Hygiene

Industry

CPC
H01J37/32853

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32853Hygiene

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Particle removal during fabrication of electrochromic devices
- Patent number 12,360,425
- Issue date Jul 15, 2025
- View Operating Corporation
- Robert T. Rozbicki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for conductance liners in semiconductor proce...
- Patent number 12,354,847
- Issue date Jul 8, 2025
- Applied Materials, Inc.
- Timothy Joseph Franklin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shutter disc for a semiconductor processing tool
- Patent number 12,215,414
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Lin Wang
- B08 - CLEANING
Information Patent Grant
Conditioning treatment for ALD productivity
- Patent number 12,195,845
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Christina L. Engler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conditioning chamber component
- Patent number 12,064,795
- Issue date Aug 20, 2024
- Lam Research Corporation
- Amir A. Yasseri
- B08 - CLEANING
Information Patent Grant
Micro-surface morphological matching for reactor components
- Patent number 11,901,164
- Issue date Feb 13, 2024
- Intel Corporation
- Patrick Whiting
- B08 - CLEANING
Information Patent Grant
Shutter disc for a semiconductor processing tool
- Patent number 11,827,970
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Lin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber processes for reducing backside particles
- Patent number 11,702,738
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Yi Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment module with a cleaning chamber
- Patent number 11,637,004
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Alexander N. Lerner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 11,569,069
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Conditioning treatment for ALD productivity
- Patent number 11,566,324
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Christina L. Engler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitive sensing data integration for plasma chamber condition mo...
- Patent number 11,545,346
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for aligning a mask with a substrate
- Patent number 11,538,706
- Issue date Dec 27, 2022
- Applied Materials, Inc.
- Alexander N. Lerner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning method
- Patent number 11,517,942
- Issue date Dec 6, 2022
- Edwards, S.R.O.
- Martin Zahradka
- B08 - CLEANING
Information Patent Grant
Low contamination chamber for surface activation
- Patent number 11,508,562
- Issue date Nov 22, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Yin Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system having an inspection tool and controller t...
- Patent number 11,276,564
- Issue date Mar 15, 2022
- Lam Research Corporation
- Richard Alan Gottscho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and cleaning method
- Patent number 11,264,218
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Wataru Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,145,494
- Issue date Oct 12, 2021
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Shogo Okita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Micro-surface morphological matching for reactor components
- Patent number 11,139,151
- Issue date Oct 5, 2021
- Intel Corporation
- Patrick Whiting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conditioning chamber component
- Patent number 10,967,407
- Issue date Apr 6, 2021
- Lam Research Corporation
- Amir A. Yasseri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning a substrate processing apparatus and the substra...
- Patent number 10,944,051
- Issue date Mar 9, 2021
- Tokyo Electron Limited
- Takuya Kubo
- G11 - INFORMATION STORAGE
Information Patent Grant
Substrate processing chamber with showerhead having cooled faceplate
- Patent number 10,900,124
- Issue date Jan 26, 2021
- Lam Research Corporation
- Damodar Rajaram Shanbhag
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching organic region
- Patent number 10,903,085
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition tool and operating method thereof
- Patent number 10,879,049
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Ta Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Textured skin for chamber components
- Patent number 10,872,749
- Issue date Dec 22, 2020
- Applied Materials, Inc.
- Gangadhar Sheelavant
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for fabrication semiconductor device
- Patent number 10,867,843
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shao-Kuan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D printed chamber components configured for lower film stress and...
- Patent number 10,777,391
- Issue date Sep 15, 2020
- Applied Materials, Inc.
- Kadthala R. Narendrnath
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Plasma film forming method
- Patent number 10,734,219
- Issue date Aug 4, 2020
- ASM IP Holdings B.V.
- Fumitaka Shoji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit shield for improved particle reduction
- Patent number 10,718,049
- Issue date Jul 21, 2020
- Applied Materials, Inc.
- Muhammad Rasheed
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 10,714,355
- Issue date Jul 14, 2020
- Tokyo Electron Limited
- Hiroki Sato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM
- Publication number 20250232953
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Ryan T. DOWNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT SYSTEM
- Publication number 20250226189
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Toshiki AKAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...
- Publication number 20250207249
- Publication date Jun 26, 2025
- ASM IP HOLDING B.V.
- Toshiharu Watarai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST
- Publication number 20250166976
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
- Publication number 20250137114
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Lin WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250104981
- Publication date Mar 27, 2025
- Hitachi High-Tech Corporation
- Kosa HIROTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVERTED PLASMA SOURCE, AND METHOD
- Publication number 20250087457
- Publication date Mar 13, 2025
- MKS Instruments, Inc.
- Gordon HILL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...
- Publication number 20250052272
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Rohit Ode
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD
- Publication number 20250046585
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Tatsuru OKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250006473
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Yuki ONODERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS
- Publication number 20240429062
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Alok Ranjan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PRECLEAN APPARATUS AND PROCESSING METHOD FOR IMPURITY REM...
- Publication number 20240404803
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- Yoon Ah SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONING CHAMBER COMPONENT
- Publication number 20240383017
- Publication date Nov 21, 2024
- LAM RESEARCH CORPORATION
- Amir A. YASSERI
- B08 - CLEANING
Information Patent Application
METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE...
- Publication number 20240290586
- Publication date Aug 29, 2024
- WONIK IPS CO., LTD.
- Jae Hun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED DRY CLEANING APPARATUS AND METHOD FOR DRIVE DEVICE
- Publication number 20240194460
- Publication date Jun 13, 2024
- LC Tech Co., Ltd.
- Jong Hwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...
- Publication number 20240150894
- Publication date May 9, 2024
- ASM IP HOLDING B.V.
- Toshiharu Watarai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING METHOD AND PLASMA PROCESSING METHOD
- Publication number 20240087858
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Junichi SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE
- Publication number 20240047185
- Publication date Feb 8, 2024
- Applied Materials, Inc.
- Abhijit A. Kangude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240006161
- Publication date Jan 4, 2024
- ASM IP HOLDING B.V.
- HaeIn Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
- Publication number 20230383397
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Lin WANG
- B08 - CLEANING
Information Patent Application
CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...
- Publication number 20230343568
- Publication date Oct 26, 2023
- Applied Materials, Inc.
- Yaoling Pan
- G01 - MEASURING TESTING
Information Patent Application
PLASMA DEVICE FOR GAS-BASED SURFACE TREATMENT AND WATER ACTIVATION
- Publication number 20230298858
- Publication date Sep 21, 2023
- The Regents of the University of Michigan
- John Foster
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR FILLING GAP FEATURES ON SUBSTRATE SURFACES
- Publication number 20230295795
- Publication date Sep 21, 2023
- ASM IP HOLDING B.V.
- Yasiel Cabrera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, AND WATERPROOFING DEVICE FOR ACOUST...
- Publication number 20230268194
- Publication date Aug 24, 2023
- EBARA CORPORATION
- Hiroaki NISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING SURFACES OF COMPONENTS USED IN PLASMA ETCHING TOOLS USING A...
- Publication number 20230215703
- Publication date Jul 6, 2023
- LAM RESEARCH CORPORATION
- Robin KOSHY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONDITIONING TREATMENT FOR ALD PRODUCTIVITY
- Publication number 20230139267
- Publication date May 4, 2023
- Applied Materials, Inc.
- Christina L. Engler
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...
- Publication number 20230103165
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
- Publication number 20230023914
- Publication date Jan 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Lin WANG
- B08 - CLEANING
Information Patent Application
Process Kit Conditioning Chamber
- Publication number 20220189749
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Ribhu Gautam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220102114
- Publication date Mar 31, 2022
- Kokusai Electric Corporation
- Naofumi OHASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Particle removal during fabrication of electrochromic devices

