for microlithography

Industry

CPC
G03F9/70

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/70for microlithography

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Exposure control in photolithographic direct exposure methods for m...
- Patent number 12,169,370
- Issue date Dec 17, 2024
- Laser Imaging Systems GmbH
- Christian Schwarz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement device and measurement method, exposure apparatus and e...
- Patent number 12,164,236
- Issue date Dec 10, 2024
- Nikon Corporation
- Akihiro Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Display device having magnetic alignment marks
- Patent number 12,164,237
- Issue date Dec 10, 2024
- Samsung Display Co., Ltd.
- Young Sang Ha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint lithography
- Patent number 12,147,162
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Catharinus De Schiffart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus with movable stages
- Patent number 12,147,167
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Offset alignment method and micro-lithographic printing device
- Patent number 12,147,168
- Issue date Nov 19, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical designs of miniaturized overlay measurement system
- Patent number 12,140,872
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement method, measurement apparatus, and mark
- Patent number 12,140,879
- Issue date Nov 12, 2024
- Kioxia Corporation
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 12,140,878
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of obtaining array of plurality of regions on substrate, exp...
- Patent number 12,130,562
- Issue date Oct 29, 2024
- Canon Kabushiki Kaisha
- Atsushi Shigenobu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of wafer alignment using at resolution metrology on product...
- Patent number 12,124,179
- Issue date Oct 22, 2024
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for optimizing actuator forces
- Patent number 12,124,165
- Issue date Oct 22, 2024
- Canon Kabushiki Kaisha
- Nilabh K. Roy
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography system and method
- Patent number 12,124,178
- Issue date Oct 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hao-Yu Lan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining position of mark, lithography method, exposur...
- Patent number 12,092,967
- Issue date Sep 17, 2024
- Canon Kabushiki Kaisha
- Ryota Makino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of stitching error using split targets
- Patent number 12,094,100
- Issue date Sep 17, 2024
- KLA Corporation
- Mark Ghinovker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography process monitoring method
- Patent number 12,085,867
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Jie Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay measurement device
- Patent number 12,085,383
- Issue date Sep 10, 2024
- AUROS TECHNOLOGY, INC.
- Gyu Nam Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template, manufacturing method of template, and manufacturing metho...
- Patent number 12,087,604
- Issue date Sep 10, 2024
- Kioxia Corporation
- Kazuhiro Takahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method, imprint apparatus, and article manufacturing method
- Patent number 12,078,927
- Issue date Sep 3, 2024
- Canon Kabushiki Kaisha
- Kazuhiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template, workpiece, and alignment method
- Patent number 12,078,922
- Issue date Sep 3, 2024
- Kioxia Corporation
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus, measurement method, lithography apparatus an...
- Patent number 12,072,175
- Issue date Aug 27, 2024
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection method, detection apparatus, lithography apparatus, and a...
- Patent number 12,061,079
- Issue date Aug 13, 2024
- Canon Kabushiki Kaisha
- Masaharu Kajitani
- G01 - MEASURING TESTING
Information Patent Grant
Operational policies of industrial field devices and distributed da...
- Patent number 12,056,152
- Issue date Aug 6, 2024
- Siemens Aktiengesellschaft
- Wolfgang Boelderl-Ermel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wafer-level etching methods for planar photonics circuits and devices
- Patent number 12,057,332
- Issue date Aug 6, 2024
- Ayar Labs, Inc.
- Chen Sun
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Assembly for collimating broadband radiation
- Patent number 12,050,409
- Issue date Jul 30, 2024
- ASML Netherlands B.V.
- Yongfeng Ni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for optimization of lithographic process
- Patent number 12,044,981
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Marc Hauptmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus and method of manufacturing article
- Patent number 12,032,283
- Issue date Jul 9, 2024
- Canon Kabushiki Kaisha
- Naosuke Nishimura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240385509
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROCESS MONITORING METHOD
- Publication number 20240385545
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Jie Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...
- Publication number 20240377763
- Publication date Nov 14, 2024
- Nikon Corporation
- Arata OCHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240377767
- Publication date Nov 14, 2024
- Canon Kabushiki Kaisha
- MIZUKI ISHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...
- Publication number 20240369738
- Publication date Nov 7, 2024
- Arizona Board of Regents on behalf of Arizona State University
- Chao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240369919
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Marcus Adrianus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS, MEASUREMENT METHOD, LITHOGRAPHY APPARATUS AN...
- Publication number 20240369347
- Publication date Nov 7, 2024
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G01 - MEASURING TESTING
Information Patent Application
TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION
- Publication number 20240354485
- Publication date Oct 24, 2024
- ONTO INNOVATION INC.
- Keith Frank Best
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE
- Publication number 20240353353
- Publication date Oct 24, 2024
- Karim S. KARIM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD
- Publication number 20240353761
- Publication date Oct 24, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK
- Publication number 20240345474
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takahiro KISHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SENSOR SYSTEM
- Publication number 20240345492
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Gijs KRAMER
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...
- Publication number 20240339295
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Tzu-Chao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329549
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...
- Publication number 20240319620
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT MARK STRUCTURE AND METHOD FOR MAKING
- Publication number 20240321767
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Hao Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...
- Publication number 20240310738
- Publication date Sep 19, 2024
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20240304617
- Publication date Sep 12, 2024
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...
- Publication number 20240302758
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Ingyun CHUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-OVERLAY STACKED GRATING METROLOGY TARGET
- Publication number 20240302751
- Publication date Sep 12, 2024
- KLA Corporation
- Jordan Pio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE POD INCLUDING MOTION LIMITING FEATURES AND METHOD OF ASSEMB...
- Publication number 20240302757
- Publication date Sep 12, 2024
- Entegris, Inc.
- Russ V. Raschke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND STORAGE MEDIUM
- Publication number 20240288845
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- TOMOHIRO MASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...
- Publication number 20240288781
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- MITSURU INOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...
- Publication number 20240288787
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- WATARU YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
- Publication number 20240288780
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
- Publication number 20240263941
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Rui CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING METHOD FOR DECIDING ARRANGEMENT OF DROPLETS...
- Publication number 20240264529
- Publication date Aug 8, 2024
- Canon Kabushiki Kaisha
- NAOKI KIYOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20240264537
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Gijs TEN HAAF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ELECTRONIC DEVICE
- Publication number 20240241455
- Publication date Jul 18, 2024
- InnoLux Corporation
- Kuang-Ming FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Exposure control in photolithographic direct exposure methods for m...

