High voltage power supply or regulation circuits

Industry

CPC
H01J37/241

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/241High voltage power supply or regulation circuits

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Power supply module and charged particle beam device
- Patent number 12,132,411
- Issue date Oct 29, 2024
- HITACHI HIGH-TECH CORPORATION
- Ryo Kadoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for generating particle wave carrying electric...
- Patent number 12,125,666
- Issue date Oct 22, 2024
- Yanbing Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Booster circuit and voltage generator
- Patent number 12,062,993
- Issue date Aug 13, 2024
- Mitsubishi Electric Corporation
- Masato Moriwaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aggregating capacity for depot charging
- Patent number 12,043,134
- Issue date Jul 23, 2024
- BP PULSE FLEET NORTH AMERICA INC.
- Bryan M. Chow
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Corona/plasma treatment machine
- Patent number 11,848,175
- Issue date Dec 19, 2023
- 3DT LLC
- Donald J. Weyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,830,704
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High voltage power supply
- Patent number 11,764,033
- Issue date Sep 19, 2023
- AES Global Holdings, PTE. LTD
- Gary Byfield
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF voltage and current (V-I) sensors and measurement methods
- Patent number 11,600,474
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and control method
- Patent number 11,574,798
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Current source apparatus and method
- Patent number 11,562,884
- Issue date Jan 24, 2023
- ASML Netherlands B.V.
- Yixiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective material ring
- Patent number 11,545,345
- Issue date Jan 3, 2023
- THINKON NEW TECHNOLOGY JAPAN CORPORATION
- Atsushi Ikari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling multiple plasma processes
- Patent number 11,538,670
- Issue date Dec 27, 2022
- TRUMPF Huettinger Sp. z o. o.
- Jan Peter Engelstaedter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precise plasma control system
- Patent number 11,532,457
- Issue date Dec 20, 2022
- Eagle Harbor Technologies, Inc.
- Christopher Bowman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
System and method of generating high voltage variable frequency ele...
- Patent number 11,420,070
- Issue date Aug 23, 2022
- Advanced Biotechnologies, LLC
- James William Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method for electron microscope and electron microscope
- Patent number 11,404,238
- Issue date Aug 2, 2022
- Jeol Ltd.
- Mitsuru Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance matching device and impedance matching method
- Patent number 11,387,078
- Issue date Jul 12, 2022
- Daihen Corporation
- Tatsuya Morii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compact high-voltage power supply and radiation apparatus systems a...
- Patent number 11,310,898
- Issue date Apr 19, 2022
- Schlumberger Technology Corporation
- Jani Reijonen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Space charge insensitive electron gun designs
- Patent number 11,302,510
- Issue date Apr 12, 2022
- KLA-Tencor Corporation
- Christopher Sears
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam particle beam system
- Patent number 11,239,054
- Issue date Feb 1, 2022
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosecond pulser bias compensation
- Patent number 11,222,767
- Issue date Jan 11, 2022
- Eagle Harbor Technologies, Inc.
- Timothy Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma polymerization apparatus and plasma polymerization method us...
- Patent number 11,133,159
- Issue date Sep 28, 2021
- Ming Chi University of Technology
- Jang-Hsing Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Noise reduction of a high voltage supply voltage
- Patent number 11,101,105
- Issue date Aug 24, 2021
- Applied Materials Israel Ltd.
- Denys Mets
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Discharge control apparatus and method
- Patent number 11,094,500
- Issue date Aug 17, 2021
- NGK Spark Plug Co., Ltd.
- Yuji Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,037,758
- Issue date Jun 15, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Ion plasma disintegrator
- Patent number 10,998,165
- Issue date May 4, 2021
- Bradley Nelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,973,112
- Issue date Apr 6, 2021
- HITACHI HIGH-TECH CORPORATION
- Ryo Kadoi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic lens and exciting current control method
- Patent number 10,923,312
- Issue date Feb 16, 2021
- Focus-eBeam Technology (Beijing) Co., Ltd.
- Wei He
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matching method and plasma processing apparatus
- Patent number 10,903,051
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Masato Kon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with multiple configurations
- Patent number 10,896,799
- Issue date Jan 19, 2021
- Applied Materials, Inc.
- Klaus Becker
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240429021
- Publication date Dec 26, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA LOW NOISE, HIGH STABILITY, HIGH PRECISION VOLTAGE OR CURRENT...
- Publication number 20240405655
- Publication date Dec 5, 2024
- ZEALOGICS TECHNOLOGIES PVT. LTD.
- Gursaran Singh Bhumbra
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Magnetron Sputtering
- Publication number 20240404806
- Publication date Dec 5, 2024
- Melec GmbH
- Günter Mark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Light Source with Direct Gas Injection
- Publication number 20240194454
- Publication date Jun 13, 2024
- Hamamatsu Photonics K. K.
- Donald K. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER GENERATOR WITH PARTIAL SINUSOIDAL WAVEFORM, PLASMA PROCESSING...
- Publication number 20240128892
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Hyuk Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE PLASMA CONTROL
- Publication number 20240120170
- Publication date Apr 11, 2024
- Timothy Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF POWER CONSUMPTION FOR A CHARGED PARTICLE SYSTEM
- Publication number 20240120171
- Publication date Apr 11, 2024
- FEI Company
- Casper Smit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20230290606
- Publication date Sep 14, 2023
- Hitachi High-Tech Corporation
- Yusuke ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF NUCLEAR REPROGRAMMING
- Publication number 20230282445
- Publication date Sep 7, 2023
- KYOTO UNIVERSITY
- Shinya Yamanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20230162946
- Publication date May 25, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF GENERATING HIGH VOLTAGE VARIABLE FREQUENCY ELE...
- Publication number 20230097778
- Publication date Mar 30, 2023
- Advanced Biotechnologies, LLC.
- James William Law
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR GENERATING PARTICLE WAVE CARRYING ELECTRIC...
- Publication number 20220392733
- Publication date Dec 8, 2022
- Yanbing LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Corona/Plasma Treatment Machine
- Publication number 20220310358
- Publication date Sep 29, 2022
- 3DT LLC
- Donald J. Weyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH VOLTAGE POWER SUPPLY
- Publication number 20220246390
- Publication date Aug 4, 2022
- AES Global Holdings, PTE. LTD.
- Gary Byfield
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RC IGBT, Method of Producing an RC IGBT and Method of Controlling a...
- Publication number 20220093585
- Publication date Mar 24, 2022
- Roman Baburske
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Voltage and Current (V-I) Sensors and Measurement Methods
- Publication number 20210407775
- Publication date Dec 30, 2021
- TOKYO ELECTRON LIMITED
- Justin Moses
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA POLYMERIZATION APPARATUS AND PLASMA POLYMERIZATION METHOD US...
- Publication number 20210305026
- Publication date Sep 30, 2021
- Ming Chi University of Technology
- Jang-Hsing HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPACT HIGH-VOLTAGE POWER SUPPLY AND RADIATION APPARATUS SYSTEMS A...
- Publication number 20210195721
- Publication date Jun 24, 2021
- SCHLUMBERGER TECHNOLOGY CORPORATION
- Jani Reijonen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTROSTATIC FILTER WITH SHAPED ELECTRODES
- Publication number 20210090845
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Robert C. Lindberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Control Method for Electron Microscope and Electron Microscope
- Publication number 20210074506
- Publication date Mar 11, 2021
- Mitsuru Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM PARTICLE BEAM SYSTEM
- Publication number 20210066037
- Publication date Mar 4, 2021
- Carl Zeiss MultiSEM GmbH
- Yanko Sarov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20210013001
- Publication date Jan 14, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
PROTECTIVE MATERIAL RING
- Publication number 20200365376
- Publication date Nov 19, 2020
- THINKON NEW TECHNOLOGY JAPAN CORPORATION
- Atsushi Ikari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200335306
- Publication date Oct 22, 2020
- TOKYO ELECTRON LIMITED
- Masato KON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CURRENT SOURCE APPARATUS AND METHOD
- Publication number 20200335298
- Publication date Oct 22, 2020
- ASML NETHERLANDS B.V.
- Yixiang WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHARGE CONTROL APPARATUS AND METHOD
- Publication number 20200312607
- Publication date Oct 1, 2020
- NGK SPARK PLUG CO., LTD.
- Yuji MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Impedance Matching Device and Impedance Matching Method
- Publication number 20200303166
- Publication date Sep 24, 2020
- DAIHEN Corporation
- Tatsuya Morii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION PLASMA DISINTEGRATOR
- Publication number 20200303160
- Publication date Sep 24, 2020
- Bradley Nelson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20200273670
- Publication date Aug 27, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER BIAS COMPENSATION
- Publication number 20200227230
- Publication date Jul 16, 2020
- Eagle Harbor Technologies, Inc.
- Timothy Ziemba
- H01 - BASIC ELECTRIC ELEMENTS

High voltage power supply or regulation circuits

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Power supply module and charged particle beam device

Apparatus and method for generating particle wave carrying electric...

Booster circuit and voltage generator

Aggregating capacity for depot charging

Corona/plasma treatment machine

Plasma processing apparatus and control method

High voltage power supply

RF voltage and current (V-I) sensors and measurement methods

Plasma processing apparatus and control method

Current source apparatus and method

Protective material ring

Controlling multiple plasma processes

Precise plasma control system

In-situ plasma cleaning of process chamber components

System and method of generating high voltage variable frequency ele...

Control method for electron microscope and electron microscope

Impedance matching device and impedance matching method

Compact high-voltage power supply and radiation apparatus systems a...

Space charge insensitive electron gun designs

Multi-beam particle beam system

Nanosecond pulser bias compensation

Plasma polymerization apparatus and plasma polymerization method us...

Noise reduction of a high voltage supply voltage

Discharge control apparatus and method

In-situ plasma cleaning of process chamber components

Ion plasma disintegrator

Charged particle beam device

Magnetic lens and exciting current control method

Matching method and plasma processing apparatus

Ion source with multiple configurations

Patents Applicationslast 30 patents

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

ULTRA LOW NOISE, HIGH STABILITY, HIGH PRECISION VOLTAGE OR CURRENT...

Method for Magnetron Sputtering

Inductively Coupled Plasma Light Source with Direct Gas Injection

POWER GENERATOR WITH PARTIAL SINUSOIDAL WAVEFORM, PLASMA PROCESSING...

HIGH VOLTAGE PLASMA CONTROL

REDUCTION OF POWER CONSUMPTION FOR A CHARGED PARTICLE SYSTEM

Charged Particle Beam Device

METHOD OF NUCLEAR REPROGRAMMING

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

SYSTEM AND METHOD OF GENERATING HIGH VOLTAGE VARIABLE FREQUENCY ELE...

APPARATUS AND METHOD FOR GENERATING PARTICLE WAVE CARRYING ELECTRIC...

Corona/Plasma Treatment Machine

HIGH VOLTAGE POWER SUPPLY

RC IGBT, Method of Producing an RC IGBT and Method of Controlling a...

RF Voltage and Current (V-I) Sensors and Measurement Methods

PLASMA POLYMERIZATION APPARATUS AND PLASMA POLYMERIZATION METHOD US...

COMPACT HIGH-VOLTAGE POWER SUPPLY AND RADIATION APPARATUS SYSTEMS A...

ELECTROSTATIC FILTER WITH SHAPED ELECTRODES

Control Method for Electron Microscope and Electron Microscope

MULTI-BEAM PARTICLE BEAM SYSTEM

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

PROTECTIVE MATERIAL RING

MATCHING METHOD AND PLASMA PROCESSING APPARATUS

CURRENT SOURCE APPARATUS AND METHOD

DISCHARGE CONTROL APPARATUS AND METHOD

Impedance Matching Device and Impedance Matching Method

ION PLASMA DISINTEGRATOR

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

NANOSECOND PULSER BIAS COMPENSATION