Gas control

Industry

CPC
H01J37/32449

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32449Gas control

Industries

Patents Grantslast 30 patents

Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 12,322,579
- Issue date Jun 3, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Helium-free silicon formation
- Patent number 12,315,724
- Issue date May 27, 2025
- Applied Materials, Inc.
- Zeqiong Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for etching a semiconductor substrate in a pla...
- Patent number 12,315,732
- Issue date May 27, 2025
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced chemical vapor deposition of graphene on optical fi...
- Patent number 12,312,680
- Issue date May 27, 2025
- California Institute of Technology
- Deepan Kishore Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate treating method
- Patent number 12,315,699
- Issue date May 27, 2025
- Semes Co., Ltd.
- Yoon Jong Ju
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Large-area high-density plasma processing chamber for flat panel di...
- Patent number 12,312,689
- Issue date May 27, 2025
- Applied Materials, Inc.
- Suhail Anwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier device, semiconductor apparatus, and residual charge detect...
- Patent number 12,315,706
- Issue date May 27, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jian Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,315,743
- Issue date May 27, 2025
- Semes Co., Ltd.
- Ki Yung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of performing maintenance on substrate processing apparatus
- Patent number 12,315,709
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,308,208
- Issue date May 20, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 12,308,209
- Issue date May 20, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and substrate treating apparatus
- Patent number 12,308,219
- Issue date May 20, 2025
- Semes Co., Ltd.
- Seong Gil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-etch treatment for metal etch
- Patent number 12,308,250
- Issue date May 20, 2025
- Tokyo Electron Limited
- Scott Lefevre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 12,300,469
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,300,467
- Issue date May 13, 2025
- Tokyo Electron Limited
- Manabu Oie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced film formation method
- Patent number 12,300,466
- Issue date May 13, 2025
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus including shower head and edge ring...
- Patent number 12,293,901
- Issue date May 6, 2025
- Samsung Electronics Co., Ltd.
- Woorim Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing gap filling fluids and related systems and d...
- Patent number 12,293,942
- Issue date May 6, 2025
- ASM IP Holding B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Throughput improvement with interval conditioning purging
- Patent number 12,291,777
- Issue date May 6, 2025
- Lam Research Corporation
- Chun-Hao Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 12,288,683
- Issue date Apr 29, 2025
- Kokusai Electric Corporation
- Yasunobu Koshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, purge gas control method, and vacuu...
- Patent number 12,285,786
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Norihiko Amikura
- B08 - CLEANING
Information Patent Grant
Etch selectivity control in atomic layer etching
- Patent number 12,280,091
- Issue date Apr 22, 2025
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method using pentafluoropropanol
- Patent number 12,278,093
- Issue date Apr 15, 2025
- Ajou University Industry-Academic Cooperation Foundation
- Chang-Koo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment device
- Patent number 12,278,092
- Issue date Apr 15, 2025
- Nissin Electric Co., Ltd.
- Toshihiko Sakai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal oxide directional removal
- Patent number 12,272,563
- Issue date Apr 8, 2025
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,570
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,272,571
- Issue date Apr 8, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,272,526
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Tsukasa Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Station-to-station control of backside bow compensation deposition
- Patent number 12,272,608
- Issue date Apr 8, 2025
- Lam Research Corporation
- Yanhui Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
- Publication number 20250179625
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20250179637
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Simon CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER-EFFICIENT MICROWAVE PLASMA JET BASED ON EVANESCENT-MODE CAVIT...
- Publication number 20250183007
- Publication date Jun 5, 2025
- The University of Toledo
- Abbas Semnani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE DIRECTIONAL REMOVAL
- Publication number 20250183053
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONING OF A PROCESSING CHAMBER
- Publication number 20250179629
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Pramit MANNA
- B08 - CLEANING
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20250183013
- Publication date Jun 5, 2025
- SEMES CO., LTD.
- Jong Joon JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL FOR PLASMA PROCESSING
- Publication number 20250174444
- Publication date May 29, 2025
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250174462
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Takuya SEINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250166975
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
- Publication number 20250166978
- Publication date May 22, 2025
- Applied Materials, Inc.
- Colin John DICKINSON
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
GAS CURTAIN FOR SEMICONDUCTOR MANUFACUTRING SYSTEM
- Publication number 20250166998
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Lid.
- Kent LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL PLENUM SHOWERHEAD WITH CENTER TO EDGE TUNABILITY
- Publication number 20250163581
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Krishna Birru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PR...
- Publication number 20250166974
- Publication date May 22, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Oxidation-Reduction Adjustable Plasma
- Publication number 20250157800
- Publication date May 15, 2025
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250154649
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...
- Publication number 20250154644
- Publication date May 15, 2025
- LAM RESEARCH CORPORATION
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250149331
- Publication date May 8, 2025
- Kokusai Electric Corporation
- Kenshiro USUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF CONTROLLING PHY...
- Publication number 20250149317
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yunha Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20250149330
- Publication date May 8, 2025
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250149342
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Koki CHINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION APPARATUS AND FILM FORMATION METHOD OF GALLIUM NITRI...
- Publication number 20250146127
- Publication date May 8, 2025
- Japan Display Inc.
- Masanobu IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...
- Publication number 20250149293
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Jaewon Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250149296
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250149389
- Publication date May 8, 2025
- SEMES CO., LTD.
- Il Young KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...
- Publication number 20250149299
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCRUBBER, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBST...
- Publication number 20250149314
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Mukyeong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT
- Publication number 20250140537
- Publication date May 1, 2025
- Applied Materials, Inc.
- Zaoyuan Ge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES
- Publication number 20250140530
- Publication date May 1, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT
- Publication number 20250140531
- Publication date May 1, 2025
- SEMES CO., LTD.
- Sang Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS

Gas control

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metal contamination reduction in substrate processing systems with...

Helium-free silicon formation

Method and apparatus for etching a semiconductor substrate in a pla...

Plasma enhanced chemical vapor deposition of graphene on optical fi...

Substrate treating apparatus and substrate treating method

Large-area high-density plasma processing chamber for flat panel di...

Carrier device, semiconductor apparatus, and residual charge detect...

Substrate treating method and substrate treating apparatus

Method of performing maintenance on substrate processing apparatus

Substrate processing method and substrate processing apparatus

Workpiece processing apparatus with plasma and thermal processing s...

Substrate treating method and substrate treating apparatus

Pre-etch treatment for metal etch

Plasma processing apparatus, calculation method, and calculation pr...

Plasma processing method and plasma processing apparatus

Plasma enhanced film formation method

Method of uniformity control

Substrate processing apparatus including shower head and edge ring...

Methods for depositing gap filling fluids and related systems and d...

Throughput improvement with interval conditioning purging

Method of manufacturing semiconductor device, substrate processing...

Substrate processing apparatus, purge gas control method, and vacuu...

Etch selectivity control in atomic layer etching

Plasma etching method using pentafluoropropanol

Plasma treatment device

Metal oxide directional removal

Systems and methods for metastable activated radical selective stri...

Systems and methods for metastable activated radical selective stri...

Substrate processing method and substrate processing apparatus

Station-to-station control of backside bow compensation deposition

Patents Applicationslast 30 patents

METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS

SHOWERHEAD FOR SUBSTRATE PROCESSING SYSTEMS

POWER-EFFICIENT MICROWAVE PLASMA JET BASED ON EVANESCENT-MODE CAVIT...

METAL OXIDE DIRECTIONAL REMOVAL

CONDITIONING OF A PROCESSING CHAMBER

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME

UNIFORMITY CONTROL FOR PLASMA PROCESSING

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT

GAS CURTAIN FOR SEMICONDUCTOR MANUFACUTRING SYSTEM

DUAL PLENUM SHOWERHEAD WITH CENTER TO EDGE TUNABILITY

SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PR...

Oxidation-Reduction Adjustable Plasma

SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS

HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF CONTROLLING PHY...

METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

FILM FORMATION APPARATUS AND FILM FORMATION METHOD OF GALLIUM NITRI...

PLASMA GENERATION CIRCUIT AND SUBSTRATE PROCESSING DEVICE INCLUDING...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...

SCRUBBER, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBST...

CHAMBER AND METHODS FOR DOWNSTREAM RESIDUE MANAGEMENT

IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES

SUBSTRATE PROCESSING APPARATUS INCLUDING SUBSTRATE SUPPORT UNIT