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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/703Gap setting

Industries

Patents Grantslast 30 patents

Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,032,299
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a center of a radiation spot, sensor and sta...
- Patent number 11,982,948
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Mihaita Popinciuc
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus lithographic apparatus measurement method
- Patent number 11,914,307
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Bas Johannes Petrus Roset
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hollow-core photonic crystal fiber based broadband radiation generator
- Patent number 11,846,867
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Janneke Ravensbergen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Supercontinuum radiation source and associated metrology devices
- Patent number 11,774,828
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Sebastian Thomas Bauerschmidt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow-core photonic crystal fiber based optical component for broa...
- Patent number 11,774,671
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Apparatus and method for measuring substrate height
- Patent number 11,662,669
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Andrey Valerievich Rogachevskiy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology apparatus, optical system and method
- Patent number 11,537,055
- Issue date Dec 27, 2022
- ASML Holding N.V.
- Stanislav Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 11,525,786
- Issue date Dec 13, 2022
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 11,500,299
- Issue date Nov 15, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yung-Yao Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Height sensor, lithographic apparatus and method for manufacturing...
- Patent number 11,467,505
- Issue date Oct 11, 2022
- ASML Netherlands B.V.
- Hans Butler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for monitoring a lithographic manufacturing p...
- Patent number 11,422,476
- Issue date Aug 23, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to obtain a height map of a substrate having alignment marks...
- Patent number 11,307,507
- Issue date Apr 19, 2022
- ASML Netherlands B.V.
- Bram Van Hoof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for measurement of alignment
- Patent number 11,249,404
- Issue date Feb 15, 2022
- ASML Netherlands B.V.
- Emil Peter Schmitt-Weaver
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for use in a device manufacturing method
- Patent number 11,226,567
- Issue date Jan 18, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Level sensor and lithographic apparatus
- Patent number 11,221,565
- Issue date Jan 11, 2022
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Distance sensor, alignment system and method
- Patent number 11,221,214
- Issue date Jan 11, 2022
- Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Hamed Sadeghian Marnani
- G01 - MEASURING TESTING
Information Patent Grant
Imprint apparatus, imprint method, and article manufacturing method
- Patent number 11,187,979
- Issue date Nov 30, 2021
- Canon Kabushiki Kaisha
- Setsuo Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic apparatus, device manufacturing method and associated...
- Patent number 11,169,447
- Issue date Nov 9, 2021
- ASML Netherlands B.V.
- Erik Willem Bogaart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template, imprint apparatus, imprint method and imprint apparatus m...
- Patent number 11,152,218
- Issue date Oct 19, 2021
- TOSHIBA MEMORY CORPORATION
- Manabu Takakuwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining a height profile, a measurement system and a...
- Patent number 11,137,695
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Arend Johannes Donkerbroek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-resolution position encoder with image sensor and encoded targ...
- Patent number 11,061,338
- Issue date Jul 13, 2021
- NIKON CORPORATION
- Jonathan Kyle Wells
- G01 - MEASURING TESTING
Information Patent Grant
Information processing apparatus, storage medium, lithography appar...
- Patent number 11,061,335
- Issue date Jul 13, 2021
- Canon Kabushiki Kaisha
- Shinichiro Koga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoetching apparatus and method
- Patent number 11,042,099
- Issue date Jun 22, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Chang Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vertical control method for use in lithography machine
- Patent number 11,042,101
- Issue date Jun 22, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Dan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Level sensor apparatus, method of measuring topographical variation...
- Patent number 11,029,614
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method in which alignment control of a member and a substrate is ef...
- Patent number 10,990,005
- Issue date Apr 27, 2021
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Position detection apparatus, position detection method, imprint ap...
- Patent number 10,989,527
- Issue date Apr 27, 2021
- Canon Kabushiki Kaisha
- Hiroshi Sato
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 10,955,353
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SENSOR SYSTEM
- Publication number 20240345492
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Gijs KRAMER
- G01 - MEASURING TESTING
Information Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR
- Publication number 20240118584
- Publication date Apr 11, 2024
- ASML NETHERLANDS B.V.
- Janneke Ravensbergen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DATA FILTER FOR SCANNING METROLOGY
- Publication number 20240069454
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Cristina CARESIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES
- Publication number 20240061314
- Publication date Feb 22, 2024
- ASML NETHERLANDS B.V.
- Sebastian Thomas BAUERSCHMIDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...
- Publication number 20240004127
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
SUBSTRATE LEVEL SENSING IN A LITHOGRAPHIC APPARATUS
- Publication number 20230384698
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Martin Jules Marie-Emile DE NIVELLE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...
- Publication number 20230341784
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Tijmen Pieter COLLIGNON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEIGHT MEASUREMENT METHOD AND HEIGHT MEASUREMENT SYSTEM
- Publication number 20230244153
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Andrey Valerievich ROGACHEVSKIY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE METHOD AND EXPOSURE APPARATUS
- Publication number 20230076566
- Publication date Mar 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20230017491
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-CORRECTABLE ERROR IN METROLOGY
- Publication number 20220365450
- Publication date Nov 17, 2022
- ASML NETHERLANDS B.V.
- Arie VAN DEN BRINK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A CENTER OF A RADIATION SPOT, SENSOR AND STA...
- Publication number 20220308468
- Publication date Sep 29, 2022
- ASML NETHERLANDS B.V.
- Mihaita POPINCIUC
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR MEASURING SUBSTRATE HEIGHT
- Publication number 20220244651
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Andrey Valerievich ROGACHEVSKIY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR
- Publication number 20220187680
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Janneke Ravensbergen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD
- Publication number 20220179330
- Publication date Jun 9, 2022
- ASML Holding N.V.
- Stanislav SMIRNOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES
- Publication number 20210364885
- Publication date Nov 25, 2021
- ASML NETHERLANDS B.V.
- Sebastian Thomas BAUERSCHMIDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Angular-Resolved Spectroscopic Lithography...
- Publication number 20210208083
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...
- Publication number 20210124112
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- G02 - OPTICS
Information Patent Application
Method to Obtain a Height Map of a Substrate Having Alignment Marks...
- Publication number 20210116825
- Publication date Apr 22, 2021
- ASML NETHERLANDS B.V.
- Bram VAN HOOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Level Sensor and Lithographic Apparatus
- Publication number 20210072652
- Publication date Mar 11, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...
- Publication number 20210018847
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...
- Publication number 20200379358
- Publication date Dec 3, 2020
- ASML NETHERLANDS B.V.
- Erik Willem BOGAART
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD AND EXPOSURE APPARATUS
- Publication number 20200379361
- Publication date Dec 3, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yung-Yao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE
- Publication number 20200310242
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOETCHING APPARATUS AND METHOD
- Publication number 20200257207
- Publication date Aug 13, 2020
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Chang ZHOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD IN WHICH ALIGNMENT CONTROL OF A MEMBER AND A SUBSTRATE IS EF...
- Publication number 20200241411
- Publication date Jul 30, 2020
- Canon Kabushiki Kaisha
- Shingo Okushima
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD
- Publication number 20200218169
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF LEVELING WAFER IN EXPOSURE PROCESS AND EXPOSURE SYSTEM TH...
- Publication number 20200201198
- Publication date Jun 25, 2020
- XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
- BUM-HWAN JEON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Measurement of Alignment
- Publication number 20200133144
- Publication date Apr 30, 2020
- ASML NETHERLANDS B.V.
- Emil Peter SCHMITT-WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HEIGHT SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20200057390
- Publication date Feb 20, 2020
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Gap setting

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metrology method and associated metrology and lithographic apparatuses

Method for determining a center of a radiation spot, sensor and sta...

Inspection apparatus lithographic apparatus measurement method

Hollow-core photonic crystal fiber based broadband radiation generator

Supercontinuum radiation source and associated metrology devices

Hollow-core photonic crystal fiber based optical component for broa...

Apparatus and method for measuring substrate height

Lithographic apparatus, metrology apparatus, optical system and method

Method and apparatus for angular-resolved spectroscopic lithography...

Exposure method and exposure apparatus

Height sensor, lithographic apparatus and method for manufacturing...

Methods and apparatus for monitoring a lithographic manufacturing p...

Method to obtain a height map of a substrate having alignment marks...

System and method for measurement of alignment

Methods and apparatus for use in a device manufacturing method

Level sensor and lithographic apparatus

Distance sensor, alignment system and method

Imprint apparatus, imprint method, and article manufacturing method

Lithographic apparatus, device manufacturing method and associated...

Template, imprint apparatus, imprint method and imprint apparatus m...

Method of determining a height profile, a measurement system and a...

Focus and overlay improvement by modifying a patterning device

High-resolution position encoder with image sensor and encoded targ...

Information processing apparatus, storage medium, lithography appar...

Photoetching apparatus and method

Vertical control method for use in lithography machine

Level sensor apparatus, method of measuring topographical variation...

Method in which alignment control of a member and a substrate is ef...

Position detection apparatus, position detection method, imprint ap...

Method and apparatus for angular-resolved spectroscopic lithography...

Patents Applicationslast 30 patents

SENSOR SYSTEM

HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR

DATA FILTER FOR SCANNING METROLOGY

SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES

HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...

SUBSTRATE LEVEL SENSING IN A LITHOGRAPHIC APPARATUS

METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...

HEIGHT MEASUREMENT METHOD AND HEIGHT MEASUREMENT SYSTEM

EXPOSURE METHOD AND EXPOSURE APPARATUS

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

NON-CORRECTABLE ERROR IN METROLOGY

METHOD FOR DETERMINING A CENTER OF A RADIATION SPOT, SENSOR AND STA...

APPARATUS AND METHOD FOR MEASURING SUBSTRATE HEIGHT

HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION GENERATOR

LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD

SUPERCONTINUUM RADIATION SOURCE AND ASSOCIATED METROLOGY DEVICES

Method and Apparatus for Angular-Resolved Spectroscopic Lithography...

HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...

Method to Obtain a Height Map of a Substrate Having Alignment Marks...

Level Sensor and Lithographic Apparatus

METHODS & APPARATUS FOR MONITORING A LITHOGRAPHIC MANUFACTURING PRO...

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...

EXPOSURE METHOD AND EXPOSURE APPARATUS

FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE

PHOTOETCHING APPARATUS AND METHOD

METHOD IN WHICH ALIGNMENT CONTROL OF A MEMBER AND A SUBSTRATE IS EF...

METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD

METHOD OF LEVELING WAFER IN EXPOSURE PROCESS AND EXPOSURE SYSTEM TH...

System and Method for Measurement of Alignment

HEIGHT SENSOR, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING...