Imagewise removal using liquid means

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/30Imagewise removal using liquid means

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Patents Grantslast 30 patents

Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 12,165,866
- Issue date Dec 10, 2024
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
- Patent number 12,140,866
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Film processing method
- Patent number 12,119,242
- Issue date Oct 15, 2024
- SCREEN Holdings Co., Ltd.
- Yuji Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 12,105,419
- Issue date Oct 1, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for treating a relief plate precursor having a...
- Patent number 12,078,932
- Issue date Sep 3, 2024
- XSYS PREPRESS N.V.
- Bart Wattyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid crystal display device and manufacturing method thereof
- Patent number 12,072,581
- Issue date Aug 27, 2024
- Japan Display Inc.
- Shoichi Uchino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate processing method, micropattern forming method, and subst...
- Patent number 12,057,323
- Issue date Aug 6, 2024
- Samsung Electronics Co., Ltd.
- Sangjine Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, laminate, and pattern forming pro...
- Patent number 12,055,853
- Issue date Aug 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of operating drippage prevention system
- Patent number 12,048,944
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Hung Wang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
UV patternable polymer blends for organic thin-film transistors
- Patent number 12,048,236
- Issue date Jul 23, 2024
- Corning Incorporated
- Mingqian He
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ion generating device, method for manufacturing same, and air condi...
- Patent number 12,036,562
- Issue date Jul 16, 2024
- LG Electronics Inc.
- Sanggu Lee
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,038,689
- Issue date Jul 16, 2024
- FUJIFILM Corporation
- Akihiro Kaneko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,290
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive film and method for forming permanent mask resist
- Patent number 12,032,292
- Issue date Jul 9, 2024
- Resonac Corporation
- Hideki Etori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for treating a relief printing plate precursor...
- Patent number 12,023,907
- Issue date Jul 2, 2024
- XSYS PREPRESS N.V.
- Bart Marc Luc Wattyn
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,013,636
- Issue date Jun 18, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nozzle, substrate processing apparatus, and substrate processing me...
- Patent number 12,007,692
- Issue date Jun 11, 2024
- Tokyo Electron Limited
- Hiroki Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming process
- Patent number 11,994,799
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid heating device
- Patent number 11,985,736
- Issue date May 14, 2024
- Kelk Ltd.
- Daisuke Watanabe
- B08 - CLEANING
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 11,966,162
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,966,159
- Issue date Apr 23, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing treatment method and developing treatment apparatus
- Patent number 11,960,209
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Akiko Kai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,953,827
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for treating and transporting a relief printin...
- Patent number 11,953,834
- Issue date Apr 9, 2024
- XSYS PREPRESS N.V.
- Bart Wattyn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making photolithography mask plate
- Patent number 11,947,261
- Issue date Apr 2, 2024
- Tsinghua University
- Mo Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, ME...
- Publication number 20240391232
- Publication date Nov 28, 2024
- FUJIFILM CORPORATION
- Keisuke ARIMURA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EMBEDDING REDISTRIBUTION LAYER METAL TRACES IN A POLYMERIC DIELECTRIC
- Publication number 20240379411
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Peng SOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Optimizing Negative Tone Development Photoresist Model
- Publication number 20240369942
- Publication date Nov 7, 2024
- Dongfang Jingyuan Electron CO., LTD.
- Shijia GAO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, ME...
- Publication number 20240359500
- Publication date Oct 31, 2024
- FUJIFILM CORPORATION
- Yusuke NAMBA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING SYSTEM, AND PROCESSING METHOD
- Publication number 20240345484
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Shinji Kobayashi
- C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
Information Patent Application
METHOD OF OPERATING DRIPPAGE PREVENTION SYSTEM
- Publication number 20240342745
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hung WANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240339334
- Publication date Oct 10, 2024
- Samsung Electronics Co., Ltd.
- Sangjine PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A Lithographic Printing Plate Precursor
- Publication number 20240337942
- Publication date Oct 10, 2024
- AGFA Offset BV
- Hubertus Van Aert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240321624
- Publication date Sep 26, 2024
- DAIKIN FINETECH, LTD.
- Satoshi USHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR TREATING A RELIEF PRECURSOR WITH LIQUID
- Publication number 20240310734
- Publication date Sep 19, 2024
- XSYS PREPRESS N.V.
- Bart Marc Luc WATTYN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING SOLUTION AND METHOD OF CLEANING WAFER
- Publication number 20240297036
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
FLOW CELLS AND METHODS FOR MAKING THE SAME
- Publication number 20240288765
- Publication date Aug 29, 2024
- Illumina, Inc.
- Ravi Billa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240280915
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240280903
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithographic Method for Imprinting Three-Dimensional Microstructure...
- Publication number 20240248395
- Publication date Jul 25, 2024
- JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH
- Ladislav KUNA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Fabrication of Microscale Structures
- Publication number 20240241450
- Publication date Jul 18, 2024
- Meta Materials Inc.
- Milad Khoshnegar Shahrestani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20240231235
- Publication date Jul 11, 2024
- FUJIFILM CORPORATION
- Kei YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240231224
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUPPORT FOR LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLAT...
- Publication number 20240217253
- Publication date Jul 4, 2024
- FUJIFILM CORPORATION
- Atsushi MATSUURA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
WASHOUT PROCESSOR AND WASHING METHOD
- Publication number 20240210834
- Publication date Jun 27, 2024
- FUJIFILM CORPORATION
- Masato SHIRAKAWA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
REGENERATION TREATMENT APPARATUS, WASHOUT PROCESSOR, AND MANUFACTUR...
- Publication number 20240190726
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Seiji TAJIMA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...
- Publication number 20240134274
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Timothy William Weidman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20240118607
- Publication date Apr 11, 2024
- SEMES CO.,LTD
- Hyun YOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...
- Publication number 20240112933
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jeonghee Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING M...
- Publication number 20240103374
- Publication date Mar 28, 2024
- FUJIFILM CORPORATION
- Tetsuya SHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20240085788
- Publication date Mar 14, 2024
- DUK SAN NEOLUX CO., LTD.
- Jun BAE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240079251
- Publication date Mar 7, 2024
- SCREEN Holdings Co., Ltd.
- Jun KOMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR ELECTRICALLY CONDUCTIVE MEMBRANE SEPARATION
- Publication number 20240042387
- Publication date Feb 8, 2024
- SiTration, Inc.
- Brendan D. Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Imagewise removal using liquid means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer cleaning apparatus and wafer cleaning method using the same

