Gas-filled discharge tubes

Industry

CPC
H01J37/32

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32Gas-filled discharge tubes

Industries

Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chuck device
- Patent number 12,249,492
- Issue date Mar 11, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma cleaning of chambers for electronics manufacturing sy...
- Patent number 12,249,494
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter deposition
- Patent number 12,249,498
- Issue date Mar 11, 2025
- Dyson Technology Limited
- Michael Edward Rendall
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,487
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma shaper to control ion flux distribution of plasma source
- Patent number 12,249,488
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carbon based depositions used for critical dimension control during...
- Patent number 12,249,514
- Issue date Mar 11, 2025
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,249,486
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor manufacturing method and the manufactured susceptor using...
- Patent number 12,249,501
- Issue date Mar 11, 2025
- ASM IP Holding B.V.
- Hoyoun Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,249,485
- Issue date Mar 11, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical device improvement
- Patent number 12,249,489
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single crystal metal oxide plasma chamber component
- Patent number 12,249,490
- Issue date Mar 11, 2025
- Lam Research Corporation
- Lin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling radio frequency electrode imp...
- Patent number 12,249,484
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Jian Janson Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate support unit
- Patent number 12,249,491
- Issue date Mar 11, 2025
- Semes Co., Ltd.
- Hyoungkyu Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of etching apparatus
- Patent number 12,249,495
- Issue date Mar 11, 2025
- Winbond Electronics Corp.
- Shih-Chieh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for transmission and detection of free radicals
- Patent number 12,247,920
- Issue date Mar 11, 2025
- Wisconsin Alumni Research Foundation
- J. Leon Shohet
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Gas distribution ring for process chamber
- Patent number 12,243,719
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Hsiang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,716
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,243,718
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate supporting unit, apparatus for treating substrate includi...
- Patent number 12,243,726
- Issue date Mar 4, 2025
- Semes Co., Ltd.
- Jae-Won Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature RF connection with integral thermal choke
- Patent number 12,243,725
- Issue date Mar 4, 2025
- Lam Research Corporation
- Timothy S. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding method and substrate processing apparatus
- Patent number 12,243,728
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for etching a substrate using a hybrid wet atomic layer etc...
- Patent number 12,243,752
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repellent electrode for electron repelling
- Patent number 12,243,707
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Heng Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator and ion implanter
- Patent number 12,243,708
- Issue date Mar 4, 2025
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Syuta Ochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,723
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance matching device and high-frequency power supply system
- Patent number 12,244,286
- Issue date Mar 4, 2025
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 12,241,772
- Issue date Mar 4, 2025
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...
- Publication number 20250087458
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- David Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS
- Publication number 20250087459
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE-ASSISTED PLASMA STRIKE
- Publication number 20250087461
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE
- Publication number 20250087462
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STAGE PUMPING LINER
- Publication number 20250087471
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250087497
- Publication date Mar 13, 2025
- HITACHI HIGH-TECH CORPORATION
- Yohei ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVERTED PLASMA SOURCE, AND METHOD
- Publication number 20250087457
- Publication date Mar 13, 2025
- MKS Instruments, Inc.
- Gordon HILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...
- Publication number 20250087465
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW ETCHING PROCESS CHAMBER
- Publication number 20250087467
- Publication date Mar 13, 2025
- VM Inc.
- Sang Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087470
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Takari YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUS RING ALIGNMENT APPARATUS
- Publication number 20250087464
- Publication date Mar 13, 2025
- Samsung Electronics Co., LTD
- Jaehyun SOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGETED GAS DELIVERY VIA SIDE GAS INJECTION
- Publication number 20250087506
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...
- Publication number 20250087509
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Jitae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...
- Publication number 20250087473
- Publication date Mar 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES
- Publication number 20250087472
- Publication date Mar 13, 2025
- INTEVAC, INC.
- Samuel D. Harkness
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION SYSTEM AND METHOD
- Publication number 20250087536
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Hao CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087460
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROMAGNETIC WAVE SUPPLY MECHANISM AND PLASMA PROCESSING APPARATUS
- Publication number 20250087463
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Mitsutoshi ASHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY WITH IMPROVED THERMAL UNIFORMITY
- Publication number 20250087468
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250087469
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kohei OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250084530
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCL...
- Publication number 20250085320
- Publication date Mar 13, 2025
- Hyo Seong SEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LONG-LIFE EXTENDED TEMPERATURE RANGE EMBEDDED DIODE DESIGN FOR ELEC...
- Publication number 20250087518
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Siyuan TIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH
- Publication number 20250087456
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20250087466
- Publication date Mar 13, 2025
- United Semiconductor (Xiamen) Co., Ltd.
- Ching-Shu Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME
- Publication number 20250079230
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Ikuhisa MORIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAL ASSEMBLY WITH A RETAINING MECHANISM
- Publication number 20250075795
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Jonathan SIMMONS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC PLASMA ETCHING USING C2H2F2
- Publication number 20250079127
- Publication date Mar 6, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- H01 - BASIC ELECTRIC ELEMENTS

Gas-filled discharge tubes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Electrostatic chuck device

Method for manufacturing semiconductor wafer with wafer chuck havin...

Remote plasma cleaning of chambers for electronics manufacturing sy...

Sputter deposition

Plasma processing apparatus and plasma processing method

Plasma shaper to control ion flux distribution of plasma source

Carbon based depositions used for critical dimension control during...

Etching method and etching apparatus

Plasma processing apparatus and plasma processing method

Susceptor manufacturing method and the manufactured susceptor using...

Substrate processing apparatus, method of manufacturing semiconduct...

Optical device improvement

Single crystal metal oxide plasma chamber component

Methods and apparatus for controlling radio frequency electrode imp...

Substrate treating apparatus and substrate support unit

Etching method of etching apparatus

Methods and systems for transmission and detection of free radicals

Gas distribution ring for process chamber

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma generating device and process executing apparatus including...

Substrate supporting unit, apparatus for treating substrate includi...

High temperature RF connection with integral thermal choke

Substrate holding method and substrate processing apparatus

Systems for etching a substrate using a hybrid wet atomic layer etc...

Repellent electrode for electron repelling

Ion generator and ion implanter

Plasma processing apparatus

Impedance matching device and high-frequency power supply system

Flow metrology calibration for improved processing chamber matching...

Patents Applicationslast 30 patents

TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SH...

TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS

PULSED VOLTAGE-ASSISTED PLASMA STRIKE

RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE

MULTI-STAGE PUMPING LINER

PLASMA PROCESSING METHOD

INVERTED PLASMA SOURCE, AND METHOD

RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...

SHALLOW ETCHING PROCESS CHAMBER

SUBSTRATE PROCESSING APPARATUS

FOCUS RING ALIGNMENT APPARATUS

TARGETED GAS DELIVERY VIA SIDE GAS INJECTION

SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...

MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...

SIMULTANEOUS ETCHING OF MULTI-FACETED SUBSTRATES

DEPOSITION SYSTEM AND METHOD

SUBSTRATE PROCESSING APPARATUS

ELECTROMAGNETIC WAVE SUPPLY MECHANISM AND PLASMA PROCESSING APPARATUS

SUBSTRATE SUPPORT ASSEMBLY WITH IMPROVED THERMAL UNIFORMITY

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

INSPECTING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT INCL...

LONG-LIFE EXTENDED TEMPERATURE RANGE EMBEDDED DIODE DESIGN FOR ELEC...

HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH

PROCESSING APPARATUS AND PROCESSING METHOD

WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME

SEAL ASSEMBLY WITH A RETAINING MECHANISM

DIELECTRIC PLASMA ETCHING USING C2H2F2