The present invention is generally related to coatings, and more particularly to diamond-like carbon synthesized by atmospheric plasma.
In general, Diamond-like carbon (DLC) is a class of amorphous carbon material that displays some of the typical properties of diamond. DLC is a mixture of Sp3 bonded diamond structure and Sp2 bonded graphite structure, DLC is usually applied as coatings to other materials that could benefit from some of those properties.
Current DLC coating technologies depend on vacuum technology, which make DLC coatings on large surfaces and inner surfaces of a specific surface difficult.
The following presents a simplified summary of the innovation in order to provide a basic understanding of some aspects of the invention. This summary is not an extensive overview of the invention. It is intended to neither identify key or critical elements of the invention nor delineate the scope of the invention. Its sole purpose is to present some concepts of the invention in a simplified form as a prelude to the more detailed description that is presented later.
In general, in one aspect, the invention features a system including a tube having a gas inlet and a plasma outlet, the tube configured to generate a plasma, a helical coil surrounding a surface of the tube, a radio frequency generator, and a matching box, the helical coil linked to matching box, the radio frequency generator linked to the matching box.
In another aspect, the invention features a method including a shell having a gas inlet and a plasma outlet, a refractory tube included in the shell, the refractory tube including an orifice to the plasma outlet, a hollow cathode centrally positioned within the refractory tube, an anode surrounding an interior wall of the refractory tube, an anode surrounding an interior wall of the refractory tube, wherein application of power between the anode and the hollow cathode causes atoms in the gas to ionize to generate a charged particle plasma.
In still another aspect, the invention features a system including a structure including an upper chamber linked to a lower chamber, the upper chamber including a gas inlet configured to enable a gas to enter the upper chamber, the lower chamber including a plasma outlet, a microwave generator configured to deliver a microwave to the upper chamber causing atoms in the gas to ionize to generate a charged particle microwave plasma, a hollow cathode centrally positioned within the lower chamber and an anode surrounding an interior wall of the lower chamber, and a power source for generating power, the current flowing between the anode and the hollow cathode causing atoms in the gas to ionize to generate a charged particle hollow cathode plasma.
In yet another aspect, the invention features a method of synthesizing diamond-like carbon by atmospheric plasma including introducing a gas into an inlet of a first chamber of a quartz tube, applying electromagnetic radiation in a microwave range to the gas, causing atoms in the gas to ionize to generate a charged particle microwave plasma, receiving the gas in a second chamber of the quartz tube, the second chamber including a hollow cathode centrally positioned within and an anode surrounding an interior wall, applying power to the second chamber to enable a current to flow between the hollow cathode and anode, causing atoms in the gas to ionize to generate a charged particle hollow cathode plasma, and releasing the microwave plasma and hollow cathode plasma through a plasma outlet as a plume plasma.
The invention may include one or more of the following advantages.
Systems of the present invention generate a DLC without the need of a the vacuum system
Systems of the present invention generate a high density plasma.
Systems of the present invention generate a plasma that can be irradiated directly to an object.
Systems of the present invention are applicable to things that cannot be placed in a vacuum.
Systems of the present invention generate a low temperature plasma that can be used to irradiate substances sensitive to heat.
These and other features and advantages will be apparent from a reading of the following detailed description and a review of the associated drawings. It is to be understood that both the foregoing general description and the following detailed description are explanatory only and are not restrictive of aspects as claimed.
These and other features, aspects, and advantages of the present invention will become better understood with reference to the following description, appended claims, and accompanying drawings where:
The subject innovation is now described with reference to the drawings, wherein like reference numerals are used to refer to like elements throughout. In the following description, for purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It may be evident, however, that the present invention may be practiced without these specific details. In other instances, well-known structures and devices are shown in block diagram form in order to facilitate describing the present invention.
As shown in
In operation, a gas 114 is introduced into a chamber of the tube 102 and a diamond-like carbon (DLC) plasma 116 is generated within the tube 102. DLC is a class of amorphous carbon material that displays some of the typical properties of diamond. DLC is usually applied as coatings to other materials that could benefit from some of those properties. The gas 114 includes a mixture of at least two gases, i.e., a carbon containing gas and an inert gas. The carbon containing gas may include, for example, acetylene (C2H2), methane (CH4), or other carbon containing gas. The inert gas may include, for example, argon (Ar), helium (He), or other inert gas.
