Gas-filled discharge tubes

Industry

CPC
H01J37/32

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32Gas-filled discharge tubes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate test apparatus and method for measuring dechucking force...
- Patent number 12,261,072
- Issue date Mar 25, 2025
- Semes Co., Ltd.
- Jong Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plenum assemblies for cooling transformer coupled plasma windows
- Patent number 12,261,018
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hanry Issavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and cleaning method
- Patent number 12,261,024
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Wataru Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protection system for switches in direct drive circuits of substrat...
- Patent number 12,261,029
- Issue date Mar 25, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 12,261,030
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Plasma treatment apparatus, lower electrode assembly and forming me...
- Patent number 12,261,012
- Issue date Mar 25, 2025
- ADVANCED MICRO-FABRICATION EQUIPMENT INC.
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant antenna for physical vapor deposition applications
- Patent number 12,261,017
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Barton Lane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Voltage pulse time-domain multiplexing
- Patent number 12,261,019
- Issue date Mar 25, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for treating substrate
- Patent number 12,261,021
- Issue date Mar 25, 2025
- Samsung Electronics Co., Ltd.
- Hyun Bae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor process apparatus and plasma ignition method
- Patent number 12,261,022
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for revitalizing plasma processing tools
- Patent number 12,261,026
- Issue date Mar 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Hsing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for plasma processing apparatus
- Patent number 12,261,073
- Issue date Mar 25, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Work processing apparatus
- Patent number 12,257,641
- Issue date Mar 25, 2025
- Toshiro DOI
- Hideo Aida
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,020
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Takahiro Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and support for coating eyeglass lenses
- Patent number 12,261,031
- Issue date Mar 25, 2025
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing with material modification and removal
- Patent number 12,261,054
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for producing layers with improved uniformity in...
- Patent number 12,258,661
- Issue date Mar 25, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus and stage cleaning method
- Patent number 12,261,060
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Tsutomu Hiroki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave plasma apparatus and methods for processing materials usi...
- Patent number 12,261,023
- Issue date Mar 25, 2025
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,025
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer hardmask for defect reduction in EUV patterning
- Patent number 12,261,044
- Issue date Mar 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with selective etching
- Patent number 12,261,053
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano-coating protection method for electrical devices
- Patent number 12,252,789
- Issue date Mar 18, 2025
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diagnostic method and system for measuring potential and electric f...
- Patent number 12,255,056
- Issue date Mar 18, 2025
- Southwest Jiaotong University
- Yuhong Xu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Process control for ion energy delivery using multiple generators a...
- Patent number 12,255,052
- Issue date Mar 18, 2025
- Lam Research Corporation
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control ion energy
- Patent number 12,255,048
- Issue date Mar 18, 2025
- Advanced Energy Industries, Inc.
- Victor Brouk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
HYPER-SPECTRAL MULTI-SPOT OPTICAL REFLECTOMETER
- Publication number 20250102356
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Pengyu HAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250104975
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
- Publication number 20250104976
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM
- Publication number 20250104979
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TESTING RING ASSEMBLY OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20250104983
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Dong Mok LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250105043
- Publication date Mar 27, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, PLASMA PROCESSING METHOD, AND PLASMA PROCESSIN...
- Publication number 20250105044
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Yong Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Capillary Nanodiamond Reactor
- Publication number 20250101577
- Publication date Mar 27, 2025
- Board of Trustees of Michigan State University
- Tanvi NIKHAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...
- Publication number 20250101580
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Tu HONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS CONTROL KNOB ESTIMATION
- Publication number 20250104984
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Jeong Jin Hong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20250106976
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250104967
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- CHANGBAE PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE PROCESSING METHOD US...
- Publication number 20250104969
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- HYUN BAE KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL VARIABLE CAPACITOR CIRCUIT AND SEMICONDUCTOR PROCESSING...
- Publication number 20250104970
- Publication date Mar 27, 2025
- INDUSTRIAL COOPERATION FOUNDATION JEONBUK NATIONAL UNIVERSITY
- Yongsug SUH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA IGNITION DETECTION DEVICE FOR CONNECTION TO AN IMPEDANCE MAT...
- Publication number 20250104973
- Publication date Mar 27, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Device
- Publication number 20250104974
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...
- Publication number 20250104980
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Changbae PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR SEMICONDUCTOR PROCESSING
- Publication number 20250105002
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Hunter Frost
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...
- Publication number 20250101581
- Publication date Mar 27, 2025
- ASM IP HOLDING B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLU...
- Publication number 20250101597
- Publication date Mar 27, 2025
- TOTO LTD.
- Hiroaki ASHIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250104971
- Publication date Mar 27, 2025
- Tokyo Electron Limited
- Masaki HIRAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Source and Plasma Processing Apparatus
- Publication number 20250104972
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Eiki KAMATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source and Plasma Processing Apparatus
- Publication number 20250104977
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING AND CONTROL OF PLASMA-BASED PROCESSES
- Publication number 20250104982
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Gordon Alex MacDonald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250105045
- Publication date Mar 27, 2025
- TOTO LTD.
- Tetsuro ITOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250105052
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Yong Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS
- Publication number 20250100263
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Arvinder Manmohan Singh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMBUSTION APPARATUS AND METHOD OF MAKING A COMBUSTION APPARATUS
- Publication number 20250099894
- Publication date Mar 27, 2025
- UNIVERSITY OF NEWCASTLE UPON TYNE
- Adam HARVEY
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING THE SAME
- Publication number 20250104968
- Publication date Mar 27, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING THE SAME
- Publication number 20250104978
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Dong Mok LEE
- H01 - BASIC ELECTRIC ELEMENTS

Gas-filled discharge tubes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate test apparatus and method for measuring dechucking force...

Plenum assemblies for cooling transformer coupled plasma windows

Plasma processing apparatus and cleaning method

Protection system for switches in direct drive circuits of substrat...

Normal-incidence in-situ process monitor sensor

Semiconductor processing apparatus and dielectric window cleaning m...

Plasma treatment apparatus, lower electrode assembly and forming me...

Resonant antenna for physical vapor deposition applications

Voltage pulse time-domain multiplexing

Apparatus and method for treating substrate

Semiconductor process apparatus and plasma ignition method

Method and apparatus for revitalizing plasma processing tools

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Electrostatic chuck assembly for plasma processing apparatus

Work processing apparatus

Plasma processing apparatus and plasma processing method

System, method and support for coating eyeglass lenses

Substrate processing with material modification and removal

Device and method for producing layers with improved uniformity in...

Substrate processing apparatus and stage cleaning method

Microwave plasma apparatus and methods for processing materials usi...

Plasma processing apparatus

Multi-layer hardmask for defect reduction in EUV patterning

Substrate processing with selective etching

Nano-coating protection method for electrical devices

Methods and systems for depositing a layer

Diagnostic method and system for measuring potential and electric f...

Process control for ion energy delivery using multiple generators a...

Apparatus to control ion energy

Patents Applicationslast 30 patents

HYPER-SPECTRAL MULTI-SPOT OPTICAL REFLECTOMETER

PLASMA PROCESSING APPARATUS

RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES

SUBSTRATE PROCESSING SYSTEM

APPARATUS FOR TESTING RING ASSEMBLY OF SUBSTRATE PROCESSING APPARATUS

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

ELECTROSTATIC CHUCK, PLASMA PROCESSING METHOD, AND PLASMA PROCESSIN...

Microwave Capillary Nanodiamond Reactor

UNDERCOATING COVERAGE AND RESISTANCE CONTROL FOR ESCS OF SUBSTRATE...

PROCESS CONTROL KNOB ESTIMATION

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE PROCESSING METHOD US...

ELECTRICAL VARIABLE CAPACITOR CIRCUIT AND SEMICONDUCTOR PROCESSING...

PLASMA IGNITION DETECTION DEVICE FOR CONNECTION TO AN IMPEDANCE MAT...

Plasma Processing Device

SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRA...

METHOD FOR SEMICONDUCTOR PROCESSING

APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CH...

COMPOSITE STRUCTURE AND SEMICONDUCTOR MANUFACTURING APPARATUS INCLU...

PLASMA PROCESSING APPARATUS

Plasma Source and Plasma Processing Apparatus

Plasma Source and Plasma Processing Apparatus

MONITORING AND CONTROL OF PLASMA-BASED PROCESSES

ELECTROSTATIC CHUCK

SUBSTRATE SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING T...

SUBSTRATE SUPPORT ASSEMBLY WITH MULTIPLE DISCS

COMBUSTION APPARATUS AND METHOD OF MAKING A COMBUSTION APPARATUS

ANTENNA STRUCTURE AND PLASMA GENERATING DEVICE USING THE SAME

RING ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS COMPRISING THE SAME