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G03F1/06

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

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G03F1/06from printing surfaces

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Patents Grantslast 30 patents

Information Patent Grant
Technique for defining active regions of semiconductor devices with...
- Patent number 10,199,259
- Issue date Feb 5, 2019
- GLOBALFOUNDRIES Inc.
- Elliot John Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY