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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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Patents Grantslast 30 patents

Information Patent Grant
Methods to reduce microbridge defects in EUV patterning for microel...
- Patent number 11,615,958
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and process for stochastic driven detectivity healing
- Patent number 11,163,236
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor structure
- Patent number 11,086,222
- Issue date Aug 10, 2021
- NANYA TECHNOLOGY CORPORATION
- Shing-Yih Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact modeling for the negative tone development processes
- Patent number 10,852,635
- Issue date Dec 1, 2020
- Synopsys, Inc.
- Chun-Chieh Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bias correction for lithography
- Patent number 10,725,383
- Issue date Jul 28, 2020
- D25, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bias correction for lithography
- Patent number 10,444,629
- Issue date Oct 15, 2019
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for forming mask pattern, thin film transistor and method fo...
- Patent number 10,236,361
- Issue date Mar 19, 2019
- BOE Technology Group Co., Ltd.
- Bin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and apparatus
- Patent number 10,175,586
- Issue date Jan 8, 2019
- ASML Netherlands B.V.
- Jaqueline Borges Nicolau
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-layer substrate, preparation method thereof and display device
- Patent number 10,101,661
- Issue date Oct 16, 2018
- Beijing BOE Optoelectronics Technology Co., Ltd
- Jian Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic method and apparatus
- Patent number 9,817,320
- Issue date Nov 14, 2017
- ASML Netherlands B.V.
- Jaqueline Borges Nicolau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming pattern
- Patent number 9,459,535
- Issue date Oct 4, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double-mask photolithography method minimizing the impact of substr...
- Patent number 9,116,433
- Issue date Aug 25, 2015
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Cyril Vannuffel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 8,928,858
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ink jet recording head and method of producing ink jet recording head
- Patent number 8,622,516
- Issue date Jan 7, 2014
- Canon Kabushiki Kaisha
- Yohei Hamade
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Exposure method and exposure mask
- Patent number 8,603,707
- Issue date Dec 10, 2013
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Planarizing method
- Patent number 7,862,737
- Issue date Jan 4, 2011
- TDK Corporation
- Akifumi Kamijima
- G11 - INFORMATION STORAGE
Information Patent Grant
Apparatus and method for exposing edge of substrate
- Patent number 7,859,642
- Issue date Dec 28, 2010
- LG Display Co., Ltd.
- Jong Ho Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing method, manufacturing method of semiconductor device, an...
- Patent number 7,727,853
- Issue date Jun 1, 2010
- Kabushiki Kaisha Toshiba
- Tomoyuki Takeishi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiple exposure lithography technique and method
- Patent number 7,691,549
- Issue date Apr 6, 2010
- KLA-Tencor Technologies Corporation
- Lance A. Glasser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Edge exposure apparatus, coating and developing apparatus, and edge...
- Patent number 7,573,054
- Issue date Aug 11, 2009
- Tokyo Electron Limited
- Yasuharu Iwashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing method, manufacturing method of semiconductor device, an...
- Patent number 7,288,466
- Issue date Oct 30, 2007
- Kabushiki Kaisha Toshiba
- Tomoyuki Takeishi
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for manipulating the topography of a film surface
- Patent number 7,279,267
- Issue date Oct 9, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsai-Sheng Gau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full sized scattering bar alt-PSM technique for IC manufacturing in...
- Patent number 7,131,102
- Issue date Oct 31, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Ming Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full sized scattering bar alt-PSM technique for IC manufacturing in...
- Patent number 7,036,108
- Issue date Apr 25, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Ming Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full sized scattering bar alt-PSM technique for IC manufacturing in...
- Patent number 7,013,453
- Issue date Mar 14, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Ming Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a peripheral area of a wafer and apparatus for...
- Patent number 6,924,072
- Issue date Aug 2, 2005
- Samsung Electronics Co., Ltd.
- Hyung-Sik Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist edge correction
- Patent number 6,872,513
- Issue date Mar 29, 2005
- Intel Corporation
- Robert P. Meagley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure process and exposure device
- Patent number 6,864,954
- Issue date Mar 8, 2005
- Ushiodenki Kabushiki Kaisha
- Shinji Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a photomask and corresponding photomask
- Patent number 6,835,506
- Issue date Dec 28, 2004
- Infineon Technologies AG
- Uwe Griesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...
- Publication number 20240419074
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Michael Murphy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD...
- Publication number 20240288768
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...
- Publication number 20240272552
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- GABRIELA ALVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20230400763
- Publication date Dec 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM N...
- Publication number 20230307214
- Publication date Sep 28, 2023
- Korea Institute of Science and Technology
- Ho Joong JUNG
- B08 - CLEANING
Information Patent Application
FLOW CELLS AND METHODS FOR MAKING THE SAME
- Publication number 20230259034
- Publication date Aug 17, 2023
- ILLUMINA, INC.
- Jeffrey S. Fisher
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Anisotropic Pattern Transfer Via Colloidal Lithography
- Publication number 20230185198
- Publication date Jun 15, 2023
- The Trustees of the University of Pennsylvania
- Cherie R Kagan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MET...
- Publication number 20230043696
- Publication date Feb 9, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Jie Du
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY PATTERNING WITH ASSIST FEATURES
- Publication number 20220413376
- Publication date Dec 29, 2022
- Intel Corporation
- Leonard Guler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20220334472
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng Hung TSAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Production of Three-Dimensional Structures by Means of Photoresists
- Publication number 20210341835
- Publication date Nov 4, 2021
- Laser Imaging Systems GmbH
- Jens THEIS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO REDUCE MICROBRIDGE DEFECTS IN EUV PATTERNING FOR MICROEL...
- Publication number 20210305048
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Akiteru Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210278767
- Publication date Sep 9, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masayoshi UENO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method and Process for Stochastic Driven Defectivity Healing
- Publication number 20210048749
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200341380
- Publication date Oct 29, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, METHOD FOR CONTROLLING THE SAME AND ARTICLE MAN...
- Publication number 20200218162
- Publication date Jul 9, 2020
- Canon Kabushiki Kaisha
- Akihisa Kaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20200168457
- Publication date May 28, 2020
- NANYA TECHNOLOGY CORPORATION
- Shing-Yih SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER DISTORTION MEASUREMENT AND OVERLAY CORRECTION
- Publication number 20200018709
- Publication date Jan 16, 2020
- GLOBALFOUNDRIES INC.
- Erik R. Hosler
- G01 - MEASURING TESTING
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200012195
- Publication date Jan 9, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE MICROTE...
- Publication number 20190187567
- Publication date Jun 20, 2019
- H.E.F.
- Maxime BICHOTTE
- B82 - NANO-TECHNOLOGY
Information Patent Application
COMPACT MODELING FOR THE NEGATIVE TONE DEVELOPMENT PROCESSES
- Publication number 20190072847
- Publication date Mar 7, 2019
- Synopsys, Inc.
- Chun-Chieh Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20180039180
- Publication date Feb 8, 2018
- ASML NETHERLANDS B.V.
- Jaqueline BORGES NICOLAU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20170371246
- Publication date Dec 28, 2017
- D2S, INC.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithographic Method and Apparatus
- Publication number 20160274462
- Publication date Sep 22, 2016
- ASML NETHERLANDS B.V.
- Jaqueline BORGES NICOLAU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MULTI-LAYER SUBSTRATE, PREPARATION METHOD THEREOF AND DISPLAY DEVICE
- Publication number 20150277227
- Publication date Oct 1, 2015
- BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Jian Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Blade for Substrate Edge Protection During Photolithography
- Publication number 20150234281
- Publication date Aug 20, 2015
- Rudolph Technologies, Inc.
- Steven D. Gardner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOUBLE-MASK PHOTOLITHOGRAPHY METHOD MINIMIZING THE IMPACT OF SUBSTR...
- Publication number 20140242522
- Publication date Aug 28, 2014
- Cyril VANNUFFEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FORMING PATTERN
- Publication number 20130209941
- Publication date Aug 15, 2013
- TOKYO ELECTRON LIMITED
- Naoto Motoike
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND EXPOSURE MASK
- Publication number 20130059234
- Publication date Mar 7, 2013
- Takashi KAMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INK JET RECORDING HEAD AND METHOD OF PRODUCING INK JET RECORDING HEAD
- Publication number 20120086750
- Publication date Apr 12, 2012
- Canon Kabushiki Kaisha
- Yohei Hamade
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

for the removal of unwanted material

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods to reduce microbridge defects in EUV patterning for microel...

Method and process for stochastic driven detectivity healing

Bias correction for lithography

Method of manufacturing semiconductor structure

Compact modeling for the negative tone development processes

Bias correction for lithography

Bias correction for lithography

Method for forming mask pattern, thin film transistor and method fo...

Lithographic method and apparatus

Multi-layer substrate, preparation method thereof and display device

Lithographic method and apparatus

Method of forming pattern

Double-mask photolithography method minimizing the impact of substr...

Projection exposure apparatus with optimized adjustment possibility

Ink jet recording head and method of producing ink jet recording head

Exposure method and exposure mask

Planarizing method

Apparatus and method for exposing edge of substrate

Processing method, manufacturing method of semiconductor device, an...

Multiple exposure lithography technique and method

Edge exposure apparatus, coating and developing apparatus, and edge...

Processing method, manufacturing method of semiconductor device, an...

Method for manipulating the topography of a film surface

Full sized scattering bar alt-PSM technique for IC manufacturing in...

Full sized scattering bar alt-PSM technique for IC manufacturing in...

Full sized scattering bar alt-PSM technique for IC manufacturing in...

Method for exposing a peripheral area of a wafer and apparatus for...

Photoresist edge correction

Exposure process and exposure device

Method for producing a photomask and corresponding photomask

Patents Applicationslast 30 patents

FORMATION OF SUB-LITHOGRAPHIC MANDREL PATTERNS USING REVERSIBLE OVE...

PHOTORESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD...

PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...

LITHOGRAPHY SYSTEM AND METHODS

METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM N...

FLOW CELLS AND METHODS FOR MAKING THE SAME

Anisotropic Pattern Transfer Via Colloidal Lithography

METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MET...

EXTREME ULTRAVIOLET LITHOGRAPHY PATTERNING WITH ASSIST FEATURES

LITHOGRAPHY SYSTEM AND METHODS

Production of Three-Dimensional Structures by Means of Photoresists

METHODS TO REDUCE MICROBRIDGE DEFECTS IN EUV PATTERNING FOR MICROEL...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

Method and Process for Stochastic Driven Defectivity Healing

BIAS CORRECTION FOR LITHOGRAPHY

EXPOSURE APPARATUS, METHOD FOR CONTROLLING THE SAME AND ARTICLE MAN...

METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE

WAFER DISTORTION MEASUREMENT AND OVERLAY CORRECTION

BIAS CORRECTION FOR LITHOGRAPHY

SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE MICROTE...

COMPACT MODELING FOR THE NEGATIVE TONE DEVELOPMENT PROCESSES

Lithographic Method and Apparatus

BIAS CORRECTION FOR LITHOGRAPHY

Lithographic Method and Apparatus

MULTI-LAYER SUBSTRATE, PREPARATION METHOD THEREOF AND DISPLAY DEVICE

Blade for Substrate Edge Protection During Photolithography

DOUBLE-MASK PHOTOLITHOGRAPHY METHOD MINIMIZING THE IMPACT OF SUBSTR...

METHOD OF FORMING PATTERN

EXPOSURE METHOD AND EXPOSURE MASK

INK JET RECORDING HEAD AND METHOD OF PRODUCING INK JET RECORDING HEAD