Gas-filled discharge tubes

Industry

CPC
H01J37/32

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32Gas-filled discharge tubes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Heat exchange method using fluorinated compounds having a low GWP
- Patent number 12,325,819
- Issue date Jun 10, 2025
- Solvay Specialty Polymers Italy S.p.A.
- Emanuela Antenucci
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Plasma reactor for inductively coupled plasma and method of assembl...
- Patent number 12,327,713
- Issue date Jun 10, 2025
- LOT CES CO., LTD.
- Jin Ho Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation quality monitoring using multi-channel sensor data
- Patent number 12,327,714
- Issue date Jun 10, 2025
- Applied Materials, Inc.
- Jeremy Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antennas, circuits for generating plasma, plasma processing apparat...
- Patent number 12,327,709
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Dong-Hyub Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of manufacturing semiconductor device
- Patent number 12,327,710
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Jiye Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active gas generation apparatus
- Patent number 12,327,711
- Issue date Jun 10, 2025
- TMEIC Corporation
- Ren Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck device, pressure calculation method and program
- Patent number 12,327,750
- Issue date Jun 10, 2025
- Horiba Stec, Co., Ltd.
- Lei Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage power supply apparatus and plasma etching equipment ha...
- Patent number 12,327,712
- Issue date Jun 10, 2025
- Samsung Electronics Co., Ltd.
- Jihwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,327,735
- Issue date Jun 10, 2025
- Semes Co., Ltd.
- Seong Gil Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and method
- Patent number 12,327,748
- Issue date Jun 10, 2025
- PIOTECH INC.
- Zhuo Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate
- Patent number 12,325,919
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state RF pulsing to control mask shape and breaking selectivi...
- Patent number 12,322,571
- Issue date Jun 3, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching processes and processing assemblies
- Patent number 12,322,575
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Bablu Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exhaust device, processing apparatus, and exhausting method
- Patent number 12,322,578
- Issue date Jun 3, 2025
- Tokyo Electron Limited
- Kazuya Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin film deposition process
- Patent number 12,322,591
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Naoki Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal atomic layer etching processes
- Patent number 12,320,012
- Issue date Jun 3, 2025
- ASM IP Holding B.V.
- Tom E. Blomberg
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Member for use in plasma processing device, and plasma processing d...
- Patent number 12,322,576
- Issue date Jun 3, 2025
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anomalous plasma event detection and mitigation in semiconductor pr...
- Patent number 12,322,582
- Issue date Jun 3, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Texturizing a surface without bead blasting
- Patent number 12,318,868
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Gang Peng
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pulsing assembly and power supply arrangement
- Patent number 12,322,570
- Issue date Jun 3, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for tuning a MHz RF generator within a cycle of...
- Patent number 12,322,572
- Issue date Jun 3, 2025
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma baffle, substrate processing apparatus including the same, a...
- Patent number 12,322,577
- Issue date Jun 3, 2025
- Samsung Electronics Co., Ltd.
- Hakyoung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electromagnetic field signal acquisition system for high signal-to-...
- Patent number 12,322,580
- Issue date Jun 3, 2025
- Dublin City University
- Alessio Di Liberto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with improved temperature control
- Patent number 12,322,633
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Hanish Kumar Panavalappil Kumarankutty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for medical plasma treatment and generation of...
- Patent number 12,318,499
- Issue date Jun 3, 2025
- Peter F. Vandermeulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing plasma treatment for film densification
- Patent number 12,322,573
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Rui Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for growth of one or more crystalline materials
- Patent number 12,322,574
- Issue date Jun 3, 2025
- Sigma Carbon Technologies
- Tarun Sharda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 12,322,579
- Issue date Jun 3, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional sweep probe system
- Patent number 12,322,581
- Issue date Jun 3, 2025
- Georgia Tech Research Corporation
- Chhavi Chhavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive control of variability in device performance in advanced s...
- Patent number 12,322,618
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
- Publication number 20250179625
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20250179637
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Simon CHAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...
- Publication number 20250178234
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takayuki ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT
- Publication number 20250183015
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Seyed Jafar JAFARIAN-TEHRANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAULT EVENT RECOVERY IN MULTI-SLOT PROCESSING CHAMBERS
- Publication number 20250181067
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Mitesh Harshad Sanghvi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD ASSEMBLY AND SUBSTRATE PROCESSING SYSTEMS FOR IMPROVING...
- Publication number 20250179638
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Eli JEON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250183004
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Hwasoo SEOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...
- Publication number 20250183006
- Publication date Jun 5, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER-EFFICIENT MICROWAVE PLASMA JET BASED ON EVANESCENT-MODE CAVIT...
- Publication number 20250183007
- Publication date Jun 5, 2025
- The University of Toledo
- Abbas Semnani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING
- Publication number 20250183016
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Yi Zhou
- B08 - CLEANING
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20250183020
- Publication date Jun 5, 2025
- SAMSUNG DISPLAY CO., LTD.
- Gi Woon SUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PEDESTAL THERMAL PROFILE TUNING USING MULTIPLE HEATED ZONES AND THE...
- Publication number 20250179633
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Gary B. LIND
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL PLASMA ETCHING SYSTEM AND THERMAL PLASMA ETCHING METHOD
- Publication number 20250183010
- Publication date Jun 5, 2025
- Metal Industries Research & Development Centre
- Wei-Chen Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20250183014
- Publication date Jun 5, 2025
- SEMES CO., LTD.
- Won Jun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE DIRECTIONAL REMOVAL
- Publication number 20250183053
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Baiwei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...
- Publication number 20250183009
- Publication date Jun 5, 2025
- ASM IP HOLDING B.V.
- Amin Azimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID COOLING PLATE FOR COOLING OF DIELECTRIC WINDOW OF A SUBSTRAT...
- Publication number 20250183011
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Hanry ISSAVI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250183012
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...
- Publication number 20250183018
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Wataru SUWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATION OF SEMICONDUCTOR STRUCTURES AND APPARATUS FO...
- Publication number 20250183045
- Publication date Jun 5, 2025
- National Yang Ming Chiao Tung University
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS
- Publication number 20250183093
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Suresh GUPTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR A PACKAGING SUBSTRATE
- Publication number 20250183055
- Publication date Jun 5, 2025
- ABSOLICS INC.
- Jong Hyun LEE
- B08 - CLEANING
Information Patent Application
CONDITIONING OF A PROCESSING CHAMBER
- Publication number 20250179629
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Pramit MANNA
- B08 - CLEANING
Information Patent Application
HARDWARE DESIGN WITH INDEPENDENT CONTROL TO IMPROVE WIW UNIFORMITY
- Publication number 20250179639
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Rupankar CHOUDHURY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250183005
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD ASSEMBLY AND PLASMA PROCESSING APPARATUS INCLUDING THE...
- Publication number 20250183008
- Publication date Jun 5, 2025
- SEMES CO., LTD.
- Sung Yeon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME
- Publication number 20250183013
- Publication date Jun 5, 2025
- SEMES CO., LTD.
- Jong Joon JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING PARTICLES OF ION BEAM ETCHING SYSTEM, AND ION B...
- Publication number 20250183017
- Publication date Jun 5, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Xiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROGRAMMABLE PRECISION ETCHING
- Publication number 20250183019
- Publication date Jun 5, 2025
- Board of Regents, The University of Texas System
- Sidlgata V. Sreenivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE RANGE HEATED ELECTROSTATIC CHUCK
- Publication number 20250183085
- Publication date Jun 5, 2025
- Axcelis Technologies, Inc.
- John Baggett
- H01 - BASIC ELECTRIC ELEMENTS

