for ion implantation

Industry

CPC
H01J37/3171

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3171for ion implantation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Ribbon beam angle adjustment in an ion implantation system
- Patent number 12,170,182
- Issue date Dec 17, 2024
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toroidal motion enhanced ion source
- Patent number 12,154,755
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- June Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for implanting particles into a substrate
- Patent number 12,125,670
- Issue date Oct 22, 2024
- MI2-FACTORY GMBH
- Constantin Csato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation system
- Patent number 12,125,665
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Kai-Yun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Vaporizer, ion source and method for generating aluminum-containing...
- Patent number 12,112,915
- Issue date Oct 8, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Sami K. Hahto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual source injector with switchable analyzing magnet
- Patent number 12,112,918
- Issue date Oct 8, 2024
- Axcelis Technologies, Inc.
- Wilhelm Platow
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 12,094,685
- Issue date Sep 17, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Taisei Futakuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy filter element for ion implantation systems for the use in t...
- Patent number 12,080,510
- Issue date Sep 3, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine based molecular co-gas when running dimethylaluminum chlor...
- Patent number 12,051,561
- Issue date Jul 30, 2024
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shield for filament in an ion source
- Patent number 12,046,443
- Issue date Jul 23, 2024
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulator for an ion implantation source
- Patent number 12,020,896
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Min Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spinning disk with electrostatic clamped platens for ion implantation
- Patent number 12,002,649
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Robert Mitchell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable support for arc chamber of ion source
- Patent number 12,002,647
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Tang Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear accelerator coil including multiple fluid channels
- Patent number 11,985,756
- Issue date May 14, 2024
- Applied Materials, Inc.
- Robert B. Vopat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generation device and ion generation method
- Patent number 11,978,608
- Issue date May 7, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yuuji Ishida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus, ion implantation apparatus, and ion i...
- Patent number 11,961,695
- Issue date Apr 16, 2024
- Semes Co., Ltd.
- Doyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source cathode
- Patent number 11,961,696
- Issue date Apr 16, 2024
- Ion Technology Solutions, LLC
- Manuel A. Jerez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation gas supply system
- Patent number 11,961,707
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsing-Piao Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam irradiation apparatus and program therefor
- Patent number 11,955,311
- Issue date Apr 9, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Shinya Takemura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer supporting device
- Patent number 11,929,266
- Issue date Mar 12, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Takashi Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for metal contamination control in an ion impl...
- Patent number 11,923,169
- Issue date Mar 5, 2024
- Axcelis Technologies, Inc.
- Causon Ko-Chuan Jen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,923,167
- Issue date Mar 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam implantation method and semiconductor device
- Patent number 11,908,694
- Issue date Feb 20, 2024
- Infineon Technologies AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toxic outgas control post process
- Patent number 11,901,198
- Issue date Feb 13, 2024
- Axcelis Technologies, Inc.
- John F. Baggett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid high-temperature electrostatic clamp for improved workpiece...
- Patent number 11,887,808
- Issue date Jan 30, 2024
- Axcelis Technologies, Inc.
- Atul Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite ion source based upon heterogeneous metal-metal fluoride...
- Patent number 11,887,806
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS
- Publication number 20240420919
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Aaron P. WEBB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED GAS BOX AND ION SOURCE
- Publication number 20240420920
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- William H. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404787
- Publication date Dec 5, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTER AND ION IMPLANTATION METHOD
- Publication number 20240404785
- Publication date Dec 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Taisei Futakuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM
- Publication number 20240379321
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Kai-Yun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FASTENER FOR SECURING FACEPLATE TO ION SOURCE
- Publication number 20240379319
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- John Alexander Walder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION SYSTEM AND RELATED METHODS
- Publication number 20240379320
- Publication date Nov 14, 2024
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heated Plasma Flood Gun Sweeper
- Publication number 20240371602
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339287
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
- Publication number 20240339288
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS
- Publication number 20240331973
- Publication date Oct 3, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya UCHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Actively Cooled Gas Line For Ion Source
- Publication number 20240331972
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Adam M. McLaughlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A COMPUTER-IMPLEMENTED METHOD FOR THE SIMULATION OF AN ENERGY-FILTE...
- Publication number 20240303390
- Publication date Sep 12, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HOLDING DEVICE ARRANGEMENT FOR USE IN AN IMPLANTATION PROCESS OF A...
- Publication number 20240297011
- Publication date Sep 5, 2024
- SOITEC
- Cédric Charles-Alfred
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
JET IMPINGEMENT COOLING ASSEMBLY FOR PLASMA WINDOWS POSITIONED IN A...
- Publication number 20240297017
- Publication date Sep 5, 2024
- SHINE Technologies, LLC
- Preston Barrows
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPELLER FOR ION GENERATING APPARATUS, ION GENERATING APPARATUS AND...
- Publication number 20240290570
- Publication date Aug 29, 2024
- Samsung Electronics Co., LTD
- Kyoungchul YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM EXTRACTION ELECTRODE, ION SOURCE AND EXTRACTION ELECTRODE...
- Publication number 20240290576
- Publication date Aug 29, 2024
- NISSIN ION EQUIPMENT CO., LTD.
- Yuya HIRAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE
- Publication number 20240282543
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Tang Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Reducing Particle Formation in a Process Cham...
- Publication number 20240274404
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- Frank Sinclair
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER POSITIONING METHOD AND APPARATUS
- Publication number 20240274478
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATOR FOR AN ION IMPLANTATION SOURCE
- Publication number 20240274405
- Publication date Aug 15, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMAPNY, LTD.
- Tsung-Min LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ALUMINUM ION BEAM GENERATION SOURCE TECHNOLOGY
- Publication number 20240266143
- Publication date Aug 8, 2024
- II-VI Delaware, Inc.
- Ahmet Hassan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION GENERATION DEVICE AND ION IMPLANTER
- Publication number 20240266140
- Publication date Aug 8, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Sho KAWATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE-AREA WAFER-SCALE CMOS-COMPATIBLE 2D-MATERIAL INTERCALATION DO...
- Publication number 20240258118
- Publication date Aug 1, 2024
- Destination 2D Inc.
- Kaustav BANERJEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL SURFACE REFORMING APPARATUS USING ION IMPLANTATION
- Publication number 20240258069
- Publication date Aug 1, 2024
- Radpion Inc.
- Myung Jin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose Cup Assembly for an Ion Implanter
- Publication number 20240249908
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Frank Sinclair
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REP...
- Publication number 20240249906
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Tang TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROBOT, APPARATUS INCLUDING ROBOT, AND METHOD FOR MANUFACTURING SEMI...
- Publication number 20240243001
- Publication date Jul 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Yun CHENG
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
A Method for the Simulation of an Energy-Filtered Ion Implantation...
- Publication number 20240232470
- Publication date Jul 11, 2024
- mi2-factory GmbH
- Florian KRIPPENDORF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Ion source structure of ion implanter and its operation method
- Publication number 20240234079
- Publication date Jul 11, 2024
- United Semiconductor (Xiamen) Co., Ltd.
- Wen Shuo Cui
- H01 - BASIC ELECTRIC ELEMENTS

