Hygiene

Industry

CPC
G03F7/70908

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70908Hygiene

Industries

Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 12,055,865
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for removing airborne molecular contaminants from...
- Patent number 11,980,847
- Issue date May 14, 2024
- Entegris, Inc.
- Marc Venet
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
System for supplying photoresist and method for fabricating semicon...
- Patent number 11,733,616
- Issue date Aug 22, 2023
- Samsung Electronics Co., Ltd.
- Takashi Sasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 11,609,504
- Issue date Mar 21, 2023
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Object stage bearing for lithographic apparatus
- Patent number 11,442,369
- Issue date Sep 13, 2022
- ASML Netherlands B.V.
- Yang-Shan Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photolithography system and methods of operating the same
- Patent number 11,442,365
- Issue date Sep 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Kuang Sun
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for cleaning semiconductor wafer backside surface by hybrid...
- Patent number 11,417,512
- Issue date Aug 16, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsuan-Ying Mai
- B08 - CLEANING
Information Patent Grant
Particle removal device and method
- Patent number 11,392,041
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for operating an optical apparatus, and optical apparatus
- Patent number 11,307,505
- Issue date Apr 19, 2022
- Carl Zeiss SMT GmbH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Suction device, carry-in method, carrier system and exposure appara...
- Patent number 11,289,362
- Issue date Mar 29, 2022
- Nikon Corporation
- Go Ichinose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of operating semiconductor apparatus and semiconductor appar...
- Patent number 11,243,479
- Issue date Feb 8, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiang Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lens control for lithography tools
- Patent number 11,221,563
- Issue date Jan 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh Lin Yang
- G02 - OPTICS
Information Patent Grant
Molding apparatus for molding composition on substrate with mold, a...
- Patent number 11,194,249
- Issue date Dec 7, 2021
- Canon Kabushiki Kaisha
- Atsushi Kimura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Extreme ultraviolet light generation device and electronic device m...
- Patent number 11,126,095
- Issue date Sep 21, 2021
- Gigaphoton Inc.
- Georg Saumagne
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 11,092,896
- Issue date Aug 17, 2021
- Gigaphoton Inc.
- Yuta Takashima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System, a lithographic apparatus, and a method for reducing oxidati...
- Patent number 11,086,238
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Lucas Henricus Johannes Stevens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,086,055
- Issue date Aug 10, 2021
- Carl Zeiss SMT GmbH
- Peter Huber
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet lithography system
- Patent number 11,086,237
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for removing airborne molecular contaminants from...
- Patent number 11,020,704
- Issue date Jun 1, 2021
- Entegris, Inc.
- Marc Venet
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for exposing wafer
- Patent number 11,016,390
- Issue date May 25, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Objective lens protection device, objective lens system and lithogr...
- Patent number 10,983,448
- Issue date Apr 20, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Xianming Li
- G02 - OPTICS
Information Patent Grant
Method for detecting EUV pellicle rupture
- Patent number 10,976,674
- Issue date Apr 13, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask cleaning apparatus and method for cleaning mask
- Patent number 10,942,446
- Issue date Mar 9, 2021
- Semes Co. Ltd
- Seong Soo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprinting system, method of manufacturing semiconductor device, an...
- Patent number 10,915,018
- Issue date Feb 9, 2021
- TOSHIBA MEMORY CORPORATION
- Takahito Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprinting method and apparatus
- Patent number 10,895,806
- Issue date Jan 19, 2021
- Canon Kabushiki Kaisha
- Mehul N. Patel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,866,530
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens control for lithography tools
- Patent number 10,845,717
- Issue date Nov 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yueh Lin Yang
- G02 - OPTICS
Information Patent Grant
Lithography system and method for exposing wafer
- Patent number 10,775,700
- Issue date Sep 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Extreme ultraviolet (EUV) exposure apparatus and method of manufact...
- Patent number 10,754,254
- Issue date Aug 25, 2020
- Samsung Electronics Co., Ltd.
- Keunhee Bai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,705,432
- Issue date Jul 7, 2020
- ASML Netherlands B.V.
- Aleksey Yurievich Kolesnychenko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS, SYSTEM AND METHOD
- Publication number 20240385525
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20240353766
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20240192611
- Publication date Jun 13, 2024
- SEMES CO., LTD.
- Ho Jin JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240142886
- Publication date May 2, 2024
- Samsung Electronics Co., Ltd.
- Injae Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MA...
- Publication number 20240085811
- Publication date Mar 14, 2024
- Canon Kabushiki Kaisha
- TAKAHIRO YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS, SYSTEM AND METHOD
- Publication number 20230384682
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Han Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...
- Publication number 20230341784
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Tijmen Pieter COLLIGNON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR SUPPLYING PHOTORESIST AND METHOD FOR FABRICATING SEMICON...
- Publication number 20230115351
- Publication date Apr 13, 2023
- Samsung Electronics Co., Ltd.
- Takashi Sasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR FABRICATING SYSTEM HAVIND HYBRID BURSH ASSEMBLY
- Publication number 20220351957
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsuan-Ying MAI
- B08 - CLEANING
Information Patent Application
PARTICLE REMOVAL DEVICE AND METHOD
- Publication number 20220334496
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM
- Publication number 20210364934
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CLEANING SEMICONDUCTOR WAFER BACKSIDE SURFACE BY HYBRID...
- Publication number 20210249253
- Publication date Aug 12, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsuan-Ying MAI
- B08 - CLEANING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20210096476
- Publication date Apr 1, 2021
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE M...
- Publication number 20210080842
- Publication date Mar 18, 2021
- Gigaphoton Inc.
- Georg SAUMAGNE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LENS CONTROL FOR LITHOGRAPHY TOOLS
- Publication number 20210033984
- Publication date Feb 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yueh Lin YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR REMOVING AIRBORNE MOLECULAR CONTAMINANTS FROM...
- Publication number 20210031141
- Publication date Feb 4, 2021
- Entegris, Inc.
- Marc VENET
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR EXPOSING WAFER
- Publication number 20200409268
- Publication date Dec 31, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hung LIAO
- G02 - OPTICS
Information Patent Application
Object Stage Bearing for Lithographic Apparatus
- Publication number 20200333717
- Publication date Oct 22, 2020
- ASML NETHERLANDS B.V.
- Yang-Shan HUANG
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
LENS CONTROL FOR LITHOGRAPHY TOOLS
- Publication number 20200209764
- Publication date Jul 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yueh Lin YANG
- G02 - OPTICS
Information Patent Application
METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS
- Publication number 20200183292
- Publication date Jun 11, 2020
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G01 - MEASURING TESTING
Information Patent Application
SUCTION DEVICE, CARRY-IN METHOD, CARRIER SYSTEM AND EXPOSURE APPARA...
- Publication number 20200176298
- Publication date Jun 4, 2020
- Nikon Corporation
- Go ICHINOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20190339428
- Publication date Nov 7, 2019
- Carl Zeiss SMT GMBH
- Peter HUBER
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190324374
- Publication date Oct 24, 2019
- ASML NETHERLANDS B.V.
- Bob Streefkerk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190271920
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Johannes Catharinus Hubertus Mulkens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190235398
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Jan Steven Christiaan WESTERLAKEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20190212662
- Publication date Jul 11, 2019
- ASML NETHERLANDS B.V.
- Aleksey Yurievich KOLESNYCHENKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS CONTAMINATION PREVENTION DEVICE AND METHOD
- Publication number 20190187561
- Publication date Jun 20, 2019
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Baotong HAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUCTION DEVICE, CARRY-IN METHOD, CARRIER SYSTEM AND EXPOSURE APPARA...
- Publication number 20190172745
- Publication date Jun 6, 2019
- Nikon Corporation
- Go ICHINOSE
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180246418
- Publication date Aug 30, 2018
- ASML NETHERLANDS B.V.
- Aleksey Yurievich KOLESNYCHENKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20180203364
- Publication date Jul 19, 2018
- ASMLNETHERLANDS B.V.
- Bob STREEFKERK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Extreme ultraviolet lithography system

System and method for removing airborne molecular contaminants from...

System for supplying photoresist and method for fabricating semicon...

Lithographic apparatus and device manufacturing method

Object stage bearing for lithographic apparatus

EUV photolithography system and methods of operating the same

Method for cleaning semiconductor wafer backside surface by hybrid...

Particle removal device and method

Method for operating an optical apparatus, and optical apparatus

Suction device, carry-in method, carrier system and exposure appara...

Method of operating semiconductor apparatus and semiconductor appar...

Lens control for lithography tools

Molding apparatus for molding composition on substrate with mold, a...

Extreme ultraviolet light generation device and electronic device m...

Extreme ultraviolet light generation apparatus and electronic devic...

System, a lithographic apparatus, and a method for reducing oxidati...

Mirror, in particular for a microlithographic projection exposure a...

Extreme ultraviolet lithography system

System and method for removing airborne molecular contaminants from...

Method for exposing wafer

Objective lens protection device, objective lens system and lithogr...

Method for detecting EUV pellicle rupture

Mask cleaning apparatus and method for cleaning mask

Imprinting system, method of manufacturing semiconductor device, an...

Imprinting method and apparatus

Lithographic apparatus and device manufacturing method

Lens control for lithography tools

Lithography system and method for exposing wafer

Extreme ultraviolet (EUV) exposure apparatus and method of manufact...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

APPARATUS, SYSTEM AND METHOD

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

SUBSTRATE PROCESSING APPARATUS

DETERMINING APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MA...

APPARATUS, SYSTEM AND METHOD

METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...

SYSTEM FOR SUPPLYING PHOTORESIST AND METHOD FOR FABRICATING SEMICON...

SEMICONDUCTOR FABRICATING SYSTEM HAVIND HYBRID BURSH ASSEMBLY

PARTICLE REMOVAL DEVICE AND METHOD

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

METHOD FOR CLEANING SEMICONDUCTOR WAFER BACKSIDE SURFACE BY HYBRID...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE AND ELECTRONIC DEVICE M...

LENS CONTROL FOR LITHOGRAPHY TOOLS

SYSTEM AND METHOD FOR REMOVING AIRBORNE MOLECULAR CONTAMINANTS FROM...

METHOD FOR EXPOSING WAFER

Object Stage Bearing for Lithographic Apparatus

LENS CONTROL FOR LITHOGRAPHY TOOLS

METHOD FOR OPERATING AN OPTICAL APPARATUS, AND OPTICAL APPARATUS

SUCTION DEVICE, CARRY-IN METHOD, CARRIER SYSTEM AND EXPOSURE APPARA...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LENS CONTAMINATION PREVENTION DEVICE AND METHOD

SUCTION DEVICE, CARRY-IN METHOD, CARRIER SYSTEM AND EXPOSURE APPARA...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD