Gas-filled discharge tubes

Industry

CPC
H01J37/32

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32Gas-filled discharge tubes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Process kits and related methods for processing chambers to facilit...
- Patent number 12,221,696
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measuring instrument and measuring method
- Patent number 12,222,379
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Takayuki Hatanaka
- G01 - MEASURING TESTING
Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bowed substrate clamping method, apparatus, and system
- Patent number 12,224,192
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Arvinder S. Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 12,224,156
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Xiaopu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas mixing method to enhance plasma
- Patent number 12,224,159
- Issue date Feb 11, 2025
- SKY TECH INC.
- Ta-Hao Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with mesas
- Patent number 12,224,198
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Topographic selective deposition
- Patent number 12,224,160
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature manifold assembly for substrate processing systems
- Patent number 12,224,161
- Issue date Feb 11, 2025
- Lam Research Corporation
- Gabriel De Jesus Soto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conditioning of a processing chamber
- Patent number 12,221,694
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulating structure, method for manufacturing insulating structure...
- Patent number 12,221,689
- Issue date Feb 11, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Yuuji Ishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,224,157
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,224,158
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yoshinori Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catalytic nanofiber membrane assembly and reduced pressure plasma r...
- Patent number 12,224,162
- Issue date Feb 11, 2025
- The UAB Research Foundation
- Andrei V. Stanishevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,217,942
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and electrostatic chuck
- Patent number 12,217,943
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kohei Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for producing uniform films on moving substrates...
- Patent number 12,217,947
- Issue date Feb 4, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor manufacturing system, method of manufacturing a semic...
- Patent number 12,217,962
- Issue date Feb 4, 2025
- Kioxia Corporation
- Shingo Honda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method using perfluoropropyl carbinol
- Patent number 12,217,970
- Issue date Feb 4, 2025
- Ajou University Industry-Academic Cooperation Foundation
- Chang-Koo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spheroidal titanium metallic powders with custom microstructures
- Patent number 12,214,420
- Issue date Feb 4, 2025
- 6K Inc.
- Kamal Hadidi
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Langmuir probe operating at fixed voltages
- Patent number 12,219,685
- Issue date Feb 4, 2025
- Lockheed Martin Corporation
- Aaron Michael Schinder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for processing gases
- Patent number 12,215,026
- Issue date Feb 4, 2025
- Transform Materials LLC
- David S. Soane
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Pedestal thermal profile tuning using multiple heated zones and the...
- Patent number 12,215,420
- Issue date Feb 4, 2025
- Lam Research Corporation
- Gary B. Lind
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus including light receiving device and...
- Patent number 12,218,269
- Issue date Feb 4, 2025
- ASM IP Holding B.V.
- Kazuhiro Nishiwaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 12,217,944
- Issue date Feb 4, 2025
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,218,222
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing methods using multiphase multifrequency bias pulses
- Patent number 12,217,935
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sorption chamber walls for semiconductor equipment
- Patent number 12,217,945
- Issue date Feb 4, 2025
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CARBON MASK DEPOSITION
- Publication number 20250054760
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
- Publication number 20250054767
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Qihao ZHU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORT LEVELING APPARATUS
- Publication number 20250054797
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Katherine Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF SPUTTERING OF MULTIPLE ELECTRODES WITH OPTIMIZED PLAMSA COUPLING...
- Publication number 20250054728
- Publication date Feb 13, 2025
- SPUTTERING COMPONENTS, INC.
- Ken Nauman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...
- Publication number 20250054729
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Shen PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20250054733
- Publication date Feb 13, 2025
- Samsung Electronics Co., Ltd.
- Yirop Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck with High Cooling Efficiency
- Publication number 20250054737
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Karthik ELUMALAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250051915
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD
- Publication number 20250054731
- Publication date Feb 13, 2025
- ULVAC, Inc.
- Kazuhiko Tonari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS MIXING METHOD TO ENHANCE PLASMA
- Publication number 20250054732
- Publication date Feb 13, 2025
- SKY TECH INC.
- TA-HAO KUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD FACEPLATE CONFIGURATIONS
- Publication number 20250054734
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Bin LUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EDGE RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME
- Publication number 20250054735
- Publication date Feb 13, 2025
- Samsung Electronics Co., Ltd.
- Wookhyeon Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC...
- Publication number 20250054739
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES
- Publication number 20250054740
- Publication date Feb 13, 2025
- Impedans Ltd
- Paul SCULLIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...
- Publication number 20250054749
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Kent Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...
- Publication number 20250054778
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Anthony DE LA LLERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20250054793
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLDING APPARATUS
- Publication number 20250054799
- Publication date Feb 13, 2025
- Niterra Co., Ltd.
- Akira INAYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...
- Publication number 20250052272
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Rohit Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20250054730
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS
- Publication number 20250054738
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dan MAROHL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS
- Publication number 20250054736
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Patrick G. BREILING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD FOR IMP...
- Publication number 20250054803
- Publication date Feb 13, 2025
- PSK Holdings Inc.
- Gunwoo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL-BASED SCHEDULING FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20250044775
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Raymond CHAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME
- Publication number 20250046571
- Publication date Feb 6, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION CHAMBER SYSTEM DIFFUSER WITH INCREASED POWER EFFICIENCY
- Publication number 20250046578
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Changling Li
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
REGENERATING METHOD FOR INNER MEMBER OF PLASMA PROCESSING APPARATUS
- Publication number 20250046582
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Wenhao WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIAMOND-LIKE CARBON GAP FILL
- Publication number 20250046599
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Jialiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...
- Publication number 20250046629
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS

