Gas supply means

Industry

CPC
H01J37/3244

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3244Gas supply means

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,368,024
- Issue date Jul 22, 2025
- Applied Materials, Inc.
- Abdullah Zafar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for forming metal-insulator-metal capacitors
- Patent number 12,369,336
- Issue date Jul 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Liang Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma type ion implanter
- Patent number 12,368,021
- Issue date Jul 22, 2025
- SK Hynix Inc.
- Jong Jin Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, processing method, and non-transito...
- Patent number 12,368,043
- Issue date Jul 22, 2025
- Kokusai Electric Corporation
- Akinori Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and CVD mask coating method using the same
- Patent number 12,365,975
- Issue date Jul 22, 2025
- Samsung Display Co., Ltd.
- Sungmin Hur
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,368,027
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Takatoshi Orui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,368,050
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Masahiko Yokoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 12,368,030
- Issue date Jul 22, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas analyzer apparatus
- Patent number 12,368,032
- Issue date Jul 22, 2025
- Atonarp Inc.
- Naoki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanisms for supplying process gas into wafer process apparatus
- Patent number 12,359,318
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Su-Horng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for treating substrate
- Patent number 12,362,147
- Issue date Jul 15, 2025
- Semes Co., Ltd.
- Sang Jeong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for treating substrate and assembly for distributing gas
- Patent number 12,362,148
- Issue date Jul 15, 2025
- Semes Co., Ltd.
- Hyoung Kyu Son
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming thermally stable carbon film
- Patent number 12,362,181
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glow plasma stabilization
- Patent number 12,362,140
- Issue date Jul 15, 2025
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stress control for plasma enhanced chemical vapor deposition
- Patent number 12,362,149
- Issue date Jul 15, 2025
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,362,156
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Atsushi Kubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas showerhead with controllable airflow distribution
- Patent number 12,351,916
- Issue date Jul 8, 2025
- PIOTECH INC.
- Zhenjie Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus
- Patent number 12,354,854
- Issue date Jul 8, 2025
- Shibaura Mechatronics Corporation
- Hisashi Nishigaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,354,846
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Takahiro Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Porous inlet
- Patent number 12,351,915
- Issue date Jul 8, 2025
- Picosun Oy
- Marko Pudas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,354,849
- Issue date Jul 8, 2025
- Tokyo Electron Limited
- Gyeong min Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 12,354,871
- Issue date Jul 8, 2025
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active gas generation apparatus
- Patent number 12,354,845
- Issue date Jul 8, 2025
- TMEIC Corporation
- Kensuke Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 12,354,848
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Yasunori Ejiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for treating substrate
- Patent number 12,347,694
- Issue date Jul 1, 2025
- Semes Co., Ltd.
- Dong-Hun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform in situ cleaning and deposition
- Patent number 12,347,653
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Saket Rathi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for topography-selective depositions
- Patent number 12,347,675
- Issue date Jul 1, 2025
- ASM IP Holding B.V.
- Akiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming plasma coating
- Patent number 12,347,652
- Issue date Jul 1, 2025
- Applied Materials, Inc.
- Lance A. Scudder
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pressure control system for a multi-head processing chamber of a pl...
- Patent number 12,347,661
- Issue date Jul 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS
- Publication number 20250239476
- Publication date Jul 24, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR WAFER PROCESSING APPARATUS
- Publication number 20250239436
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Seongha JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR PROTECTING OXYGEN-SENSITIVE TARGET MATERIALS...
- Publication number 20250239442
- Publication date Jul 24, 2025
- FHR Anlagenbau GmbH
- Sven HAEBERLEIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250239437
- Publication date Jul 24, 2025
- Hitachi High-Tech Corporation
- Makoto SATAKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MULTI-WAFER ASHING SYSTEM
- Publication number 20250237959
- Publication date Jul 24, 2025
- Rockwell Collins, Inc.
- Mark J. Reimer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...
- Publication number 20250232960
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20250232964
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR FILM FORMATION
- Publication number 20250232958
- Publication date Jul 17, 2025
- Gallium Enterprises Pty Ltd
- Satyanarayan Barik
- C01 - INORGANIC CHEMISTRY
Information Patent Application
FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226210
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250226185
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuki MOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA
- Publication number 20250226187
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Heewon MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20250226189
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...
- Publication number 20250226207
- Publication date Jul 10, 2025
- Kokusai Electric Corporation
- Yasunobu KOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHOWERHEAD STRUCTURE AND APPARATUS FOR TREATING SUBSTRATE
- Publication number 20250223699
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Tae Seung YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMB...
- Publication number 20250226186
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- Ala MORADIAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218825
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jae Woo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD ASSEMBLY AND SUBSTRATE TREATING APPARATUS INCLUDING THE...
- Publication number 20250218728
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Tae Guen PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218729
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Jae Hwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND METHOD
- Publication number 20250218732
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Seong Gil LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUDING TH...
- Publication number 20250218734
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Sung Yeon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250218735
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Si Young JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250218743
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- In Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASS FLOW CONTROLLER, FLOW CONTROL METHOD USING THE SAME, AND SUBST...
- Publication number 20250216872
- Publication date Jul 3, 2025
- Samsung Electronics Co., Ltd.
- Seunghun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD OF CONTROLLING PLASMA CHARACTERISTIC, AND SYSTEM...
- Publication number 20250218730
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Dong Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD AND SUBSTRATE TREATMENT APPARATUS INCLUDING SHOWERHEAD
- Publication number 20250218731
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Je Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250215320
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Ryo MATSUBARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING
- Publication number 20250213650
- Publication date Jul 3, 2025
- LAM RESEARCH CORPORATION
- Andreas Fischer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS

Gas supply means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and apparatus for processing a substrate

Method and system for forming metal-insulator-metal capacitors

Inductively coupled plasma type ion implanter

Substrate processing apparatus, processing method, and non-transito...

Sputtering apparatus and CVD mask coating method using the same

Substrate processing method and substrate processing apparatus

Plasma processing method and plasma processing apparatus

Deposition method and deposition apparatus

Gas analyzer apparatus

Mechanisms for supplying process gas into wafer process apparatus

Ion beam etching chamber with etching by-product redistributor

Apparatus for treating substrate

Apparatus for treating substrate and assembly for distributing gas

Methods of forming thermally stable carbon film

Glow plasma stabilization

Film stress control for plasma enhanced chemical vapor deposition

Substrate processing method and substrate processing apparatus

Gas showerhead with controllable airflow distribution

Film formation apparatus

Plasma processing apparatus

Porous inlet

Plasma processing apparatus

Ultrathin atomic layer deposition film accuracy thickness control

Active gas generation apparatus

Substrate processing apparatus, substrate processing method, method...

Method and apparatus for treating substrate

Uniform in situ cleaning and deposition

Methods and systems for topography-selective depositions

Method for forming plasma coating

Pressure control system for a multi-head processing chamber of a pl...

Patents Applicationslast 30 patents

ETCHING METHOD, PRECOAT METHOD, AND ETCHING APPARATUS

SEMICONDUCTOR WAFER PROCESSING APPARATUS

METHOD AND DEVICE FOR PROTECTING OXYGEN-SENSITIVE TARGET MATERIALS...

PLASMA PROCESSING METHOD

PLASMA MULTI-WAFER ASHING SYSTEM

FOCUS RING, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND...

VERTICALLY ADJUSTABLE PLASMA SOURCE

APPARATUS AND METHOD FOR FILM FORMATION

FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA

SUBSTRATE TREATMENT SYSTEM

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SHOWERHEAD STRUCTURE AND APPARATUS FOR TREATING SUBSTRATE

HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMB...

SUBSTRATE PROCESSING APPARATUS

SHOWER HEAD ASSEMBLY AND SUBSTRATE TREATING APPARATUS INCLUDING THE...

SHOWER HEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING APPARATUS AND METHOD

SHOWERHEAD ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS INCLUDING TH...

GAS SPRAYING APPARATUS AND SUBSTRATE TREATING APPARATUS INCLUDING T...

SUBSTRATE PROCESSING APPARATUS

MASS FLOW CONTROLLER, FLOW CONTROL METHOD USING THE SAME, AND SUBST...

DEVICE AND METHOD OF CONTROLLING PLASMA CHARACTERISTIC, AND SYSTEM...

SHOWERHEAD AND SUBSTRATE TREATMENT APPARATUS INCLUDING SHOWERHEAD

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...