Gas supply means

Industry

CPC
H01J37/3244

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3244Gas supply means

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Showerhead assembly with heated showerhead
- Patent number 12,170,186
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma abatement system utilizing water vapor and oxygen reagent
- Patent number 12,170,192
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Colin John Dickinson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and coating method
- Patent number 12,170,189
- Issue date Dec 17, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition method and plasma processing apparatus
- Patent number 12,170,198
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply system, plasma processing apparatus, and gas supply method
- Patent number 12,170,187
- Issue date Dec 17, 2024
- Tokyo Electron Limited
- Atsushi Sawachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,163,220
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Yu Komai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,163,219
- Issue date Dec 10, 2024
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method for using plasma processing...
- Patent number 12,165,845
- Issue date Dec 10, 2024
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Shogo Okita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,165,846
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Eiki Kamata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method, substrate processing apparatus, and me...
- Patent number 12,165,848
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Kenichi Oyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma light source
- Patent number 12,165,856
- Issue date Dec 10, 2024
- Hamamatsu Photonics K.K.
- Stephen F. Horne
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treatment unit for a facility for treating the surface of a substra...
- Patent number 12,165,847
- Issue date Dec 10, 2024
- Coating Plasma Innovation
- Julien Vallade
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Screwless semiconductor processing chambers
- Patent number 12,165,909
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Bo-Ru Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching device and method of manufacturing display device using the...
- Patent number 12,161,041
- Issue date Dec 3, 2024
- Samsung Display Co., Ltd.
- Dae Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic multi zone flow control for a processing system
- Patent number 12,159,785
- Issue date Dec 3, 2024
- Applied Materials, Inc.
- Daemian Raj Benjamin Raj
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Surface processing equipment and surface processing method
- Patent number 12,154,768
- Issue date Nov 26, 2024
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Gas supply determination method and plasma generator
- Patent number 12,154,764
- Issue date Nov 26, 2024
- FUJI CORPORATION
- Shinji Takikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 12,154,824
- Issue date Nov 26, 2024
- ASM IP Holding B.V.
- Hyunchul Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intersecting module
- Patent number 12,152,303
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Syuan Lan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck sidewall gas curtain
- Patent number 12,154,813
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ian Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source having different modes of operation
- Patent number 12,154,766
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support
- Patent number 12,148,636
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Masanori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone gas distribution systems and methods
- Patent number 12,148,597
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MODIFICATION OF METAL-CONTAINING SURFACES IN HIGH ASPECT RATIO PLAS...
- Publication number 20240420963
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- He Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER COOLING FLANGE FOR REMO...
- Publication number 20240420924
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amit Sahu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR CARBON PLUG FORMATION
- Publication number 20240420927
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING METHOD
- Publication number 20240420914
- Publication date Dec 19, 2024
- Jiangsu Favored Nanotechnology Co., Ltd.
- Jian ZONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION PART COATING CHAMBER
- Publication number 20240420926
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20240420932
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER HAVING SWIRL MOTION SIDE GAS FEED
- Publication number 20240420925
- Publication date Dec 19, 2024
- NYSEPLASMA CORP.
- Nam Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20240420935
- Publication date Dec 19, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsunahiko NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC SUBSTRATE SUPPORT
- Publication number 20240420984
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED GAS BOX AND ION SOURCE
- Publication number 20240420920
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- William H. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLURALITY OF ELECTRODES AND METHOD...
- Publication number 20240412987
- Publication date Dec 12, 2024
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...
- Publication number 20240412953
- Publication date Dec 12, 2024
- LAM RESEARCH CORPORATION
- Bradley Taylor Streng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240414919
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Sung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICRO-CAPILLARY HIGH VOLTAGE ISOLATOR FOR GAS DELIVERY TO VACUUM
- Publication number 20240412952
- Publication date Dec 12, 2024
- Oregon Physics, LLC
- Philip J. Witham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE ADJUSTING SYSTEM, TEMPERATURE ADJUSTING METHOD, SUBSTRA...
- Publication number 20240412955
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Masahiko YOKOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...
- Publication number 20240412948
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Shuran SHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Remote Plasma Device and Plasma Processing Apparatus
- Publication number 20240412949
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REACTION CHAMBER AND OXIDATION DEVICE
- Publication number 20240412950
- Publication date Dec 12, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Jianmin JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20240404794
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Derek William Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240404795
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALOGEN-FREE ETCHING OF SILICON NITRIDE
- Publication number 20240404837
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Zhiren Luo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240404802
- Publication date Dec 5, 2024
- Kokusai Electric Corporation
- Atsushi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM
- Publication number 20240404805
- Publication date Dec 5, 2024
- Tokyo Electron Limited
- Mikio SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
- Publication number 20240404834
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUXLESS DIE BONDING USING IN-SITU PLASMA TREATMENT AND APPARATUS F...
- Publication number 20240404988
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hui-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE BEVEL CLEANING
- Publication number 20240404821
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Saravanapriyan SRIRAMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT
- Publication number 20240404793
- Publication date Dec 5, 2024
- SEMES CO., LTD.
- Wook Sang JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARALLEL PLASMA TREATMENT AND THERMOCOMPRESSION BONDING AND APPARAT...
- Publication number 20240404989
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Hui-Min Huang
- H01 - BASIC ELECTRIC ELEMENTS

Gas supply means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Showerhead assembly with heated showerhead

Plasma abatement system utilizing water vapor and oxygen reagent

Plasma treatment apparatus, a method of monitoring a process of man...

Coating apparatus and coating method

Deposition method and plasma processing apparatus

Gas supply system, plasma processing apparatus, and gas supply method

Methods and systems for advanced ion control for etching processes

Deposition method and deposition apparatus

Ex situ coating of chamber components for semiconductor processing

Plasma processing apparatus and method for using plasma processing...

Plasma processing apparatus and plasma processing method

Substrate processing method, substrate processing apparatus, and me...

Inductively coupled plasma light source

Treatment unit for a facility for treating the surface of a substra...

Screwless semiconductor processing chambers

Etching device and method of manufacturing display device using the...

Dynamic multi zone flow control for a processing system

Atomic layer etch process using plasma in conjunction with a rapid...

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Surface processing equipment and surface processing method

Gas supply determination method and plasma generator

Substrate processing method

Intersecting module

Etching method and plasma processing apparatus

Electrostatic chuck sidewall gas curtain

Ion source having different modes of operation

Flow control features of CVD chambers

Substrate support

Multi-zone gas distribution systems and methods

Plasma uniformity control in pulsed DC plasma chamber

Patents Applicationslast 30 patents

MODIFICATION OF METAL-CONTAINING SURFACES IN HIGH ASPECT RATIO PLAS...

SEMICONDUCTOR MANUFACTURING PROCESS CHAMBER COOLING FLANGE FOR REMO...

SYSTEM AND METHOD FOR CARBON PLUG FORMATION

COATING METHOD

ATOMIC LAYER DEPOSITION PART COATING CHAMBER

SUBSTRATE SUPPORT

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

PLASMA CHAMBER HAVING SWIRL MOTION SIDE GAS FEED

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

ELECTROSTATIC SUBSTRATE SUPPORT

INTEGRATED GAS BOX AND ION SOURCE

SUBSTRATE PROCESSING APPARATUS, PLURALITY OF ELECTRODES AND METHOD...

APPARATUSES AND SYSTEMS FOR AMMONIA/CHLORINE CHEMISTRY SEMICONDUCTO...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

MICRO-CAPILLARY HIGH VOLTAGE ISOLATOR FOR GAS DELIVERY TO VACUUM

TEMPERATURE ADJUSTING SYSTEM, TEMPERATURE ADJUSTING METHOD, SUBSTRA...

METHODS AND APPARATUS FOR RPS-RF PLASMA CLEAN AND ACTIVATION FOR AD...

Remote Plasma Device and Plasma Processing Apparatus

REACTION CHAMBER AND OXIDATION DEVICE

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

PLASMA PROCESSING METHOD AND APPARATUS

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

HALOGEN-FREE ETCHING OF SILICON NITRIDE

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM

METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY

FLUXLESS DIE BONDING USING IN-SITU PLASMA TREATMENT AND APPARATUS F...

SEMICONDUCTOR SUBSTRATE BEVEL CLEANING

SUBSTRATE TREATING APPARATUS AND FLUID SUPPLY UNIT

PARALLEL PLASMA TREATMENT AND THERMOCOMPRESSION BONDING AND APPARAT...