Gas-filled discharge tubes

Industry

CPC
H01J37/32

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32Gas-filled discharge tubes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Power adjustment method of upper electrode power supply and semicon...
- Patent number 12,300,460
- Issue date May 13, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Complex modality reactor for materials production and synthesis
- Patent number 12,296,312
- Issue date May 13, 2025
- LytEn, Inc.
- Michael W. Stowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, plasma processing apparatus, and cleaning method
- Patent number 12,300,471
- Issue date May 13, 2025
- Tokyo Electron Limited
- Takahiro Senda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
- Patent number 12,300,488
- Issue date May 13, 2025
- Lam Research Corporation
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus of low temperature plasma enhanced chemical va...
- Patent number 12,300,497
- Issue date May 13, 2025
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for low temperature selective epitaxy in a dee...
- Patent number 12,297,559
- Issue date May 13, 2025
- Applied Materials, Inc.
- Abhishek Dube
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, calculation method, and calculation pr...
- Patent number 12,300,469
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate support power transmission components
- Patent number 12,300,474
- Issue date May 13, 2025
- Applied Materials, Inc.
- Paul L. Brillhart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and method
- Patent number 12,300,523
- Issue date May 13, 2025
- Picosun Oy
- Väinö Kilpi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 12,300,472
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Pei-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,300,476
- Issue date May 13, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Autonomous operation of plasma processing tool
- Patent number 12,300,477
- Issue date May 13, 2025
- Tokyo Electron Limited
- Jun Shinagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Placement stage and substrate processing apparatus
- Patent number 12,300,530
- Issue date May 13, 2025
- Tokyo Electron Limited
- Daisuke Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Support unit, heating unit and substrate treating apparatus includi...
- Patent number 12,300,531
- Issue date May 13, 2025
- Semes Co., Ltd.
- Chung Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Robust tensorized shaped setpoint waveform streaming control
- Patent number 12,300,464
- Issue date May 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,300,465
- Issue date May 13, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,300,467
- Issue date May 13, 2025
- Tokyo Electron Limited
- Manabu Oie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus having edge impedance control circuit
- Patent number 12,300,470
- Issue date May 13, 2025
- Semes Co., Ltd.
- Daehyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for automated frequency tuning of radiofrequency...
- Patent number 12,300,463
- Issue date May 13, 2025
- Lam Research Corporation
- Mathew Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced film formation method
- Patent number 12,300,466
- Issue date May 13, 2025
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck for high bias radio frequency (RF) power applic...
- Patent number 12,300,473
- Issue date May 13, 2025
- Applied Materials, Inc.
- Jaeyong Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,300,475
- Issue date May 13, 2025
- Tokyo Electron Limited
- Michishige Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency diverter assembly enabling on-demand different spatial
- Patent number 12,293,897
- Issue date May 6, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, gas re...
- Patent number 12,293,904
- Issue date May 6, 2025
- Kioxia Corporation
- Horoyuki Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Depositing coatings on and within housings, apparatus, or tools
- Patent number 12,291,775
- Issue date May 6, 2025
- Halliburton Energy Services, Inc.
- James M. Price
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Simplified voltage-boosting snubber network
- Patent number 12,294,212
- Issue date May 6, 2025
- Advanced Energy Industries, Inc.
- Faleh Alskran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and mounting table thereof
- Patent number 12,293,937
- Issue date May 6, 2025
- Tokyo Electron Limited
- Yohei Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for film formation
- Patent number 12,293,900
- Issue date May 6, 2025
- Gallium Enterprises Pty Ltd.
- Satyanarayan Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20250154645
- Publication date May 15, 2025
- Tokyo Electron Limited
- Tadashi MITSUNARI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...
- Publication number 20250157790
- Publication date May 15, 2025
- Applied Materials, Inc.
- Bencherki MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetrical Process Reactor
- Publication number 20250157792
- Publication date May 15, 2025
- Stephan Wege
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...
- Publication number 20250157798
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Ryohei TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250157799
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidation-Reduction Adjustable Plasma
- Publication number 20250157800
- Publication date May 15, 2025
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOUSING, MOBILE TERMINAL, AND SPUTTER COATING APPARATUS
- Publication number 20250155622
- Publication date May 15, 2025
- Huawei Technologies Co., Ltd
- Peiling Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250154649
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER AMPLIFIER, RADIO FREQUENCY GENERATOR, AND WIRELESS POWER TRAN...
- Publication number 20250158581
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Sunwoo Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250157844
- Publication date May 15, 2025
- Shinko Electric Industries Co., Ltd.
- Ryosuke Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250157845
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Masanori SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...
- Publication number 20250157795
- Publication date May 15, 2025
- SEMES CO., LTD.
- Jun Seok PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION
- Publication number 20250157815
- Publication date May 15, 2025
- Applied Materials, Inc.
- Tassie ANDERSEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250157797
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Katsuyuki Koizumi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250157843
- Publication date May 15, 2025
- Shinko Electric Industries Co., Ltd.
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...
- Publication number 20250154644
- Publication date May 15, 2025
- LAM RESEARCH CORPORATION
- Eli Jeon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL ATOMIC LAYER ETCHING PROCESSES
- Publication number 20250154662
- Publication date May 15, 2025
- ASM IP HOLDING B.V.
- Tom E. Blomberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING IRREGULARITIES WITHIN A PLASMA-BAS...
- Publication number 20250157794
- Publication date May 15, 2025
- Applied Materials, Inc.
- Sheng Yi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH A ROTATABLE PEDESTAL HUB
- Publication number 20250157796
- Publication date May 15, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUB-MILLISECOND OPTICAL DETECTION OF PULSED PLASMA PROCESSES
- Publication number 20250157801
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Francisco Machuca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD
- Publication number 20250157787
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Masakazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inductively Coupled Plasma Source with Radial Coil Network
- Publication number 20250157791
- Publication date May 15, 2025
- Yuhui ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250157793
- Publication date May 15, 2025
- DAIHEN Corporation
- Ryoji TAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS
- Publication number 20250157802
- Publication date May 15, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250149294
- Publication date May 8, 2025
- Hitachi High-Tech Corporation
- Juhyun NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE
- Publication number 20250149301
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Chan Hoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250149331
- Publication date May 8, 2025
- Kokusai Electric Corporation
- Kenshiro USUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bowed Substrate Clamping Method, Apparatus, and System
- Publication number 20250149361
- Publication date May 8, 2025
- Applied Materials, Inc.
- Arvinder S. CHADHA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-PLASMA COATING
- Publication number 20250149302
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Kai Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Gas-filled discharge tubes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Power adjustment method of upper electrode power supply and semicon...

Complex modality reactor for materials production and synthesis

Stage, plasma processing apparatus, and cleaning method

Doped or undoped silicon carbide deposition and remote hydrogen pla...

Method and apparatus of low temperature plasma enhanced chemical va...

Method and apparatus for low temperature selective epitaxy in a dee...

Plasma processing apparatus, calculation method, and calculation pr...

Semiconductor substrate support power transmission components

Substrate processing apparatus and method

Plasma processing apparatus and method

Wafer placement table

Autonomous operation of plasma processing tool

Placement stage and substrate processing apparatus

Support unit, heating unit and substrate treating apparatus includi...

Robust tensorized shaped setpoint waveform streaming control

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Substrate treating apparatus having edge impedance control circuit

Method and system for automated frequency tuning of radiofrequency...

Plasma enhanced film formation method

Method of uniformity control

Electrostatic chuck for high bias radio frequency (RF) power applic...

Substrate support and substrate processing apparatus

Radio frequency diverter assembly enabling on-demand different spatial

Substrate support and plasma processing apparatus

Substrate processing apparatus, substrate processing method, gas re...

Depositing coatings on and within housings, apparatus, or tools

Simplified voltage-boosting snubber network

Plasma processing apparatus and mounting table thereof

Apparatus and method for film formation

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING APPARATUS

APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...

Symmetrical Process Reactor

CONTROL PROGRAM, INFORMATION PROCESSING PROGRAM, CONTROL METHOD, IN...

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

Oxidation-Reduction Adjustable Plasma

HOUSING, MOBILE TERMINAL, AND SPUTTER COATING APPARATUS

SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS

POWER AMPLIFIER, RADIO FREQUENCY GENERATOR, AND WIRELESS POWER TRAN...

CERAMIC SUBSTRATE, ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

ELECTROSTATIC CHUCK AND SUBSTRATE PROCESSING APPARATUS

ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...

SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPR...

THERMAL ATOMIC LAYER ETCHING PROCESSES

SYSTEMS AND METHODS FOR REDUCING IRREGULARITIES WITHIN A PLASMA-BAS...

PROCESSING CHAMBER WITH A ROTATABLE PEDESTAL HUB

SUB-MILLISECOND OPTICAL DETECTION OF PULSED PLASMA PROCESSES

PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...

Inductively Coupled Plasma Source with Radial Coil Network

PLASMA PROCESSING APPARATUS

ETCH FEEDBACK FOR CONTROL OF UPSTREAM PROCESS

PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

Bowed Substrate Clamping Method, Apparatus, and System

ANTI-PLASMA COATING