Hollow cathodes

Industry

CPC
H01J37/32596

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32596Hollow cathodes

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus for generating etchants for remote plasma processes
- Patent number 12,002,659
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for symmetrical hollow cathode electrode and...
- Patent number 11,901,161
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source utilizing a macro-particle reduction coating and meth...
- Patent number 11,875,976
- Issue date Jan 16, 2024
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hollow cathode, an apparatus including a hollow cathode for manufac...
- Patent number 11,798,788
- Issue date Oct 24, 2023
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for controlling radicals using a radical filter
- Patent number 11,721,530
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,715,623
- Issue date Aug 1, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,676,797
- Issue date Jun 13, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DC plasma control for electron enhanced material processing
- Patent number 11,664,195
- Issue date May 30, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of low-temperature plasma generation, method of an electrica...
- Patent number 11,651,937
- Issue date May 16, 2023
- FYZIKALINI USTAV AV CR, V.V.I.
- ZdenZden{hacek over (e)}k Hubicka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma so...
- Patent number 11,640,900
- Issue date May 2, 2023
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,587,766
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for symmetrical hollow cathode electrode and...
- Patent number 11,373,845
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for coating surfaces
- Patent number 11,348,759
- Issue date May 31, 2022
- AGM Container Controls, Inc.
- Andrew Tudhope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion injector and lens system for ion beam milling
- Patent number 11,062,920
- Issue date Jul 13, 2021
- Lam Research Corporation
- Ivan L. Berry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,043,361
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of manufacturing semiconduct...
- Patent number 10,950,414
- Issue date Mar 16, 2021
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for plasma discharge in liquid
- Patent number 10,793,447
- Issue date Oct 6, 2020
- ENERGY ONVECTOR, LLC
- Jun Kang
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Grant
Plasma source utilizing a macro-particle reduction coating and meth...
- Patent number 10,755,901
- Issue date Aug 25, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hollow cathode plasma source
- Patent number 10,586,685
- Issue date Mar 10, 2020
- AGC GLASS EUROPE
- Thomas Biquet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source and methods for depositing thin film coatings using p...
- Patent number 10,580,625
- Issue date Mar 3, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- Peter Maschwitz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source and methods for depositing thin film coatings using p...
- Patent number 10,580,624
- Issue date Mar 3, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- Peter Maschwitz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of extracting and accelerating ions
- Patent number 10,573,499
- Issue date Feb 25, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma device driven by multiple-phase alternating or pulsed electr...
- Patent number 10,559,452
- Issue date Feb 11, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow cathode plasma source
- Patent number 10,535,503
- Issue date Jan 14, 2020
- AGC GLASS EUROPE
- Thomas Biquet
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma source and methods for depositing thin film coatings using p...
- Patent number 10,529,544
- Issue date Jan 7, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- Peter Maschwitz
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Plasma device driven by multiple-phase alternating or pulsed electr...
- Patent number 10,529,545
- Issue date Jan 7, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of extracting and accelerating ions
- Patent number 10,529,546
- Issue date Jan 7, 2020
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma device driven by multiple-phase alternating or pulsed electr...
- Patent number 10,483,094
- Issue date Nov 19, 2019
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of extracting and accelerating ions
- Patent number 10,483,095
- Issue date Nov 19, 2019
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HOLLOW CATHODE SYSTEM FOR GENERATING A PLASMA AND METHOD FOR OPERAT...
- Publication number 20240062995
- Publication date Feb 22, 2024
- Fraunhofer Gesellschaft zur Forderung der angewandten Forschung e.V.
- Henrik Flaske
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH CURRENT HEATERLESS HOLLOW CATHODE
- Publication number 20240014014
- Publication date Jan 11, 2024
- California Institute of Technology
- Dan M. GOEBEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES
- Publication number 20230402262
- Publication date Dec 14, 2023
- Tae Seung CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS
- Publication number 20230386797
- Publication date Nov 30, 2023
- Peter CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20230197406
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20230144264
- Publication date May 11, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20230143453
- Publication date May 11, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING
- Publication number 20230140979
- Publication date May 11, 2023
- VELVETCH LLC
- William Andrew Goddard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20230082246
- Publication date Mar 16, 2023
- KIOXIA Corporation
- Kazuya YOSHIMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...
- Publication number 20220293396
- Publication date Sep 15, 2022
- Applied Materials, Inc.
- Tae Seung CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON PLASMA APPARATUS
- Publication number 20220181129
- Publication date Jun 9, 2022
- BB PLASMA DESIGN AB
- Ladislav BARDOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS...
- Publication number 20220127726
- Publication date Apr 28, 2022
- Hana Baránková
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING TOOL CAPABLE OF MODULATING ONE OR MORE PLASMA...
- Publication number 20220119954
- Publication date Apr 21, 2022
- Lee CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR COATING METAL
- Publication number 20220018021
- Publication date Jan 20, 2022
- AGC Glass Europe
- Grégory ARNOULT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...
- Publication number 20210384011
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Tae Seung CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20210313147
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR CONTROLLING RADICALS USING A RADICAL FILTER
- Publication number 20210265139
- Publication date Aug 26, 2021
- Applied Materials, Inc.
- Christopher R. Hatem
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Cyclotron Rotation (ECR)-Enhanced Hollow Cathode Plasma So...
- Publication number 20210249234
- Publication date Aug 12, 2021
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...
- Publication number 20210057193
- Publication date Feb 25, 2021
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF LOW-TEMPERATURE PLASMA GENERATION, METHOD OF AN ELECTRICA...
- Publication number 20210050181
- Publication date Feb 18, 2021
- FYZIKALNI USTAV AV CR, V.V.I.
- Zdenek Hubicka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIAMOND-LIKE CARBON SYNTHESIZED BY ATMOSPHERIC PLASMA
- Publication number 20210002759
- Publication date Jan 7, 2021
- SAMU TECHNOLOGY, LLC
- Jinqiu Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF...
- Publication number 20200408959
- Publication date Dec 31, 2020
- Trion Technology
- Addison Randolph Crockett
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE UTILIZING A MACRO-PARTICLE REDUCTION COATING AND METH...
- Publication number 20200350144
- Publication date Nov 5, 2020
- AGC Flat Glass North America, Inc.
- John CHAMBERS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR COATING SURFACES
- Publication number 20200118793
- Publication date Apr 16, 2020
- DURALAR TECHNOLOGIES, LLC
- Andrew Tudhope
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Device with an External RF Hollow Cathode for Plasma Cleanin...
- Publication number 20200058472
- Publication date Feb 20, 2020
- XEI SCIENTIFIC, INC.
- Ronald A. Vane
- B08 - CLEANING
Information Patent Application
LINEAR PLASMA SOURCE WITH SEGMENTED HOLLOW CATHODE
- Publication number 20200058473
- Publication date Feb 20, 2020
- AGC Glass Europe
- Hugues WIAME
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CONTROLLING THE DEPOSITION RATE OF THIN FILMS IN A VACUU...
- Publication number 20190276937
- Publication date Sep 12, 2019
- FYZIKALNI USTAV AV CR, V.V.I.
- Jiri OLEJNICEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus and Method of Manufacturing Semiconduct...
- Publication number 20190122866
- Publication date Apr 25, 2019
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...
- Publication number 20190122867
- Publication date Apr 25, 2019
- Samsung Electronics Co., Ltd.
- Sang Ki Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWER HEAD AND VACUUM PROCESSING APPARATUS
- Publication number 20190055651
- Publication date Feb 21, 2019
- ULVAC, Inc.
- YOSUKE JINBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hollow cathodes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for generating etchants for remote plasma processes