Methods and apparatus for conductance liners in semiconductor proce...

Shutter disc for a semiconductor processing tool

Conditioning treatment for ALD productivity

Conditioning chamber component

Micro-surface morphological matching for reactor components

Shutter disc for a semiconductor processing tool

Chamber processes for reducing backside particles

Alignment module with a cleaning chamber

3D printed chamber components configured for lower film stress and...

Conditioning treatment for ALD productivity

Capacitive sensing data integration for plasma chamber condition mo...

System and method for aligning a mask with a substrate

Cleaning method

Low contamination chamber for surface activation

Plasma processing system having an inspection tool and controller t...

Substrate processing apparatus and cleaning method

Plasma processing apparatus

Micro-surface morphological matching for reactor components

Conditioning chamber component

Method of cleaning a substrate processing apparatus and the substra...

Substrate processing chamber with showerhead having cooled faceplate

Method for etching organic region

Chemical vapor deposition tool and operating method thereof

Textured skin for chamber components

Method and system for fabrication semiconductor device

3D printed chamber components configured for lower film stress and...

Plasma film forming method

Process kit shield for improved particle reduction

Plasma etching method and plasma etching apparatus

Patents Applicationslast 30 patents

PLASMA SOURCE WITH A COOLANT LEAKAGE DETECTION SYSTEM

SUBSTRATE TREATMENT SYSTEM

EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...

DRY-DEVELOPING RESIST FILM FORMED OF METAL-CONTAINING RESIST

SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL

PLASMA PROCESSING METHOD

INVERTED PLASMA SOURCE, AND METHOD

MULTI-ZONE COATINGS ON PARTS FOR GALLING PREVENTION AND HIGH-TEMPER...

SUBSTRATE PROCESSING SYSTEM AND TRANSFER METHOD

PLASMA PROCESSING APPARATUS

INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS

MICROWAVE PRECLEAN APPARATUS AND PROCESSING METHOD FOR IMPURITY REM...

CONDITIONING CHAMBER COMPONENT

METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE...

ADVANCED DRY CLEANING APPARATUS AND METHOD FOR DRIVE DEVICE

EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATU...

CLEANING METHOD AND PLASMA PROCESSING METHOD

SHARED RPS CLEAN AND BYPASS DELIVERY ARCHITECTURE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL

CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...

PLASMA DEVICE FOR GAS-BASED SURFACE TREATMENT AND WATER ACTIVATION

METHODS AND SYSTEMS FOR FILLING GAP FEATURES ON SUBSTRATE SURFACES

SUBSTRATE PROCESSING APPARATUS, AND WATERPROOFING DEVICE FOR ACOUST...

SEALING SURFACES OF COMPONENTS USED IN PLASMA ETCHING TOOLS USING A...

CONDITIONING TREATMENT FOR ALD PRODUCTIVITY

CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MO...

SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL

Process Kit Conditioning Chamber

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE