Gas supply means

Industry

CPC
H01J37/3244

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3244Gas supply means

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and cleaning method
- Patent number 12,261,024
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Wataru Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Normal-incidence in-situ process monitor sensor
- Patent number 12,261,030
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma apparatus and methods for processing materials usi...
- Patent number 12,261,023
- Issue date Mar 25, 2025
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,025
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing with selective etching
- Patent number 12,261,053
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Ivo Otto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical etch nonvolatile materials for MRAM patterning
- Patent number 12,256,645
- Issue date Mar 18, 2025
- Lam Research Corporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote plasma cleaning of chambers for electronics manufacturing sy...
- Patent number 12,249,494
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yuanhong Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma shaper to control ion flux distribution of plasma source
- Patent number 12,249,488
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,249,485
- Issue date Mar 11, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical device improvement
- Patent number 12,249,489
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single crystal metal oxide plasma chamber component
- Patent number 12,249,490
- Issue date Mar 11, 2025
- Lam Research Corporation
- Lin Xu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution ring for process chamber
- Patent number 12,243,719
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Hsiang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,716
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for etching a substrate using a hybrid wet atomic layer etc...
- Patent number 12,243,752
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow metrology calibration for improved processing chamber matching...
- Patent number 12,241,772
- Issue date Mar 4, 2025
- Lam Research Corporation
- Evangelos T. Spyropoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply block and substrate-processing apparatus including the same
- Patent number 12,243,720
- Issue date Mar 4, 2025
- Wonik IPS Co., Ltd.
- Byoung Ho Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Batch type substrate processing apparatus
- Patent number 12,243,724
- Issue date Mar 4, 2025
- Eugene Technology Co., Ltd.
- Sung Ho Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas curtain for semiconductor manufacturing system
- Patent number 12,243,750
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kent Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,237,151
- Issue date Feb 25, 2025
- SEMES CO, LTD.
- Seong Gil Lee
- B08 - CLEANING
Information Patent Grant
Two-dimensional electronic component and method of manufacturing same
- Patent number 12,237,152
- Issue date Feb 25, 2025
- National Central University
- Ching-Yuan Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and sub...
- Patent number 12,237,173
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Keiko Hada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Showerhead device for semiconductor processing system
- Patent number 12,237,182
- Issue date Feb 25, 2025
- ASM IP Holding B.V.
- Tom E. Blomberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detaching and installing device for gas distribution plate of etchi...
- Patent number 12,230,480
- Issue date Feb 18, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Ko Wei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,230,474
- Issue date Feb 18, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and device for diamond synthesis by CVD
- Patent number 12,227,834
- Issue date Feb 18, 2025
- DIAROTECH
- Horacio Tellez Oliva
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ex situ coating of chamber components for semiconductor processing
- Patent number 12,227,837
- Issue date Feb 18, 2025
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,230,504
- Issue date Feb 18, 2025
- Kioxia Corporation
- Junji Kataoka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Die Bonding Apparatus, Mounting Method, and Method for Manufacturin...
- Publication number 20250096188
- Publication date Mar 20, 2025
- Fasford Technology Co., Ltd.
- Keita YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME
- Publication number 20250095972
- Publication date Mar 20, 2025
- PSK INC.
- Yong Soo YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS TRANSPORT SYSTEM
- Publication number 20250092892
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jheng-Syun LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250095991
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250096006
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Rin SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
- Publication number 20250095967
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...
- Publication number 20250098248
- Publication date Mar 20, 2025
- Kioxia Corporation
- Masaya NAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STAGE PUMPING LINER
- Publication number 20250087471
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Mingle Tong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250087497
- Publication date Mar 13, 2025
- HITACHI HIGH-TECH CORPORATION
- Yohei ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...
- Publication number 20250087465
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHALLOW ETCHING PROCESS CHAMBER
- Publication number 20250087467
- Publication date Mar 13, 2025
- VM Inc.
- Sang Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TARGETED GAS DELIVERY VIA SIDE GAS INJECTION
- Publication number 20250087506
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...
- Publication number 20250087509
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Jitae Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250087469
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kohei OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250084530
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Yohei MATSUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250084535
- Publication date Mar 13, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH
- Publication number 20250087456
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC PLASMA ETCHING USING C2H2F2
- Publication number 20250079127
- Publication date Mar 6, 2025
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Nathan STAFFORD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS
- Publication number 20250079128
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT APPARATUS
- Publication number 20250079126
- Publication date Mar 6, 2025
- SHIBAURA MACHINE CO., LTD.
- Rintaro SUEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etched Compound Semiconductor
- Publication number 20250079175
- Publication date Mar 6, 2025
- SPTS TECHNOLOGIES LIMITED
- Alex CROOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250079193
- Publication date Mar 6, 2025
- TES CO., LTD.
- In-Il JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATOR AND METHOD OF USING SAME
- Publication number 20250079123
- Publication date Mar 6, 2025
- JEHARA CORPORATION
- Hongseub KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250079133
- Publication date Mar 6, 2025
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...
- Publication number 20250079200
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- MING-YING PEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL
- Publication number 20250066913
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Supriya Ghosh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREFOR
- Publication number 20250069858
- Publication date Feb 27, 2025
- ULVAC, Inc.
- Kenta DOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...
- Publication number 20250069869
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...
- Publication number 20250066921
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Ranjit Rohidas Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Gas supply means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and cleaning method

Normal-incidence in-situ process monitor sensor

Microwave plasma apparatus and methods for processing materials usi...

Plasma processing apparatus

Substrate processing with selective etching

Methods and systems for depositing a layer

Chemical etch nonvolatile materials for MRAM patterning

Remote plasma cleaning of chambers for electronics manufacturing sy...

Plasma shaper to control ion flux distribution of plasma source

Etching method and etching apparatus

Substrate processing apparatus, method of manufacturing semiconduct...

Optical device improvement

Single crystal metal oxide plasma chamber component

Gas distribution ring for process chamber

Plasma processing apparatus

Plasma generating device and process executing apparatus including...

Systems for etching a substrate using a hybrid wet atomic layer etc...

Flow metrology calibration for improved processing chamber matching...

Gas supply block and substrate-processing apparatus including the same

Batch type substrate processing apparatus

Gas curtain for semiconductor manufacturing system

Apparatus and method for processing substrate using plasma

Two-dimensional electronic component and method of manufacturing same

Substrate processing method, substrate processing apparatus and sub...

Showerhead device for semiconductor processing system

Detaching and installing device for gas distribution plate of etchi...

Substrate processing apparatus, method of manufacturing semiconduct...

Process and device for diamond synthesis by CVD

Ex situ coating of chamber components for semiconductor processing

Plasma etching method and plasma etching apparatus

Patents Applicationslast 30 patents

Die Bonding Apparatus, Mounting Method, and Method for Manufacturin...

SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME

GAS TRANSPORT SYSTEM

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...

MULTI-STAGE PUMPING LINER

PLASMA PROCESSING METHOD

RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...

SHALLOW ETCHING PROCESS CHAMBER

TARGETED GAS DELIVERY VIA SIDE GAS INJECTION

SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR...

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH

DIELECTRIC PLASMA ETCHING USING C2H2F2

PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS

SURFACE TREATMENT APPARATUS

Plasma Etched Compound Semiconductor

SUBSTRATE PROCESSING APPARATUS

PLASMA GENERATOR AND METHOD OF USING SAME

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

SYSTEM OF DETERMINING LEAKAGE OF SEMICONDUCTOR MANUFACTURING TOOL A...

SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL

PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREFOR

PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING MET...

MULTIPLE-CHAMBER REACTOR FOR SELECTIVE DEPOSITION OF SILICON NITRID...