from a wafer supported on a rotating chuck

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CPC
G03F7/3021

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/3021from a wafer supported on a rotating chuck

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Lithography process and material for negative tone development
- Patent number 12,189,296
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Wei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 12,165,866
- Issue date Dec 10, 2024
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, micropattern forming method, and subst...
- Patent number 12,057,323
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Sangjine Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating drippage prevention system
- Patent number 12,048,944
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Hung Wang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Nozzle, substrate processing apparatus, and substrate processing me...
- Patent number 12,007,692
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Hiroki Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing treatment method and developing treatment apparatus
- Patent number 11,960,209
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Akiko Kai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nozzle apparatus, apparatus and method for treating substrate
- Patent number 11,845,090
- Issue date Dec 19, 2023
- Semes Co., Ltd.
- Chang Suk Oh
- B08 - CLEANING
Information Patent Grant
Method and apparatus to develop lithographically defined high aspec...
- Patent number 11,822,249
- Issue date Nov 21, 2023
- Intel Corporation
- Pooya Tadayon
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Spin dispenser module substrate surface protection system
- Patent number 11,806,743
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Company
- Ching-Hai Yang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,630,392
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Tsunenaga Nakashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developer critical dimension control with pulse development
- Patent number 11,543,793
- Issue date Jan 3, 2023
- International Business Machines Corporation
- Richard C. Johnson
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,453,734
- Issue date Sep 27, 2022
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical supply structure and a developing apparatus having the same
- Patent number 11,415,889
- Issue date Aug 16, 2022
- Samsung Electronics Co., Ltd.
- Jong-Keun Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spin dispenser module substrate surface protection system
- Patent number 11,344,910
- Issue date May 31, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Hai Yang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Implanting method and apparatus
- Patent number 11,340,530
- Issue date May 24, 2022
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- Jong-Moo Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus and method thereof
- Patent number 11,256,180
- Issue date Feb 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Fu-Chun Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to develop lithographically defined high aspec...
- Patent number 11,204,555
- Issue date Dec 21, 2021
- Intel Corporation
- Pooya Tadayon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing method
- Patent number 11,150,558
- Issue date Oct 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yi-Rem Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus
- Patent number 11,114,316
- Issue date Sep 7, 2021
- SCREEN Holdings Co., Ltd.
- Kota Kabune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and recording medium capable of suppres...
- Patent number 11,079,679
- Issue date Aug 3, 2021
- Tokyo Electron Limited
- Yusaku Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for dispensing liquid material and method for fabricating...
- Patent number 11,048,170
- Issue date Jun 29, 2021
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yung-Yao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,018,034
- Issue date May 25, 2021
- SCREEN Holdings Co., Ltd.
- Toru Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film processing unit and substrate processing apparatus
- Patent number 11,004,702
- Issue date May 11, 2021
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing method, computer-readable storage medium and developing...
- Patent number 10,921,713
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Koshi Muta
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Developer critical dimension control with pulse development
- Patent number 10,915,085
- Issue date Feb 9, 2021
- International Business Machines Corporation
- Richard C. Johnson
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Developing method, developing apparatus, and computer-readable reco...
- Patent number 10,901,320
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Tomohiro Iseki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Film processing unit, substrate processing apparatus and substrate...
- Patent number 10,854,480
- Issue date Dec 1, 2020
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Treatment solution supply apparatus and substrate treatment system
- Patent number 10,807,027
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Katsunori Ichino
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Drippage prevention system and method of operating same
- Patent number 10,792,697
- Issue date Oct 6, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Hung Wang
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF OPERATING DRIPPAGE PREVENTION SYSTEM
- Publication number 20240342745
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hung WANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240339334
- Publication date Oct 10, 2024
- Samsung Electronics Co., Ltd.
- Sangjine PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240079251
- Publication date Mar 7, 2024
- SCREEN Holdings Co., Ltd.
- Jun KOMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
- Publication number 20230350304
- Publication date Nov 2, 2023
- SEMES CO, LTD.
- Hae Won CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN COATER
- Publication number 20230333467
- Publication date Oct 19, 2023
- Samsung Electronics Co., Ltd.
- Sunghwan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING ME...
- Publication number 20230185199
- Publication date Jun 15, 2023
- TOKYO ELECTRON LIMITED
- Hiroki SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE ROTATING APPARATUS, SUBSTRATE PROCESSING SYSTEM INCLUDING...
- Publication number 20230046060
- Publication date Feb 16, 2023
- Samsung Electronics Co., Ltd.
- SANGJINE PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN DISPENSER MODULE SUBSTRATE SURFACE PROTECTION SYSTEM
- Publication number 20220288627
- Publication date Sep 15, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ching-Hai Yang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEVELOPING METHOD AND APPARATUS
- Publication number 20220146942
- Publication date May 12, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Helei SUN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DEVELOP LITHOGRAPHICALLY DEFINED HIGH ASPEC...
- Publication number 20220091511
- Publication date Mar 24, 2022
- Intel Corporation
- Pooya Tadayon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME
- Publication number 20220084812
- Publication date Mar 17, 2022
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVING UNIFORMITY OF PHOTORESIST DEVELOPMENT
- Publication number 20210349393
- Publication date Nov 11, 2021
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Lei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM PROCESSING METHOD
- Publication number 20210233784
- Publication date Jul 29, 2021
- SCREEN Holdings Co., Ltd.
- Yuji TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS
- Publication number 20210134617
- Publication date May 6, 2021
- SEMES CO., LTD.
- Yong Jun SEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPING TREATMENT METHOD AND DEVELOPING TREATMENT APPARATUS
- Publication number 20210063885
- Publication date Mar 4, 2021
- TOKYO ELECTRON LIMITED
- Akiko KAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING APPARATUS AND METHOD THEREOF
- Publication number 20200341390
- Publication date Oct 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Fu-Chun HSIEH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR DISPENSING LIQUID MATERIAL AND METHOD FOR FABRICATING...
- Publication number 20200326626
- Publication date Oct 15, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- YUNG-YAO LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPING METHOD
- Publication number 20200241421
- Publication date Jul 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yi-Rem CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANTING METHOD AND APPARATUS
- Publication number 20200218156
- Publication date Jul 9, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- JONG-MOO CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR DISPENSING LIQUID MATERIAL AND METHOD FOR FABRICATING...
- Publication number 20200133130
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- YUNG-YAO LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPER CRITICAL DIMENSION CONTROL WITH PULSE DEVELOPMENT
- Publication number 20200089188
- Publication date Mar 19, 2020
- International Business Machines Corporation
- Richard C. Johnson
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200064741
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Tsunenaga Nakashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM CAPABLE OF SUPPRES...
- Publication number 20200050111
- Publication date Feb 13, 2020
- TOKYO ELECTRON LIMITED
- Yusaku Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Developing Method, Computer-Readable Storage Medium and Developing...
- Publication number 20190391496
- Publication date Dec 26, 2019
- TOKYO ELECTRON LIMITED
- Koshi MUTA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COATING AND DEVELOPING METHOD AND COATING AND DEVELOPING APPARATUS
- Publication number 20190332013
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Shinichiro KAWAKAMI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190295862
- Publication date Sep 26, 2019
- SCREEN Holdings Co., Ltd.
- Toru ENDO
- B08 - CLEANING
Information Patent Application
DEVELOPING METHOD
- Publication number 20190294049
- Publication date Sep 26, 2019
- SCREEN Holdings Co., Ltd.
- Masahiko HARUMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20190258168
- Publication date Aug 22, 2019
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPING METHOD
- Publication number 20190107780
- Publication date Apr 11, 2019
- SCREEN Holdings Co., Ltd.
- Yuji TANAKA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Developing Method, Developing Apparatus, and Computer-Readable Reco...
- Publication number 20190056666
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Tomohiro ISEKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...

