Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings

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G03F7/70091

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings

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Patents Grantslast 30 patents

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Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Image-forming optical system, exposure apparatus, and device produc...

Metrology method and lithographic apparatuses

Metrology of semiconductor devices in electron micrographs using fa...

EUV lithography system with 3D sensing and tunning modules

Exposure apparatus, exposure method, and article manufacturing method

Illumination apparatus, measurement apparatus, substrate processing...

Lithographic apparatus, metrology system, and illumination systems...

Exposure apparatus, exposure method, and method of manufacturing ar...

Image-forming optical system, exposure apparatus, and device produc...

Method and apparatus for determining a radiation beam intensity pro...

Light source apparatus, illumination apparatus, exposure apparatus,...

Method to determine a patterning process parameter

Apparatus and method for monitoring reflectivity of the collector f...

Lithography scanner

Method and apparatus for source mask optimization configured to inc...

Selection of substrate measurement recipes

Tool to provide integrated circuit masks with accurate dimensional...

Optical system for a projection exposure apparatus

Tool to provide integrated circuit masks with accurate dimensional...

Image-forming optical system, exposure apparatus, and device produc...

Apparatus and method for monitoring reflectivity of the collector f...

Method and device for characterizing a mask for microlithography

Source and mask optimization by changing intensity and shape of the...

Lithographic mask functions to model the incident angles of a parti...

Metal-compound-removing solvent and method in lithography

Method of optimizing a metrology process

Illumination optical assembly, exposure apparatus, and device manuf...

Model-based scanner tuning systems and methods

Method for determining a focus position of a lithography mask and m...

Evaluation method, exposure method, and method for manufacturing an...

Patents Applicationslast 30 patents

METHOD FOR SIMULATING ILLUMINATION AND IMAGING PROPERTIES OF AN OPT...

SYSTEMS AND METHODS FOR FORMING TOPOLOGICAL LATTICES OF PLASMONIC M...

EUV Lithography System With 3D Sensing and Tunning Modules

ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...

METROLOGY SYSTEM AND COHERENCE ADJUSTERS

DETECTION DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD

EUV LITHOGRAPHY SYSTEM WITH 3D SENSING AND TUNNING MODULES

METHODS OF PATTERNING A PHOTORESIST, AND RELATED PATTERNING SYSTEMS

ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

METROLOGY METHOD AND LITHOGRAPHIC APPARATUSES

EDGE EXPOSURE APPARATUS AND LIGHT SOURCE OUTPUT CONTROL METHOD

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEM, AND ILLUMINATION SYSTEMS...

DETECTING METHOD FOR MANUFACTURING PROCESS OF SEMICONDUCTOR

EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD

METROLOGY OF SEMICONDUCTOR DEVICES IN ELECTRON MICROGRAPHS USING FA...

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

APPARATUS AND METHOD FOR MONITORING REFLECTIVITY OF THE COLLECTOR F...

METHOD AND APPARATUS FOR SOURCE MASK OPTIMIZATION CONFIGURED TO INC...

OPTICAL SYSTEM FOR A PROJECTION EXPOSURE APPARATUS

Lithography Scanner

MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS

LIGHT SOURCE APPARATUS, ILLUMINATION APPARATUS, EXPOSURE APPARATUS,...

Tool To Provide Integrated Circuit Masks With Accurate Dimensional...

Tool To Provide Integrated Circuit Masks With Accurate Dimensional...

METHOD OF DETERMINING PELLICLE DEGRADATION COMPENSATION CORRECTIONS...

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

SELECTION OF SUBSTRATE MEASUREMENT RECIPES

METHOD FOR DETERMINING A FOCUS POSITION OF A LITHOGRAPHY MASK AND M...