high speed

Industry

CPC
H01J2237/3326

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/3326high speed

Industries

Patents Grantslast 30 patents

Information Patent Grant
Ways to generate plasma in continuous power mode for low pressure p...
- Patent number 10,410,833
- Issue date Sep 10, 2019
- Europlasma NV
- Filip Legein
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Radical generator and molecular beam epitaxy apparatus
- Patent number 10,312,054
- Issue date Jun 4, 2019
- National University Corporation Nagoya University
- Masaru Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-chemical coating apparatus
- Patent number 10,186,401
- Issue date Jan 22, 2019
- W & L Coating Systems GmbH
- Michael Liehr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma deposition of amorphous semiconductors at microwave frequencies
- Patent number 8,273,641
- Issue date Sep 25, 2012
- Ovshinsky Innovation LLC
- Stanford R. Ovshinsky
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and apparatus for production of metal film or the like
- Patent number 7,923,374
- Issue date Apr 12, 2011
- Canon Anelva Corporation
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interconnection structure
- Patent number 7,262,500
- Issue date Aug 28, 2007
- Phyzchemix Corporation
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for production of metal film or the like
- Patent number 7,208,421
- Issue date Apr 24, 2007
- Mitsubishi Heavy Industries, Ltd.
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma CVD apparatus including rotating magnetic field generation m...
- Patent number 5,423,915
- Issue date Jun 13, 1995
- Mitsubishi Jukogyo Kagushiki Kaisha
- Masayoshi Murata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ATMOSPHERIC PLASMA PROCESSING METHOD AND ATMOSPHERIC PLASMA PROCESS...
- Publication number 20230253194
- Publication date Aug 10, 2023
- FUJIFILM CORPORATION
- Akihisa YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DODECADON TRANSFER CHAMBER AND PROCESSING SYSTEM HAVING THE SAME
- Publication number 20170352562
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Shinichi KURITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Improved Ways to Generate Plasma in Continuous Power Mode for Low P...
- Publication number 20160284518
- Publication date Sep 29, 2016
- EUROPLASMA NV
- Filip Legein
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
GROUND STATE HYDROGEN RADICAL SOURCES FOR CHEMICAL VAPOR DEPOSITION...
- Publication number 20160276140
- Publication date Sep 22, 2016
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-CHEMICAL COATING APPARATUS
- Publication number 20160211122
- Publication date Jul 21, 2016
- W & L COATING SYSTEMS GMBH
- Michael LIEHR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL GENERATOR AND MOLECULAR BEAM EPITAXY APPARATUS
- Publication number 20160181068
- Publication date Jun 23, 2016
- National University Corporation Nagoya University
- Masaru HORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARC-PLASMA FILM FORMATION DEVICE
- Publication number 20160071702
- Publication date Mar 10, 2016
- Shimadzu Corporation
- Masayasu SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20150136735
- Publication date May 21, 2015
- PANASONIC CORPORATION
- TOMOHIRO OKUMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20140335288
- Publication date Nov 13, 2014
- TOHOKU UNIVERSITY
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies
- Publication number 20130065356
- Publication date Mar 14, 2013
- Ovshinsky Innovation LLC
- Stanford R. Ovshinsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies
- Publication number 20130037755
- Publication date Feb 14, 2013
- Stanford R. Ovshinsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies
- Publication number 20120040513
- Publication date Feb 16, 2012
- Stanford R. Ovshinsky
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE
- Publication number 20100040802
- Publication date Feb 18, 2010
- Canon ANELVA Corporation
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE
- Publication number 20090311866
- Publication date Dec 17, 2009
- Canon ANELVA Corporation
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE
- Publication number 20090233442
- Publication date Sep 17, 2009
- Canon ANELVA Corporation
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for production of metal film or the like
- Publication number 20050230830
- Publication date Oct 20, 2005
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for production of metal film or the like
- Publication number 20050217579
- Publication date Oct 6, 2005
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for production of metal film or the like
- Publication number 20040029384
- Publication date Feb 12, 2004
- Hitoshi Sakamoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Ways to generate plasma in continuous power mode for low pressure p...

Radical generator and molecular beam epitaxy apparatus

Plasma-chemical coating apparatus

Plasma deposition of amorphous semiconductors at microwave frequencies

Method and apparatus for production of metal film or the like

Interconnection structure

Method and apparatus for production of metal film or the like

Plasma CVD apparatus including rotating magnetic field generation m...

Patents Applicationslast 30 patents

ATMOSPHERIC PLASMA PROCESSING METHOD AND ATMOSPHERIC PLASMA PROCESS...

DODECADON TRANSFER CHAMBER AND PROCESSING SYSTEM HAVING THE SAME

Improved Ways to Generate Plasma in Continuous Power Mode for Low P...

GROUND STATE HYDROGEN RADICAL SOURCES FOR CHEMICAL VAPOR DEPOSITION...

PLASMA-CHEMICAL COATING APPARATUS

RADICAL GENERATOR AND MOLECULAR BEAM EPITAXY APPARATUS

ARC-PLASMA FILM FORMATION DEVICE

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies

Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies

Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies

METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE

METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE

METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE

Method and apparatus for production of metal film or the like

Method and apparatus for production of metal film or the like

Method and apparatus for production of metal film or the like