for microlithography

Industry

CPC
G03F9/70

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/70for microlithography

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method of designing an alignment mark
- Patent number 12,259,664
- Issue date Mar 25, 2025
- ASML Netherlands B.V.
- Jigang Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template, method for fabricating template, and method for fabricati...
- Patent number 12,259,663
- Issue date Mar 25, 2025
- Kioxia Corporation
- Toshiaki Komukai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Embedded high-z marker material and process for alignment of multil...
- Patent number 12,255,047
- Issue date Mar 18, 2025
- HRL Laboratories, LLC
- Christopher Bohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Height measurement method and height measurement system
- Patent number 12,253,807
- Issue date Mar 18, 2025
- ASML Netherlands B.V.
- Andrey Valerievich Rogachevskiy
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,242,765
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Imprinting method, pre-processing apparatus, substrate for imprinti...
- Patent number 12,221,340
- Issue date Feb 11, 2025
- Canon Kabushiki Kaisha
- Hiroshi Sato
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Metrology system for packaging applications
- Patent number 12,222,659
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Venkatakaushik Voleti
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor marks and forming methods thereof
- Patent number 12,218,073
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shengan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-referencing integrated alignment sensor
- Patent number 12,216,414
- Issue date Feb 4, 2025
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and metrology tool for determining information about a targe...
- Patent number 12,209,994
- Issue date Jan 28, 2025
- ASML Netherlands B.V.
- Zili Zhou
- G01 - MEASURING TESTING
Information Patent Grant
Managing multi-objective alignments for imprinting
- Patent number 12,204,258
- Issue date Jan 21, 2025
- Magic Leap, Inc.
- Jeremy Lee Sevier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for inspection and metrology
- Patent number 12,204,826
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Lotte Marloes Willems
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Supercontinuum radiation source and associated metrology devices
- Patent number 12,204,229
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Sebastian Thomas Bauerschmidt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint method, imprint apparatus, and article manufacturing method
- Patent number 12,204,243
- Issue date Jan 21, 2025
- Canon Kabushiki Kaisha
- Masato Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,199,093
- Issue date Jan 14, 2025
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography measurement machine and operating method thereof
- Patent number 12,197,124
- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,189,314
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method and apparatus and computer program
- Patent number 12,189,305
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Simon Gijsbert Josephus Mathijssen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having integral alignment marks with decouplin...
- Patent number 12,191,258
- Issue date Jan 7, 2025
- NANYA TECHNOLOGY CORPORATION
- Shing-Yih Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure control in photolithographic direct exposure methods for m...
- Patent number 12,169,370
- Issue date Dec 17, 2024
- Laser Imaging Systems GmbH
- Christian Schwarz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement device and measurement method, exposure apparatus and e...
- Patent number 12,164,236
- Issue date Dec 10, 2024
- Nikon Corporation
- Akihiro Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Display device having magnetic alignment marks
- Patent number 12,164,237
- Issue date Dec 10, 2024
- Samsung Display Co., Ltd.
- Young Sang Ha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint lithography
- Patent number 12,147,162
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Catharinus De Schiffart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus with movable stages
- Patent number 12,147,167
- Issue date Nov 19, 2024
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Offset alignment method and micro-lithographic printing device
- Patent number 12,147,168
- Issue date Nov 19, 2024
- Mycronic AB
- Anders Svensson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical designs of miniaturized overlay measurement system
- Patent number 12,140,872
- Issue date Nov 12, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement method, measurement apparatus, and mark
- Patent number 12,140,879
- Issue date Nov 12, 2024
- Kioxia Corporation
- Takashi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 12,140,878
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
MANAGING MULTI-OBJECTIVE ALIGNMENTS FOR IMPRINTING
- Publication number 20250102928
- Publication date Mar 27, 2025
- Magic Leap, Inc.
- Jeremy Lee SEVIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS
- Publication number 20250098325
- Publication date Mar 20, 2025
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DIE
- Publication number 20250095987
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Chi FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF
- Publication number 20250096146
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hao Chu Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR MICROFABRICATION AND LASER WRITING ALIG...
- Publication number 20250085644
- Publication date Mar 13, 2025
- IonQ, Inc.
- Jason Madjdi AMINI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITION MEASURING METHOD, METHOD FOR MANUFACTURING ARTICLE, POSITI...
- Publication number 20250085645
- Publication date Mar 13, 2025
- Canon Kabushiki Kaisha
- Nozomu Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR GENERATING MULTIPLE ILLUMINATION SPOTS FROM...
- Publication number 20250085646
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Kirill Urievich SOBOLEV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, INFORMATION PROCESSING APPARATUS...
- Publication number 20250073963
- Publication date Mar 6, 2025
- Canon Kabushiki Kaisha
- RYO NAWATA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
LITHOGRAPHY APPARATUS, STAGE APPARATUS, AND ARTICLE MANUFACTURING M...
- Publication number 20250076774
- Publication date Mar 6, 2025
- Canon Kabushiki Kaisha
- Naosuke Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND M...
- Publication number 20250076768
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Zhongchuan Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MECHANICALLY CONTROLLED STRESS-ENGINEERED OPTICAL SYSTEMS AND METHODS
- Publication number 20250068090
- Publication date Feb 27, 2025
- ASML NETHERLANDS B.V.
- Adel JOOBEUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20250060686
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- HSU TUNG YEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER ALIGNMENT SYSTEM AND WAFER ALIGNMENT METHOD
- Publication number 20250060685
- Publication date Feb 20, 2025
- Samsung Electronics Co., Ltd.
- Sangyun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AN OPTICAL SYSTEM IMPLEMENTED IN A SYSTEM FOR FAST OPTICAL INSPECTI...
- Publication number 20250060684
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY
- Publication number 20250054872
- Publication date Feb 13, 2025
- KLA Corporation
- Shlomo Eisenbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...
- Publication number 20250054873
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sung-Hsin YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS
- Publication number 20250053106
- Publication date Feb 13, 2025
- ASML Netherlands B,V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20250044714
- Publication date Feb 6, 2025
- Canon Kabushiki Kaisha
- NOZOMU HAYASHI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING
- Publication number 20250044710
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Jiyou FU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROJECTION UNIT FOR A LEVEL SENSOR, METHOD OF MONITORING HEIGHT OF...
- Publication number 20250044715
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Ahmet Burak CUNBUL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A LOCATION OF AN OBJECT SURFACE
- Publication number 20250036034
- Publication date Jan 30, 2025
- Carl Zeiss SMT GMBH
- Susanne Toepfer
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING
- Publication number 20250036033
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPENSATING OPTICAL SYSTEM FOR NONUNIFORM SURFACES, A METROLOGY SY...
- Publication number 20250028258
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Oleg Viacheslavovich VOZNYI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imprint Apparatus with Movable Stages
- Publication number 20250028259
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Junichi KANEHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR DEVICE HAVING INTEGRAL ALIGNMENT MARKS WITH DECOUPLIN...
- Publication number 20250006657
- Publication date Jan 2, 2025
- NANYA TECHNOLOGY CORPORATION
- SHING-YIH SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A SENSOR POSITIONING METHOD, A POSITIONING SYSTEM, A LITHOGRAPHIC A...
- Publication number 20250004390
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Jeroen Johan Maarten VAN DE WIJDEVEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240385509
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

for microlithography

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of designing an alignment mark

Template, method for fabricating template, and method for fabricati...

Embedded high-z marker material and process for alignment of multil...

Height measurement method and height measurement system

Information processing apparatus and information processing method

Imprinting method, pre-processing apparatus, substrate for imprinti...

Metrology system for packaging applications

Semiconductor marks and forming methods thereof

Self-referencing integrated alignment sensor

Method and metrology tool for determining information about a targe...

Managing multi-objective alignments for imprinting

Method and apparatus for inspection and metrology

Supercontinuum radiation source and associated metrology devices

Imprint method, imprint apparatus, and article manufacturing method

3D semiconductor devices and structures with metal layers

Lithography measurement machine and operating method thereof

Metrology method and associated metrology and lithographic apparatuses

Metrology method and apparatus and computer program

Semiconductor device having integral alignment marks with decouplin...

Exposure control in photolithographic direct exposure methods for m...

Measurement device and measurement method, exposure apparatus and e...

Display device having magnetic alignment marks

System and method for aligned stitching

Imprint lithography

Imprint apparatus with movable stages

Offset alignment method and micro-lithographic printing device

Optical designs of miniaturized overlay measurement system

Measurement method, measurement apparatus, and mark

Method and apparatus to determine a patterning process parameter us...

Processing system, processing method, measurement apparatus, substr...

Patents Applicationslast 30 patents

MANAGING MULTI-OBJECTIVE ALIGNMENTS FOR IMPRINTING

3D SEMICONDUCTOR DEVICES AND STRUCTURES WITH METAL LAYERS

METHOD FOR FORMING SEMICONDUCTOR DIE

PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF

METHODS AND APPARATUSES FOR MICROFABRICATION AND LASER WRITING ALIG...

POSITION MEASURING METHOD, METHOD FOR MANUFACTURING ARTICLE, POSITI...

SYSTEMS AND METHODS FOR GENERATING MULTIPLE ILLUMINATION SPOTS FROM...

IMPRINT APPARATUS, IMPRINT METHOD, INFORMATION PROCESSING APPARATUS...

LITHOGRAPHY APPARATUS, STAGE APPARATUS, AND ARTICLE MANUFACTURING M...

DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND M...

MECHANICALLY CONTROLLED STRESS-ENGINEERED OPTICAL SYSTEMS AND METHODS

SEMICONDUCTOR DEVICE

WAFER ALIGNMENT SYSTEM AND WAFER ALIGNMENT METHOD

AN OPTICAL SYSTEM IMPLEMENTED IN A SYSTEM FOR FAST OPTICAL INSPECTI...

OVERLAY METROLOGY TARGET FOR DIE-TO-WAFER OVERLAY METROLOGY

SEMICONDUCTOR DEVICE INCLUDING AN ALIGNMENT MARK AND METHODS OF FOR...

ENHANCED ALIGNMENT FOR A PHOTOLITHOGRAPHIC APPARATUS

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

OVERLAY METROLOGY BASED ON TEMPLATE MATCHING WITH ADAPTIVE WEIGHTING

PROJECTION UNIT FOR A LEVEL SENSOR, METHOD OF MONITORING HEIGHT OF...

METHOD FOR DETERMINING A LOCATION OF AN OBJECT SURFACE

METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

COMPENSATING OPTICAL SYSTEM FOR NONUNIFORM SURFACES, A METROLOGY SY...

Imprint Apparatus with Movable Stages

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

SEMICONDUCTOR DEVICE HAVING INTEGRAL ALIGNMENT MARKS WITH DECOUPLIN...

A SENSOR POSITIONING METHOD, A POSITIONING SYSTEM, A LITHOGRAPHIC A...

LITHOGRAPHY SYSTEM AND METHODS