Photoacid generators, photoresist compositions, and pattern formati...

Film processing method

Salt, quencher, resist composition and method for producing resist...

Resist composition and method of forming resist pattern

Apparatus and method for treating a relief plate precursor having a...

Liquid crystal display device and manufacturing method thereof

Substrate processing method, micropattern forming method, and subst...

Photosensitive resin composition, laminate, and pattern forming pro...

Method of operating drippage prevention system

UV patternable polymer blends for organic thin-film transistors

Ion generating device, method for manufacturing same, and air condi...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive film and method for forming permanent mask resist

Apparatus and method for treating a relief printing plate precursor...

Salt, acid generator, resist composition and method for producing r...

Nozzle, substrate processing apparatus, and substrate processing me...

Negative resist composition and pattern forming process

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Fluid heating device

Semiconductor devices and methods of manufacturing

Photoresist composition and method of manufacturing a semiconductor...

Radiation-sensitive resin composition and method for forming pattern

Organometallic solution based high resolution patterning compositions

Developing treatment method and developing treatment apparatus

Molecular resist composition and patterning process

Apparatus and method for treating and transporting a relief printin...

Method for making photolithography mask plate

Patents Applicationslast 30 patents

ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, ME...

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

EMBEDDING REDISTRIBUTION LAYER METAL TRACES IN A POLYMERIC DIELECTRIC

Method for Optimizing Negative Tone Development Photoresist Model

ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, ME...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

PROCESSING SYSTEM, AND PROCESSING METHOD

METHOD OF OPERATING DRIPPAGE PREVENTION SYSTEM

SUBSTRATE PROCESSING APPARATUS

A Lithographic Printing Plate Precursor

SUBSTRATE PROCESSING APPARATUS

APPARATUS AND METHOD FOR TREATING A RELIEF PRECURSOR WITH LIQUID

CLEANING SOLUTION AND METHOD OF CLEANING WAFER

FLOW CELLS AND METHODS FOR MAKING THE SAME

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

Lithographic Method for Imprinting Three-Dimensional Microstructure...

Fabrication of Microscale Structures

METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUC...

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

SUPPORT FOR LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLAT...

WASHOUT PROCESSOR AND WASHING METHOD

REGENERATION TREATMENT APPARATUS, WASHOUT PROCESSOR, AND MANUFACTUR...

HALOGEN-AND ALIPHATIC-CONTAINING ORGANOTIN PHOTORESISTS AND METHODS...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD USING T...

TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, PATTERN FORMING M...

METHOD FOR PREPARING PIXEL DEFINE LAYER

SUBSTRATE PROCESSING APPARATUS

SYSTEM AND METHOD FOR ELECTRICALLY CONDUCTIVE MEMBRANE SEPARATION