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H01J37/32449
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ELECTRICITY
H01
Electric elements
H01J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/00
Discharge tubes with provision for introducing objects or material to be exposed to the discharge
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H01J37/32449
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma etching method and plasma etching apparatus
Patent number
12,230,504
Issue date
Feb 18, 2025
Kioxia Corporation
Junji Kataoka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
Patent number
12,224,156
Issue date
Feb 11, 2025
Applied Materials, Inc.
Xiaopu Li
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Gas mixing method to enhance plasma
Patent number
12,224,159
Issue date
Feb 11, 2025
SKY TECH INC.
Ta-Hao Kuo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Topographic selective deposition
Patent number
12,224,160
Issue date
Feb 11, 2025
Tokyo Electron Limited
Shyam Sridhar
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Conditioning of a processing chamber
Patent number
12,221,694
Issue date
Feb 11, 2025
Applied Materials, Inc.
Pramit Manna
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
12,224,157
Issue date
Feb 11, 2025
HITACHI HIGH-TECH CORPORATION
Yuki Tanaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus
Patent number
12,224,158
Issue date
Feb 11, 2025
HITACHI HIGH-TECH CORPORATION
Yoshinori Yoshida
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus and electrostatic chuck
Patent number
12,217,943
Issue date
Feb 4, 2025
Tokyo Electron Limited
Kohei Otsuki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching method using perfluoropropyl carbinol
Patent number
12,217,970
Issue date
Feb 4, 2025
Ajou University Industry-Academic Cooperation Foundation
Chang-Koo Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
To an inductively coupled plasma source
Patent number
12,217,938
Issue date
Feb 4, 2025
Applied Materials, Inc.
James Rogers
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
FinFET device and method of forming same
Patent number
12,218,222
Issue date
Feb 4, 2025
Taiwan Semiconductor Manufacturing Company, Ltd
Chien-Wei Lee
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for etching features using a targeted deposition for selecti...
Patent number
12,217,955
Issue date
Feb 4, 2025
Lam Research Corporation
Wenchi Liu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
DC bias in plasma process
Patent number
12,217,936
Issue date
Feb 4, 2025
Taiwan Semiconductor Manufacturing Co., Ltd
Sheng-Liang Pan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Systems and methods for metastable activated radical selective stri...
Patent number
12,211,709
Issue date
Jan 28, 2025
Lam Research Corporation
Dengliang Yang
B08 - CLEANING
Information
Patent Grant
Apparatus for treating substrate and method for treating a substrate
Patent number
12,211,675
Issue date
Jan 28, 2025
Semes Co., Ltd.
Ji Hun Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Uniformity control for plasma processing
Patent number
12,211,677
Issue date
Jan 28, 2025
Applied Materials, Inc.
Vladimir Nagorny
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Grant
Plasma processing apparatus
Patent number
12,205,799
Issue date
Jan 21, 2025
Tokyo Electron Limited
Isao Gunji
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Pressure-induced temperature modification during atomic scale proce...
Patent number
12,205,803
Issue date
Jan 21, 2025
Kurt J. Lesker Company
Gilbert Bruce Rayner
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Sputtering apparatus, film formation method, and method for manufac...
Patent number
12,205,805
Issue date
Jan 21, 2025
Canon Kabushiki Kaisha
Kazuya Demura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Etching method and plasma processing apparatus
Patent number
12,198,937
Issue date
Jan 14, 2025
Tokyo Electron Limited
Koki Chino
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Etching method
Patent number
12,198,938
Issue date
Jan 14, 2025
Tokyo Electron Limited
Takatoshi Orui
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Substrate processing apparatus and gas switching method for substra...
Patent number
12,191,119
Issue date
Jan 7, 2025
Tokyo Electron Limited
Nobutaka Sasaki
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus and plasma processing method
Patent number
12,191,124
Issue date
Jan 7, 2025
Tokyo Electron Limited
Tatsuo Matsudo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor reaction chamber and atomic layer plasma etching appa...
Patent number
12,191,114
Issue date
Jan 7, 2025
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
Xingfei Mao
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Workpiece processing apparatus with thermal processing systems
Patent number
12,183,558
Issue date
Dec 31, 2024
Beijing E-Town Semiconductor Technology Co., Ltd.
Dixit Desai
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Remote source pulsing with advanced pulse control
Patent number
12,183,583
Issue date
Dec 31, 2024
Tokyo Electron Limited
Peter Lowell George Ventzek
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for filling a recess formed within a substrate...
Patent number
12,176,243
Issue date
Dec 24, 2024
ASM IP Holding B.V.
Viljami Pore
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
Patent number
12,176,236
Issue date
Dec 24, 2024
Kioxia Corporation
Wu Li
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma abatement system utilizing water vapor and oxygen reagent
Patent number
12,170,192
Issue date
Dec 17, 2024
Applied Materials, Inc.
Colin John Dickinson
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information
Patent Grant
Deposition method and plasma processing apparatus
Patent number
12,170,198
Issue date
Dec 17, 2024
Tokyo Electron Limited
Hiroyuki Matsuura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
Publication number
20250062133
Publication date
Feb 20, 2025
Mattson Technology, Inc.
Shawming Ma
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING METAL OXI...
Publication number
20250059645
Publication date
Feb 20, 2025
Duck Ho KIM
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER
Publication number
20250062106
Publication date
Feb 20, 2025
LAM RESEARCH CORPORATION
Danae Nicole Kay
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR PROCESSING A SUBSTRATE
Publication number
20250054733
Publication date
Feb 13, 2025
Samsung Electronics Co., Ltd.
Yirop Kim
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
Publication number
20250054767
Publication date
Feb 13, 2025
Applied Materials, Inc.
Qihao ZHU
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
Publication number
20250051915
Publication date
Feb 13, 2025
TOKYO ELECTRON LIMITED
Yuta NAKANE
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
GAS MIXING METHOD TO ENHANCE PLASMA
Publication number
20250054732
Publication date
Feb 13, 2025
SKY TECH INC.
TA-HAO KUO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SHOWERHEAD FACEPLATE CONFIGURATIONS
Publication number
20250054734
Publication date
Feb 13, 2025
LAM RESEARCH CORPORATION
Bin LUO
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
Publication number
20250054748
Publication date
Feb 13, 2025
Applied Materials, Inc.
Guangyan Zhong
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC...
Publication number
20250054739
Publication date
Feb 13, 2025
Applied Materials, Inc.
Qiwei Liang
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SHOWERHEAD FACEPLATES WITH ANGLED GAS DISTRIBUTION PASSAGES FOR SEM...
Publication number
20250043425
Publication date
Feb 6, 2025
LAM RESEARCH CORPORATION
Pratik Mankidy
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA VESSEL CLEANING FOR ION BEAM SYSTEM
Publication number
20250046586
Publication date
Feb 6, 2025
VEECO INSTRUMENTS INC.
Mohammad SAGHAYEZHIAN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
Publication number
20250046579
Publication date
Feb 6, 2025
TOKYO ELECTRON LIMITED
Hirotoshi SAKAUE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
Publication number
20250046574
Publication date
Feb 6, 2025
UVAT TECHNOLOGY CO.,LTD.
YUAN-CHI LEE
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...
Publication number
20250038005
Publication date
Jan 30, 2025
Hitachi High-Tech Corporation
Yoshihide YAMAGUCHI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE
Publication number
20250037994
Publication date
Jan 30, 2025
ASM IP HOLDING B.V.
Yoshio Susa
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
Publication number
20250037991
Publication date
Jan 30, 2025
TOKYO ELECTRON LIMITED
Takashi CHIBA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
Publication number
20250037977
Publication date
Jan 30, 2025
TOKYO ELECTRON LIMITED
Barton Lane
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Actively Controlled gas inject FOR PROCESS Temperature CONTROL
Publication number
20250037975
Publication date
Jan 30, 2025
Applied Materials, Inc.
Zhepeng CONG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD AND DEVICE TO DISTRIBUTE GAS INTO A CONTAINER
Publication number
20250029815
Publication date
Jan 23, 2025
Entegris, Inc.
Mark V. SMITH
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
Publication number
20250022688
Publication date
Jan 16, 2025
TOKYO ELECTRON LIMITED
Barton Lane
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUSES AND TECHNIQUES FOR CLEANING A MULTI-STATION SEMICONDUCT...
Publication number
20250022696
Publication date
Jan 16, 2025
LAM RESEARCH CORPORATION
Xin Meng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ELECTROSTATIC CHUCK DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLU...
Publication number
20250022692
Publication date
Jan 16, 2025
ASM IP HOLDING B.V.
Koji Tanaka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY
Publication number
20250022697
Publication date
Jan 16, 2025
Applied Materials, Inc.
Costel BILOIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
GAS CLUSTER ASSISTED PLASMA PROCESSING
Publication number
20250022689
Publication date
Jan 16, 2025
TOKYO ELECTRON LIMITED
Peter Ventzek
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
APPARATUS FOR IMPROVED INJECTION FOR A PLASMA REACTOR
Publication number
20250022686
Publication date
Jan 16, 2025
Nox Box Technologies LLC
Joseph E. Lewis
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
Publication number
20250019815
Publication date
Jan 16, 2025
TOKYO ELECTRON LIMITED
Shimon OTSUKI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
VAPOR INJECTION SYSTEM FOR A PLASMA REACTOR AND METHOD OF USE THEREOF
Publication number
20250022687
Publication date
Jan 16, 2025
Nox Box Technologies LLC
Joseph E. Lewis
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
Publication number
20250014877
Publication date
Jan 9, 2025
Panasonic Intellectual Property Management Co., Ltd.
Hisao NAGAI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA APPARATUS AND METHODS FOR PROCESSING FEED MATERIAL UTIZILING...
Publication number
20250014869
Publication date
Jan 9, 2025
6K Inc.
Michael C. Kozlowski
H01 - BASIC ELECTRIC ELEMENTS