from a wafer supported on a rotating chuck

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Lithography process and material for negative tone development

Wafer cleaning apparatus and wafer cleaning method using the same

Film processing method

Substrate processing method, micropattern forming method, and subst...

Method of operating drippage prevention system

Nozzle, substrate processing apparatus, and substrate processing me...

Developing treatment method and developing treatment apparatus

Nozzle apparatus, apparatus and method for treating substrate

Method and apparatus to develop lithographically defined high aspec...

Spin dispenser module substrate surface protection system

Substrate processing apparatus

Developer critical dimension control with pulse development

Treatment liquid and pattern forming method

Chemical supply structure and a developing apparatus having the same

Spin dispenser module substrate surface protection system

Implanting method and apparatus

Processing apparatus and method thereof

Method and apparatus to develop lithographically defined high aspec...

Developing method

Substrate treating apparatus

Substrate processing method and recording medium capable of suppres...

Apparatus for dispensing liquid material and method for fabricating...

Substrate processing method and substrate processing apparatus

Film processing unit and substrate processing apparatus

Developing method, computer-readable storage medium and developing...

Developer critical dimension control with pulse development

Developing method, developing apparatus, and computer-readable reco...

Film processing unit, substrate processing apparatus and substrate...

Treatment solution supply apparatus and substrate treatment system

Drippage prevention system and method of operating same

Patents Applicationslast 30 patents

METHOD OF OPERATING DRIPPAGE PREVENTION SYSTEM

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

SPIN COATER

NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING ME...

SUBSTRATE ROTATING APPARATUS, SUBSTRATE PROCESSING SYSTEM INCLUDING...

SPIN DISPENSER MODULE SUBSTRATE SURFACE PROTECTION SYSTEM

DEVELOPING METHOD AND APPARATUS

METHOD AND APPARATUS TO DEVELOP LITHOGRAPHICALLY DEFINED HIGH ASPEC...

WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME

METHOD FOR IMPROVING UNIFORMITY OF PHOTORESIST DEVELOPMENT

FILM PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS

DEVELOPING TREATMENT METHOD AND DEVELOPING TREATMENT APPARATUS

PROCESSING APPARATUS AND METHOD THEREOF

APPARATUS FOR DISPENSING LIQUID MATERIAL AND METHOD FOR FABRICATING...

DEVELOPING METHOD

IMPLANTING METHOD AND APPARATUS

APPARATUS FOR DISPENSING LIQUID MATERIAL AND METHOD FOR FABRICATING...

DEVELOPER CRITICAL DIMENSION CONTROL WITH PULSE DEVELOPMENT

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM CAPABLE OF SUPPRES...

Developing Method, Computer-Readable Storage Medium and Developing...

COATING AND DEVELOPING METHOD AND COATING AND DEVELOPING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

DEVELOPING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

DEVELOPING METHOD

Developing Method, Developing Apparatus, and Computer-Readable Reco...