Measurement device and measurement method, exposure apparatus and e...

Display device having magnetic alignment marks

System and method for aligned stitching

Imprint lithography

Imprint apparatus with movable stages

Offset alignment method and micro-lithographic printing device

Optical designs of miniaturized overlay measurement system

Measurement method, measurement apparatus, and mark

Method and apparatus to determine a patterning process parameter us...

Processing system, processing method, measurement apparatus, substr...

Method of obtaining array of plurality of regions on substrate, exp...

Overlay measurement system using lock-in amplifier technique

Method of wafer alignment using at resolution metrology on product...

Apparatus and method for optimizing actuator forces

Lithography system and method

Method of determining position of mark, lithography method, exposur...

Measurement of stitching error using split targets

Lithography process monitoring method

Overlay measurement device

Template, manufacturing method of template, and manufacturing metho...

Imprint method, imprint apparatus, and article manufacturing method

Template, workpiece, and alignment method

Measurement apparatus, measurement method, lithography apparatus an...

Detection method, detection apparatus, lithography apparatus, and a...

Operational policies of industrial field devices and distributed da...

Wafer-level etching methods for planar photonics circuits and devices

Assembly for collimating broadband radiation

Method and apparatus for optimization of lithographic process

Imprint apparatus and method of manufacturing article

Patents Applicationslast 30 patents

LITHOGRAPHY SYSTEM AND METHODS

LITHOGRAPHY PROCESS MONITORING METHOD

FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APP...

IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...

PATTERNING DEVICE FOR A LITHOGRAPHIC APPARATUS AND METHOD

MEASUREMENT APPARATUS, MEASUREMENT METHOD, LITHOGRAPHY APPARATUS AN...

TRACKING AND/OR PREDICTING SUBSTRATE YIELD DURING FABRICATION

MULTI-LAYER HIGH-ASPECT RATIO X-RAY GRATING AND METHOD OF MANUFACTURE

METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD

METHOD FOR EVALUATING REFERENCE MARK FORMED ON EUV MASK BLANK

SENSOR SYSTEM

METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...

EXPOSURE APPARATUS

METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE...

ALIGNMENT MARK STRUCTURE AND METHOD FOR MAKING

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMET...

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...

MULTI-OVERLAY STACKED GRATING METROLOGY TARGET

RETICLE POD INCLUDING MOTION LIMITING FEATURES AND METHOD OF ASSEMB...

INFORMATION PROCESSING APPARATUS AND STORAGE MEDIUM

METHOD OF OBTAINING ARRAY OF PLURALITY OF REGIONS ON SUBSTRATE, EXP...

MEASURING METHOD OF MEASURING SUBSTRATE BY CAPTURING IMAGES OF MARK...

INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

INFORMATION PROCESSING METHOD FOR DECIDING ARRANGEMENT OF DROPLETS...

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

Lithographic Method for Imprinting Three-Dimensional Microstructure...

ELECTRONIC DEVICE