When the gas 114 is within the chamber of the tube 102, RF power is transmitted from the RF generator 110 to the chamber through the matching box 112. The application of power causes the atoms in the gas 114 to either gain or lose electrons (ionization) and the end result is a charged particle plasma. The matching box 112 is used to match an impedance between a transmitter and a receiver by tuning a series adjustable capacitor and a parallel capacitor. More specifically, the RF power generator 110, the matching box 112, the helical coil 108 and plasma constitute a circuit loop, and by adjusting the matching box 112 the plasma output 116 can be made more stable. In this manner, the DLC output 116 is made by atmospheric plasma that does not depend on any type of vacuum technology.
The DLC coating 116 is generated using high wattage and low current. For example, an average applied voltage range is 9 kilovolts (kv). An average applied current range in less than 1 amp (A) and preferably between 400-500 mA. An average applied power range is preferably less than 50 watts (W) and typically does not exceed 100 W. An average power is preferably less than 50 watts (W) and typically not greater than 100 W. The temperature range of the plasma being generated is preferably less than 100° C.
As shown in
The chamber may constructed of, for example, quartz or ceramic, or other materials. An exterior surface of the tube is surrounded by helical coil. The helical coil linked to a radio frequency (RF) generator through a matching box.
The introduced gas may include a mixture of at least two gases, i.e., a carbon containing gas and an inert gas. The carbon containing gas may include, for example, acetylene (C2H2), methane (CH4), or other carbon containing gas.
Process 150 transmits (154) power from a RF generator through a matching box to the coil surrounding the chamber housing the introduced gas.
Process 150 generates (156) a plasma in the chamber and from this generated plasma a diamond-like coating (DLC) exits (158) the chamber.
As shown in
A hollow cathode 212 is centrally positioned within the refractory tube 208 while an anode 214 surrounds an interior wall of the refractory tube 208. Application of power between the anode 214 and the hollow cathode 212 causes a generation of a plasma 216, i.e., the current flowing between the anode 214 and the hollow cathode 212 causes the atoms in the gas to either gain or lose electrons (ionization) and the end result is a charged particle plasma.
More specifically, gas entering the gas inlet 204 enters the refractory tube 208 and application of power across the anode 214 generates a plasma. The gas entering the gas inlet 204 includes a mixture of at least two gases, i.e., a carbon containing gas and an inert gas. The carbon containing gas may include, for example, acetylene (C2H2), methane (CH4), or other carbon containing gas.
Generated plasma is compressed in the orifice 210, making a plume plasma 216 (i.e., DLC coating) exiting the more dense.
Here again, a temperature range of the plume plasma 216 being generated is typically less than 100° C.
As shown in
The shell includes a refractory tube, also referred to as a cathode plasma generation chamber. The refractory tube includes an orifice that is an opening from the refractory tube to a plasma outlet on the shell.
A hollow cathode is centrally positioned within the refractory tube while an anode 214 surrounds an interior wall of the refractory tube.
Process 250 applies (254) power between the anode and the hollow cathode which generates (256) a plasma.
Process 250 compresses (258) the generated plasma in the orifice and a plume plasma exits the plasma outlet.
As shown in
The lower chamber 304 includes a hollow cathode 314 centrally positioned within and an anode 316 surrounding an interior wall. Application of power between the anode 316 and the hollow cathode 314 causes a generation of a hollow cathode plasma 318. A power source 322 generates pulse DC power across the cathode 314 and anode 316 of the lower chamber 304 to generate the hollow cathode plasma 318. Subsequently, a DLC coating exits the plasma outlet 308, which may be deposited on a surface 320.
Gas flowing into the gas inlet 306 includes a mixture of at least two gases, i.e., a carbon containing gas and an inert gas. The carbon containing gas may include, for example, acetylene (C2H2), methane (CH4), or other carbon containing gas.
As shown in
Process 350 delivers (354) a microwave to the upper chamber.
Process 350 generates (356) a microwave plasma upon receiving the microwave.
Process 350 delivers (358) the gas and microwave plasma to the lower chamber. The lower chamber includes a hollow cathode centrally positioned within and an anode surrounding an interior wall.
Process 350 applies (360) power between the anode and the hollow cathode and generates (362) a hollow cathode plasma.
Process 350 delivers (364) the microwave plasma and hollow cathode plasma through an outlet on the lower chamber as a plume plasma.
It would be appreciated by those skilled in the art that various changes and modifications can be made to the illustrated embodiments without departing from the spirit of the present invention. All such modifications and changes are intended to be within the scope of the present invention except as limited by the scope of the appended claims.
This application claims benefit from U.S. Provisional Patent Application Ser. No. 62/921,656, filed Jul. 1, 2019, which is incorporated by reference in its entirety.
Number | Date | Country | |
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62921656 | Jul 2019 | US |