Symmetric VHF source for a plasma reactor

Methods and apparatus for symmetrical hollow cathode electrode and...

Plasma source utilizing a macro-particle reduction coating and meth...

Hollow cathode, an apparatus including a hollow cathode for manufac...

System for controlling radicals using a radical filter

DC plasma control for electron enhanced material processing

DC plasma control for electron enhanced material processing

DC plasma control for electron enhanced material processing

Method of low-temperature plasma generation, method of an electrica...

Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma so...

Symmetric VHF source for a plasma reactor

Methods and apparatus for symmetrical hollow cathode electrode and...

Systems and methods for coating surfaces

Ion injector and lens system for ion beam milling

Symmetric VHF source for a plasma reactor

Plasma processing apparatus and method of manufacturing semiconduct...

System and method for plasma discharge in liquid

Plasma source utilizing a macro-particle reduction coating and meth...

Hollow cathode plasma source

Plasma source and methods for depositing thin film coatings using p...

Plasma source and methods for depositing thin film coatings using p...

Method of extracting and accelerating ions

Plasma device driven by multiple-phase alternating or pulsed electr...

Hollow cathode plasma source

Plasma source and methods for depositing thin film coatings using p...

Plasma device driven by multiple-phase alternating or pulsed electr...

Method of extracting and accelerating ions

Plasma device driven by multiple-phase alternating or pulsed electr...

Method of extracting and accelerating ions

Patents Applicationslast 30 patents

HOLLOW CATHODE SYSTEM FOR GENERATING A PLASMA AND METHOD FOR OPERAT...

HIGH CURRENT HEATERLESS HOLLOW CATHODE

APPARATUS FOR GENERATING ETCHANTS FOR REMOTE PLASMA PROCESSES

PLASMA GENERATING APPARATUS

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING

DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING

DC PLASMA CONTROL FOR ELECTRON ENHANCED MATERIAL PROCESSING

SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICON...

METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...

MAGNETRON PLASMA APPARATUS

METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS...

SUBSTRATE PROCESSING TOOL CAPABLE OF MODULATING ONE OR MORE PLASMA...

METHOD FOR COATING METAL

METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SYSTEM FOR CONTROLLING RADICALS USING A RADICAL FILTER

Electron Cyclotron Rotation (ECR)-Enhanced Hollow Cathode Plasma So...

HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...

METHOD OF LOW-TEMPERATURE PLASMA GENERATION, METHOD OF AN ELECTRICA...

DIAMOND-LIKE CARBON SYNTHESIZED BY ATMOSPHERIC PLASMA

APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF...

PLASMA SOURCE UTILIZING A MACRO-PARTICLE REDUCTION COATING AND METH...

SYSTEMS AND METHODS FOR COATING SURFACES

Plasma Device with an External RF Hollow Cathode for Plasma Cleanin...

LINEAR PLASMA SOURCE WITH SEGMENTED HOLLOW CATHODE

METHOD FOR CONTROLLING THE DEPOSITION RATE OF THIN FILMS IN A VACUU...

Plasma Processing Apparatus and Method of Manufacturing Semiconduct...

HOLLOW CATHODE, AN APPARATUS INCLUDING A HOLLOW CATHODE FOR MANUFAC...

SHOWER HEAD AND VACUUM PROCESSING APPARATUS