Gas-filled discharge tubes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Heat exchange method using fluorinated compounds having a low GWP

Plasma reactor for inductively coupled plasma and method of assembl...

Plasma generation quality monitoring using multi-channel sensor data

Antennas, circuits for generating plasma, plasma processing apparat...

Apparatus for and method of manufacturing semiconductor device

Active gas generation apparatus

Electrostatic chuck device, pressure calculation method and program

High voltage power supply apparatus and plasma etching equipment ha...

Apparatus and method for processing substrate

Semiconductor processing apparatus and method

Apparatus for processing substrate

Multi-state RF pulsing to control mask shape and breaking selectivi...

Etching processes and processing assemblies

Exhaust device, processing apparatus, and exhausting method

Thin film deposition process

Thermal atomic layer etching processes

Member for use in plasma processing device, and plasma processing d...

Anomalous plasma event detection and mitigation in semiconductor pr...

Texturizing a surface without bead blasting

Pulsing assembly and power supply arrangement

Systems and methods for tuning a MHz RF generator within a cycle of...

Plasma baffle, substrate processing apparatus including the same, a...

Electromagnetic field signal acquisition system for high signal-to-...

Electrostatic chuck with improved temperature control

Methods and systems for medical plasma treatment and generation of...

Pulsing plasma treatment for film densification

System for growth of one or more crystalline materials

Metal contamination reduction in substrate processing systems with...

Three-dimensional sweep probe system

Adaptive control of variability in device performance in advanced s...

Patents Applicationslast 30 patents

METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS

SHOWERHEAD FOR SUBSTRATE PROCESSING SYSTEMS

METHOD OF ADDITIVELY MANUFACTURING HIGH-PURITY SILICON, METHOD OF A...

HIGH POWER CABLE FOR HEATED COMPONENTS IN RF ENVIRONMENT

FAULT EVENT RECOVERY IN MULTI-SLOT PROCESSING CHAMBERS

SHOWERHEAD ASSEMBLY AND SUBSTRATE PROCESSING SYSTEMS FOR IMPROVING...

PLASMA PROCESSING APPARATUS

MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...

POWER-EFFICIENT MICROWAVE PLASMA JET BASED ON EVANESCENT-MODE CAVIT...

INTEGRATED CLEANING PROCESS FOR SUBSTRATE ETCHING

SPUTTERING APPARATUS

PEDESTAL THERMAL PROFILE TUNING USING MULTIPLE HEATED ZONES AND THE...

THERMAL PLASMA ETCHING SYSTEM AND THERMAL PLASMA ETCHING METHOD

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME

METAL OXIDE DIRECTIONAL REMOVAL

METALLIC ARTICLES, SEMICONDUCTOR PROCESSING SYSTEMS HAVING METALLIC...

LIQUID COOLING PLATE FOR COOLING OF DIELECTRIC WINDOW OF A SUBSTRAT...

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

PARAMETER ESTIMATION SYSTEM, PARAMETER ESTIMATION METHOD, STORAGE M...

METHOD FOR FABRICATION OF SEMICONDUCTOR STRUCTURES AND APPARATUS FO...

HYBRID SEAL FOR SEMICONDUCTOR PROCESSING CHAMBERS

MANUFACTURING METHOD FOR A PACKAGING SUBSTRATE

CONDITIONING OF A PROCESSING CHAMBER

HARDWARE DESIGN WITH INDEPENDENT CONTROL TO IMPROVE WIW UNIFORMITY

SUBSTRATE PROCESSING METHOD

SHOWER HEAD ASSEMBLY AND PLASMA PROCESSING APPARATUS INCLUDING THE...

ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS INCLUDING THE SAME

METHOD FOR REMOVING PARTICLES OF ION BEAM ETCHING SYSTEM, AND ION B...

PROGRAMMABLE PRECISION ETCHING

LARGE RANGE HEATED ELECTROSTATIC CHUCK