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H01J2237/3355

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

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H01J2237/3355Holes or apertures

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment apparatus and method
- Patent number 11,538,664
- Issue date Dec 27, 2022
- JCU CORPORATION
- Keisuke Asano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extraction apparatus and system for high throughput ion beam proces...
- Patent number 11,127,556
- Issue date Sep 21, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to apply surface release coating for imprint mold
- Patent number 8,337,959
- Issue date Dec 25, 2012
- Nanonex Corporation
- Wei Zhang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for cleaning substrates
- Patent number 6,908,865
- Issue date Jun 21, 2005
- Applied Materials, Inc.
- Martin Kranz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma desmearing apparatus and method
- Patent number 4,425,210
- Issue date Jan 10, 1984
- Fazal A. Fazlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor and method therefor
- Patent number 4,399,014
- Issue date Aug 16, 1983
- Frank W. Engle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma desmearing apparatus and method
- Patent number 4,328,081
- Issue date May 4, 1982
- Micro-Plate, Inc.
- Fazal A. Fazlin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor and method therefor
- Patent number 4,289,598
- Issue date Sep 15, 1981
- Technics, Inc.
- Frank W. Engle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas plasma reactor for circuit boards and the like
- Patent number 4,285,800
- Issue date Aug 25, 1981
- Branson International Plasma Corp.
- Joseph M. Welty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform plasma etching system
- Patent number 4,282,077
- Issue date Aug 4, 1981
- General Dynamics, Pomona Division
- Joseph A. Reavill
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ENHANCED DRY DESMEAR EQUIPMENT WITH PROTECTIVE FILM PEELING CAPABIL...
- Publication number 20240222089
- Publication date Jul 4, 2024
- Intel Corporation
- Ala OMER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SEMICONDUCTOR STRUCTURE
- Publication number 20230022624
- Publication date Jan 26, 2023
- Changxin Memory Technologies, Inc.
- Ning XI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS AND METHOD
- Publication number 20190096637
- Publication date Mar 28, 2019
- JCU CORPORATION
- Keisuke Asano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method And Apparatus To Apply Surface Release Coating For Imprint Mold
- Publication number 20110155060
- Publication date Jun 30, 2011
- Wei Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS TO APPLY SURFACE RELEASE COATING FOR IMPRINT MOLD
- Publication number 20080131623
- Publication date Jun 5, 2008
- Wei Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etching method and apparatus
- Publication number 20040192053
- Publication date Sep 30, 2004
- TOKYO ELECTRON LIMITED
- Kiwamu Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for cleaning substrates
- Publication number 20030062333
- Publication date Apr 3, 2003
- APPLIED MATERIALS, INC.
- Martin Kranz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Desmearing process/apparatus for pulse-type D.C. plasma
- Publication number 20030048591
- Publication date Mar 13, 2003
- Saturn Vac Co., Ltd.
- Robert Jann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for fabricating printed circuit board using at...
- Publication number 20020148816
- Publication date Oct 17, 2002
- Chang Bo Jung
- H01 - BASIC ELECTRIC ELEMENTS

Holes or apertures

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma treatment apparatus and method

Extraction apparatus and system for high throughput ion beam proces...

Method and apparatus to apply surface release coating for imprint mold

Method and apparatus for cleaning substrates

Plasma desmearing apparatus and method

Plasma reactor and method therefor

Plasma desmearing apparatus and method

Plasma reactor and method therefor

Gas plasma reactor for circuit boards and the like

Uniform plasma etching system

Patents Applicationslast 30 patents

ENHANCED DRY DESMEAR EQUIPMENT WITH PROTECTIVE FILM PEELING CAPABIL...

METHOD FOR PROCESSING SEMICONDUCTOR STRUCTURE

PLASMA TREATMENT APPARATUS AND METHOD

Method And Apparatus To Apply Surface Release Coating For Imprint Mold

METHOD AND APPARATUS TO APPLY SURFACE RELEASE COATING FOR IMPRINT MOLD

Etching method and apparatus

Method and apparatus for cleaning substrates

Desmearing process/apparatus for pulse-type D.C. plasma

Method and apparatus for fabricating printed circuit board using at...