Homogenization of illumination intensity in the mask plane, by using an integrator

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G03F7/70075

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70075Homogenization of illumination intensity in the mask plane, by using an integrator

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Patents Grantslast 30 patents

Information Patent Grant
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- Carl Zeiss SMT GmbH
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Optical module with an anticollision device for module components
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Method for producing an illumination system for an EUV projection e...
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LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...
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EUV LIGHT UNIFORMITY CONTROL APPARATUS, EUV EXPOSURE EQUIPMENT INCL...
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MASK EXPOSURE SYSTEM AND MASK EXPOSURE METHOD
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FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
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COMPONENT OF AN OPTICAL SYSTEM
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OPTICAL ARRANGEMENT AND LITHOGRAPHY APPARATUS
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APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
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OPTICAL BEAM HOMOGENIZER BASED ON A LENS ARRAY
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- Publication date Jun 24, 2021
- KULICKE & SOFFA LITEQ B.V.
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Homogenization of illumination intensity in the mask plane, by using an integrator

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Light adjustment module

Method for generating a mathematical model for positioning individu...

Radiation system

Light source apparatus, optical apparatus, exposure apparatus, devi...

High uniformity telecentric illuminator

Method of assembling a facet mirror of an optical system

Field facet system, optical arrangement and lithography apparatus

Facet mirror for an illumination optical unit of a projection expos...

Apparatus for lithographically forming wafer identification marks a...

Imaging optical unit for EUV microlithography

Method for producing a reflecting optical element of a projection e...

Optical arrangement and lithography apparatus

Pupil facet mirror, illumination optics and optical system for a pr...

Photolithography device having illuminator and method for adjusting...

Method and apparatus for determining a radiation beam intensity pro...

Light source apparatus, optical apparatus, exposure apparatus, devi...

Illumination optical system for projection lithography

Exposure apparatus, and article manufacturing method

Exposure apparatus, and article manufacturing method

Component for a mirror array for EUV lithography

Exposure equipment and exposure method

Euv lithography system for dense line patterning

Test of operational status of a digital scanner during lithographic...

Method for producing a reflective optical element and reflective op...

Pupil facet mirror, illumination optics and optical system for a pr...

Optical module with an anticollision device for module components

Method for producing an illumination system for an EUV projection e...

Optical beam homogenizer based on a lens array

Multi-mirror UV-LED optical lithography system

Optical assembly with a protective element and optical arrangement...

Patents Applicationslast 30 patents

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD...

EXPOSURE DEVICE

FAST UNIFORMITY DRIFT CORRECTION

PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURI...

OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION D...

LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...

EUV LIGHT UNIFORMITY CONTROL APPARATUS, EUV EXPOSURE EQUIPMENT INCL...

MASK EXPOSURE SYSTEM AND MASK EXPOSURE METHOD

HIGH-PERFORMANCE EUV MICROSCOPE DEVICE WITH FREE-FORM ILLUMINATION...

FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS

FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS

FACET ASSEMBLY FOR A FACET MIRROR

COMPONENT OF AN OPTICAL SYSTEM

LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...

FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOS...

FIELD FACET SYSTEM, OPTICAL ARRANGEMENT AND LITHOGRAPHY APPARATUS

METHOD FOR GENERATING A MATHEMATICAL MODEL FOR POSITIONING INDIVIDU...

OPTICAL ARRANGEMENT AND LITHOGRAPHY APPARATUS

APPARATUS AND METHOD FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY

PUPIL FACET MIRROR, ILLUMINATION OPTICS AND OPTICAL SYSTEM FOR A PR...

MULTI-MIRROR UV-LED OPTICAL LITHOGRAPHY SYSTEM

OPTICAL BEAM HOMOGENIZER BASED ON A LENS ARRAY

METHOD FOR PRODUCING A REFLECTING OPTICAL ELEMENT OF A PROJECTION E...

PHOTOGRAPHY DEVICE HAVING ILLUMINATOR AND METHOD FOR ADJUSTING INTE...

LIGHT SOURCE APPARATUS, OPTICAL APPARATUS, EXPOSURE APPARATUS, DEVI...

EXPOSURE EQUIPMENT AND EXPOSURE METHOD

IMAGING OPTICAL UNIT FOR EUV MICROLITHOGRAPHY

ILLUMINATION OPTIC FOR PROJECTION LITHOGRAPHY