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SUBSTRATE TREATMENT SYSTEM
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Publication date Jul 10, 2025
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TOKYO ELECTRON LIMITED
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H01 - BASIC ELECTRIC ELEMENTS
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SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
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Publication number 20250137114
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Publication date May 1, 2025
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Taiwan Semiconductor Manufacturing Company, Ltd.
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Yi-Lin WANG
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PLASMA PROCESSING METHOD
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Publication number 20250104981
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Publication date Mar 27, 2025
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Hitachi High-Tech Corporation
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Kosa HIROTA
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H01 - BASIC ELECTRIC ELEMENTS
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PLASMA PROCESSING APPARATUS
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Publication number 20250006473
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Publication date Jan 2, 2025
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TOKYO ELECTRON LIMITED
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Yuki ONODERA
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H01 - BASIC ELECTRIC ELEMENTS
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CONDITIONING TREATMENT FOR ALD PRODUCTIVITY
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Publication number 20230139267
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Publication date May 4, 2023
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Applied Materials, Inc.
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Christina L. Engler
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Process Kit Conditioning Chamber
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Publication number 20220189749
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Publication date Jun 16, 2022
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Applied Materials, Inc.
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Ribhu Gautam
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METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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Publication number 20220102114
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Publication date Mar 31, 2022
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Kokusai Electric Corporation
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Naofumi OHASHI
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...