for ion implantation

Industry

CPC
H01J37/3171

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3171for ion implantation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method for ion implantation uniformity control
- Patent number 12,368,018
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tien-Shun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma type ion implanter
- Patent number 12,368,021
- Issue date Jul 22, 2025
- SK Hynix Inc.
- Jong Jin Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for setting gap between cathode and filament
- Patent number 12,354,834
- Issue date Jul 8, 2025
- Axcelis Technologies, Inc.
- Steven T. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and systems useful for producing aluminum ions
- Patent number 12,347,639
- Issue date Jul 1, 2025
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen supply device, and ion beam irradiation apparatus equipped...
- Patent number 12,340,974
- Issue date Jun 24, 2025
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya Hirai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feature patterning using pitch relaxation and directional end-pushi...
- Patent number 12,315,737
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzung-Hua Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three layer resonator coil for linear accelerator
- Patent number 12,308,206
- Issue date May 20, 2025
- Applied Materials, Inc.
- William Herron Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Closed loop faraday correction of a horizontal beam current profile...
- Patent number 12,283,460
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holder state detection device and substrate holder state...
- Patent number 12,278,083
- Issue date Apr 15, 2025
- SCREEN Holdings Co., Ltd.
- Yuji Okita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Ion implantation method and ion implanter
- Patent number 12,255,046
- Issue date Mar 18, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yoji Kawasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding device
- Patent number 12,249,479
- Issue date Mar 11, 2025
- Nissin Ion Equipment Co., Ltd.
- Yusuke Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlled ion implantation
- Patent number 12,247,283
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Alexander K. Eidukonis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Repellent electrode for electron repelling
- Patent number 12,243,707
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Heng Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
- Patent number 12,243,708
- Issue date Mar 4, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized stress modulation by implant to back of wafer
- Patent number 12,217,974
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure of semiconductor device and method of manufacture
- Patent number 12,211,701
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsan-Chun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Calibration hardware for ion implanter
- Patent number 12,205,840
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Lung-Yin Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repeller assembly for mounting into an arc chamber of an ion implan...
- Patent number 12,198,890
- Issue date Jan 14, 2025
- Plansee USA LLC
- Nam Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for optimizing full horizontal scanned beam dis...
- Patent number 12,191,113
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Tyler Wills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controller and control techniques for linear accelerator and ion im...
- Patent number 12,193,140
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Keith E. Kowal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonator, linear accelerator, and ion implanter having dielectric-...
- Patent number 12,185,451
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus, semiconductor device and man...
- Patent number 12,183,538
- Issue date Dec 31, 2024
- Kioxia Corporation
- Takayuki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toroidal motion enhanced ion source
- Patent number 12,154,755
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- June Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation system
- Patent number 12,125,665
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Kai-Yun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Vaporizer, ion source and method for generating aluminum-containing...
- Patent number 12,112,915
- Issue date Oct 8, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Sami K. Hahto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual source injector with switchable analyzing magnet
- Patent number 12,112,918
- Issue date Oct 8, 2024
- Axcelis Technologies, Inc.
- Wilhelm Platow
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
Shield for an Ion Implanter
- Publication number 20250232949
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tseh-Jen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU, PRE-IMPLANT WAFER CHARACTERIZATION SYSTEM AND METHOD
- Publication number 20250226266
- Publication date Jul 10, 2025
- Axcelis Technologies, Inc.
- Scott Edwin Galica
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIMODE DOSE COMPENSATION SYSTEM
- Publication number 20250218722
- Publication date Jul 3, 2025
- Applied Materials, Inc.
- Klaus PETRY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiation Heating to Dry Moisture from Air Bearing Shaft
- Publication number 20250201510
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR GUIDE STAR ALIGNMENT OF AN ION IMPLANTER
- Publication number 20250201513
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Radiation Heating to Clean Deposits from Air Bearing Shaft
- Publication number 20250201514
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Natural Frequency Adjuster For Extraction Electrodes
- Publication number 20250201508
- Publication date Jun 19, 2025
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT
- Publication number 20250191944
- Publication date Jun 12, 2025
- Axcelis Technologies, Inc.
- Yusef Nouri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE RANGE HEATED ELECTROSTATIC CHUCK
- Publication number 20250183085
- Publication date Jun 5, 2025
- Axcelis Technologies, Inc.
- John Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATOR AND ION IMPLANTER
- Publication number 20250174424
- Publication date May 29, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH BANDWIDTH VARIABLE DOSE ION IMPLANTATION SYSTEM AND METHOD
- Publication number 20250166959
- Publication date May 22, 2025
- Axcelis Technologies, Inc.
- Andy Ray
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIXED POSITION FILAMENT
- Publication number 20250157775
- Publication date May 15, 2025
- Axcelis Technologies, Inc.
- Steve T. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE IMPLANT FOR WAFER CURVATURE CONTROL
- Publication number 20250157821
- Publication date May 15, 2025
- Axcelis Technologies, Inc.
- Sean Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC ION BEAM SHAPE SELECTION
- Publication number 20250140510
- Publication date May 1, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING
- Publication number 20250140520
- Publication date May 1, 2025
- Axcelis Technologies, Inc.
- Michael Cristoforo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS APPARATUS AND METHOD
- Publication number 20250140522
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Chun-Wei Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...
- Publication number 20250140523
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION
- Publication number 20250140567
- Publication date May 1, 2025
- Applied Materials, Inc.
- Stanislav S. TODOROV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
- Publication number 20250140569
- Publication date May 1, 2025
- Applied Materials, Inc.
- Sony Varghese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DOPING TWO-DIMENSIONAL MATERIAL BASED ON CLUSTER ION IMP...
- Publication number 20250132126
- Publication date Apr 24, 2025
- Jiangsu Jichuang Atomic Cluster Technology Research Institute Co., Ltd.
- Fengqi SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH WIRE FORM METAL DOPANT
- Publication number 20250125119
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Roger B. Fish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM
- Publication number 20250118524
- Publication date Apr 10, 2025
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION HARDWARE FOR ION IMPLANTER
- Publication number 20250118585
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lung-Yin Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION
- Publication number 20250112026
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Richard Allen SPRENKLE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT
- Publication number 20250104965
- Publication date Mar 27, 2025
- Axcelis Technologies, Inc.
- Wilhelm Platow
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...
- Publication number 20250095952
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Ori Noked
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
- Publication number 20250095958
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Frank SINCLAIR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
- Publication number 20250095949
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Christopher A. Rowland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING M...
- Publication number 20250095960
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- Sang Woo SEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROFILING USING OPTICAL TOMOGRAPHY
- Publication number 20250087448
- Publication date Mar 13, 2025
- Axcelis Technologies, Inc.
- Neil J. Bassom
- H01 - BASIC ELECTRIC ELEMENTS

for ion implantation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for ion implantation uniformity control

Inductively coupled plasma type ion implanter

Method for setting gap between cathode and filament

Method and systems useful for producing aluminum ions

Hydrogen supply device, and ion beam irradiation apparatus equipped...

Feature patterning using pitch relaxation and directional end-pushi...

Three layer resonator coil for linear accelerator

Closed loop faraday correction of a horizontal beam current profile...

Substrate holder state detection device and substrate holder state...

Ion implantation method and ion implanter

Substrate holding device

Method and apparatus for controlled ion implantation

Repellent electrode for electron repelling

Ion generator and ion implanter

Localized stress modulation by implant to back of wafer

Gate structure of semiconductor device and method of manufacture

Calibration hardware for ion implanter

Repeller assembly for mounting into an arc chamber of an ion implan...

Systems and methods for optimizing full horizontal scanned beam dis...

Controller and control techniques for linear accelerator and ion im...

Resonator, linear accelerator, and ion implanter having dielectric-...

Semiconductor manufacturing apparatus, semiconductor device and man...

Ribbon beam angle adjustment in an ion implantation system

Device to control uniformity of extracted ion beam

Toroidal motion enhanced ion source

Device and method for implanting particles into a substrate

Ion implantation system

Ion beam processing apparatus, electrode assembly, and method of cl...

Vaporizer, ion source and method for generating aluminum-containing...

Dual source injector with switchable analyzing magnet

Patents Applicationslast 30 patents

Shield for an Ion Implanter

IN-SITU, PRE-IMPLANT WAFER CHARACTERIZATION SYSTEM AND METHOD

MULTIMODE DOSE COMPENSATION SYSTEM

Radiation Heating to Dry Moisture from Air Bearing Shaft

TECHNIQUES FOR GUIDE STAR ALIGNMENT OF AN ION IMPLANTER

Radiation Heating to Clean Deposits from Air Bearing Shaft

Natural Frequency Adjuster For Extraction Electrodes

SYSTEM AND METHOD OF VERIFYING WORKPIECE ALIGNMENT

LARGE RANGE HEATED ELECTROSTATIC CHUCK

ION GENERATOR AND ION IMPLANTER

HIGH BANDWIDTH VARIABLE DOSE ION IMPLANTATION SYSTEM AND METHOD

FIXED POSITION FILAMENT

BACKSIDE IMPLANT FOR WAFER CURVATURE CONTROL

DYNAMIC ION BEAM SHAPE SELECTION

APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING

SEMICONDUCTOR PROCESS APPARATUS AND METHOD

SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE...

MULTI-PARAMETER IMPLANTATION FOR MANAGING WAFER DISTORTION

LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER

METHOD FOR DOPING TWO-DIMENSIONAL MATERIAL BASED ON CLUSTER ION IMP...

ION SOURCE WITH WIRE FORM METAL DOPANT

ACTIVELY HEATED TARGET TO GENERATE AN ION BEAM

CALIBRATION HARDWARE FOR ION IMPLANTER

INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION

HIGH ENERGY IMPLANTER WITH SMALL FOOTPRINT

CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING...

CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION

ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES

ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING M...

ION BEAM PROFILING USING OPTICAL TOMOGRAPHY