for ion implantation

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ribbon beam angle adjustment in an ion implantation system

Device to control uniformity of extracted ion beam

Toroidal motion enhanced ion source

Device and method for implanting particles into a substrate

Ion implantation system

Ion beam processing apparatus, electrode assembly, and method of cl...

Vaporizer, ion source and method for generating aluminum-containing...

Dual source injector with switchable analyzing magnet

Ion implanter and ion implantation method

Energy filter element for ion implantation systems for the use in t...

Fluorine based molecular co-gas when running dimethylaluminum chlor...

Shield for filament in an ion source

Insulator for an ion implantation source

Spinning disk with electrostatic clamped platens for ion implantation

Adjustable support for arc chamber of ion source

Linear accelerator coil including multiple fluid channels

Ion generation device and ion generation method

Wafer positioning method and apparatus

Substrate treating apparatus, ion implantation apparatus, and ion i...

Ion source cathode

Ion implantation gas supply system

Ion beam irradiation apparatus and program therefor

Semiconductor wafer

Wafer supporting device

Apparatus and method for metal contamination control in an ion impl...

Ion implanter and ion implantation method

Ion beam implantation method and semiconductor device

Toxic outgas control post process

Hybrid high-temperature electrostatic clamp for improved workpiece...

Composite ion source based upon heterogeneous metal-metal fluoride...

Patents Applicationslast 30 patents

METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS

INTEGRATED GAS BOX AND ION SOURCE

ION IMPLANTER AND ION IMPLANTATION METHOD

ION IMPLANTER AND ION IMPLANTATION METHOD

ION IMPLANTATION SYSTEM

FASTENER FOR SECURING FACEPLATE TO ION SOURCE

ION IMPLANTATION SYSTEM AND RELATED METHODS

Heated Plasma Flood Gun Sweeper

APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM

ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS

Actively Cooled Gas Line For Ion Source

A COMPUTER-IMPLEMENTED METHOD FOR THE SIMULATION OF AN ENERGY-FILTE...

HOLDING DEVICE ARRANGEMENT FOR USE IN AN IMPLANTATION PROCESS OF A...

JET IMPINGEMENT COOLING ASSEMBLY FOR PLASMA WINDOWS POSITIONED IN A...

REPELLER FOR ION GENERATING APPARATUS, ION GENERATING APPARATUS AND...

ION BEAM EXTRACTION ELECTRODE, ION SOURCE AND EXTRACTION ELECTRODE...

ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE

System and Method for Reducing Particle Formation in a Process Cham...

WAFER POSITIONING METHOD AND APPARATUS

INSULATOR FOR AN ION IMPLANTATION SOURCE

SYSTEMS AND METHODS FOR ALUMINUM ION BEAM GENERATION SOURCE TECHNOLOGY

ION GENERATION DEVICE AND ION IMPLANTER

LARGE-AREA WAFER-SCALE CMOS-COMPATIBLE 2D-MATERIAL INTERCALATION DO...

MATERIAL SURFACE REFORMING APPARATUS USING ION IMPLANTATION

Dose Cup Assembly for an Ion Implanter

ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REP...

ROBOT, APPARATUS INCLUDING ROBOT, AND METHOD FOR MANUFACTURING SEMI...

A Method for the Simulation of an Energy-Filtered Ion Implantation...

Ion source structure of ion implanter and its operation method