having two or more different absorber layers

Industry

CPC
G03F1/58

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/58having two or more different absorber layers

Industries

Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask with reduced wafer neighboring effect
- Patent number 12,130,548
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shift mask for extreme ultraviolet lithography and a method o...
- Patent number 12,099,293
- Issue date Sep 24, 2024
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask and fabricating method thereof
- Patent number 12,038,684
- Issue date Jul 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for producing photomask, and photomask
- Patent number 11,971,653
- Issue date Apr 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and display device manufactured by using the same
- Patent number 11,947,223
- Issue date Apr 2, 2024
- Samsung Display Co., Ltd.
- Dong Hee Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,860,533
- Issue date Jan 2, 2024
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle in an apparatus for extreme ultraviolet exposure
- Patent number 11,835,850
- Issue date Dec 5, 2023
- Samsung Electronics Co., Ltd.
- Sanghyun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,815,809
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective type blankmask and photomask for EUV
- Patent number 11,815,801
- Issue date Nov 14, 2023
- S&S TECH Co., Ltd.
- Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing reflective mask blank, and reflective mask...
- Patent number 11,789,357
- Issue date Oct 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming semiconductor structure
- Patent number 11,764,062
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ping-Hao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet mask blank with multilayer absorber and method...
- Patent number 11,754,917
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing extreme ultraviolet mask with reduced wafer...
- Patent number 11,740,547
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV in-situ linearity calibration for TDI image sensors using test...
- Patent number 11,733,605
- Issue date Aug 22, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Substrate
- Patent number 11,633,903
- Issue date Apr 25, 2023
- LG Chem, Ltd.
- Cheol Ock Song
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Mirror for extreme ultraviolet light and extreme ultraviolet light...
- Patent number 11,614,572
- Issue date Mar 28, 2023
- Gigaphoton Inc.
- Osamu Wakabayashi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Exposure mask and display device manufactured by using the same
- Patent number 11,579,493
- Issue date Feb 14, 2023
- Samsung Display Co., Ltd.
- Dong Hee Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate with conductive film, substrate with multilayer reflectiv...
- Patent number 11,561,463
- Issue date Jan 24, 2023
- Hoya Corporation
- Masanori Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask with enhanced contamination control and method of forming...
- Patent number 11,480,869
- Issue date Oct 25, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chien-Hung Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, reflective mask blank, r...
- Patent number 11,454,878
- Issue date Sep 27, 2022
- Hoya Corporation
- Hirofumi Kozakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank, manufacturing method of photomask and photomask
- Patent number 11,402,744
- Issue date Aug 2, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoki Matsuhashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask blank, photomask manufactured by using the EUV mask blank,...
- Patent number 11,372,322
- Issue date Jun 28, 2022
- Samsung Electronics Co., Ltd.
- Ho Yeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and manufacturing method thereof
- Patent number 11,372,325
- Issue date Jun 28, 2022
- HKC CORPORATION LIMITED
- En-Tsung Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate
- Patent number 11,338,499
- Issue date May 24, 2022
- LG Chem, Ltd.
- Cheol Ock Song
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 11,327,393
- Issue date May 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming photomask and photolithography method
- Patent number 11,307,492
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,300,871
- Issue date Apr 12, 2022
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing photomask, method for producing semiconductor...
- Patent number 11,275,305
- Issue date Mar 15, 2022
- Kioxia Corporation
- Yukio Oppata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, method for manufacturing transfer mask, and method for...
- Patent number 11,231,645
- Issue date Jan 25, 2022
- Hoya Corporation
- Hiroaki Shishido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask and method for manufacturing semicondu...
- Patent number 11,119,399
- Issue date Sep 14, 2021
- Hoya Corporation
- Atsushi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20240027891
- Publication date Jan 25, 2024
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT
- Publication number 20230367194
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chang HSUEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20230341760
- Publication date Oct 26, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
REFLECTIVE MASK AND FABRICATING METHOD THEREOF
- Publication number 20230229072
- Publication date Jul 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsiao-Chen WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE MASK AND DISPLAY DEVICE MANUFACTURED BY USING THE SAME
- Publication number 20230185135
- Publication date Jun 15, 2023
- SAMSUNG DISPLAY CO., LTD.
- Dong Hee SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK
- Publication number 20230148427
- Publication date May 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20230143851
- Publication date May 11, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Ayumi GODA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK
- Publication number 20230135120
- Publication date May 4, 2023
- SKC solmics Co., Ltd.
- Sung Hoon SON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20220342293
- Publication date Oct 27, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20220269161
- Publication date Aug 25, 2022
- HOYA CORPORATION
- Kota SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE
- Publication number 20220234277
- Publication date Jul 28, 2022
- LG CHEM, LTD.
- Cheol Ock Song
- G02 - OPTICS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20220229357
- Publication date Jul 21, 2022
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK
- Publication number 20220229358
- Publication date Jul 21, 2022
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUVL, REFLECTIVE MASK FOR EUVL, AND METHO...
- Publication number 20220187699
- Publication date Jun 16, 2022
- AGC Inc.
- Hiroyoshi TANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Ma...
- Publication number 20220163882
- Publication date May 26, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GLASS SUBSTRATE FOR EUVL, AND MASK BLANK FOR EUVL
- Publication number 20220137500
- Publication date May 5, 2022
- AGC Inc.
- Daisuke YOSHIMUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME,...
- Publication number 20220121102
- Publication date Apr 21, 2022
- HOYA CORPORATION
- Tsutomu SHOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method...
- Publication number 20220082925
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE TYPE BLANKMASK FOR EUV, AND METHOD FOR MANUFACTURING THE...
- Publication number 20220066311
- Publication date Mar 3, 2022
- S&S TECH CO., LTD.
- Chul-Kyu YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETICLE IN AN APPARATUS FOR EXTREME ULTRAVIOLET EXPOSURE
- Publication number 20210397076
- Publication date Dec 23, 2021
- Samsung Electronics Co., Ltd.
- Sanghyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASE SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD O...
- Publication number 20210389662
- Publication date Dec 16, 2021
- Samsung Electronics Co., Ltd.
- Hwanseok SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS
- Publication number 20210341828
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Shiyu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20210333702
- Publication date Oct 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210302826
- Publication date Sep 30, 2021
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...
- Publication number 20210278759
- Publication date Sep 9, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...
- Publication number 20210247688
- Publication date Aug 12, 2021
- HOYA CORPORATION
- Hirofumi KOZAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER...
- Publication number 20210247687
- Publication date Aug 12, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chang HSUEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV
- Publication number 20210208495
- Publication date Jul 8, 2021
- S&S TECH Co., Ltd.
- Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV MASK BLANK, PHOTOMASK MANUFACTURED BY USING THE EUV MASK BLANK,...
- Publication number 20210157226
- Publication date May 27, 2021
- Samsung Electronics Co., Ltd.
- Ho Yeon KIM
- H01 - BASIC ELECTRIC ELEMENTS

having two or more different absorber layers

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Extreme ultraviolet mask with reduced wafer neighboring effect

Phase shift mask for extreme ultraviolet lithography and a method o...

Reflective mask and fabricating method thereof

Photomask blank, method for producing photomask, and photomask

Exposure mask and display device manufactured by using the same

Extreme ultraviolet mask absorber materials

Reticle in an apparatus for extreme ultraviolet exposure

Extreme ultraviolet mask absorber materials

Reflective type blankmask and photomask for EUV

Method of manufacturing reflective mask blank, and reflective mask...

Method of forming semiconductor structure

Extreme ultraviolet mask blank with multilayer absorber and method...

Method of manufacturing extreme ultraviolet mask with reduced wafer...

EUV in-situ linearity calibration for TDI image sensors using test...

Substrate

Mirror for extreme ultraviolet light and extreme ultraviolet light...

Exposure mask and display device manufactured by using the same

Substrate with conductive film, substrate with multilayer reflectiv...

Photomask with enhanced contamination control and method of forming...

Substrate with multilayer reflective film, reflective mask blank, r...

Photomask blank, manufacturing method of photomask and photomask

EUV mask blank, photomask manufactured by using the EUV mask blank,...

Mask and manufacturing method thereof

Substrate

Photomask blank and method for preparing photomask

Method for forming photomask and photolithography method

Extreme ultraviolet mask absorber materials

Method for producing photomask, method for producing semiconductor...

Mask blank, method for manufacturing transfer mask, and method for...

Mask blank, phase shift mask and method for manufacturing semicondu...

Patents Applicationslast 30 patents

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

REFLECTIVE MASK AND FABRICATING METHOD THEREOF

EXPOSURE MASK AND DISPLAY DEVICE MANUFACTURED BY USING THE SAME

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

MULTILAYER REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLAN...

SUBSTRATE

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...

PHOTOMASK BLANK, METHOD FOR PRODUCING PHOTOMASK, AND PHOTOMASK

REFLECTIVE MASK BLANK FOR EUVL, REFLECTIVE MASK FOR EUVL, AND METHO...

Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Ma...

GLASS SUBSTRATE FOR EUVL, AND MASK BLANK FOR EUVL

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD FOR PRODUCING SAME,...

Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method...

REFLECTIVE TYPE BLANKMASK FOR EUV, AND METHOD FOR MANUFACTURING THE...

RETICLE IN AN APPARATUS FOR EXTREME ULTRAVIOLET EXPOSURE

PHASE SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD O...

EXTREME ULTRAVIOLET MASK ABSORBER MATERIALS

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

Extreme Ultraviolet Mask Absorber Materials

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, R...

METHOD OF MANUFACTURING EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER...

REFLECTIVE TYPE BLANKMASK AND PHOTOMASK FOR EUV

EUV MASK BLANK, PHOTOMASK MANUFACTURED BY USING THE EUV MASK BLANK,...