage having the heater
- Patent number 12,284,731
- Issue date Apr 22, 2025
- NHK Spring Co., Ltd.
- Toshihiko Hanamachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,283,489
- Issue date Apr 22, 2025
- Tokyo Electron Limited
- Satoshi Toda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etch selectivity control in atomic layer etching
- Patent number 12,280,091
- Issue date Apr 22, 2025
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,278,131
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Naoki Sugawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment fixture for a reactor system
- Patent number 12,278,129
- Issue date Apr 15, 2025
- ASM IP Holding B.V.
- Surojit Ganguli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anodized titanium material and method for producing the same
- Patent number 12,276,037
- Issue date Apr 15, 2025
- Yamaguchi Prefectural Industrial Technology Institute
- Takehiko Muranaka
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Wafer chuck structure with holes in upper surface to improve temper...
- Patent number 12,272,585
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Jung Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, ETCHING...
- Publication number 20250232983
- Publication date Jul 17, 2025
- Central Glass Company, Limited
- Yuki FUKUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250232961
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Kazuya TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR ETCHING A SUBSTRATE AND METHOD AND APPARATUS...
- Publication number 20250226202
- Publication date Jul 10, 2025
- ASM IP HOLDING B.V.
- Rami Khazaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATIVE HEAT WINDOWS AND WAFER SUPPORT PADS IN VAPOR ETCH REACTORS
- Publication number 20250218819
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Ilia Kalinovski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, REC...
- Publication number 20250218786
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Masato KAWANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING
- Publication number 20250213650
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
END POINT DETECTION DEVICE, ETCHING CONTROL SYSTEM, END POINT DETEC...
- Publication number 20250218827
- Publication date Jul 3, 2025
- Horiba Stec, Co., Ltd.
- Michie IMANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE MASK MULTI-CRITICAL DIMENSION ETCHING USING ETCH STOP
- Publication number 20250210368
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Matthew Ocana
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIALLY TUNABLE INDUCTIVELY COUPLED PLASMA ANTENNA
- Publication number 20250210305
- Publication date Jun 26, 2025
- LAM RESEARCH CORPORATION
- Jozef Kudela
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20250210313
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Sunwoo BANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-Stimulated Etching of Silicon
- Publication number 20250210361
- Publication date Jun 26, 2025
- Applied Materials, Inc.
- Sonam Dorje SHERPA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS AND METHOD
- Publication number 20250201592
- Publication date Jun 19, 2025
- HUAYING RESEARCH CO., LTD
- Sophia Ziying WEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS
- Publication number 20250201528
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hsing LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PROCESSING METHOD AND WAFER PROCESSING SYSTEM
- Publication number 20250201570
- Publication date Jun 19, 2025
- He WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250191963
- Publication date Jun 12, 2025
- Kokusai Electric Corporation
- Toshiki FUJINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPARK PLASMA SINTERED COMPONENT FOR CRYO-PLASMA PROCESSING
- Publication number 20250191893
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Lin XU
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20250191878
- Publication date Jun 12, 2025
- Kokusai Electric Corporation
- Takeshi YASUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL
- Publication number 20250179634
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Mariusch GREGOR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS
- Publication number 20250183051
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Madeleine Parker GORDON
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20250183048
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Nobuhiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250183043
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Nobuhiro TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250183047
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Naoki SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATION OF SEMICONDUCTOR STRUCTURES AND APPARATUS FO...
- Publication number 20250183045
- Publication date Jun 5, 2025
- National Yang Ming Chiao Tung University
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS
- Publication number 20250183093
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Suresh GUPTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PROCESSING SYSTEM
- Publication number 20250183052
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Mitsuhiro TACHIBANA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD AND DEVICE FOR ETCHING SILICON OXIDE
- Publication number 20250174464
- Publication date May 29, 2025
- Central Glass Company, Limited
- Shoi SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE
- Publication number 20250149301
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Chan Hoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING MICRO INTERCONNECT STRUC...
- Publication number 20250149424
- Publication date May 8, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Francis J. CARNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR NON-DESTRUCTIVE INSPECTION OF CELL ETCH REDEPOSITION
- Publication number 20250149387
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Che Lee
- G06 - COMPUTING CALCULATING COUNTING

for drying etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing method

High aspect ratio etch with infinite selectivity

Methods and apparatus for conductance liners in semiconductor proce...

Electrostatic chuck, substrate processing apparatus, and substrate...

Plasma processing apparatus

Electrostatic chuck assembly for cryogenic applications

System for backside deposition of a substrate

Batch-type apparatus for atomic layer etching (ALE), and ALE method...

Filter device and plasma processing apparatus

Integrated showerhead with thermal control for delivering radical a...

Apparatus for producing a waveform

Power control for rf impedance matching network

Antennas, circuits for generating plasma, plasma processing apparat...

Apparatus and method for processing substrate

Metal contamination reduction in substrate processing systems with...

Plasma processing apparatus, and method and program for controlling...

Dry etching method, method for producing semiconductor device, and...

Stage, plasma processing apparatus, and cleaning method

Electrostatic chuck for high bias radio frequency (RF) power applic...

Alternating etch and passivation process

Mounting table and plasma processing apparatus

Systems and methods for achieving peak ion energy enhancement with...

Heater and stage having the heater

Etching method and etching apparatus

Etch selectivity control in atomic layer etching

Stage and plasma processing apparatus

Alignment fixture for a reactor system

Anodized titanium material and method for producing the same

Wafer chuck structure with holes in upper surface to improve temper...

Systems and methods for metastable activated radical selective stri...

Patents Applicationslast 30 patents

ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, ETCHING...

PLASMA PROCESSING APPARATUS

METHOD AND DEVICE FOR ETCHING A SUBSTRATE AND METHOD AND APPARATUS...

RADIATIVE HEAT WINDOWS AND WAFER SUPPORT PADS IN VAPOR ETCH REACTORS

METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, REC...

ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING

END POINT DETECTION DEVICE, ETCHING CONTROL SYSTEM, END POINT DETEC...

SINGLE MASK MULTI-CRITICAL DIMENSION ETCHING USING ETCH STOP

SPATIALLY TUNABLE INDUCTIVELY COUPLED PLASMA ANTENNA

APPARATUS FOR PROCESSING A SUBSTRATE

Electron-Stimulated Etching of Silicon

SEMICONDUCTOR PROCESSING APPARATUS AND METHOD

METHOD AND APPARATUS FOR REVITALIZING PLASMA PROCESSING TOOLS

WAFER PROCESSING METHOD AND WAFER PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

SPARK PLASMA SINTERED COMPONENT FOR CRYO-PLASMA PROCESSING

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

SYSTEMS AND METHODS FOR PULSE WIDTH MODULATED DOSE CONTROL

SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR FABRICATION OF SEMICONDUCTOR STRUCTURES AND APPARATUS FO...

HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS

PROCESSING METHOD AND PROCESSING SYSTEM

METHOD AND DEVICE FOR ETCHING SILICON OXIDE

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE

SEMICONDUCTOR DEVICE AND METHOD OF FORMING MICRO INTERCONNECT STRUC...

METHOD FOR NON-DESTRUCTIVE INSPECTION OF CELL ETCH REDEPOSITION