Gas-filled discharge tubes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Process kits and related methods for processing chambers to facilit...

Measuring instrument and measuring method

Radio frequency (RF) system with embedded RF signal pickups

Bowed substrate clamping method, apparatus, and system

Microwave plasma source for spatial plasma enhanced atomic layer de...

Gas mixing method to enhance plasma

Electrostatic chuck with mesas

Topographic selective deposition

Low temperature manifold assembly for substrate processing systems

Conditioning of a processing chamber

Insulating structure, method for manufacturing insulating structure...

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Catalytic nanofiber membrane assembly and reduced pressure plasma r...

Ion beam source, substrate process apparatus including the same, an...

Plasma processing apparatus

Substrate processing apparatus and electrostatic chuck

Method and device for producing uniform films on moving substrates...

Semiconductor manufacturing system, method of manufacturing a semic...

Plasma etching method using perfluoropropyl carbinol

Spheroidal titanium metallic powders with custom microstructures

Langmuir probe operating at fixed voltages

Systems and methods for processing gases

Pedestal thermal profile tuning using multiple heated zones and the...

Substrate processing apparatus including light receiving device and...

To an inductively coupled plasma source

High power cable for heated components in RF environment

FinFET device and method of forming same

Plasma processing methods using multiphase multifrequency bias pulses

Sorption chamber walls for semiconductor equipment

Patents Applicationslast 30 patents

CARBON MASK DEPOSITION

SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE

SEMICONDUCTOR SUBSTRATE SUPPORT LEVELING APPARATUS

RF SPUTTERING OF MULTIPLE ELECTRODES WITH OPTIMIZED PLAMSA COUPLING...

SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...

APPARATUS FOR PROCESSING A SUBSTRATE

Electrostatic Chuck with High Cooling Efficiency

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD

GAS MIXING METHOD TO ENHANCE PLASMA

SHOWERHEAD FACEPLATE CONFIGURATIONS

EDGE RING AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC...

APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...

IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

HOLDING APPARATUS

MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...

Systems and Methods for Extracting Process Control Information from...

TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS

A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD FOR IMP...

MODEL-BASED SCHEDULING FOR SUBSTRATE PROCESSING SYSTEMS

PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME

DEPOSITION CHAMBER SYSTEM DIFFUSER WITH INCREASED POWER EFFICIENCY

REGENERATING METHOD FOR INNER MEMBER OF PLASMA PROCESSING APPARATUS

DIAMOND-LIKE CARBON GAP FILL

ION BEAM ETCHING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR...