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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/285from a gas or vapour

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming a barrier layer in an interconnect structure of s...
- Patent number 12,266,567
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bo-Jhih Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with source/drain contact formed using bottom-...
- Patent number 12,266,688
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sung-Li Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned contacts
- Patent number 12,266,571
- Issue date Apr 1, 2025
- Intel Corporation
- Mark T. Bohr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 12,261,038
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Field stop IGBT with grown injection region
- Patent number 12,262,553
- Issue date Mar 25, 2025
- iPower Semiconductor
- Hamza Yilmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and stage cleaning method
- Patent number 12,261,060
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Tsutomu Hiroki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aluminum-based gallium nitride integrated circuits
- Patent number 12,261,134
- Issue date Mar 25, 2025
- Analog Devices, Inc.
- Daniel Piedra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition for uniform tungsten growth
- Patent number 12,252,783
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pin-Wen Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming thin film
- Patent number 12,252,788
- Issue date Mar 18, 2025
- Soulbrain Co., Ltd.
- Changbong Yeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Trench contact structures for advanced integrated circuit structure...
- Patent number 12,255,247
- Issue date Mar 18, 2025
- Intel Corporation
- Subhash M. Joshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 12,255,070
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Min-Hsuan Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device including epitaxial region
- Patent number 12,249,505
- Issue date Mar 11, 2025
- Samsung Electronics Co., Ltd.
- Gyeom Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with air gap in pattern- dense region and m...
- Patent number 12,249,512
- Issue date Mar 11, 2025
- NANYA TECHNOLOGY CORPORATION
- Jar-Ming Ho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a grid
- Patent number 12,249,630
- Issue date Mar 11, 2025
- II-VI DELAWARE, INC.
- Adolf Schöner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon phosphide semiconductor device
- Patent number 12,243,784
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ching Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having nickel oxide film on gate electrode
- Patent number 12,243,927
- Issue date Mar 4, 2025
- Sumitomo Electric Device Innovations, Inc.
- Tomohiro Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
P-GaN high electron mobility transistor (HEMT) with MOS2-based 2D b...
- Patent number 12,243,928
- Issue date Mar 4, 2025
- IMAM MOHAMMAD IBN SAUD ISLAMIC UNIVERSITY
- Ghada A. Khouqeer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial source/drain recess formation with metal-comprising maski...
- Patent number 12,243,783
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hui-Lin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Producing an ohmic contact and electronic component with ohmic contact
- Patent number 12,243,917
- Issue date Mar 4, 2025
- Forschungszentrum Julich GmbH
- Alexander Pawlis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having improved electrostatic discharge protec...
- Patent number 12,237,323
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Fu Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Titanium aluminum and tantalum aluminum thin films
- Patent number 12,237,392
- Issue date Feb 25, 2025
- ASM IP Holding B.V.
- Suvi Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital pen with enhanced educational and therapeutic feedback
- Patent number 12,233,661
- Issue date Feb 25, 2025
- Lauren Michelle Neubauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having fin structure
- Patent number 12,237,322
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shun-Li Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor dep...
- Patent number 12,237,170
- Issue date Feb 25, 2025
- Entegris, Inc.
- Sangbum Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming vanadium nitride layer and structure including th...
- Patent number 12,237,171
- Issue date Feb 25, 2025
- ASM IP Holding B.V.
- Giuseppe Alessio Verni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nucleation-free tungsten deposition
- Patent number 12,237,221
- Issue date Feb 25, 2025
- Lam Research Corporation
- Sema Ermez
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium film forming method and substrate processing system
- Patent number 12,227,841
- Issue date Feb 18, 2025
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Word line structure of three-dimensional memory device
- Patent number 12,232,320
- Issue date Feb 18, 2025
- Yangtze Memory Technologies Co., Ltd.
- Qiang Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional semiconductor memory devices
- Patent number 12,232,323
- Issue date Feb 18, 2025
- Samsung Electronics Co., Ltd.
- Euntaek Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 12,230,509
- Issue date Feb 18, 2025
- United Microelectronics Corp.
- Ming Thai Chai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ARTICLES COATED WITH CRACK-RESISTANT FLUORO-ANNEALED FILMS AND METH...
- Publication number 20250109483
- Publication date Apr 3, 2025
- Entegris, Inc.
- Nilesh Gunda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Forming A Metal Liner For Interconnect Structures
- Publication number 20250112090
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Ge Qu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT ENABLING SUPER-CONFORMAL METAL CAP PROFILE ON MID...
- Publication number 20250112091
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Jianqiu GUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20250107184
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Yen CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH ANNULAR SEMICONDUCTOR FIN AND METHOD FOR...
- Publication number 20250107224
- Publication date Mar 27, 2025
- NANYA TECHNOLOGY CORPORATION
- Te-Yin CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTIVITY METAL STACKS AND METHODS OF DEPOSITING THE SAME
- Publication number 20250105013
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Zhaoxuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
- Publication number 20250107210
- Publication date Mar 27, 2025
- Kabushiki Kaisha Toshiba
- Kanako Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SEMICONDUCTOR PROCESSING
- Publication number 20250105002
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Hunter Frost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE WITH ANNULAR SEMICONDUCTOR FIN AND METHOD FOR...
- Publication number 20250107223
- Publication date Mar 27, 2025
- NANYA TECHNOLOGY CORPORATION
- Te-Yin CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES
- Publication number 20250107150
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Daesik KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW RESISTANCE INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE
- Publication number 20250105147
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jason HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250107144
- Publication date Mar 27, 2025
- Infineon Technologies Austria AG
- Thomas Martin Feil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250095996
- Publication date Mar 20, 2025
- Fuji Electric Co., Ltd.
- Takeyoshi Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A GATE TERMINAL OF A HEMT DEVICE, AND HEMT...
- Publication number 20250095998
- Publication date Mar 20, 2025
- STMicroelectronics S.r.l.
- Ferdinando IUCOLANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM LATERAL EXPANSION OF CONTACT PLUGS THROUGH IMPLANTATION
- Publication number 20250096041
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Meng-Han Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MITIGATING PROXIMITY EFFECTS OF DEEP TRENCH VIAS
- Publication number 20250098249
- Publication date Mar 20, 2025
- Intel Corporation
- Avijit Barik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20250096038
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Gulbagh SINGH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCT...
- Publication number 20250098258
- Publication date Mar 20, 2025
- Intel Corporation
- Andrew W. YEOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME
- Publication number 20250092508
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-REGION DIFFUSION BARRIER CONTAINING TITANIUM, SILICON AND NIT...
- Publication number 20250087534
- Publication date Mar 13, 2025
- EUGENUS, INC.
- Vinayak Veer Vats
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL-INSULATOR-METAL (MIM) CAPACITORS WITH IMPROVED RELIABILITY
- Publication number 20250089277
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Yueh Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT RESISTANCE REDUCTION FOR TRANSISTORS
- Publication number 20250087491
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Ping Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20250089297
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- JEEWOONG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20250089340
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jet-Rung Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250081533
- Publication date Mar 6, 2025
- INNOSCIENCE (SUZHOU) SEMICONDUCTOR CO., LTD.
- Jianfa ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE ISOLATION OF CONTACT AND SOURCE/DRAIN STRUCTURES
- Publication number 20250072049
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Szu-Chien WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF
- Publication number 20250072075
- Publication date Feb 27, 2025
- UNITED MICROELECTRONICS CORP.
- Da-Jun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISPLAY DEVICE, METHOD OF MANUFACTURING DISPLAY DEVICE, AND ELECTRO...
- Publication number 20250072214
- Publication date Feb 27, 2025
- SONY GROUP CORPORATION
- Hitoshi Tsuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TERMINAL STRUCTURE WITH OPTIMIZED RELIABILITY FOR POWER DEVICE, PRE...
- Publication number 20250072095
- Publication date Feb 27, 2025
- Huahong ZealCore Electronics Technology Co.,Ltd
- Yimin WAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...
- Publication number 20250072078
- Publication date Feb 27, 2025
- Intel Corporation
- Andrew W. YEOH
- H01 - BASIC ELECTRIC ELEMENTS

from a gas or vapour

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of forming a barrier layer in an interconnect structure of s...

Semiconductor device with source/drain contact formed using bottom-...

Self-aligned contacts

Gapfill of variable aspect ratio features with a composite PEALD an...

Field stop IGBT with grown injection region

Substrate processing apparatus and stage cleaning method

Aluminum-based gallium nitride integrated circuits

Chemical vapor deposition for uniform tungsten growth

Method for forming thin film

Trench contact structures for advanced integrated circuit structure...

Semiconductor devices and methods of manufacturing

Semiconductor device including epitaxial region

Semiconductor structure with air gap in pattern- dense region and m...

Method for manufacturing a grid

Silicon phosphide semiconductor device

Semiconductor device having nickel oxide film on gate electrode

P-GaN high electron mobility transistor (HEMT) with MOS2-based 2D b...

Epitaxial source/drain recess formation with metal-comprising maski...

Producing an ohmic contact and electronic component with ohmic contact

Semiconductor device having improved electrostatic discharge protec...

Titanium aluminum and tantalum aluminum thin films

Digital pen with enhanced educational and therapeutic feedback

Semiconductor device having fin structure

Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor dep...

Method of forming vanadium nitride layer and structure including th...

Nucleation-free tungsten deposition

Ruthenium film forming method and substrate processing system

Word line structure of three-dimensional memory device

Three-dimensional semiconductor memory devices

Method for fabricating semiconductor device

Patents Applicationslast 30 patents

ARTICLES COATED WITH CRACK-RESISTANT FLUORO-ANNEALED FILMS AND METH...

Method Of Forming A Metal Liner For Interconnect Structures

SURFACE TREATMENT ENABLING SUPER-CONFORMAL METAL CAP PROFILE ON MID...

SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

SEMICONDUCTOR DEVICE WITH ANNULAR SEMICONDUCTOR FIN AND METHOD FOR...

LOW RESISTIVITY METAL STACKS AND METHODS OF DEPOSITING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

METHOD FOR SEMICONDUCTOR PROCESSING

SEMICONDUCTOR DEVICE WITH ANNULAR SEMICONDUCTOR FIN AND METHOD FOR...

SEMICONDUCTOR DEVICES

LOW RESISTANCE INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING A GATE TERMINAL OF A HEMT DEVICE, AND HEMT...

BOTTOM LATERAL EXPANSION OF CONTACT PLUGS THROUGH IMPLANTATION

MITIGATING PROXIMITY EFFECTS OF DEEP TRENCH VIAS

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCT...

PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME

MULTI-REGION DIFFUSION BARRIER CONTAINING TITANIUM, SILICON AND NIT...

METAL-INSULATOR-METAL (MIM) CAPACITORS WITH IMPROVED RELIABILITY

CONTACT RESISTANCE REDUCTION FOR TRANSISTORS

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICE ISOLATION OF CONTACT AND SOURCE/DRAIN STRUCTURES

COMPOUND SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF

DISPLAY DEVICE, METHOD OF MANUFACTURING DISPLAY DEVICE, AND ELECTRO...

TERMINAL STRUCTURE WITH OPTIMIZED RELIABILITY FOR POWER DEVICE, PRE...

HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCU...