Gas control

Industry

CPC
H01J37/32449

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32449Gas control

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Metal oxide directional removal
- Patent number 12,272,563
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,571
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,272,526
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Tsukasa Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,266,522
- Issue date Apr 1, 2025
- Kokusai Electric Corporation
- Kazuyuki Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and cleaning method
- Patent number 12,261,024
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Wataru Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 12,261,030
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,025
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with selective etching
- Patent number 12,261,053
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical etch nonvolatile materials for MRAM patterning
- Patent number 12,256,645
- Issue date Mar 18, 2025
- Lam Research Corporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma cleaning of chambers for electronics manufacturing sy...
- Patent number 12,249,494
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical device improvement
- Patent number 12,249,489
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 12,241,772
- Issue date Mar 4, 2025
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply block and substrate-processing apparatus including the same
- Patent number 12,243,720
- Issue date Mar 4, 2025
- Wonik IPS Co., Ltd.
- Byoung Ho Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas curtain for semiconductor manufacturing system
- Patent number 12,243,750
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kent Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,237,151
- Issue date Feb 25, 2025
- SEMES CO, LTD.
- Seong Gil Lee
- B08 - CLEANING
Information Patent Grant
Two-dimensional electronic component and method of manufacturing same
- Patent number 12,237,152
- Issue date Feb 25, 2025
- National Central University
- Ching-Yuan Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,230,504
- Issue date Feb 18, 2025
- Kioxia Corporation
- Junji Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 12,224,156
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Xiaopu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas mixing method to enhance plasma
- Patent number 12,224,159
- Issue date Feb 11, 2025
- SKY TECH INC.
- Ta-Hao Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conditioning of a processing chamber
- Patent number 12,221,694
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Topographic selective deposition
- Patent number 12,224,160
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,224,157
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,224,158
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yoshinori Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and electrostatic chuck
- Patent number 12,217,943
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kohei Otsuki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20250118566
- Publication date Apr 10, 2025
- HITACHI HIGH-TECH CORPORATION
- Junya Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND METHOD OF MANUFACTURING DISPLAY APPARATUS
- Publication number 20250118571
- Publication date Apr 10, 2025
- SAMSUNG DISPLAY CO., LTD.
- Changho YI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH
- Publication number 20250118536
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Yi-Hsuan Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK LAYER AND FORMATION METHOD THEREOF
- Publication number 20250118569
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM
- Publication number 20250118578
- Publication date Apr 10, 2025
- Applied Materials, Inc.
- Ajith Karonnan Ramapurath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING PROCESSING METHOD AND ETCHING PROCESSING APPARATUS
- Publication number 20250112055
- Publication date Apr 3, 2025
- HITACHI HIGH-TECH CORPORATION
- Nobuya MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING CARBON-CONTAINING FILM
- Publication number 20250112036
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...
- Publication number 20250101580
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250104981
- Publication date Mar 27, 2025
- Hitachi High-Tech Corporation
- Kosa HIROTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Die Bonding Apparatus, Mounting Method, and Method for Manufacturin...
- Publication number 20250096188
- Publication date Mar 20, 2025
- Fasford Technology Co., Ltd.
- Keita YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250095991
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250096006
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Rin SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STAGE PUMPING LINER
- Publication number 20250087471
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...
- Publication number 20250087465
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250087469
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kohei OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH
- Publication number 20250087456
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIELECTRIC PLASMA ETCHING USING C2H2F2
- Publication number 20250079127
- Publication date Mar 6, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS
- Publication number 20250079128
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etched Compound Semiconductor
- Publication number 20250079175
- Publication date Mar 6, 2025
- SPTS TECHNOLOGIES LIMITED
- Alex CROOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR AND METHOD OF USING SAME
- Publication number 20250079123
- Publication date Mar 6, 2025
- JEHARA CORPORATION
- Hongseub KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250079133
- Publication date Mar 6, 2025
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...
- Publication number 20250079200
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- MING-YING PEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL
- Publication number 20250066913
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Supriya Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...
- Publication number 20250066921
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Ranjit Rohidas Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20250069935
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Wu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING METAL OXI...
- Publication number 20250059645
- Publication date Feb 20, 2025
- Duck Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20250062133
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER
- Publication number 20250062106
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Danae Nicole Kay
- H01 - BASIC ELECTRIC ELEMENTS

Gas control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metal oxide directional removal

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Substrate processing method and substrate processing apparatus

Station-to-station control of backside bow compensation deposition

Plasma processing apparatus and method for venting a processing cha...

Substrate processing apparatus, method of manufacturing semiconduct...

Plasma processing apparatus and cleaning method

Normal-incidence in-situ process monitor sensor

Plasma processing apparatus

Substrate processing with selective etching

Methods and systems for depositing a layer

Chemical etch nonvolatile materials for MRAM patterning

Remote plasma cleaning of chambers for electronics manufacturing sy...

Etching method and etching apparatus

Optical device improvement

Plasma generating device and process executing apparatus including...

Flow metrology calibration for improved processing chamber matching...

Gas supply block and substrate-processing apparatus including the same

Gas curtain for semiconductor manufacturing system

Apparatus and method for processing substrate using plasma

Two-dimensional electronic component and method of manufacturing same

Plasma etching method and plasma etching apparatus

Microwave plasma source for spatial plasma enhanced atomic layer de...

Gas mixing method to enhance plasma

Conditioning of a processing chamber

Topographic selective deposition

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Substrate processing apparatus and electrostatic chuck

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

PLASMA ETCHING METHOD AND METHOD OF MANUFACTURING DISPLAY APPARATUS

MICROWAVE HIGH-DENSITY PLASMA FOR SELECTIVE ETCH

HARD MASK LAYER AND FORMATION METHOD THEREOF

PEDESTAL HEATER WITH SUBSTRATE TEMPERATURE MEASUREMENT SYSTEM

ETCHING PROCESSING METHOD AND ETCHING PROCESSING APPARATUS

METHOD OF FORMING CARBON-CONTAINING FILM

UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...

PLASMA PROCESSING METHOD

Die Bonding Apparatus, Mounting Method, and Method for Manufacturin...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

MULTI-STAGE PUMPING LINER

RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

DIELECTRIC PLASMA ETCHING USING C2H2F2

PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS

Plasma Etched Compound Semiconductor

PLASMA GENERATOR AND METHOD OF USING SAME

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...

SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL

MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

SUBSTRATE PROCESSING DEVICE, AND METHOD FOR MANUFACTURING METAL OXI...

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

REMOTE PLASMA CLEAN (RPC) DELIVERY INLET ADAPTER