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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/285from a gas or vapour

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Patents Grantslast 30 patents

Information Patent Grant
Optimized saddle nozzle design for gas injection system
- Patent number 12,368,019
- Issue date Jul 22, 2025
- Applied Materials Israel Ltd.
- Yehuda Zur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Epitaxial layers in source/drain contacts and methods of forming th...
- Patent number 12,369,386
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ding-Kang Shih
- C30 - CRYSTAL GROWTH
Information Patent Grant
Systems and methods for fabrication of superconducting integrated c...
- Patent number 12,369,501
- Issue date Jul 22, 2025
- 1372934 B.C. LTD
- Eric Ladizinsky
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Cap structure coupled to source to reduce saturation current in HEM...
- Patent number 12,363,938
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Cheng Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing a Group IV semiconductor and related semicond...
- Patent number 12,363,960
- Issue date Jul 15, 2025
- ASM IP Holding B.V.
- Joe Margetis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group VI metal deposition process
- Patent number 12,359,309
- Issue date Jul 15, 2025
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 12,362,280
- Issue date Jul 15, 2025
- Renesas Electronics Corporation
- Takeshi Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inner spacer features for multi-gate transistors
- Patent number 12,363,988
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Han Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Schottky barrier diode with reduced leakage current and method of f...
- Patent number 12,363,925
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Meng-Han Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,363,992
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Kan Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a uniform and thin silicide layer on an...
- Patent number 12,362,187
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Hsuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preventing line bending during metal fill process
- Patent number 12,362,188
- Issue date Jul 15, 2025
- Lam Research Corporation
- Adam Jandl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of calculating thickness of graphene layer and method of mea...
- Patent number 12,359,911
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Eunkyu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming source/drain regions with quadrilateral layers
- Patent number 12,363,945
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsz-Mei Kwok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field effect transistor with contact via structures that are latera...
- Patent number 12,356,704
- Issue date Jul 8, 2025
- SanDisk Technologies, Inc.
- Kouta Onogi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing metal-insulator-metal (MIM) capacitors with...
- Patent number 12,356,641
- Issue date Jul 8, 2025
- ASM IP Holding B.V.
- Alessandra Leonhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of films using molybdenum precursors
- Patent number 12,351,914
- Issue date Jul 8, 2025
- Lam Research Corporation
- Joshua Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate structure passivating species drive-in method and structure fo...
- Patent number 12,354,876
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High mobility transistor with algan buffer layer
- Patent number 12,356,670
- Issue date Jul 8, 2025
- IMAM MOHAMMAD IBN SAUD ISLAMIC UNIVERSITY
- Ghada A. Khouqeer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor deposition of films comprising molybdenum
- Patent number 12,354,877
- Issue date Jul 8, 2025
- ASM IP Holding B.V.
- Bhushan Zope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for controlling contact resistance in cobalt-titanium struc...
- Patent number 12,347,695
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Takashi Kuratomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated circuit device
- Patent number 12,349,373
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Kyooho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench plug hardmask for advanced integrated circuit structure fabr...
- Patent number 12,349,450
- Issue date Jul 1, 2025
- Intel Corporation
- Anthony St. Amour
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact resistance reduction in transistor devices with metallizati...
- Patent number 12,342,574
- Issue date Jun 24, 2025
- Intel Corporation
- Koustav Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,342,580
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number RE50471
- Issue date Jun 24, 2025
- Kabushiki Kaisha Toshiba
- Daimotsu Kato
Information Patent Grant
Semiconductor device structure and methods of forming the same
- Patent number 12,342,616
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device with liner structure
- Patent number 12,341,062
- Issue date Jun 24, 2025
- NANYA TECHNOLOGY CORPORATION
- Tse-Yao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 12,342,615
- Issue date Jun 24, 2025
- Sony Group Corporation
- Shinya Yamakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field effect transistor with shallow trench isolation features with...
- Patent number 12,336,285
- Issue date Jun 17, 2025
- GLOBALFOUNDRIES U.S. Inc.
- Anthony K. Stamper
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELF-ALIGNED CONTACTS
- Publication number 20250239486
- Publication date Jul 24, 2025
- Intel Corporation
- Mark T. BOHR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF OPERATING A SPATIAL DEPOSITION TOOL
- Publication number 20250239479
- Publication date Jul 24, 2025
- Applied Materials, Inc.
- Joseph AuBuchon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIPOLAR JUNCTION TRANSISTOR DEVICE AND FABRICATION METHOD THEREOF
- Publication number 20250240990
- Publication date Jul 24, 2025
- UNITED MICROELECTRONICS CORP.
- Hsin-Han Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE RESISTANCE IMPROVEMENT AND METHOD THEREOF
- Publication number 20250241001
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Li Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEDMOS Transistor Devices
- Publication number 20250241007
- Publication date Jul 24, 2025
- pSemi Corporation
- Jagar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Different Via Configurations for Different Via Interface Requirements
- Publication number 20250239527
- Publication date Jul 24, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Shih-Che Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER STRUCTURE INCLUDING SILICIDE LAYER, METHOD OF MANUFACTURING T...
- Publication number 20250234628
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Woonghyeon PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FI...
- Publication number 20250230544
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Contact Structures in Semiconductor Devices
- Publication number 20250234602
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD FOR PREVENTING SILICIDE CONTAMINATION DURING T...
- Publication number 20250234542
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Meng-Han LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF METAL-CONTAINING FILMS AND CHAMBER CLEAN
- Publication number 20250226227
- Publication date Jul 10, 2025
- LAM RESEARCH CORPORATION
- Dustin Zachary Austin
- B08 - CLEANING
Information Patent Application
CONTACT RESISTANCE REDUCTION IN TRANSISTOR DEVICES WITH METALLIZATI...
- Publication number 20250227956
- Publication date Jul 10, 2025
- Intel Corporation
- Koustav GANGULY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226228
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuaki IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250218782
- Publication date Jul 3, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- Eunhyoung CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250218784
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Arito OGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD, SYSTEM AND APPARATUS FOR FORMING A THRESHOLD VOLTAGE SHIFTI...
- Publication number 20250218783
- Publication date Jul 3, 2025
- ASM IP HOLDING B.V.
- Giuseppe Alessio Verni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250215563
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Takashi YOKOGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL PHOSPHIDE DEPOSITION VIA PHOSPHASILANE REACTANTS AND RELATED...
- Publication number 20250207254
- Publication date Jun 26, 2025
- Intel Corporation
- Scott Peter Semproni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR D...
- Publication number 20250210359
- Publication date Jun 26, 2025
- Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
- Frank DIETZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITOR ELECTRODE FORMING METHOD
- Publication number 20250210358
- Publication date Jun 26, 2025
- Jusung Engineering Co., Ltd.
- Jeong Soo JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250207250
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Tsutomu HIROKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON COMPATIBLE HIGH TEMPERATURE GALLIUM NITRIDE PROCESS
- Publication number 20250212462
- Publication date Jun 26, 2025
- Analog Devices, Inc.
- James G. Fiorenza
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH SOURCE/DRAIN CONTACT FORMED USING BOTTOM-...
- Publication number 20250203976
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sung-Li WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20250203996
- Publication date Jun 19, 2025
- RENESAS ELECTRONICS CORPORATION
- Yukio MAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250203995
- Publication date Jun 19, 2025
- RENESAS ELECTRONICS CORPORATION
- Tomoki AYANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250204011
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Seongdong Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPLEMENTARY FIELD EFFECT TRANSISTOR AND RELATED METHODS
- Publication number 20250204037
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsien-Chih HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...
- Publication number 20250194201
- Publication date Jun 12, 2025
- Intel Corporation
- Subhash M. JOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for depositing transition metal carbide
- Publication number 20250188602
- Publication date Jun 12, 2025
- ASM IP HOLDING B.V.
- Paloma Ruiz Y Kärkkäinen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION FOR UNIFORM TUNGSTEN GROWTH
- Publication number 20250188601
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pin-Wen CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

from a gas or vapour

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Optimized saddle nozzle design for gas injection system

Epitaxial layers in source/drain contacts and methods of forming th...

Systems and methods for fabrication of superconducting integrated c...

Cap structure coupled to source to reduce saturation current in HEM...

Method for depositing a Group IV semiconductor and related semicond...

Group VI metal deposition process

Semiconductor device and method of manufacturing the same

Inner spacer features for multi-gate transistors

Schottky barrier diode with reduced leakage current and method of f...

Semiconductor device and manufacturing method thereof

Semiconductor device having a uniform and thin silicide layer on an...

Method for preventing line bending during metal fill process

Method of calculating thickness of graphene layer and method of mea...

Method of forming source/drain regions with quadrilateral layers

Field effect transistor with contact via structures that are latera...

Method of manufacturing metal-insulator-metal (MIM) capacitors with...

Deposition of films using molybdenum precursors

Gate structure passivating species drive-in method and structure fo...

High mobility transistor with algan buffer layer

Vapor deposition of films comprising molybdenum

Methods for controlling contact resistance in cobalt-titanium struc...

Integrated circuit device

Trench plug hardmask for advanced integrated circuit structure fabr...

Contact resistance reduction in transistor devices with metallizati...

Method of manufacturing a semiconductor device and a semiconductor...

Semiconductor device and method for manufacturing the same

Semiconductor device structure and methods of forming the same

Method for fabricating semiconductor device with liner structure

Semiconductor device and method of manufacturing the same

Field effect transistor with shallow trench isolation features with...

Patents Applicationslast 30 patents

SELF-ALIGNED CONTACTS

METHODS OF OPERATING A SPATIAL DEPOSITION TOOL

BIPOLAR JUNCTION TRANSISTOR DEVICE AND FABRICATION METHOD THEREOF

GATE RESISTANCE IMPROVEMENT AND METHOD THEREOF

PEDMOS Transistor Devices

Different Via Configurations for Different Via Interface Requirements

LAYER STRUCTURE INCLUDING SILICIDE LAYER, METHOD OF MANUFACTURING T...

DIETHYL ZINC AND METAL HALIDE PRECURSORS FOR DEPOSITION OF METAL FI...

Contact Structures in Semiconductor Devices

STRUCTURE AND METHOD FOR PREVENTING SILICIDE CONTAMINATION DURING T...

DEPOSITION OF METAL-CONTAINING FILMS AND CHAMBER CLEAN

CONTACT RESISTANCE REDUCTION IN TRANSISTOR DEVICES WITH METALLIZATI...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

METHOD, SYSTEM AND APPARATUS FOR FORMING A THRESHOLD VOLTAGE SHIFTI...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METAL PHOSPHIDE DEPOSITION VIA PHOSPHASILANE REACTANTS AND RELATED...

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR D...

CAPACITOR ELECTRODE FORMING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SILICON COMPATIBLE HIGH TEMPERATURE GALLIUM NITRIDE PROCESS

SEMICONDUCTOR DEVICE WITH SOURCE/DRAIN CONTACT FORMED USING BOTTOM-...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURING THE SAME

COMPLEMENTARY FIELD EFFECT TRANSISTOR AND RELATED METHODS

TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE...

Method and system for depositing transition metal carbide

CHEMICAL VAPOR DEPOSITION FOR UNIFORM TUNGSTEN GROWTH