Gas discharge electron sources

Industry

CPC
H01J2237/06366

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/06366Gas discharge electron sources

Industries

Patents Grantslast 30 patents

Information Patent Grant
Electron source devices, electron source assemblies, and methods fo...
- Patent number 11,862,426
- Issue date Jan 2, 2024
- Teledyne FLIR Detection, Inc.
- James Mitchell Wells
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system having multiple user-selectable operat...
- Patent number 8,445,870
- Issue date May 21, 2013
- FEI Company
- Shouyin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam system having multiple user-selectable operat...
- Patent number 8,253,118
- Issue date Aug 28, 2012
- FEI Company
- Shouyin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma electron flood for ion beam implanter
- Patent number 7,800,083
- Issue date Sep 21, 2010
- Axcelis Technologies, Inc.
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High brightness—multiple beamlets source for patterned X-ray produc...
- Patent number 7,609,815
- Issue date Oct 27, 2009
- The Regents of the University of California
- Ka-Ngo Leung
- G01 - MEASURING TESTING
Information Patent Grant
Slotted antenna waveguide plasma source
- Patent number 7,305,935
- Issue date Dec 11, 2007
- The United States of America as represented by the Administration of NASA
- John Foster
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Characterizing an electron beam treatment apparatus
- Patent number 7,045,798
- Issue date May 16, 2006
- Applied Materials, Inc.
- Khaled A. Elsheref
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for performing plasma process on semiconductor wafers and...
- Patent number 5,601,653
- Issue date Feb 11, 1997
- Kabushiki Kaisha Toshiba
- Masao Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron beam excited plasma system
- Patent number 5,397,956
- Issue date Mar 14, 1995
- Tokyo Electron Limited
- Yoh-ichi Araki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Soft vacuum electron beam patterning apparatus and process
- Patent number 4,827,137
- Issue date May 2, 1989
- Applied Electron Corporation
- George J. Collins
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON SOURCE, PLASMA SOURCE AND SWITCH DEVICE
- Publication number 20230377828
- Publication date Nov 23, 2023
- Kabushiki Kaisha Toshiba
- Hisao MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE
- Publication number 20220384138
- Publication date Dec 1, 2022
- US Electron, Inc.
- John Noonan
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
LOW ENERGY ELECTRON STERILIZATION
- Publication number 20150056095
- Publication date Feb 26, 2015
- Electronworks Holdings LLC
- Daniel F. Gorzen
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
E-BEAM PLASMA SOURCE WITH PROFILED E-BEAM EXTRACTION GRID FOR UNIFO...
- Publication number 20130098552
- Publication date Apr 25, 2013
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM PLASMA SOURCE WITH PROFILED CHAMBER WALL FOR UNIFORM...
- Publication number 20130098553
- Publication date Apr 25, 2013
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM SYSTEM HAVING MULTIPLE USER-SELECTABLE OPERAT...
- Publication number 20120091360
- Publication date Apr 19, 2012
- FEI Company
- Shouyin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System Having Multiple User-Selectable Operat...
- Publication number 20110084207
- Publication date Apr 14, 2011
- FEI Company
- Shouyin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF electron source for ionizing gas clusters
- Publication number 20090166555
- Publication date Jul 2, 2009
- Joseph C. Olson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ELECTRON FLOOD FOR ION BEAM IMPLANTER
- Publication number 20090114815
- Publication date May 7, 2009
- Bo H. Vanderberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Brightness - Multiple Beamlets Source for Patterned X-ray Prod...
- Publication number 20080049888
- Publication date Feb 28, 2008
- Ka-Ngo Leung
- G01 - MEASURING TESTING
Information Patent Application
CHARACTERIZING AN ELECTRON BEAM TREATMENT APPARATUS
- Publication number 20050184257
- Publication date Aug 25, 2005
- APPLIED MATERIALS, INC.
- Khaled A. Elsheref
- H01 - BASIC ELECTRIC ELEMENTS

Gas discharge electron sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electron source devices, electron source assemblies, and methods fo...

Charged particle beam system having multiple user-selectable operat...

Charged particle beam system having multiple user-selectable operat...

Plasma electron flood for ion beam implanter

High brightness—multiple beamlets source for patterned X-ray produc...

Slotted antenna waveguide plasma source

Characterizing an electron beam treatment apparatus

Apparatus for performing plasma process on semiconductor wafers and...

Electron beam excited plasma system

Soft vacuum electron beam patterning apparatus and process

Patents Applicationslast 30 patents

ELECTRON SOURCE, PLASMA SOURCE AND SWITCH DEVICE

ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE

LOW ENERGY ELECTRON STERILIZATION

E-BEAM PLASMA SOURCE WITH PROFILED E-BEAM EXTRACTION GRID FOR UNIFO...

ELECTRON BEAM PLASMA SOURCE WITH PROFILED CHAMBER WALL FOR UNIFORM...

CHARGED PARTICLE BEAM SYSTEM HAVING MULTIPLE USER-SELECTABLE OPERAT...

Charged Particle Beam System Having Multiple User-Selectable Operat...

RF electron source for ionizing gas clusters

PLASMA ELECTRON FLOOD FOR ION BEAM IMPLANTER

High Brightness - Multiple Beamlets Source for Patterned X-ray Prod...

CHARACTERIZING AN ELECTRON BEAM TREATMENT APPARATUS