for etching

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CPC
H01L21/2633

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/2633for etching

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching apparatus and method
- Patent number 12,087,558
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal line structure and method
- Patent number 12,051,646
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Lun Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and ion beam irradiati...
- Patent number 12,040,155
- Issue date Jul 16, 2024
- Kioxia Corporation
- Junichi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching platinum-containing thin film using protective cap layer
- Patent number 11,929,423
- Issue date Mar 12, 2024
- Texas Instruments Incorporated
- Sebastian Meier
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for extreme ultraviolet lithography mask treatment
- Patent number 11,906,897
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Artificial intelligence-enabled preparation end-pointing
- Patent number 11,847,813
- Issue date Dec 19, 2023
- FEI Company
- Thomas Gary Miller
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical image capturing system, image capturing device and electron...
- Patent number 11,815,667
- Issue date Nov 14, 2023
- LARGAN PRECISION CO., LTD
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depositive shielding for fiducial protection from redeposition
- Patent number 11,817,395
- Issue date Nov 14, 2023
- FEI Company
- Sean Morgan-Jones
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus including laser heating for etching thin layer
- Patent number 11,772,198
- Issue date Oct 3, 2023
- Semes Co., Ltd.
- Won Geun Kim
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
RF capacitive coupled etch reactor
- Patent number 11,742,187
- Issue date Aug 29, 2023
- EVATEC AG
- Johannes Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a semiconductor device
- Patent number 11,735,469
- Issue date Aug 22, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing re-sputtered material from patterned sidewalls
- Patent number 11,615,960
- Issue date Mar 28, 2023
- Cornell University
- David G. Lishan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controlled hardmask shaping to create tapered slanted fins
- Patent number 11,581,189
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical image capturing system, image capturing device and electron...
- Patent number 11,555,987
- Issue date Jan 17, 2023
- LARGAN PRECISION CO., LTD
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phosphorus fugitive emission control
- Patent number 11,545,368
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Cuiyang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma workpiece treatment apparatus
- Patent number 11,469,085
- Issue date Oct 11, 2022
- EVATEC AG
- Jurgen Weichart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxy-free nanowire cell process for the manufacture of photovolt...
- Patent number 11,362,229
- Issue date Jun 14, 2022
- California Institute of Technology
- Phillip R. Jahelka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a semiconductor device
- Patent number 11,322,393
- Issue date May 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method
- Patent number 11,322,404
- Issue date May 3, 2022
- Disco Corporation
- Masaru Nakamura
- B28 - WORKING CEMENT, CLAY, OR STONE
Information Patent Grant
RF capacitive coupled dual frequency etch reactor
- Patent number 11,217,434
- Issue date Jan 4, 2022
- EVATEC AG
- Jurgen Weichart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for ion beam delayering of a sample and control t...
- Patent number 11,214,874
- Issue date Jan 4, 2022
- Techinsights Inc.
- Robert K. Foster
- G01 - MEASURING TESTING
Information Patent Grant
Artificial intelligence-enabled preparation end-pointing
- Patent number 11,176,656
- Issue date Nov 16, 2021
- FEI Company
- Thomas Gary Miller
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Controlled hardmask shaping to create tapered slanted fins
- Patent number 11,171,010
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phosphorus fugitive emission control
- Patent number 11,127,601
- Issue date Sep 21, 2021
- Applied Materials, Inc.
- Cuiyang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preserving underlying dielectric layer during MRAM device formation
- Patent number 11,121,173
- Issue date Sep 14, 2021
- International Business Machines Corporation
- Ashim Dutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern decomposition lithography techniques
- Patent number 11,107,786
- Issue date Aug 31, 2021
- Intel Corporation
- Charles H. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to eliminate contaminant particles from an acc...
- Patent number 11,101,134
- Issue date Aug 24, 2021
- Exogenesis Corporation
- Allen R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal line structure and method
- Patent number 11,101,216
- Issue date Aug 24, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiang-Lun Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with doped surfaces, and related methods with in situ doping
- Patent number 11,088,147
- Issue date Aug 10, 2021
- Micron Technology, Inc.
- Jaydip Guha
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Ion Beam Etching Apparatus And Method
- Publication number 20240379333
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PLATINUM-CONTAINING THIN FILM USING PROTECTIVE CAP LAYER
- Publication number 20240222470
- Publication date Jul 4, 2024
- TEXAS INSTRUMENTS INCORPORATED
- Sebastian Meier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARTIFICIAL INTELLIGENCE-ENABLED PREPARATION END-POINTING
- Publication number 20240071040
- Publication date Feb 29, 2024
- FEI Company
- Thomas Gary Miller
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...
- Publication number 20240027738
- Publication date Jan 25, 2024
- LARGAN PRECISION CO., LTD.
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Semiconductor Device
- Publication number 20230343636
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dynamic Laser-Assisted Etching
- Publication number 20230253207
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Han-Yu Tang
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
COMBINING FOCUSED ION BEAM MILLING AND SCANNING ELECTRON MICROSCOPE...
- Publication number 20230245933
- Publication date Aug 3, 2023
- KLA Corporation
- Youfei JIANG
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...
- Publication number 20230112466
- Publication date Apr 13, 2023
- LARGAN PRECISION CO., LTD.
- Lin-Yao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCHING APPARATUS AND METHOD
- Publication number 20230050650
- Publication date Feb 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jung-Hao CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20220416114
- Publication date Dec 29, 2022
- ENKRIS SEMICONDUCTOR, INC.
- Kai Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND ION BEAM IRRADIATI...
- Publication number 20220301809
- Publication date Sep 22, 2022
- KIOXIA Corporation
- Junichi HASHIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING A SEMICONDUCTOR DEVICE
- Publication number 20220262674
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO ELIMINATE CONTAMINANT PARTICLES FROM AN ACC...
- Publication number 20220115236
- Publication date Apr 14, 2022
- Exogenesis Corporation
- Allen R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITIVE SHIELDING FOR FIDUCIAL PROTECTION FROM REDEPOSITION
- Publication number 20220102284
- Publication date Mar 31, 2022
- FEI Company
- Sean Morgan-Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARTIFICIAL INTELLIGENCE-ENABLED PREPARATION END-POINTING
- Publication number 20220067915
- Publication date Mar 3, 2022
- FEI Company
- Thomas Gary Miller
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Phosphorus Fugitive Emission Control
- Publication number 20210384041
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Cuiyang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Line Structure and Method
- Publication number 20210375760
- Publication date Dec 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiang-Lun Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN DECOMPOSITION LITHOGRAPHY TECHNIQUES
- Publication number 20210375807
- Publication date Dec 2, 2021
- Intel Corporation
- CHARLES H. WALLACE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Extreme Ultraviolet Lithography Mask Treatment
- Publication number 20210311383
- Publication date Oct 7, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PLATINUM-CONTAINING THIN FILM USING PROTECTIVE CAP LAYER
- Publication number 20210313179
- Publication date Oct 7, 2021
- TEXAS INSTRUMENTS INCORPORATED
- Sebastian Meier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED HARDMASK SHAPING TO CREATE TAPERED SLANTED FINS
- Publication number 20210305055
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING RE-SPUTTERED MATERIAL FROM PATTERNED SIDEWALLS
- Publication number 20210193466
- Publication date Jun 24, 2021
- Cornell University
- David G. Lishan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR ETCHING THIN LAYER
- Publication number 20210178522
- Publication date Jun 17, 2021
- SEMES CO., LTD.
- Won Geun KIM
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of Forming a Semiconductor Device
- Publication number 20210134657
- Publication date May 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Nien Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Preserving Underlying Dielectric Layer During MRAM Device Formation
- Publication number 20210126051
- Publication date Apr 29, 2021
- International Business Machines Corporation
- Ashim Dutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...
- Publication number 20200344391
- Publication date Oct 29, 2020
- LARGAN PRECISION CO., LTD.
- Lin-Yao Liao
- G02 - OPTICS
Information Patent Application
METHOD AND SYSTEM FOR ION BEAM DELAYERING OF A SAMPLE AND CONTROL T...
- Publication number 20200318242
- Publication date Oct 8, 2020
- TECHINSIGHTS INC.
- Robert K. Foster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARTIFICIAL INTELLIGENCE-ENABLED PREPARATION END-POINTING
- Publication number 20200279362
- Publication date Sep 3, 2020
- FEI Company
- Thomas Gary Miller
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20200168468
- Publication date May 28, 2020
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLED HARDMASK SHAPING TO CREATE TAPERED SLANTED FINS
- Publication number 20200135482
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS

for etching

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Ion beam etching apparatus and method

Metal line structure and method

Method of manufacturing semiconductor device and ion beam irradiati...

Etching platinum-containing thin film using protective cap layer

Method for extreme ultraviolet lithography mask treatment

Artificial intelligence-enabled preparation end-pointing

Optical image capturing system, image capturing device and electron...

Depositive shielding for fiducial protection from redeposition

Apparatus including laser heating for etching thin layer

RF capacitive coupled etch reactor

Method of forming a semiconductor device

Method for removing re-sputtered material from patterned sidewalls

Controlled hardmask shaping to create tapered slanted fins

Optical image capturing system, image capturing device and electron...

Phosphorus fugitive emission control

Vacuum plasma workpiece treatment apparatus

Epitaxy-free nanowire cell process for the manufacture of photovolt...

Method of forming a semiconductor device

Wafer processing method

RF capacitive coupled dual frequency etch reactor

Method and system for ion beam delayering of a sample and control t...

Artificial intelligence-enabled preparation end-pointing

Controlled hardmask shaping to create tapered slanted fins

Phosphorus fugitive emission control

Preserving underlying dielectric layer during MRAM device formation

Pattern decomposition lithography techniques

Method and apparatus to eliminate contaminant particles from an acc...

Metal line structure and method

Apparatus with doped surfaces, and related methods with in situ doping

Patents Applicationslast 30 patents

Ion Beam Etching Apparatus And Method

ETCHING PLATINUM-CONTAINING THIN FILM USING PROTECTIVE CAP LAYER

ARTIFICIAL INTELLIGENCE-ENABLED PREPARATION END-POINTING

OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...

Method of Forming a Semiconductor Device

Dynamic Laser-Assisted Etching

COMBINING FOCUSED ION BEAM MILLING AND SCANNING ELECTRON MICROSCOPE...

OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...

ION BEAM ETCHING APPARATUS AND METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND ION BEAM IRRADIATI...

METHOD OF FORMING A SEMICONDUCTOR DEVICE

METHOD AND APPARATUS TO ELIMINATE CONTAMINANT PARTICLES FROM AN ACC...

DEPOSITIVE SHIELDING FOR FIDUCIAL PROTECTION FROM REDEPOSITION

ARTIFICIAL INTELLIGENCE-ENABLED PREPARATION END-POINTING

Phosphorus Fugitive Emission Control

Metal Line Structure and Method

PATTERN DECOMPOSITION LITHOGRAPHY TECHNIQUES

Method for Extreme Ultraviolet Lithography Mask Treatment

ETCHING PLATINUM-CONTAINING THIN FILM USING PROTECTIVE CAP LAYER

CONTROLLED HARDMASK SHAPING TO CREATE TAPERED SLANTED FINS

METHOD FOR REMOVING RE-SPUTTERED MATERIAL FROM PATTERNED SIDEWALLS

APPARATUS FOR ETCHING THIN LAYER

Method of Forming a Semiconductor Device

Preserving Underlying Dielectric Layer During MRAM Device Formation

OPTICAL IMAGE CAPTURING SYSTEM, IMAGE CAPTURING DEVICE AND ELECTRON...

METHOD AND SYSTEM FOR ION BEAM DELAYERING OF A SAMPLE AND CONTROL T...

ARTIFICIAL INTELLIGENCE-ENABLED PREPARATION END-POINTING

ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

CONTROLLED HARDMASK SHAPING TO CREATE TAPERED SLANTED FINS