for the production of exposure masks or reticles

Industry

CPC
G03F7/2063

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2063for the production of exposure masks or reticles

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lithography exposure system with debris removing mechanism
- Patent number 12,001,143
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jung Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure machine and exposure method
- Patent number 11,852,976
- Issue date Dec 26, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Bin Zou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography exposure method with debris removing mechanism
- Patent number 11,754,928
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jung Hsu
- G02 - OPTICS
Information Patent Grant
Full-size mask assembly and manufacturing method thereof
- Patent number 11,674,215
- Issue date Jun 13, 2023
- KPS CO., LTD.
- Jung Ho Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Full-size mask assembly and manufacturing method thereof
- Patent number 11,668,001
- Issue date Jun 6, 2023
- KPS CO., LTD.
- Jung Ho Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implanting method and apparatus
- Patent number 11,340,530
- Issue date May 24, 2022
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Jong-Moo Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation method of mask assembly and mask assembly
- Patent number 11,319,625
- Issue date May 3, 2022
- Chengdu BOE Optoelectronics Technology Co., Ltd.
- Chang Luo
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photomask
- Patent number 11,221,559
- Issue date Jan 11, 2022
- Toppan Printing Co., Ltd.
- Akihito Okumura
- G02 - OPTICS
Information Patent Grant
Full-size mask assembly and manufacturing method thereof
- Patent number 11,136,663
- Issue date Oct 5, 2021
- KPS CO., LTD.
- Jung Ho Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Portion of layer removal at substrate edge
- Patent number 11,054,746
- Issue date Jul 6, 2021
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating semiconductor device, pattern writing appara...
- Patent number 10,884,336
- Issue date Jan 5, 2021
- NuFlare Technology, Inc.
- Takayuki Abe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, photo mask manufacturing method, and electr...
- Patent number 10,488,755
- Issue date Nov 26, 2019
- FUJIFILM Corporation
- Hidehiro Mochizuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Conductive composition, antistatic film, laminate and production th...
- Patent number 10,488,757
- Issue date Nov 26, 2019
- Mitsubishi Chemical Corporation
- Akira Yamazaki
- B32 - LAYERED PRODUCTS
Information Patent Grant
Electron beam irradiation apparatus and electron beam dynamic focus...
- Patent number 10,451,976
- Issue date Oct 22, 2019
- NuFlare Technology, Inc.
- Munehiro Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 10,431,422
- Issue date Oct 1, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus
- Patent number 10,338,477
- Issue date Jul 2, 2019
- Samsung Electronics Co., Ltd.
- Do Hyung Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dual exposure patterning of a photomask to print a contact, a via o...
- Patent number 9,927,698
- Issue date Mar 27, 2018
- GLOBALFOUNDRIES Inc.
- Jed H. Rankin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for dimensional uniformity using charged particle...
- Patent number 9,859,100
- Issue date Jan 2, 2018
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating reflective photomask
- Patent number 9,726,970
- Issue date Aug 8, 2017
- SK Hynix Inc.
- Choong Han Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,625,809
- Issue date Apr 18, 2017
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for design of enhanced edge slope patterns for ch...
- Patent number 9,612,530
- Issue date Apr 4, 2017
- D2S, Inc.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of electron-beam lithography with correction of corner round...
- Patent number 9,607,808
- Issue date Mar 28, 2017
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Serdar Manakli
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Temperature adjusting apparatus of mask substrate, mask drawing app...
- Patent number 9,599,911
- Issue date Mar 21, 2017
- NuFlare Technology, Inc.
- Hiroki Takeuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam exposure system and methods of performing exposing an...
- Patent number 9,588,415
- Issue date Mar 7, 2017
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for preparing a pattern to be printed on a plate...
- Patent number 9,542,505
- Issue date Jan 10, 2017
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Jerome Belledent
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for fabricating semiconductor device, pattern writing appara...
- Patent number 9,535,327
- Issue date Jan 3, 2017
- Nuflare Technology, Inc.
- Takayuki Abe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming patterns with charged particle beam l...
- Patent number 9,465,297
- Issue date Oct 11, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Generalization of shot definitions for mask and wafer writing tools
- Patent number 9,448,481
- Issue date Sep 20, 2016
- Mentor Graphics Corporation
- Emile Y. Sahouria
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Patterning method using electron beam and exposure system configure...
- Patent number 9,411,236
- Issue date Aug 9, 2016
- Samsung Electronics Co., Ltd.
- Yongseok Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for forming patterns using charged particle beam...
- Patent number 9,372,391
- Issue date Jun 21, 2016
- D2S, Inc.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE MASK AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE...
- Publication number 20230393482
- Publication date Dec 7, 2023
- SAMSUNG DISPLAY CO., LTD.
- SOOHONG CHEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...
- Publication number 20230367213
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...
- Publication number 20230185188
- Publication date Jun 15, 2023
- KIOXIA Corporation
- Yoshinori KAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MACHINE AND EXPOSURE METHOD
- Publication number 20230176483
- Publication date Jun 8, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Bin ZOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY EXPOSURE SYSTEM WITH DEBRIS REMOVING MECHANISM
- Publication number 20220382162
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jung HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK WITHIN A SCANNER
- Publication number 20220299882
- Publication date Sep 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yuru Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220035250
- Publication date Feb 3, 2022
- SAMSUNG DISPLAY CO., LTD.
- JEONGKUK KIM
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
FULL-SIZE MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF
- Publication number 20210388479
- Publication date Dec 16, 2021
- KPS CO., LTD.
- Jung Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULL-SIZE MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF
- Publication number 20210108304
- Publication date Apr 15, 2021
- KPS CO., LTD.
- Jung Ho KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LITHOGRAPHY EXPOSURE METHOD WITH DEBRIS REMOVING MECHANISM
- Publication number 20210063890
- Publication date Mar 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Jung HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK
- Publication number 20200341387
- Publication date Oct 29, 2020
- TOPPAN PRINTING CO., LTD.
- Akihito OKUMURA
- G02 - OPTICS
Information Patent Application
IMPLANTING METHOD AND APPARATUS
- Publication number 20200218156
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- JONG-MOO CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...
- Publication number 20180374675
- Publication date Dec 27, 2018
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM DYNAMIC FOCUS...
- Publication number 20180284620
- Publication date Oct 4, 2018
- NuFlare Technology, Inc.
- Munehiro OGASAWARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS
- Publication number 20180164694
- Publication date Jun 14, 2018
- Samsung Electronics Co., Ltd.
- Do Hyung KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20180108513
- Publication date Apr 19, 2018
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming Patterns Using Charged Particle Beam...
- Publication number 20170213698
- Publication date Jul 27, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...
- Publication number 20170023862
- Publication date Jan 26, 2017
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20160342090
- Publication date Nov 24, 2016
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Forming Patterns Using Charged Particle Beam...
- Publication number 20160299422
- Publication date Oct 13, 2016
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Design of Enhanced Edge Slope Patterns for Ch...
- Publication number 20150338737
- Publication date Nov 26, 2015
- D2S, INC.
- Akira Fujimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE ADJUSTING APPARATUS OF MASK SUBSTRATE, MASK DRAWING APP...
- Publication number 20140362353
- Publication date Dec 11, 2014
- NuFlare Technology, Inc.
- Hiroki TAKEUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...
- Publication number 20140359542
- Publication date Dec 4, 2014
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED...
- Publication number 20140353526
- Publication date Dec 4, 2014
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR ACQUIRING DO...
- Publication number 20140291553
- Publication date Oct 2, 2014
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR FORMING A DIAGONAL PATTERN USING CHARGED PART...
- Publication number 20140282304
- Publication date Sep 18, 2014
- D2S, INC.
- Etienne Jacques
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...
- Publication number 20140229904
- Publication date Aug 14, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
EXPOSURE APPARATUS FOR FORMING A RETICLE
- Publication number 20140218710
- Publication date Aug 7, 2014
- Samsung Electronics Co., Ltd.
- Jin CHOI
- B82 - NANO-TECHNOLOGY
Information Patent Application
NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSI...
- Publication number 20140178806
- Publication date Jun 26, 2014
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Forming Circular Patterns on a Surface
- Publication number 20140134523
- Publication date May 15, 2014
- D2S, INC.
- Akira Fujimura
- B82 - NANO-TECHNOLOGY

for the production of exposure masks or reticles

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithography exposure system with debris removing mechanism

Exposure machine and exposure method

Lithography exposure method with debris removing mechanism

Full-size mask assembly and manufacturing method thereof

Full-size mask assembly and manufacturing method thereof

Implanting method and apparatus

Preparation method of mask assembly and mask assembly

Photomask

Full-size mask assembly and manufacturing method thereof

Portion of layer removal at substrate edge

Method for fabricating semiconductor device, pattern writing appara...

Pattern forming method, photo mask manufacturing method, and electr...

Conductive composition, antistatic film, laminate and production th...

Electron beam irradiation apparatus and electron beam dynamic focus...

Method and system for dimensional uniformity using charged particle...

Lithography apparatus

Dual exposure patterning of a photomask to print a contact, a via o...

Method and system for dimensional uniformity using charged particle...

Method of fabricating reflective photomask

Method and system for forming patterns using charged particle beam...

Method and system for design of enhanced edge slope patterns for ch...

Method of electron-beam lithography with correction of corner round...

Temperature adjusting apparatus of mask substrate, mask drawing app...

Electron beam exposure system and methods of performing exposing an...

Method and system for preparing a pattern to be printed on a plate...

Method for fabricating semiconductor device, pattern writing appara...

Method and system for forming patterns with charged particle beam l...

Generalization of shot definitions for mask and wafer writing tools

Patterning method using electron beam and exposure system configure...

Method and system for forming patterns using charged particle beam...

Patents Applicationslast 30 patents

EXPOSURE MASK AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE...

MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...

DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...

EXPOSURE MACHINE AND EXPOSURE METHOD

LITHOGRAPHY EXPOSURE SYSTEM WITH DEBRIS REMOVING MECHANISM

SYSTEM AND METHOD FOR CLEANING AN EUV MASK WITHIN A SCANNER

MASK AND METHOD OF MANUFACTURING THE SAME

FULL-SIZE MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF

FULL-SIZE MASK ASSEMBLY AND MANUFACTURING METHOD THEREOF

LITHOGRAPHY EXPOSURE METHOD WITH DEBRIS REMOVING MECHANISM

PHOTOMASK

IMPLANTING METHOD AND APPARATUS

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM...

ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM DYNAMIC FOCUS...

LITHOGRAPHY APPARATUS

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

Method and System for Forming Patterns Using Charged Particle Beam...

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

Method and System for Forming Patterns Using Charged Particle Beam...

Method and System for Design of Enhanced Edge Slope Patterns for Ch...

TEMPERATURE ADJUSTING APPARATUS OF MASK SUBSTRATE, MASK DRAWING APP...

METHOD AND SYSTEM FOR DIMENSIONAL UNIFORMITY USING CHARGED PARTICLE...

METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED...

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD FOR ACQUIRING DO...

METHOD AND SYSTEM FOR FORMING A DIAGONAL PATTERN USING CHARGED PART...

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM L...

EXPOSURE APPARATUS FOR FORMING A RETICLE

NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSI...

Method for Forming Circular Patterns on a Surface